公开(公告)号：JP2009016868A

公开(公告)日：2009-01-22

申请号：JP2008251029

申请日：2008-09-29

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： BARTRAY PERTRUS R ,  BOX WILHELMUS J ,  KUIT JAN JAAP ,  LUIJTEN CARLO CORNELIS MARIA ,  LUTTIKHUIS BERNARDUS ANTONIUS ,  TEN BHOMER MICHAEL ,  MIGCHELBRINK FERDY

IPC: H01L21/027 ,  G02B7/02 ,  G03B27/42 ,  G03F7/20 ,  H01L21/68

CPC classification number: G03F7/7095 ,  G02B7/028 ,  G03F7/70833 ,  G03F7/70858 ,  G03F7/709

Abstract: PROBLEM TO BE SOLVED: To overcome the problems associated with the supply of conventional reference frame materials, without encountering performance problems in return. SOLUTION: The lithographic apparatus includes: a substrate table WT for holding a substrate W; a projection system PL for projecting a patterned beam onto a target portion of the substrate W; and an isolated reference frame MF for providing a reference surface with respect to which the substrate W is measured, wherein the reference frame MF comprises a material having a high coefficient of thermal expansion. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：为了克服与传统参考框架材料的供应相关的问题，而不会遇到性能问题。 光刻设备包括：用于保持衬底W的衬底台WT; 用于将图案化的光束投影到基板W的目标部分上的投影系统PL; 以及用于提供测量衬底W的参考表面的隔离参考框架MF，其中参考框架MF包括具有高热膨胀系数的材料。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2006179912A

公开(公告)日：2006-07-06

申请号：JP2005364357

申请日：2005-12-19

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： KUIT JAN JAAP

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70733

Abstract: PROBLEM TO BE SOLVED: To provide an exchangeable object handling apparatus suited to the streaming of continuous multiple exposure jobs in a lithographic apparatus. SOLUTION: The lithographic apparatus comprises an illumination system for conditioning a radiation beam, a patterning device support for supporting a patterning device capable of forming a patterned radiation beam by imparting a pattern to the cross section of a radiation beam, a substrate support for holding a substrate, a projection system for projecting the patterned radiation beam to the target of the substrate, and the exchangeable object handling apparatus for exchanging an exchangeable object between an exchangeable object loading station and the support. The exchangeable object handling apparatus is provided with three end effectors and more, and each effector can exchange the exchangeable object with one of the supports. COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：提供一种适用于在光刻设备中连续多次曝光作业流动的可交换物体处理装置。 解决方案：光刻设备包括用于调节辐射束的照明系统，用于支撑能够通过向辐射束的横截面赋予图案而形成图案化辐射束的图案形成装置的图案形成装置支撑件，衬底支撑件 用于保持基板，用于将图案化的辐射束投影到基板的目标的投影系统，以及用于在可更换物体装载站和支撑件之间交换可更换物体的可更换物体处理装置。 可交换物体处理装置设置有三个末端执行器和更多，并且每个执行器可以与一个支撑件交换可更换物体。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：JP2006013493A

公开(公告)日：2006-01-12

申请号：JP2005178873

申请日：2005-06-20

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： KUIT JAN JAAP ,  BARTRAY PETRUS RUTGERUS ,  BIJVOET DIRK-JAN ,  HOOGKAMP JAN F

IPC: H01L21/027 ,  B65G49/07 ,  G03B27/42 ,  G03F7/20 ,  H01L21/677

CPC classification number: G03F7/70733 ,  G03F7/7075

Abstract: PROBLEM TO BE SOLVED: To provide a lithography apparatus having an improved transfer unit.
SOLUTION: The lithography apparatus comprises a processing unit for performing a lithography process including exchangeable objects. The processing unit includes an illumination system for providing a radiant beam, a support structure for supporting a patterning device for providing the radiant beam with a desired pattern, a substrate holder for holding a substrate, and a projection system for projecting the patterned beam onto a target part of the substrate. The lithography apparatus further includes the transfer unit provided with a single robot. The single robot transfers a first exchangeable object from a loading station to the processing unit and transfers a second exchangeable object from the processing unit to an ejection station.
COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：提供一种具有改进的转印单元的光刻设备。 解决方案：光刻设备包括用于执行包括可交换对象的光刻处理的处理单元。 处理单元包括用于提供辐射束的照明系统，用于支撑用于提供所需图案的辐射束的图案形成装置的支撑结构，用于保持基板的基板保持器和用于将图案化的光束投影到 靶基底部分。 光刻设备还包括设置有单个机器人的传送单元。 单个机器人将第一可交换对象从加载站传送到处理单元，并将第二可交换对象从处理单元传送到排出站。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：JP2005244232A

