公开(公告)号：NL2007127A

公开(公告)日：2012-02-07

申请号：NL2007127

申请日：2011-07-18

Applicant: ASML NETHERLANDS BV

Inventor： SCHAAR MAURITS ,  BOEF ARIE ,  MOS EVERHARDUS ,  FUCHS ANDREAS ,  COOGANS MARTYN ,  SMILDE HENDRIK

IPC: G03F7/20

公开(公告)号：NL2005162A

公开(公告)日：2011-02-02

申请号：NL2005162

申请日：2010-07-27

Applicant: ASML NETHERLANDS BV

Inventor： CRAMER HUGO ,  BOEF ARIE ,  MEGENS HENRICUS ,  SMILDE HENDRIK ,  SCHELLEKENS ADRIANUS ,  KUBIS MICHAEL

IPC: G01N21/47 ,  G03F7/20

公开(公告)号：NL2003388A

公开(公告)日：2010-03-15

申请号：NL2003388

申请日：2009-08-25

Applicant: ASML NETHERLANDS BV

Inventor： SMILDE HENDRIK ,  COENE WILLEM

IPC: G01N21/47 ,  G03F7/20

公开(公告)号：NL2010988A

公开(公告)日：2014-01-07

申请号：NL2010988

申请日：2013-06-17

Applicant: ASML NETHERLANDS BV

Inventor： SCHAAR MAURITS ,  BHATTACHARYYA KAUSTUVE ,  SMILDE HENDRIK

IPC: G03F7/20 ,  G01N21/47

Abstract: A lithographic process is used to form a plurality of target structures distributed at a plurality of locations across a substrate and having overlaid periodic structures with a number of different overlay bias values distributed across the target structures. At least some of the target structures comprising a number of overlaid periodic structures (e.g., gratings) that is fewer than said number of different overlay bias values. Asymmetry measurements are obtained for the target structures. The detected asymmetries are used to determine parameters of a lithographic process. Overlay model parameters including translation, magnification and rotation, can be calculated while correcting the effect of bottom grating asymmetry, and using a multi-parameter model of overlay error across the substrate.

公开(公告)号：SG178368A1

公开(公告)日：2012-04-27

申请号：SG2012009551

申请日：2010-08-05

Applicant: ASML NETHERLANDS BV

Inventor： SMILDE HENDRIK ,  DEN BOEF ARIE ,  COENE WILLEM ,  BLEEKER ARNO ,  KOOLEN ARMAND ,  PELLEMANS HENRICUS ,  PLUG REINDER

Abstract: A metrology apparatus is arranged to illuminate a plurality of targets with an off-axis illumination mode. Images of the targets are obtained using only one first order diffracted beam. Where the target is a composite grating, overlay measurements can be obtained from the intensities of the images of the different gratings. Overlay measurements can be corrected for errors caused by variations in the position of the gratings in an image field.

公开(公告)号：NL2010734A

公开(公告)日：2013-12-02

申请号：NL2010734

申请日：2013-05-01

Applicant: ASML NETHERLANDS BV

Inventor： JAK MARTIN ,  KOOLEN ARMAND ,  SMILDE HENDRIK

IPC: G01N21/47 ,  G03F7/20

公开(公告)号：NL2008317A

公开(公告)日：2012-09-25

申请号：NL2008317

申请日：2012-02-20

Applicant: ASML NETHERLANDS BV

Inventor： SCHAAR MAURITS ,  WARNAAR PATRICK ,  BHATTACHARYYA KAUSTUVE ,  SMILDE HENDRIK ,  KUBIS MICHAEL

IPC: G01N21/47 ,  G03F7/20

公开(公告)号：NL2005192A

公开(公告)日：2011-02-28

申请号：NL2005192

申请日：2010-08-05

Applicant: ASML NETHERLANDS BV

Inventor： SMILDE HENDRIK ,  BLEEKER ARNO ,  BOEF ARIE ,  KOOLEN ARMAND ,  PELLEMANS HENRICUS ,  PLUG REINDER ,  COENE WILLEM

IPC: G03F7/20 ,  G01N21/47

Abstract: A metrology apparatus is arranged to illuminate a plurality of targets with an off-axis illumination mode. Images of the targets are obtained using only one first order diffracted beam. Where the target is a composite grating, overlay measurements can be obtained from the intensities of the images of the different gratings. Overlay measurements can be corrected for errors caused by variations in the position of the gratings in an image field.

公开(公告)号：NL2010401A

公开(公告)日：2013-09-30

申请号：NL2010401

申请日：2013-03-06

Applicant: ASML NETHERLANDS BV

Inventor： SMILDE HENDRIK ,  ADAM OMER

IPC: G01N21/47 ,  G03F7/20

公开(公告)号：NL2007765A

公开(公告)日：2012-05-15

申请号：NL2007765

申请日：2011-11-10

Applicant: ASML NETHERLANDS BV

Inventor： SMILDE HENDRIK ,  BLEEKER ARNO ,  COENE WILLEM ,  KUBIS MICHAEL ,  WARNAAR PATRICK

IPC: G03F7/20