公开(公告)号：US20220120700A1

公开(公告)日：2022-04-21

申请号：US17492857

申请日：2021-10-04

Applicant: Applied Materials, Inc.

Inventor： Yangyang SUN ,  Jinxin FU ,  Kazuya DAITO ,  Ludovic GODET

IPC: G01N21/958

Abstract: Embodiments of the present disclosure relate to optical devices for augmented, virtual, and/or mixed reality applications. In one or more embodiments, an optical device metrology system is configured to measure a plurality of see-through metrics for optical devices.

公开(公告)号：US20240142227A1

公开(公告)日：2024-05-02

申请号：US18408193

申请日：2024-01-09

Applicant: Applied Materials, Inc.

Inventor： Yangyang SUN ,  Jinxin FU ,  Ludovic GODET

IPC: G01B11/26

CPC classification number: G01B11/26

Abstract: Embodiments described herein provide for devices and methods of measuring a pitch P of optical device structures and an orientation angle ϕ of the optical device structures. One embodiment of the system includes an optical arm coupled to an arm actuator. The optical arm includes a light source. The light source emits a light path operable to be diffracted to the stage. The optical arm further includes a first beam splitter and a second beam splitter positioned in the light path. The first beam splitter directs the light path through a first lens and the second beam splitter directs the light path through a first dove prism and a second lens. The optical arm further includes a first detector operable to detect the light path from the first lens and second detector operable to detect the light path from the second lens.

公开(公告)号：US20220397744A1

公开(公告)日：2022-12-15

申请号：US17805623

申请日：2022-06-06

Applicant: Applied Materials, Inc.

Inventor： Wubin PANG ,  Yangyang SUN ,  Jinxin FU ,  Samarth BHARGAVA

IPC: G02B13/06 ,  G02B13/16 ,  G02B13/22 ,  G02B27/00

Abstract: Embodiments of the present disclosure generally relate to an optical system having a lens system configured to have a wide field of view and high resolution. The optical system includes three or more lens groups with ability to combat optical aberrations and produce a pupil outside of the lens group. The lens system as an image projection system projects a pattern or image rendered on a flat reticle or display of finite distance to the infinity. In an imaging system, the lens system collects light from infinity and forms an image of that object on a sensor.

公开(公告)号：US20220214163A1

公开(公告)日：2022-07-07

申请号：US17645200

申请日：2021-12-20

Applicant: Applied Materials, Inc.

Inventor： Yangyang SUN ,  Jinxin Fu ,  Ludovic Godet

IPC: G01B11/26

Abstract: Embodiments described herein provide for devices and methods of measuring a pitch P of optical device structures and an orientation angle ϕ of the optical device structures. One embodiment of the system includes an optical arm coupled to an arm actuator. The optical arm includes a light source. The light source emits a light path operable to be diffracted to the stage. The optical arm further includes a first beam splitter and a second beam splitter positioned in the light path. The first beam splitter directs the light path through a first lens and the second beam splitter directs the light path through a first dove prism and a second lens. The optical arm further includes a first detector operable to detect the light path from the first lens and second detector operable to detect the light path from the second lens.

公开(公告)号：US20250068087A1

公开(公告)日：2025-02-27

申请号：US18803041

申请日：2024-08-13

Applicant: Applied Materials, Inc.

Inventor： Yangyang SUN ,  Jinxin FU ,  Sihui HE

IPC: G03F7/00

Abstract: Embodiments of the present disclosure generally relate to metrology systems and metrology methods to measure waveguides for image quality standards. In at least one embodiment, an optical device metrology system includes a stage, a body, and a light engine positioned within the body and mounted above the stage. The light engine includes, a light source, a fold mirror angled relative to the light source, the fold mirror is configured to turn a light beam toward the stage, one or more lenses or arrays positioned between the fold mirror and the stage, and a projection lens positioned between the one or more lenses or arrays and the stage. The system further includes, a first detector positioned within the body and mounted above the stage adjacent to the light engine configured to receive the projected light beam projected upwardly from the stage.

公开(公告)号：US20240385075A1

公开(公告)日：2024-11-21

申请号：US18667513

申请日：2024-05-17

Applicant: Applied Materials, Inc.

