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    RADIATION SENSITIVE MIXTURE AND PRODUCTION OF RELIEF PATTERNS
    11.
    发明专利
    RADIATION SENSITIVE MIXTURE AND PRODUCTION OF RELIEF PATTERNS 未知

    公开(公告)号：CA1334898C

    公开(公告)日：1995-03-28

    申请号：CA597191

    申请日：1989-04-19

    Applicant: BASF AG

    Inventor： SCHWALM REINHOLD ,  BOETTCHER ANDREAS ,  FISCHER MARTIN ,  BINDER HORST

    IPC: G03F7/004 ,  G03F7/039 ,  G03F7/38 ,  H01L21/027

    Abstract: A radiation sensitive mixture useful for producing relief patterns contains (a) a polymeric binder which is insoluble in water but soluble in aqueous alkaline solutions and (b) an organic compound whose solubility in an aqueous alkaline developer is increased by the action of acid and which contains at least one acid cleavable group and additionally a group which forms a strong acid on irradiation, and in addition (c) a nonphotosensitive organic compound which contains at least one acid cleavable bond and the solubility of which in an aqueous alkaline developer is increased by the action of acid, or (d) a nonphotosensitive organic compound which contains at least one acid cleavable bond and which by the action of acid decomposes in such a way as to be completely removable by treatment at from 60 to 120.degree.C

    12.
    发明专利
    未知

    公开(公告)号：DE3889977D1

    公开(公告)日：1994-07-14

    申请号：DE3889977

    申请日：1988-06-24

    Applicant: BASF AG

    Inventor： SCHWALM REINHOLD DR ,  BOETTCHER ANDREAS DR ,  BINDER HORST

    IPC: G03C1/72 ,  G03F7/004 ,  G03F7/039 ,  G03F7/075

    Abstract: A radiation-sensitive mixture consists of a polymeric binder which is insoluble in water but soluble in aqueous alkaline solutions, and of an organic compound whose solubility in an aqueous alkaline developer is increased by the action of an acid and which contains both one or more acid-cleavable groups and a group which forms a strong acid under the action of radiation. The radiation-sensitive mixture is suitable for use in photosensitive coating materials for the production of relief patterns and relief images.

    13.
    发明专利
    未知

    公开(公告)号：DE58906521D1

    公开(公告)日：1994-02-10

    申请号：DE58906521

    申请日：1989-05-10

    Applicant: BASF AG

    Inventor： SCHWALM REINHOLD DR ,  BOETTCHER ANDREAS DR ,  FISCHER MARTIN DR ,  BINDER HORST

    IPC: G03F7/004 ,  G03F7/039 ,  G03F7/38 ,  H01L21/027

    Abstract: The invention relates to a radiation-sensitive mixture which contains… (a) a polymeric binder insoluble in water and soluble in aqueous-alkaline solutions and… (b) an organic compound whose solubility in an aqueous-alkaline developer is increased by the action of acid and which contains at least one grouping which is cleavable by acid and additionally one grouping which forms a strong acid under the action of radiation, and additionally… (c) an organic compound which is not photosensitive and contains at least one bond cleavable by acid and whose solubility in an aqueous-alkaline developer is increased by the action of acid, or… (d) an organic compound which is not photosensitive and contains at least one bond cleavable by acid and which decomposes under the action of acid in such a way that it can be completely removed from the layer by treatment at temperatures from 60 to 120 DEG C. … This mixture is suitable for the formation of relief patterns.

    14.
    发明专利
    未知

    公开(公告)号：DE4202845A1

    公开(公告)日：1993-08-05

    申请号：DE4202845

    申请日：1992-01-31

    Applicant: BASF AG

    Inventor： BINDER HORST ,  SCHWALM REINHOLD DR ,  FUNHOFF DIRK DR

    IPC: G03F7/004 ,  C08L61/10 ,  G03F7/039 ,  H01L21/027

    Abstract: The invention relates to a radiation-sensitive mixture essentially comprising (a) a water-insoluble binder or binder mixture, and (b) a compound which forms a strong acid on irradiation, where component (a) is a phenolic resin all or some of whose phenolic hydroxyl groups have been replaced by groups (IA) or (IB) in which R , R and R are alkyl radicals, or R together with R forms a ring, and X is CH2, O, S, SO2 or NR . This radiation-sensitive mixture is suitable for the production of relief structures.

    16.
    发明专利
    未知

    公开(公告)号：DE3775188D1

    公开(公告)日：1992-01-23

    申请号：DE3775188

    申请日：1987-12-04

    Applicant: BASF AG

    Inventor： SCHWALM REINHOLD ,  BINDER HORST

    IPC: C08F12/00 ,  C08F20/34 ,  C08F22/32 ,  C08F212/14 ,  C08F220/36 ,  C08F222/00 ,  C08F222/22 ,  C08F222/32 ,  G03F7/00 ,  G03F7/004 ,  G03F7/039

    Abstract: Copolymer (I) contains units derived from (a) 5-50 (mole) % o-nitro(het)arylalkyl unsatd. carboxylate ester (II), (b) 95-50% p-hydroxy- or O-substd. p-hydroxy-styrene or -alpha-methyl-styrene cpd. (III) of the given formulae and (c) 0-30% other olefinically unsatd. organic comonomer(s) forming homopolymers which are transparent in the 250-400 nm range. In (I) and (II) A = an opt. substd. aromatic or heteroaromatic ring system with 5-14 ring members; X = H, 1-8C alkyl or an opt. substd. aryl or aralkyl gp., Y = a 2-6C ethylenically unsatd. gp., R1 = H or Me; R2 = H, halogen or 1-6C alkyl; R3 = H, 1-6C alkyl, acetyl, benzoyl, 1-6C alkylsilyl, 1-6C alkoxysilyl or tert.-butoxycarbonyl.

    18.
    发明专利
    未知

    公开(公告)号：AT340196T

    公开(公告)日：2006-10-15

    申请号：AT01270560

    申请日：2001-12-11

    Applicant: BASF AG

    Inventor： JAWOREK THOMAS ,  BINDER HORST ,  PAULUS WOLFGANG

    IPC: C08F8/00

    Abstract: A curable aqueous polymer dispersion is prepared by: I) reacting a (meth)acrylate polymer A) that carries ethylenically unsaturated groups and functional groups capable of a condensation or addition reaction, with at least one compound B) which Ia) carries at least one functional group that is complementary to the functional groups of the copolymer A) that are capable of undergoing a condensation or addition reaction, and additionally at least one ionogenic, ionic group or a combination thereof, or which Ib) carries at least one functional groups that is complementary to the functional groups of the copolymer A) that are capable of condensation or addition reaction and is capable of forming an ionogenic or ionic group in a condensation or addition reaction, to give a copolymer AI) which carriers ethylenically unsaturated groups and ionogenic groups, ionic groups or a combination thereof, II) with the proviso that when the ionogenic groups are present in compound B), converting at least some of the ionogenic groups of the copolymer AI) into ionic groups, and III) dispersing the copolymer AI) in an aqueous dispersion medium.

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