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    COMPOSICION DE RESINA FOTOSENSIBLE.
    11.
    发明专利
    COMPOSICION DE RESINA FOTOSENSIBLE. 未知

    公开(公告)号：ES2375471T3

    公开(公告)日：2012-03-01

    申请号：ES02758358

    申请日：2002-07-18

    Applicant: BASF SE

    Inventor： KURA HISATOSHI ,  OKA HIDETAKA ,  OHWA MASAKI

    IPC: G03F7/031 ,  C08F2/50 ,  G02B5/20 ,  G03F7/00 ,  G03F7/004 ,  H01L21/027 ,  H01L51/50 ,  H05B33/10

    Abstract: Una composición fotosensible que comprende, (A) un oligómero o polímero que contiene al menos un grupo de ácido carboxílico en la molécula y tiene un peso molecular de 200000 o menos; (B) al menos un compuesto fotoiniciador de fórmula I R1 es alquiloC1-C12 lineal o ramificado; R2 es alquilo C1-C4 lineal o ramificado; R3 y R4 independientemente uno de otro son alquilo C1-C8 lineal o ramificado; y (C) un compuesto monomérico, oligomérico o polimérico que tiene al menos un doble enlace olefínico.

    12.
    发明专利
    未知

    公开(公告)号：AT530951T

    公开(公告)日：2011-11-15

    申请号：AT02758358

    申请日：2002-07-18

    Applicant: BASF SE

    Inventor： KURA HISATOSHI ,  OKA HIDETAKA ,  OHWA MASAKI

    IPC: G03F7/031 ,  C08F2/50 ,  G02B5/20 ,  G03F7/00 ,  G03F7/004 ,  H01L21/027 ,  H01L51/50 ,  H05B33/10

    Abstract: A photopolymerization process for producing pigmented and non-pigmented articles comprises irradiating with electromagnetic radiation in the range from 190 to 600 nm, or with electron beam or with X-rays a photosensitive composition which can be developed by alkali solution which composition comprises (A) a polymer containing at least one carboxylic acid group in the molecule and having a molecular weight of 200,000 or less, (B) selected alpha-aminoalkylphenone compounds as photoinitiators and (C) an ester of a polyol, wherein the polyol is partially or fully esterified with an ethylenically unsaturated carboxylic acid a monomeric, oligomeric or polymeric compound having at least one olefinic double bond.

    OXIMESTER-PHOTOINITIATOREN
    15.
    发明专利
    OXIMESTER-PHOTOINITIATOREN 未知

    公开(公告)号：DE602006012366D1

    公开(公告)日：2010-04-01

    申请号：DE602006012366

    申请日：2006-11-09

    Applicant: BASF SE

    Inventor： MATSUMOTO AKIRA ,  TANABE JUNICHI ,  KURA HISATOSHI ,  OHWA MASAKI

    IPC: C08F2/50 ,  C07C251/66 ,  G03F7/031

    Abstract: Compounds of the Formula (I) and (II) wherein M1, M2 and M3 independently of one another are no bond, a direct bond, CO, O, S, SO, SO2 or NR14; provided that at least one of M1, M2 or M3 is a direct bond, CO, O, S, SO, SO2 or NR14; M4 is a direct bond, CR''3R''4, CS, O, S, SO, or SO2; Y is S or NR18; R1 for example is hydrogen, C3-C8cycloalkyl, phenyl or naphthyl, both of which are optionally substituted; R2 for example is C1-C20alkyl; R''2 has one of the meanings given for R2; R3 and R4 are for example hydrogen, halogen, C1-C20alkyl; R'3, R'4, R''3 and R''4 independently of one another have one of the meanings given for R3 and R4; and R5 is for example hydrogen, halogen, C1-C20alkyl; provided that in the compounds of the Formula (I) at least two oxime ester groups are present; exhibit an unexpectedly good performance in photopolymerization reactions.

    16.
    发明专利
    未知

    公开(公告)号：AT458010T

    公开(公告)日：2010-03-15

    申请号：AT06807785

    申请日：2006-11-09

    Applicant: BASF SE

    Inventor： MATSUMOTO AKIRA ,  TANABE JUNICHI ,  KURA HISATOSHI ,  OHWA MASAKI

    IPC: C08F2/50 ,  C07C251/66 ,  G03F7/031

    Abstract: Compounds of the Formula (I) and (II) wherein M1, M2 and M3 independently of one another are no bond, a direct bond, CO, O, S, SO, SO2 or NR14; provided that at least one of M1, M2 or M3 is a direct bond, CO, O, S, SO, SO2 or NR14; M4 is a direct bond, CR''3R''4, CS, O, S, SO, or SO2; Y is S or NR18; R1 for example is hydrogen, C3-C8cycloalkyl, phenyl or naphthyl, both of which are optionally substituted; R2 for example is C1-C20alkyl; R''2 has one of the meanings given for R2; R3 and R4 are for example hydrogen, halogen, C1-C20alkyl; R'3, R'4, R''3 and R''4 independently of one another have one of the meanings given for R3 and R4; and R5 is for example hydrogen, halogen, C1-C20alkyl; provided that in the compounds of the Formula (I) at least two oxime ester groups are present; exhibit an unexpectedly good performance in photopolymerization reactions.

    17.
    发明专利
    未知

    公开(公告)号：AT446322T

    公开(公告)日：2009-11-15

    申请号：AT02778878

    申请日：2002-06-04

    Applicant: BASF SE

    Inventor： KUNIMOTO KAZUHIKO ,  TANABE JUNICHI ,  KURA HISATOSHI ,  OKA HIDETAKA ,  OHWA MASAKI

    IPC: C08F2/50 ,  G02B5/20 ,  C07C251/64 ,  C07C251/66 ,  C07C323/22 ,  C07C323/47 ,  C07D209/86 ,  C07D311/16 ,  C08F10/00 ,  G03F7/031 ,  H01L21/027

    Abstract: Compounds of the formulae I, II and III wherein R 1 is for example hydrogen, C 3 -C 8 cycloalkyl, C 1 -C 12 alkyl, phenyl unsubstituted or substituted; R 2 and R 2 ' for example are hydrogen, C 1 -C 20 alkyl, C 3 -C 8 cycloalkyl or phenyl, unsubstituted or substituted, or are Ar 1 is for example phenyl, optionally substituted by e.g. Ar 2 is for example phenylene, optionally substituted e.g. by -(CO)R 7 , (D), (E) or (F); Ar 3 is for example phenyl; M 1 , M 2 and M 3 are, for example, C 1 -C 20 alkylene; M 4 is for example direct bond, -O-, -S-, -Y-(C 1 -C 10 alkylene)-Y'-, optionally substituted; Y and Y' are for example a direct bond or -O-; R 7 is for example hydrogen, C 1 -C 20 alkyl or phenyl, optionally substituted; R 8 , R 9 , R 8 ' and R 9 ' are for example hydrogen or C 1 -C 12 alkyl, exhibit an unexpectedly good performance in photopolymerization reactions.

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