METHOD FOR LABELLING INDIVIDUAL ATOM OR ATOM GROUP ON SOLID SURFACE STABLY IN TIME AND METHOD FOR STORING INFORMATION UNIT OF ATOM ALIGNMENT UTILIZING METHOD THEREOF

    公开(公告)号:JPH06103619A

    公开(公告)日:1994-04-15

    申请号:JP15727691

    申请日:1991-06-28

    Applicant: BASF AG

    Abstract: PURPOSE: To stabilize the accumulation of information with lapse of time by enabling the selective removal of atoms from a solid surface without changing the lattice structure of the remaining atoms at the time of labeling the discrete atoms or atom groups including compds. or completely intimately mixed allays on the solid surface. CONSTITUTION: A high information density is obtd. by storing the information on the atom regions at the time of storing or writing information units. Namely, erasure is made possible again by recombining vacancy to the atoms or atom groups, by which the restoration of the original state is made possible. The recombination is effected on the surface of the solid and more particularly the semiconductor layer of doped chalcogenide, etc., to this size, for example, by using the needle-like electrode of a sensitive surface scanning probe of a scanning tunnel microscope or scanning atomic microscope and applying a short time of an electric field or magnetic field to the surface. The max. limit electric field surface of the semiconductor layer surface of this kind of the probe is 10 to 0.1nm and, therefore, a linear influence is exerted on the electron structure and the desorption of the specific one kind of the atoms is made possible.

    METHOD OF BRINGING SPECIFIC CHANGE STABLE WITH TIME ONTO SOLID SURFACE WHILE SELECTING POSITION WITHIN RANGE OF NANOMETER

    公开(公告)号:JPH05210876A

    公开(公告)日:1993-08-20

    申请号:JP20678292

    申请日:1992-08-03

    Applicant: BASF AG

    Abstract: PURPOSE: To bring the pointed end of a local searching probe into the proximity to a solid-state surface having a laminated structure and to reproducibly form a build-up having a size of nanometer range stably with the lapse of time without destroying the atomic arrangement on the surface by the effect thereof. CONSTITUTION: The pointed end of the local searching probe of a scanning tunneling type electron microscope is brought into the proximity to the deformation position of a laminar semiconductor or near the same in the air under a stationary atmosphere condition, i.e., at room temp. to induce suction force electrostatically, magnetically or by adhesive force or capillarity between the semiconductor surface and the searching probe. As a result, the local build-up long in a transverse direction and stable with lapse of time within the nanometer range is formed without destroying the atom arrangement on the surface at the point where the change is brought about or near the same.

    METHOD FOR FORMING REVERSIBLE OR IRREVERSIBLE IMAGE

    公开(公告)号:JPH05177956A

    公开(公告)日:1993-07-20

    申请号:JP3631292

    申请日:1992-02-24

    Applicant: BASF AG

    Abstract: PURPOSE: To produce a surface charge pattern without forming a free charge carrier by carrying out a reversible imagewise orientation to a part or the whole of permanent dipole in the recording layer with the aid of an electric field applied imagewise. CONSTITUTION: A recording layer, which contains an organic material which solidifies in glassy form, is no photoconductive or slightly photoconductive and has permanent dipole, is formed on a support material. A surface charge pattern is produced without forming a free charge carrier by carrying out a reversible imagewise orientation to a part or the whole of permanent dipole in the recording layer with the aid of an electric field applied imagewise. The recording layer solidifies in glassy form, is no photoconductive or slightly photoconductive, and preferably contains one or several organic materials which act as nematic liquid crystal, smectic liquid crystal, chiral-smectic liquid crystal, or ferroelectricity smectic liquid crystal.

