公开(公告)号：DE3802999A1

公开(公告)日：1989-08-10

申请号：DE3802999

申请日：1988-02-02

Applicant: BASF AG

Inventor： STEININGER HELMUT DR

IPC: G11B11/10 ,  G11B11/105

公开(公告)号：DE3718523A1

公开(公告)日：1988-12-22

申请号：DE3718523

申请日：1987-06-03

Applicant: BASF AG

Inventor： KUPPELMAIER HARALD DR ,  STEININGER HELMUT DR ,  WIEGEMANN HANS-BERTRAM DR ,  KOESTER EBERHARD DR

IPC: B41M5/26 ,  G11B7/24 ,  G11B7/243 ,  B05D5/12

公开(公告)号：DE19738369A1

公开(公告)日：1999-03-25

申请号：DE19738369

申请日：1997-09-02

Applicant: BASF AG

Inventor： SCHUHMACHER PETER DR ,  SCHNEIDER NORBERT ,  RICHTER VOLKER ,  KELLER HARALD DR ,  BLASCHKA PETER ,  BETTINGER GUENTER ,  MEYER FRANK DR ,  BECK ERICH DR ,  SIEMENSMEYER KARL DR ,  STEININGER HELMUT DR

IPC: C08G63/68 ,  C08G64/04 ,  C09B67/00 ,  C09D5/36 ,  C09K19/00 ,  C09B67/20 ,  A61K7/00 ,  B05D7/26 ,  B29C41/12 ,  C08J3/28 ,  C09C1/00 ,  C09C3/00 ,  C09D5/29 ,  C09D17/00 ,  C09K19/38 ,  C14C11/00

Abstract: Cholesteric material is produced by applying a pourable cholesteric mixture to a support and forming a solid layer.- DETAILED DESCRIPTION - Cholesteric material comprises a cholesteric layer(s) of average thickness below 0.2 mu .- INDEPENDENT CLAIMS are included for the production of the material by applying a pourable cholesteric mixture to a support and forming a solid layer, a pigment obtained by grinding the material and a composition containing the pigment.TF - TECHNOLOGY FOCUS - POLYMERS - The mixture has a viscosity of 10-500 (10-100) mPa.s at 23degreesC, is applied at 1-800 (1-500) m/min. and is prepared by mixing a comprises a cholesteric monomer(s) in an inert diluent, an achiral, nematic monomer(s) and a chiral compound in an inert diluent, a cholesteric, crosslinkable oligomer or polymer in an inert diluent, a cholesteric polymer in a polymerizable diluent or a cholesteric polymer which can be congealed on rapid cooling below the Tg (claimed)

公开(公告)号：DE3918582A1

公开(公告)日：1990-12-13

申请号：DE3918582

申请日：1989-06-07

Applicant: BASF AG

Inventor： HARTH KLAUS DR ,  HIBST HARTMUT DR ,  SONNBERGER RALF DR ,  STEININGER HELMUT DR

IPC: C01B21/072 ,  C23C14/06

公开(公告)号：DE3908634A1

公开(公告)日：1990-09-20

申请号：DE3908634

申请日：1989-03-16

Applicant: BASF AG

Inventor： STEININGER HELMUT DR

IPC: G11B11/105

Abstract: A magneto-optical data disc having at least one optically transparent, dimensionally stable support (base, carrier, substrate) (A) and at least one magneto-optical recording layer (B) of a cobalt-containing lanthanide or lanthanide/transition metal alloy, in which the cobalt concentration changes in the horizontal direction, and a process for the production of the magneto-optical data disc.

公开(公告)号：DE58905929D1

公开(公告)日：1993-11-25

申请号：DE58905929

申请日：1989-01-26

Applicant: BASF AG

Inventor： STEININGER HELMUT DR

IPC: C23C14/00 ,  C23C14/06 ,  C23C14/34 ,  G02B6/122 ,  G11B7/243 ,  G11B7/253 ,  G11B7/2536 ,  G11B7/257 ,  G11B7/2578 ,  G11B11/10 ,  G11B11/105 ,  H01L21/318

Abstract: Process for producing a thin X-ray-amorphous layer of aluminium nitride or aluminium siliconitride on a surface by reactive cathodic sputtering or reactive magnetron-cathodic sputtering of aluminium or of aluminium and silicon in vacuo in a process gas atmosphere containing a rare gas and nitrogen, and by depositing the particular nitride layer from the gas phase, wherein (a) as the rare gas, a mixture of argon and one or more of the rare gases neon, krypton or xenon is used, (b) the volume ratio of argon to the other rare gases being 2:1 to 100:1 and (c) the volume ratio of the rare gas mixture (a) to nitrogen being 2:1 to 10:1.

公开(公告)号：DE3877053D1

公开(公告)日：1993-02-11

申请号：DE3877053

申请日：1988-05-11

Applicant: BASF AG

Inventor： STEININGER HELMUT DR

IPC: G11B11/10 ,  G11B5/72 ,  G11B11/105

Abstract: A planar, multilayer, magneto-optical recording material comprises a light-permeable substratee having a thermally modifiable recording layer of amorphous lanthanide-transition metal alloy, coated with a mutlilayer carbide-, nitride-and/or oxide-contg. anticorrosion coating. The novelty is that the anticorrosion coating is 30-250 nm. thick and consists of four or more separate layers of each of two or more components, directly adjacent layers being of different components. At least one of the components is selected from (i) B, Al, Si, Ti, Zr, Hf, V, Nb, Ta, Cr, Mo and W and at least one other of the components is selected from (ii) carbides, nitrides and oxides of these elements (i).

公开(公告)号：DE3802998A1

公开(公告)日：1989-08-10

申请号：DE3802998

申请日：1988-02-02

Applicant: BASF AG

Inventor： STEININGER HELMUT DR

IPC: C23C14/00 ,  C23C14/06 ,  C23C14/34 ,  G02B6/122 ,  G11B7/243 ,  G11B7/253 ,  G11B7/2536 ,  G11B7/257 ,  G11B7/2578 ,  G11B11/10 ,  G11B11/105 ,  H01L21/318

Abstract: Process for producing a thin X-ray-amorphous layer of aluminium nitride or aluminium siliconitride on a surface by reactive cathodic sputtering or reactive magnetron-cathodic sputtering of aluminium or of aluminium and silicon in vacuo in a process gas atmosphere containing a rare gas and nitrogen, and by depositing the particular nitride layer from the gas phase, wherein (a) as the rare gas, a mixture of argon and one or more of the rare gases neon, krypton or xenon is used, (b) the volume ratio of argon to the other rare gases being 2:1 to 100:1 and (c) the volume ratio of the rare gas mixture (a) to nitrogen being 2:1 to 10:1.