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    SENSOR APPARATUS AND METHOD FOR LITHOGRAPHIC MEASUREMENTS
    2.
    发明申请
    SENSOR APPARATUS AND METHOD FOR LITHOGRAPHIC MEASUREMENTS 审中-公开

    公开(公告)号：WO2020007588A1

    公开(公告)日：2020-01-09

    申请号：PCT/EP2019/065592

    申请日：2019-06-13

    Applicant: ASML NETHERLANDS B.V.

    Inventor： HUISMAN, Simon, Reinald ,  POLO, Alessandro

    IPC: G03F9/00 ,  G03F7/20 ,  G01J9/00

    Abstract: A sensor apparatus (300) for determining a position of a target (330) of a substrate (W) comprising, projection optics (315;321) configured to project a radiation beam (310) onto the substrate, collection optics (321) configured to collect measurement radiation (325) that has scattered from the target, a wavefront sensing system (335) configured to determine a pupil function variation of at least a portion (355) of the measurement radiation and output a signal (340) indicative thereof, and a measurement system (350) configured to receive the signal and to determine the position of the target in at least partial dependence on the collected measurement radiation and the determined pupil function variation of at least a portion of the measurement radiation.

    METROLOGY SENSOR, LITHOGRAPHIC APPARATUS AND METHOD FOR MANUFACTURING DEVICES
    6.
    发明申请
    METROLOGY SENSOR, LITHOGRAPHIC APPARATUS AND METHOD FOR MANUFACTURING DEVICES 审中-公开

    公开(公告)号：WO2018206177A1

    公开(公告)日：2018-11-15

    申请号：PCT/EP2018/055394

    申请日：2018-03-06

    Applicant: ASML NETHERLANDS B.V.

    Inventor： GOORDEN, Sebastianus, Adrianus ,  HUISMAN, Simon, Reinald ,  AKBULUT, Duygu ,  POLO, Alessandro ,  MATHIJSSEN, Simon, Gijsbert, Josephus

    IPC: G03F9/00

    Abstract: Disclosed is a metrology sensor apparatus and associated method. The metrology sensor apparatus comprises an illumination system operable to illuminate a metrology mark on a substrate with illumination radiation having a first polarization state and an optical collection system configured to collect scattered radiation, following scattering of the illumination radiation by the metrology mark. The metrology mark comprises a main structure and changes, relative to the first polarization state, at least one of a polarization state of a first portion of the scattered radiation predominately resultant from scattering by the main structure and a polarization state of a second portion of radiation predominately resultant from scattering by one or more features other than the main structure, such that the polarization state of the first portion of the scattered radiation is different to the polarization state of the second portion of the scattered radiation. The metrology sensor apparatus further comprises an optical filtering system which filters out the second portion of the scattered radiation based on its polarization state.

    RADIATION RECEIVING SYSTEM
    8.
    发明申请
    RADIATION RECEIVING SYSTEM 审中-公开

    公开(公告)号：WO2018184802A1

    公开(公告)日：2018-10-11

    申请号：PCT/EP2018/056357

    申请日：2018-03-14

    Applicant: ASML NETHERLANDS B.V.

    Inventor： POLO, Alessandro ,  PANDEY, Nitesh ,  KOOLEN, Armand, Eugene, Albert

    IPC: G03F7/20 ,  G01J3/02 ,  G01J3/18 ,  G01J3/28 ,  G01J3/36

    Abstract: A radiation receiving system for an inspection apparatus, used to perform measurements on target structures on lithographic substrates as part of a lithographic process, comprises a spectrometer with a number of inputs. The radiation receiving system comprises: a plurality of inputs, each input being arranged to provide radiation from a target structure; a first optical element operable to receive radiation from each of the plurality of inputs; a second optical element operable to receive radiation from the first optical element and to scatter the radiation; and a third optical element operable to direct the scattered radiation onto a detector. The second optical element may for example be a reflective diffraction grating that diffracts incoming radiation into an output radiation spectrum.

    POSITION SENSOR, LITHOGRAPHIC APPARATUS AND METHOD FOR MANUFACTURING DEVICES
    9.
    发明申请
    POSITION SENSOR, LITHOGRAPHIC APPARATUS AND METHOD FOR MANUFACTURING DEVICES 审中-公开
    位置传感器，光刻设备和用于制造设备的方法

    公开(公告)号：WO2018041440A1

    公开(公告)日：2018-03-08

    申请号：PCT/EP2017/066321

    申请日：2017-06-30

    Applicant: ASML NETHERLANDS B.V.

