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    COMPOSITION FOR METAL ELECTROPLATING COMPRISING LEVELING AGENT
    12.
    发明专利
    COMPOSITION FOR METAL ELECTROPLATING COMPRISING LEVELING AGENT 未知

    公开(公告)号：SG10201510522XA

    公开(公告)日：2016-01-28

    申请号：SG10201510522X

    申请日：2011-12-19

    Applicant: BASF SE

    Inventor： ROGER-GOPFERT CORNELIA ,  HORHAMMER HARALD ,  ARNOLD MARCO ,  EMNET CHARLOTTE ,  MAYER DIETER ,  RAETHER ROMAN BENEDIKT

    Abstract: A method of detecting space debris includes: generating a virtual space debris in accordance with the law of conservation of mass by applying a debris breakup model to an object of breakup origin; calculating an orbit of each virtual space debris based on a debris orbit propagation model; and generating appearance frequency distribution of a motion vector of each virtual space debris on the celestial sphere based on the orbit calculation. The above operations are executed multiple times. The method further includes setting a search range vector based on a motion vector having a high level of the appearance frequency distribution of the motion vector, and applying a stacking method to regions in images captured at time intervals during the fixed point observation, the regions being shifted along the search range vector sequentially in the order of capture, thereby detecting space debris appearing on the images.

    COMPOSITION FOR METAL ELECTROPLATING COMPRISING LEVELING AGENT
    17.
    发明公开
    COMPOSITION FOR METAL ELECTROPLATING COMPRISING LEVELING AGENT 审中-公开
    ZUSAMMENSETZUNG ZUR METALLGALVANISIERUNG MIT VERLAUFMITTEL

    公开(公告)号：EP2917265A4

    公开(公告)日：2016-06-29

    申请号：EP13852692

    申请日：2013-10-30

    Applicant: BASF SE

    Inventor： KIENLE MARCEL PATRIK ,  MAYER DIETER ,  RÖGER-GÖPFERT CORNELIA ,  HAAG ALEXANDRA ,  EMNET CHARLOTTE ,  FLÜGEL ALEXANDER ,  ARNOLD MARCO

    IPC: C08G73/14 ,  C23C18/38 ,  C25D3/32 ,  C25D3/38

    CPC classification number: C25D3/38 ,  C23C18/38 ,  C25D3/32

    Abstract: A composition comprising a source of metal ions and at least one additive comprising at least one polyaminoamide, said polyaminoamide comprising the structural unit represented by formula I or derivatives of the polyaminoamide of formula I obtainable by complete or partial protonation, N-functionalization or N-quaternization with a non-aromatic reactant, wherein D6 is, for each repeating unit 1 to s independently, a divalent group selected from a saturated or unsaturated C1-C20 organic radical, D7 is, for each repeating unit 1 to s independently, a divalent group selected from straight chain or branched C2-C20 alkanediyl, which may optionally be interrupted by heteroatoms or divalent groups selected from O, S and NR10, R1 is, for each repeating unit 1 to s independently, selected from H, C1-C20 alkyl, and C1-C20 alkenyl, which may optionally be substituted by hydroxyl, alkoxy or alkoxycarbonyl, or, together with R2, may form a divalent group D8, and R2 is, for each repeating unit 1 to s independently, selected from H, C1-C20 alkyl, and C1-C20 alkenyl, which may optionally be substituted by hydroxyl, alkoxy or alkoxycarbonyl, or, together with R1, may form a divalent group D8, and D8 is selected from straight chain or branched C1-C18 alkanediyl, which may optionally be interrupted by heteroatoms or divalent groups selected from O, S and NR10, s is an integer from 1 to 250, R10 is selected from H, C1-C20 alkyl, and C1-C20 alkenyl, which may optionally be substituted by hydroxyl, alkoxy or alkoxycarbonyl.

    Abstract translation: 包含金属离子源和至少一种包含至少一种聚氨基酰胺的添加剂的组合物，所述聚氨基酰胺包括由式I表示的结构单元或通过完全或部分质子化获得的式I的聚氨基酰胺的衍生物，N-官能化或N- 用非芳族反应物进行季铵化反应，其中D6对于每个重复单元1独立地选自饱和或不饱和的C 1 -C 20有机基团中的二价基团，D 7对于每个重复单元1独立地是二价 选自直链或支链C 2 -C 20烷二基的基团，其可任选被杂原子或选自O，S和NR 10的二价基团中断，R 1为每个重复单元1至s独立地选自H，C 1 -C 20烷基 和可以任选被羟基，烷氧基或烷氧基羰基取代的C1-C20烯基，或者与R2一起可以形成二价基团D8，R2是每个重复单元1〜 独立地选自H，C 1 -C 20烷基和C 1 -C 20链烯基，其可以任选地被羟基，烷氧基或烷氧基羰基取代，或者与R 1一起可以形成二价基团D8，并且D8选自直链 或支链C 1 -C 18烷二基，其可任选被杂原子或选自O，S和NR 10的二价基团中断，s为1至250的整数，R 10选自H，C 1 -C 20烷基和C 1 -C 20链烯基 ，其可以任选地被羟基，烷氧基或烷氧基羰基取代。

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