    FORMATION OF UNIFORM THIN FILM
    15.
    发明专利

    公开(公告)号:JPH02307572A

    公开(公告)日:1990-12-20

    申请号:JP9659290

    申请日:1990-04-13

    Applicant: BASF AG

    Abstract: PURPOSE: To obtain a thin film having stability to oxygen plasma etching by forming a uniform thin film of 40 Å to 1 μm thickness on a substrate by the Langmuir-Blodgett technique or the self-assembly technique using a specified silicon-contg. compd. CONSTITUTION: A uniform thin film of 40 Å to 1 μm thickness is formed on a substrate by the Langmuir-Blodgett technique or the self-assembly technique using a silicon-contg. compd. of formula I [where R', R" and R"' are each 1-4C alkyl or 6-10C aryl, R and R are each halogenated alkyl, oxyalkyl or the like, R and R are each divalent optionally halogenated alkylene, oxyalkylene or the like, R and R are each OH, COOH, CN or the like and (x) and (y) are each 0-1,000] to obtain the objective thin film having stability to oxygen plasma etching. An electronic device is produced by forming an image with radiation using the thin film and microlithography using the thin film is provided.

    16.
    发明专利
    失效

    公开(公告)号:JPH05242849A

    公开(公告)日:1993-09-21

    申请号:JP14230792

    申请日:1992-06-03

    Applicant: BASF AG

    Abstract: PURPOSE: To change selectively and eliminate reversibly a pattern with a nm range of a solid surface by positioning a pattern with an space of Å range on a solid surface, or moving a tip of a surface sensitive scanning probe contacted to the surface on a surface pattern at practically same height level. CONSTITUTION: A tip of an extra fine surface sensitive scanning probe, that is a scanning tunneling microscope(STM) or the like, is positioned right above a pattern with a nm range which is desired to be changed. Next, by moving it with a certain space kept from x/y surface of a specimen surface of a pattern which is not changed yet, a change of the pattern is mechanically formed by a very fine probe, or formed by applying a voltage pulse between the specimen and the probe. Thereby, it becomes possible to form a pattern to maintain an atomic arrangement of the solid surface observed by STM on the pattern itself and around it. As a result, an image is formed with atomic resolution, and writing, reading, treatment of changes and erasing can be done freely at any place.

    17.
    发明专利
    失效

    公开(公告)号:JPH05242685A

    公开(公告)日:1993-09-21

    申请号:JP41515790

    申请日:1990-12-27

    Applicant: BASF AG

    Inventor: HAARARUTO FUKUSU

    Abstract: PURPOSE: To enable stable recording of information units in a nanometer order with time by causing plastic deformation of the surface of a semiconductor laminated material, without changing the order of atoms by using a scanning probe having surface sensitivity. CONSTITUTION: Semiconductor layers including a conventional semiconductor layer based on WSe2 or other selenides, tellurides and sulfides are used. The surface of the semiconductor layer is plastically deformed by using a scanning probe having surface sensitivity of the surface by a closed field technique. Pits which are usually circular or elliptic are produced without disturbing the atomic order of the semiconductor material. The surface with plastic deformation of the semiconductor laminated body is very rapidly changed into the structure, without any memory by heat treatment or, if necessary, by treatment with IR laser beam. As for the closed field technique to be used to write information, a well-known method for a scanning tunneling microscope or scanning atomic force microscope is used.

    SURFACE WAVE GAS SENSOR
    18.
    发明专利

    公开(公告)号:JPH04233436A

    公开(公告)日:1992-08-21

    申请号:JP24564291

    申请日:1991-09-25

    Applicant: BASF AG

    Abstract: PURPOSE: To provide a surface wave gas sensor having high sensitivity and a short response time to a low gas concn. without generating a mode discontinuous problem. CONSTITUTION: A surface wave delay line 2 constituting a part of an oscillation circuit is coated with an org. non-conductive solid film adsorbing gas to be measured and, in this case, the delay line 2 has resonance frequency within the range of 0.5-2GHz and the length of converters 3, 4 is larger than the length of the delay line 2 and the converters 3, 4 are constituted so that the response curve in the response spectrum of the delay line does not permit the discontinuity of a mode.

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