    Inventor： HUISMAN, Simon, Reinald ,  MATHIJSSEN, Simon, Gijsbert, Josephus ,  GOORDEN, Sebastianus, Adrianus ,  AKBULUT, Duygu ,  POLO, Alessandro

    IPC: G03F9/00

    Abstract: An alignment sensor in a lithographic apparatus comprises an optical system (500; 600) configured to deliver, collect and process radiation selectively in a first waveband (e.g. 500-900 nm) and/or in a second waveband (e.g. 1500-2500 nm). The radiation of the first and second wavebands share a common optical path (506-508; 606) in at least some portion of the optical system, while the radiation of the first waveband is processed by a first processing sub-system (552a) and the radiation of the second waveband (552b) is processed by a second processing sub-system. The processing subsystems in one example comprise self-referencing interferometers (556a/556b; 656a/656b). The radiation of the second waveband allow marks to be measure through an opaque layer (308) such as carbon hard mask. Optical coatings and other components of each processing sub-system can be tailored to the respective waveband, without completely duplicating the optical system.

    Abstract translation: 光刻设备中的对准传感器包括光学系统（500; 600），所述光学系统被配置为在第一波段（例如500-900nm）和/或第二波段中选择性地传送，收集和处理辐射 波段（例如1500-2500nm）。 第一和第二波段的辐射在光学系统的至少一些部分中共享公共光路（506-508; 606），而第一波段的辐射由第一处理子系统（552a）处理，并且 第二波段（552b）的辐射由第二处理子系统处理。 一个例子中的处理子系统包括自参考干涉仪（556a / 556b; 656a / 656b）。 第二波段的辐射允许通过诸如碳硬掩模的不透明层（308）来测量标记。 每个处理子系统的光学涂层和其他部件可以根据相应的波段定制，而不必完全复制光学系统。

    POSITION SENSING ARRANGEMENT AND LITHOGRAPHIC APPARATUS INCLUDING SUCH AN ARRANGEMENT, POSITION SENSING METHOD AND DEVICE MANUFACTURING METHOD
    10.
    发明申请
    POSITION SENSING ARRANGEMENT AND LITHOGRAPHIC APPARATUS INCLUDING SUCH AN ARRANGEMENT, POSITION SENSING METHOD AND DEVICE MANUFACTURING METHOD 审中-公开
    位置检测装置和光刻装置，包括这种装置，位置检测方法和装置制造方法

    公开(公告)号：WO2017125352A1

    公开(公告)日：2017-07-27

    申请号：PCT/EP2017/050806

    申请日：2017-01-16

    Applicant: ASML NETHERLANDS B.V.

    Inventor： HUISMAN, Simon, Reinald ,  POLO, Alessandro ,  AKBULUT, Duygu ,  GOORDEN, Sebastianus, Adrianus ,  DEN BOEF, Arie, Jeffrey

    IPC: G03F9/00 ,  G01B9/02

    CPC classification number: G03F9/7049 ,  G01B9/02003 ,  G01B9/0201 ,  G01B9/02097 ,  G01D5/266

    Abstract: In an alignment sensor (AS) of a lithographic apparatus (LA), position sensing radiation (222) is delivered to a target (P1). After reflection or diffraction from the target, position sensing radiation (226) is processed (228, 336, 338) to determine a position of the target. Reference radiation (362) interferes with the position sensing radiation (226) while a relative phase modulation is applied between the reference radiation and the position sensing radiation. The interfering radiation includes a time-varying component defined by the applied phase modulation. The interfering radiation is delivered to two photodetectors (338a, 338b) in such a way that each photodetector receives said time-varying component in anti-phase to that received at the other photodetector. A difference signal (i(t)) from said photodetectors contains an amplified, low noise version of said time-varying component. This is used in determining the position of the target. Mode matching enhances interference. Surface scattered radiation is rejected.

    Abstract translation: 在光刻设备（LA）的对准传感器（AS）中，位置感测辐射（222）被传送到目标（P1）。 在从目标反射或衍射之后，处理位置感测辐射（226）（228,336,338）以确定目标的位置。 在参考辐射和位置感测辐射之间施加相对相位调制的同时，参考辐射（362）干扰位置感测辐射（226）。 干扰辐射包括由所施加的相位调制限定的时变分量。 干扰辐射以这样的方式被传送到两个光电检测器（338a，338b），使得每个光电检测器接收与另一个光电检测器处接收到的相位相反的时间变化分量。 来自所述光检测器的差信号（i（t））包含所述时变成分的放大的低噪声版本。 这用于确定目标的位置。 模式匹配增强了干扰。 表面散射的辐射被拒绝。

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