公开(公告)号：NL2005863A

公开(公告)日：2011-06-29

申请号：NL2005863

申请日：2010-12-16

Applicant: ASML NETHERLANDS BV

Inventor： TINNEMANS PATRICIUS ,  PELLEMANS HENRICUS ,  ZOUW GERBRAND ,  COENE WILLEM

IPC: G03F7/20

公开(公告)号：SG178368A1

公开(公告)日：2012-04-27

申请号：SG2012009551

申请日：2010-08-05

Applicant: ASML NETHERLANDS BV

Inventor： SMILDE HENDRIK ,  DEN BOEF ARIE ,  COENE WILLEM ,  BLEEKER ARNO ,  KOOLEN ARMAND ,  PELLEMANS HENRICUS ,  PLUG REINDER

Abstract: A metrology apparatus is arranged to illuminate a plurality of targets with an off-axis illumination mode. Images of the targets are obtained using only one first order diffracted beam. Where the target is a composite grating, overlay measurements can be obtained from the intensities of the images of the different gratings. Overlay measurements can be corrected for errors caused by variations in the position of the gratings in an image field.

公开(公告)号：NL2004995A

公开(公告)日：2011-01-24

申请号：NL2004995

申请日：2010-06-29

Applicant: ASML NETHERLANDS BV

Inventor： COENE WILLEM ,  SCHAAR MAURITS

IPC: G01N21/47 ,  G03F7/20

Abstract: A method of determining an overlay error in a set of superimposed patterns. The patterns are divided into two and a first part of the pattern has a bias of d+s/2 between the first layer and second layer. A second part of the pattern has a bias of d−s/2 between the first and second layer. The two parts of the pattern are of equal size. To eliminate a particular harmonic s is chosen to be T/(2n) where T is the period of the pattern and n is a positive integer.

公开(公告)号：NL2005192A

公开(公告)日：2011-02-28

申请号：NL2005192

申请日：2010-08-05

Applicant: ASML NETHERLANDS BV

Inventor： SMILDE HENDRIK ,  BLEEKER ARNO ,  BOEF ARIE ,  KOOLEN ARMAND ,  PELLEMANS HENRICUS ,  PLUG REINDER ,  COENE WILLEM

IPC: G03F7/20 ,  G01N21/47

Abstract: A metrology apparatus is arranged to illuminate a plurality of targets with an off-axis illumination mode. Images of the targets are obtained using only one first order diffracted beam. Where the target is a composite grating, overlay measurements can be obtained from the intensities of the images of the different gratings. Overlay measurements can be corrected for errors caused by variations in the position of the gratings in an image field.

公开(公告)号：NL2004542A

公开(公告)日：2010-11-15

申请号：NL2004542

申请日：2010-04-13

Applicant: ASML NETHERLANDS BV

Inventor： COENE WILLEM ,  MAST KAREL ,  SCHAAR MAURITS

IPC: G03F7/20 ,  G01N21/47

Abstract: A method of determining an overlay error in which asymmetry of a first order of a diffraction pattern is modeled as being a weighted sum of harmonics. Both the first order harmonic and higher order harmonics are non-negligible and weights for both are calculated. The weights are calculated using three or more of sets of superimposed patterns using a least mean square method.

公开(公告)号：NL2003388A

公开(公告)日：2010-03-15

申请号：NL2003388

申请日：2009-08-25

Applicant: ASML NETHERLANDS BV

Inventor： SMILDE HENDRIK ,  COENE WILLEM

IPC: G01N21/47 ,  G03F7/20

公开(公告)号：NL2009001A

公开(公告)日：2013-01-09

申请号：NL2009001

申请日：2012-06-14

Applicant: ASML NETHERLANDS BV

Inventor： COENE WILLEM ,  HAVER SVEN

IPC: G03F9/00 ,  H01L23/544

公开(公告)号：NL2007765A

公开(公告)日：2012-05-15

申请号：NL2007765

申请日：2011-11-10

Applicant: ASML NETHERLANDS BV

Inventor： SMILDE HENDRIK ,  BLEEKER ARNO ,  COENE WILLEM ,  KUBIS MICHAEL ,  WARNAAR PATRICK

IPC: G03F7/20

公开(公告)号：NL2004946A

公开(公告)日：2011-01-10

申请号：NL2004946

申请日：2010-06-22

Applicant: ASML NETHERLANDS BV

Inventor： SMILDE HENDRIK ,  COENE WILLEM

IPC: G01N21/47 ,  G03F7/20

公开(公告)号：NL2003179A1

公开(公告)日：2010-01-19

申请号：NL2003179

申请日：2009-07-10

Applicant: ASML NETHERLANDS BV

Inventor： COENE WILLEM ,  CRAMER HUGO ,  SETIJA IRWAN

IPC: G03F7/20 ,  G01N21/47