公开(公告)日：2005-09-08

申请号：JP2005047175

申请日：2005-02-23

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： KUIT JAN JAAP

IPC: H01L21/677 ,  G03B27/42 ,  G03F7/20 ,  H01L21/027 ,  H01L21/68

CPC classification number: G03F7/7075 ,  G03F7/70991 ,  Y10S414/135

Abstract: PROBLEM TO BE SOLVED: To provide a lithography apparatus and a device manufacturing method.
SOLUTION: A carrier system configured to carry a substrate between the lithography apparatus and a track, in particular, is disclosed. This track is equipped with a single or multiple treatment devices. The carrier system can also carry the substrate between the treatment devices within the track. In an embodiment, a single or multiple tracks and the lithography apparatus are arranged with a spacing along a carrying device passage which is provided to the carrier system is provided. The substrate can be carried along the carrying device passage by the carrying device configured to hold the substrate.
COPYRIGHT: (C)2005,JPO&NCIPI

Abstract translation: 要解决的问题：提供一种光刻设备和设备制造方法。 具体地，公开了一种构造成在光刻设备和轨道之间承载衬底的载体系统。 该轨道配备有单个或多个治疗装置。 载体系统还可以在轨道内的处理装置之间承载衬底。 在一个实施例中，单个或多个轨道和光刻设备沿着提供给载体系统的承载装置通道间隔布置。 衬底可以通过构造成保持衬底的承载装置沿着承载装置通道承载。 版权所有（C）2005，JPO＆NCIPI

公开(公告)号：JP2005197698A

公开(公告)日：2005-07-21

申请号：JP2004375765

申请日：2004-12-27

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： BOOGAARTS MARTINUS GODEFRIDUS ,  BUTLER HANS ,  COX HENRIKUS HERMAN MARIE ,  CUIJPERS MARTINUS AGNES WILLEM ,  KUIT JAN JAAP

IPC: G03F9/00 ,  G01N21/88 ,  G03F7/20 ,  H01L21/027

CPC classification number: G03F7/70808 ,  G01N21/8851 ,  G03F7/709

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic projection apparatus, which minimizes an effect of gas vibrations or gas pressure changes around an exposure system, which are caused by the actuation of a movable part of the exposure system or of another system in a housing, on the position of a board. SOLUTION: The lithographic projection apparatus includes a position disturbance correcting system, which offsets a disturbance of the position of a board holder 19 holding the board 13. In the apparatus, a space 3 including the exposure system is separated by a holed wall 5 and is separated from a space 4 including another system by a movable wall 10. The space 3, therefore, damps or cuts off the vibrations or pressure changes of the gas. The vibrations of the gas may be offset by a speaker 61. This lithograph apparatus can be employed to provide a novel device manufacturing method. COPYRIGHT: (C)2005,JPO&NCIPI

Abstract translation: 要解决的问题：提供一种光刻投影装置，其使由曝光系统的可移动部分或另一系统的可动部分的致动引起的气体振动或暴露系统周围的气体压力变化的影响最小化 一个房屋，在一个董事会的职位。 解决方案：光刻投影设备包括位置干扰校正系统，其抵消了保持板13的板保持器19的位置的干扰。在该装置中，包括曝光系统的空间3由孔壁分隔开 并且通过可移动壁10与包括另一系统的空间4分离。因此，空间3阻止或切断气体的振动或压力变化。 气体的振动可以被扬声器61抵消。该光刻设备可用于提供新型的器件制造方法。 版权所有（C）2005，JPO＆NCIPI

公开(公告)号：SG133619A1

公开(公告)日：2007-07-30

申请号：SG2007049117

申请日：2005-06-20

Applicant: ASML NETHERLANDS BV

Inventor： KUIT JAN JAAP ,  BARTRAY PETRUS RUTGERUS ,  BIJVOET DIRK-JAN ,  HOOGKAMP JAN FREDERIK

IPC: G03B27/42 ,  G03F7/20

Abstract: A lithographic apparatus having an improved transfer unit, is presented. The lithographic apparatus includes a processing unit (5) that performs a lithographic process involving exchangeable objects (1,1a,1b) in which the processing unit includes an illumination system that provides a beam of radiation, a support structure configured to support a patterning device that imparts a desired pattern to the beam of radiation, a substrate holder configured to hold a substrate, and a projection system configured to project the patterned beam onto a target portion of the substrate. The lithographic apparatus also includes a transfer unit comprising a single robot (10). The single robot is configured to transfer a first exchangeable object from a loading station to the processing unit and to transfer a second exchangeable object from the processing unit to a discharge station.