Inventor： Yangyang SUN ,  Jinxin FU ,  Kazuya DAITO ,  Ludovic GODET

IPC: G01M11/02 ,  G02B19/00 ,  G02B27/30 ,  G06T7/00 ,  H04N23/56

Abstract: Embodiments described herein provide for light engines of a measurement system and methods of using the light engines. The measurement system includes a light engine operable to illuminate a first grating of an optical device. The light engine projects a pattern with a light from a light engine. The light engine projects a pattern to the first grating such that a metrology metric may be extracted from one or more images captured by a detector of the measurement system. The metrology metrics are extracted by processing the image. The metrology metrics determine if the optical device meets image quality standards.

公开(公告)号：US20240310639A1

公开(公告)日：2024-09-19

申请号：US18675404

申请日：2024-05-28

Applicant: Applied Materials, Inc.

Inventor： Yangyang SUN ,  Jinxin FU ,  Ludovic GODET

IPC: G02B27/01

CPC classification number: G02B27/0172 ,  G02B27/0176

Abstract: Metrology tools and methods of obtaining a full-field optical field of an optical device to determine multiple metrology metrics of the optical device are provided. A metrology tool is utilized to split a light beam into a first light path and a second light path. The first light path and the second light path are combined into a combined light beam and delivered to the detector. The detector measures the intensity of the combined light beam. A first equation and second equation are utilized in combination with the intensity measurements to determine an amplitude and phase ψ at a reference point directly adjacent to a second surface of the at least one optical device.

公开(公告)号：US20240142339A1

公开(公告)日：2024-05-02

申请号：US18384126

申请日：2023-10-26

Applicant: Applied Materials, Inc.

Inventor： Yangyang SUN ,  Jinxin FU ,  Ravi KOMANDURI ,  Chi-Yuan YANG

IPC: G01M11/02

CPC classification number: G01M11/0257

Abstract: The present disclosure relates to metrology measurement systems, and related methods. In one or more embodiments a system, includes a substrate support, and an optical arm. The optical arm includes a light source operable to project a first beam on a first light path. The optical arm also includes a first lens, a first beam splitter, a second lens, a first detector, and an aperture. The first lens is disposed on the first light path and between the substrate support and the light source. The first beam splitter is disposed on the first light path. The first beam splitter is positioned between the substrate support and the light source. The first detector is disposed on the second light path. The second lens focuses the second beam to a second beam diameter. The aperture is disposed between the second lens and the first detector.

公开(公告)号：US20230314126A1

公开(公告)日：2023-10-05

申请号：US18118269

申请日：2023-03-07

Applicant: Applied Materials, Inc.

Inventor： Yangyang SUN ,  Jinxin FU ,  Ludovic GODET

IPC: G01B11/26 ,  G02B5/30 ,  G02B3/00 ,  G02B26/12

CPC classification number: G01B11/26 ,  G02B5/3025 ,  G02B3/00 ,  G02B26/123 ,  G02B2207/123

Abstract: Embodiments described herein provide for a measurement system having an aperture filtering component and methods of utilizing the measurement system. The measurement system described herein includes a measurement arm and a stage. The measurement arm projects a light beam to a top surface of an optical device structure. Multi-reflection beams resulting from reflections and diffraction off other surfaces of a non-opaque substrate leads to interference. The measurement arm includes an aperture (e.g., an aperture filtering component) that filters the multi-reflection beams from being relayed to the detector. As such, only images of the light beam are relayed to the detector.

公开(公告)号：US20230046330A1

公开(公告)日：2023-02-16

申请号：US17876195

申请日：2022-07-28

Applicant: Applied Materials, Inc.

Inventor： Yangyang SUN ,  Jinxin FU ,  Ludovic GODET

IPC: G02B27/01

Abstract: Embodiments described herein provide for metrology tools and methods of obtaining a full-field optical field of an optical device to determine multiple metrology metrics of the optical device. A metrology tool is utilized to split a light beam into a first light path and a second light path. The first light path and the second light path are combined into a combined light beam and delivered to the detector. The detector measures the intensity of the combined light beam. A first equation and second equation are utilized in combination with the intensity measurements to determine an amplitude and phase Ψ at a reference point directly adjacent to a second surface of the at least one optical device.