Patent search ap:("ASML NETHERLANDS BV") AND inv:"SMILDE HENDRIK" Page 2

11.

发明专利
METROLOGY METHOD AND APPARATUS, AND DEVICE MANUFACTURING METHOD. 未知

公开(公告)号：NL2007425A

公开(公告)日：2012-05-15

申请号：NL2007425

申请日：2011-09-15

Applicant: ASML NETHERLANDS BV

Inventor： SMILDE HENDRIK , WARNAAR PATRICK

IPC: G03F7/20

12.

发明专利
SUBSTRATE FOR USE IN METROLOGY, METROLOGY METHOD AND DEVICE MANUFACTURING METHOD. 未知

公开(公告)号：NL2007176A

公开(公告)日：2012-02-21

申请号：NL2007176

申请日：2011-07-25

Applicant: ASML NETHERLANDS BV

Inventor： SMILDE HENDRIK , SCHAAR MAURITS , BHATTACHARYYA KAUSTUVE

IPC: G03F7/20

13.

发明专利
INSPECTION METHOD AND APPARATUS, LITHOGRAPHIC APPARATUS, LITHOGRAPHIC PROCESSING CELL AND DEVICE MANUFACTURING METHOD. 未知

公开(公告)号：NL2004946A

公开(公告)日：2011-01-10

申请号：NL2004946

申请日：2010-06-22

Applicant: ASML NETHERLANDS BV

Inventor： SMILDE HENDRIK , COENE WILLEM

IPC: G01N21/47 , G03F7/20

14.

发明专利
A SUBSTRATE, A METHOD OF MEASURING A PROPERTY, AN INSPECTION APPARATUS AND A LITHOGRAPHIC APPARATUS. 未知

公开(公告)号：NL2003292A

公开(公告)日：2010-03-15

申请号：NL2003292

申请日：2009-07-27

Applicant: ASML NETHERLANDS BV

Inventor： KERKHOF MARCUS , SCHAAR MAURITS , SMILDE HENDRIK

IPC: G01N21/47 , G03F7/20

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