公开(公告)号：JPH08231649A

公开(公告)日：1996-09-10

申请号：JP28075095

申请日：1995-10-27

Applicant: BASF AG

Inventor： RAINAA BURANKENBURUKU ,  AKUSERU ZANNAA

IPC: A61K8/00 ,  A61K8/81 ,  A61Q5/00 ,  C08F2/06 ,  C08F26/00 ,  C08F226/06 ,  A61K7/06

Abstract: Copolymers (I) with K values of 30-50, obtainable by radical polymerisation of a monomer mixt. as follows in alcohol soln.: (a) 15-84.99 wt.% N-vinylpyrrolidone (NVP), N-vinyl-caprolactam (NVC) and/or N-vinylimidazole; (b) 15-84.99 wt.% other monoethylenically unsatd. monomers; and (c) 0.01-2 wt.% monomers with at least two non-conjugated olefinic double bonds.

公开(公告)号：JPH083228A

公开(公告)日：1996-01-09

申请号：JP14465395

申请日：1995-06-12

Applicant: BASF AG

Inventor： RAINAA BURANKENBURUKU ,  AKUSERU ZANAA

IPC: A61K8/00 ,  A61Q5/06 ,  C08F2/00 ,  C08F2/04 ,  C08F2/06 ,  C08F26/10 ,  C08F218/02 ,  C08F218/08 ,  C08F226/10 ,  A61K7/11

公开(公告)号：JPH03246300A

公开(公告)日：1991-11-01

申请号：JP32339390

申请日：1990-11-28

Applicant: BASF AG

Inventor： HAARARUTO FUKUSU ,  URURIKE RIHITO ,  HERUMUUTO RINGUSUDORUFU ,  RAINAA BURANKENBURUKU ,  MIHIYAERU AARERUSU

IPC: C07K14/00 ,  C07K17/02 ,  C12N11/00 ,  C12N11/06 ,  C12Q1/00 ,  G01N33/543

公开(公告)号：JPH09110933A

公开(公告)日：1997-04-28

申请号：JP23444596

申请日：1996-09-04

Applicant: BASF AG

Inventor： RAINAA BURANKENBURUKU ,  YURUGEN DEETERINGU ,  BURIGITSUTA FUTSUKESHIYUTAIN ,  AKUSERU ZANAA

IPC: C08F2/10 ,  C08F2/16 ,  C08F2/38 ,  C08F26/10 ,  C08F126/10

公开(公告)号：JPH08283129A

公开(公告)日：1996-10-29

申请号：JP7252296

申请日：1996-03-27

Applicant: BASF AG

Inventor： RAINAA BURANKENBURUKU ,  KAARIN SHIYUPERURINGU ,  AKUSERU ZANAA

IPC: A61K8/00 ,  A61K8/31 ,  A61K8/34 ,  A61K8/81 ,  A61K8/87 ,  A61K8/88 ,  A61Q5/06 ,  C08L31/02 ,  C08L31/04 ,  C08L33/04 ,  C08L39/00 ,  C08L39/04 ,  C08L75/00 ,  C08L75/04 ,  A61K7/11

Abstract: PROBLEM TO BE SOLVED: To obtain a hair setting lotion containing an N-vinylcaprolactam-based polymer and one more film-forming polymer, having excellent cleaning and removing properties and low adhesion and not showing sensitivity to hydrolysis. SOLUTION: This lotion comprises (A) 0.5-20 wt.% of a homopolymer of N-vinylcaprolactam or at least 70 wt.% of an anionic or nonionic N- vinylcaprolactam and (B) 0.5-20 wt.% of one film-forming polymer selected from a polyamide, a polyurethane and a homo- and a copolymer of a monoolefin-based unsaturated monomer. The polymers A and B exist in a solvent and the used solvent is advantageously water or an alcohol or a mixture of water and a lower alcohol. The ratio of the solvent in the hair setting lotion is 25-98 wt.%.

公开(公告)号：JPH08253536A

公开(公告)日：1996-10-01

申请号：JP4515796

申请日：1996-03-01

Applicant: BASF AG

Inventor： RAINAA BURANKENBURUKU ,  KAARIN SHIYUPEARINGU ,  AKUSERU ZANAA

IPC: A61K8/00 ,  A61K8/81 ,  A61Q5/06 ,  C08F2/06 ,  C08F18/02 ,  C08F218/02 ,  C08F218/08 ,  C08F218/10 ,  C08F220/10 ,  C08F220/12 ,  C08F220/18 ,  A61K7/11

公开(公告)号：JPH07252221A

公开(公告)日：1995-10-03

申请号：JP2954395

申请日：1995-02-17

Applicant: BASF AG

Inventor： BURIGITSUTA FUTSUKESHIYUTAIN ,  RAINAA BURANKENBURUKU ,  HERUBERUTO HERUFUERUTO

IPC: C07D207/26 ,  C07D207/267 ,  C08F26/06