THERMOPLASTIC MOLDING MATERIAL
    1.
    发明专利

    公开(公告)号:JPH10292071A

    公开(公告)日:1998-11-04

    申请号:JP582598

    申请日:1998-01-14

    Applicant: BASF AG

    Abstract: PROBLEM TO BE SOLVED: To obtain a thermoplastic molding material which is easily processable and is amenable to fusion and shows good weatherability and heat resistance. SOLUTION: This material comprises 50 wt.%, based on the total weight of the molding material (this shall apply hereinbelow), substantially linear copolymer (a) comprising ethylene and at least one α-olefin and having a density of 0.87-0.92 g/cm , a molecular weight distribution Mw /Mn of 1.5-4.0 and a melt flow rate of 0.5-12.0 g/10 min (MFR 190/2.16), 0-45 wt.% copolymer (b) comprising ethylene and a vinyl ester of a 2-4 C alkanecarboxylic acid or a 1-4C alkyl ester of a 3-5 C alkanecarboxylic acid, 0-45 wt.% thermoplastic rubber (c), 0-45 wt.% bitumen (d) and optionally other additives (e) (the total content of components (b), (c) and (d) is at least 5 wt.%).

    6.
    发明专利
    未知

    公开(公告)号:DE3869470D1

    公开(公告)日:1992-04-30

    申请号:DE3869470

    申请日:1988-05-13

    Applicant: BASF AG

    Abstract: Photopolymerisable recording material contains at least one photopolymerisable, olefinically unsatd. organic cpd. (1), opt. a polymeric binder (II), at least one photopolymerisation initiator (III), a colour forming system (IV) which on irradiation with actinic radiation causes an increase in the colour intensity of the recording material, a sensitiser (V) and opt. further additives and/or assistants. (V) comprises at least one cpd. of formula (V) or (VI) in which X = CH or N; Y = H, 1-12 C alkyl, 1-12 C alkoxy or halogen; R1 = 1-12 C alkyl, 1-12 C alkoxy, or halogen; R1 = 1-12 C alkyl, 1-12 C alkoxy, CF3, phenyl or NR4R5 (in which R4 and R5 = 1-6 C alkyl, allyl, phen-C1-4alkyl, phenyl, etc.); and R2 and R3 = 1-12 C alkyl, 1-12 C alkoxy, hydroxy-C1-4alkyl, oxaalkyl with 2-12 C and 1-5 O atoms, phen-C1-4alkyl, phenyl, naphthyl, aryl susbtd. b y 1-4 C alkyl, 1-4 C alkoxy, phenyl, CF3, trialkylsilyl, CN, -O-CO-C1-12alkyl, -CO-O-C1-12alkyl, etc.. The long wave absorption max. of cpd. (V) is below 420 nm, pref. below 400 nm.

    7.
    发明专利
    未知

    公开(公告)号:DE3868975D1

    公开(公告)日:1992-04-16

    申请号:DE3868975

    申请日:1988-05-13

    Applicant: BASF AG

    Abstract: Photopolymerisable recording material with at least one photopolymerisable, olefinically unsaturated organic cpd. (I), opt. a polymeric binder (II), at least one photopolymerisation initiator (III), a colour forming system (IV) which on irradiation with actinic radiation causes an increase in the colour intensity of the recording material, a sensitizer (V) and opt. further additives and/or assistant, the (V) comprising at least one cpd. of formula in which A = a residue of formula (VI), (VII) or (VIII) R = H or 1-8C alkyl; R1 = 1-12C alkyl, 1-12C alkoxy, phenyl or NR5R6 in which R5 and R6 (same or different) = 1-6 C alkyl, allyl, phen-C1-4 alkyl, phenyl (opt. substd.), 1-12C alkyl (opt. substd.) or oxaalkyl with 3-12 C and 1-5 0 atoms, or R5 and R6 together form a heterocyclic satd. or unsatd. ring; R2 = H, 1-12C alkyl, 1-12C alkoxy, halogen or trialkylsilyl; n = 1 or 2; R3 and R4 (same or different) = 1-8 C alkyl, cycloalkyl, C02R7 in which R7 = 1-8C alkyl or aryl, or phenyl (opt. substd.) or R3 and R4 together may form a carbocyclic or heterocyclic, satd. or unsatd. condensed ring system which may be opt. substd. with the proviso that the long wave absorption max. of the cpd. (V) is below 420 nm, pref. below 400 nm.

    10.
    发明专利
    未知

    公开(公告)号:DE3717037A1

    公开(公告)日:1988-12-08

    申请号:DE3717037

    申请日:1987-05-21

    Applicant: BASF AG

    Abstract: Photopolymerizable recording materials suitable for producing photoresist layers and lithographic printing plates are composed of one or more photopolymerizable olefinically unsaturated organic compounds, optionally a polymeric binder, one or more photopolymerization initiators, a color-forming system which on irradiation with actinic light causes an increase in the color intensity of the recording material, a sensitizer and optionally further additive and/or auxiliary substances, and contain as the color-forming system (a) one or more colorless or virtually colorless organic compounds which are oxidizable to colored compounds, and (b) a photooxidant for the colorless or virtually colorless organic compound(s) (a), wherein photooxidant (b) comprises an organic salt with a substituted or unsubstituted hetaromatic system, this hetaromatic system having one or more built-in groups of the general formula (I) (I) where R is substituted or unsubstituted alkenyl, alkynyl, hetaryl, alkoxycarbonyl, carbamoyl, alkylsulfonyl or arylsulfonylaminosulfinyl, substituted cycloalkyl or a substituted or unsubstituted hetaryl cation, with the proviso that the maximum of the long-wave absorption band of the salt is below 400 nm.

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