11.
    发明专利
    未知

    公开(公告)号:DE19701259A1

    公开(公告)日:1998-07-23

    申请号:DE19701259

    申请日:1997-01-17

    Applicant: BASF AG

    Abstract: A thermoplastic moulding material (I) consists of (A) greater than 50 wt.% of a linear copolymer of ethylene with an alpha -olefin, that has a density of 0.87-0.92, molecular weight ratio, Mw/Mn of 1.5-4.0 and a melt index (MFR 190/2:16) of 0.5-12 g/10 min; (B) 0-45 wt.% of a copolymer of ethylene, a vinyl ester of a 2-4C aliphatic carboxylic acid and/or a 1-4C alkyl ester of a 3-5C aliphatic carboxylic acid; (C) 0-45 wt.% of a thermoplastic rubber; (D) 0-45 wt.% bitumen; and optionally (E) other additives. (B), (C) and (D) account for at least 5 wt.% of (I). Also claimed are (i) the preparation of (I) by mixing (A)-(E) by kneading, stirring, rolling and/or extruding at 120-180 degrees C; and (ii) film and seals containing (I).

    19.
    发明专利
    未知

    公开(公告)号:DE3876855D1

    公开(公告)日:1993-02-04

    申请号:DE3876855

    申请日:1988-05-13

    Applicant: BASF AG

    Abstract: Photopolymerisable recording material with at least one photopolymerisable, olefinically unsaturated organic cpd. (I), opt. a polymeric binder (II), at least one photopolymerisation initiator (III), a colour forming system (IV) which on irradiation with actinic radiation causes an increase in the colour intensity of the recording material, a sensitizer (V) and opt. further additives and/or assistants, the (IV) comprising (a) least one colourless or practically colourless organic cpd. which is oxidisable to a coloured cpd., and (b) a photooxidation agent for (a) comprising an organic salt with an opt. substd. heteroaromatic system including at least one grouping of formula (A) in which R = opt. substd. alkenyl, alkynyl, hetaryl, alkenylcarbonyl, alkynylcarbonyl, alkoxycarbonyl, carbamoyl, alkylsulphonyl, arylsulphonylaminosulphinyl, substd. cycloalkyl or opt. substd. hetaryl cation, with the proviso that the long wave absorption max. of the salt is below 400 nm.

Patent Agency Ranking