公开(公告)号：DE602005018858D1

公开(公告)日：2010-03-04

申请号：DE602005018858

申请日：2005-06-21

Applicant: ASML NETHERLANDS BV

Inventor： KUIT JAN JAAP ,  BARTRAY PETRUS RUTGERUS ,  BIJVOET DIRK-JAN ,  HOOGKAMP JAN FREDERIK

IPC: G03F7/20 ,  B25J9/02 ,  G03B27/42 ,  H01L21/00

Abstract: A lithographic apparatus having an improved transfer unit, is presented. The lithographic apparatus includes a processing unit (5) that performs a lithographic process involving exchangeable objects (1,1a,1b) in which the processing unit includes an illumination system that provides a beam of radiation, a support structure configured to support a patterning device that imparts a desired pattern to the beam of radiation, a substrate holder configured to hold a substrate, and a projection system configured to project the patterned beam onto a target portion of the substrate. The lithographic apparatus also includes a transfer unit comprising a single robot (10). The single robot is configured to transfer a first exchangeable object from a loading station to the processing unit and to transfer a second exchangeable object from the processing unit to a discharge station.

公开(公告)号：SG131089A1

公开(公告)日：2007-04-26

申请号：SG2006066435

申请日：2006-09-25

Applicant: ASML NETHERLANDS BV ,  ASML HOLDING NV

Inventor： KUIT JAN JAAP ,  SCHAAP PETER ,  ROUX STEPHEN ,  OAECONNOR GEOFFREY

Abstract: A lithographic apparatus (1) arranged to transfer a pattern from a patterning structure (MA) onto a substrate (W) is disclosed that includes a substrate holder configured to hold a substrate and a substrate temperature conditioner configured to condition a temperature of the substrate prior to, during, or both, a transfer of the substrate to the substrate holder to substantially match a temperature of the substrate holder. Besides, there is provided a lithographic apparatus arranged to transfer a pattern from a patterning structure onto a substrate, comprising: a first patterning structure holder (MT) configured to hold a patterning structure (MA); a patterning structure temperature conditioner (140) configured to condition a temperature of the patterning structure prior to a transfer of the patterning structure to the patterning structure holder, wherein the patterning structure temperature conditioner is provided with a second patterning structure holder (113); and at least one system (125,126) to thermally condition the first and second patterning structure holder to substantially the same temperature.

公开(公告)号：NL2003962A

公开(公告)日：2010-06-28

申请号：NL2003962

申请日：2009-12-16

Applicant: ASML NETHERLANDS BV

Inventor： ONVLEE JOHANNES ,  KUIT JAN JAAP ,  KOS JOOST

IPC: G03F7/20 ,  G03F9/00

Abstract: A lithographic apparatus includes a support constructed to support a patterning device for imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam and a substrate table constructed to hold a substrate. A projection system projects the patterned radiation beam onto a target portion of the substrate. The patterning device includes one or more alignment patterns, the lithographic apparatus including a secondary illumination system effective to illuminate each alignment pattern with radiation separate from said radiation beam, the projection system projecting an image of each alignment pattern onto the substrate table. The substrate table includes a number of sensor arrangements, each sensitive to the projected image of one of said alignment patterns.

公开(公告)号：SG112064A1

公开(公告)日：2005-06-29

申请号：SG200406895

申请日：2004-11-10

Applicant: ASML NETHERLANDS BV

Inventor： BARTRAY PETRUS RUTGERUS ,  BOX WILHELMUS JOSEPHUS ,  KUIT JAN JAAP ,  LUIJTEN CARLO CORNELIS MARIA ,  LUTTIKHUIS BERNARDUS ANTONIUS ,  TEN BHOMER MICHAEL ,  MIGCHELBRINK FERDY

IPC: H01L21/027 ,  G02B7/02 ,  G03B27/42 ,  G03F7/20

Abstract: A lithographic apparatus is provided comprising a substrate table WT for holding a substrate W, a projection system PL for projecting the patterned beam onto a target portion of the substrate W, and an isolated reference frame MF for providing a reference surface with respect to which the substrate W is measured, wherein the reference frame MF comprises a material having a high coefficient of thermal expansion.