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    DEVELOPING AQUEOUS SOLUTION AND DEVELOPMENT OF PHOTORESIST
    14.
    发明专利
    DEVELOPING AQUEOUS SOLUTION AND DEVELOPMENT OF PHOTORESIST 失效

    公开(公告)号：JPH03260655A

    公开(公告)日：1991-11-20

    申请号：JP40991290

    申请日：1990-12-12

    Applicant: BASF AG

    Inventor： HORUSUTO BINDAA ,  RAINHORUTO SHIYUBUARUMU

    IPC: G03F7/32

    Abstract: PURPOSE: To dissolve only the exposed part of a prescribed resist, to increase contrast and to impart satisfactory shelf stability by incorporating prescribed amts. of tetraalkylammonium hydroxide and a specified amine. CONSTITUTION: This aq. developing soln. is a soln. for positively processing a photoresist contg. at least phenolic resin and an onium salt and contains 0.3-5wt.% tetraalkylammonium hydroxide (A) such as tetramethylammonium hydroxide and 3-30wt.% amine represented by the formula (where each of R -R is H, 1-3C alkyl, etc.). Diethanolamine or N-hydroxyalkylpiperidine is preferably used as the amine. It is preferable that this developing soln. further contains 2-4C alkanol or water-soluble glycol ether.

    MIXTURE SENSITIVE TO RADIATION
    16.
    发明专利
    MIXTURE SENSITIVE TO RADIATION 失效

    公开(公告)号：JPH02181150A

    公开(公告)日：1990-07-13

    申请号：JP27876689

    申请日：1989-10-27

    Applicant: BASF AG

    Inventor： ZON GUIENNKIMU ,  GEERUHARUTO HOFUMAN ,  RAINHORUTO SHIYUBUARUMU ,  HORUSUTO BINDAA

    IPC: G03F7/039 ,  C08F4/00 ,  G03F7/004 ,  H01L21/027 ,  H01L21/30

    Abstract: PURPOSE: To obtain a radiation sensitive system by adding a specified β-ketoacid ester as a compd. to inhibit a binder from dissolving in an alkali soln. CONSTITUTION: This mixture consists of a binder or a binder mixture which is insoluble with water but soluble with an alkali soln., a compd. which produces strong acid by irradiation, and an org. compd. which inhibits dissolution of the hinder or the hinder mixture in an alkali soln. The org. compd. is a β- ketoacid ester expressed by formula I. In formula I, R is an alkyl, cycloalkyl, aralkyl group or oxygen-contg. heteroring residue, R and R are hydrogen, halogens, alkyl, cycloalkyl, aralkyl groups, etc., and R and R or R and R may form a ring with -(CH2 )n , wherein (n) is 2 to 5. R is an alkyl, cycloalkyl, aryl group or -CH2 -CO-OR . Thereby, a system having sensitivity with radiation can be obtd. and the reproducibility and resolution can be improved.

    RADIATION SENSIBLE MIXTURE WITH ACID UNSTABLE GROUP AND RELIEF PATTERN AND METHOD OF FORMING PICTURE
    17.
    发明专利
    RADIATION SENSIBLE MIXTURE WITH ACID UNSTABLE GROUP AND RELIEF PATTERN AND METHOD OF FORMING PICTURE 失效

    公开(公告)号：JPH04248554A

    公开(公告)日：1992-09-04

    申请号：JP25641791

    申请日：1991-10-03

    Applicant: BASF AG

    Inventor： RAINHORUTO SHIYUBUARUMU ,  HORUSUTO BINDAA

    IPC: G03F7/004 ,  G03F7/039 ,  H01L21/027

    Abstract: PURPOSE: To provide a photoresist material based on acid catalyst reaction mechanism, especially, to provide a radiation-sensitive mixture containing an alkali soluble binder and an org. compd. having at least one acid open-ring groups and a group which produces strong acid by irradiation of radiation. CONSTITUTION: This radiation-sensitive mixture contains the following components. (a) A polymer binder which is insoluble with water but soluble with alkali, and (b) an org. compd. the solubility of which with a water-based alkali soln. is increased by the effect of acid and which has at least one acid open-ring group and a group to produce strong acid by irradiation of radiation, and additionally, (c) at least one kind of org. compd. which reacts with water and further strong anionide at up to 120 deg.C even in the presence of an acid catalyst, at need.

    RADIOSENSITIVE MIXTURE
    19.
    发明专利
    RADIOSENSITIVE MIXTURE 失效

    公开(公告)号：JPH02181151A

    公开(公告)日：1990-07-13

    申请号：JP28316589

    申请日：1989-11-01

    Applicant: BASF AG

    Inventor： ZON GUIENNKIMU ,  GEERUHARUTO HOFUMAN ,  RAINHORUTO SHIYUBUARUMU

    IPC: G03F7/039 ,  G03F7/004 ,  H01L21/027 ,  H01L21/30

    Abstract: PURPOSE: To obtain a system having high activity and sensitive for radiation by using a specified malonic ester as a compd. to inhibit dissolution of a binder in an alkali soln. CONSTITUTION: This mixture consists of a binder or a binder mixture which is insoluble with water but soluble with an alkali soln., a compd. which produces strong acid by irradiation, and an org. compd. which inhibits dissolution of the binder or the binder mixture in an alkali soln. The org. compd. is a malonic ester expressed by formula I. In formula I, R and R are alkyl, cycloalkyl, aralkyl groups, R and R are hydrogen, halogens, alkyl, cycloalkyl, alkoxy, aralkyl groups, etc. Thus, a system which is sensitive for radiation and has high activity reproducibility and resolution can be obtd.

    WATER-SOLUBLE DEVELOPER FOR PHOTO-RESIST FUNCTIONING AS POSITIVE
    20.
    发明专利
    WATER-SOLUBLE DEVELOPER FOR PHOTO-RESIST FUNCTIONING AS POSITIVE 失效

    公开(公告)号：JPH02103549A

    公开(公告)日：1990-04-16

    申请号：JP20802989

    申请日：1989-08-14

    Applicant: BASF AG

    Inventor： RAINHORUTO SHIYUBUARUMU ,  HORUSUTO BINDAA

    IPC: G03F7/32

    Abstract: PURPOSE: To obtain high contrast and high solubility and good form quality by incorporating a specified water-soluble basic compound. CONSTITUTION: This aqueous developing solution is to be used for the positive image forming photoresist and it contains at least the water-soluble basic compound represented by formula I in which each of R -R is an H atom or a hydroxy or hydroxyalkyl group; and (x) is 1-5. The paticularly preferable hydroxy-alkyl piperidine of formula I is N-hydroxy-(methyl- or ethyl- or propyl-) piperidine, thus permitting the obtained developing solution to be improved in safety and development performance and to enhance contrast and edge sharpness and solubility.

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