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    PHOTOLATENT AMIDINE BASES FOR REDOX CURING OF RADICALLY CURABLE FORMULATIONS
    1.
    发明申请
    PHOTOLATENT AMIDINE BASES FOR REDOX CURING OF RADICALLY CURABLE FORMULATIONS 审中-公开
    用于氧化固化的光固化胺基

    公开(公告)号：WO2009095282A3

    公开(公告)日：2009-11-12

    申请号：PCT/EP2009050066

    申请日：2009-01-06

    Applicant: BASF SE ,  STUDER KATIA ,  DIETLIKER KURT ,  JUNG TUNJA

    Inventor： STUDER KATIA ,  DIETLIKER KURT ,  JUNG TUNJA

    IPC: C08F2/50 ,  C07D487/04 ,  G03F7/031

    CPC classification number: C08F2/50 ,  G03F7/031

    Abstract: The invention pertains to photolatent amidine bases for redox curing of radically curable formulations, that is a composition comprising (a1) a photolatent amidine base; or (a2) a photolatent amine base; or (a3) a mixture of (a1) and (a2); and (b) a radically polymerizable compound; and (c) a free radical initiator capable to be reduced by amines and/or amidines, in particular a peroxide.

    Abstract translation: 本发明涉及用于自由基可固化制剂的氧化还原固化的照相脒基，即包含（a1）光引发脒基的组合物; 或（a2）光致胺基; 或（a3）（a1）和（a2）的混合物; 和（b）自由基聚合性化合物; 和（c）能够被胺和/或脒，特别是过氧化物还原的自由基引发剂。

    PHOTOLATENT AMIDINE BASES FOR REDOX CURING OF RADICALLY CURABLE FORMULATIONS
    2.
    发明申请
    PHOTOLATENT AMIDINE BASES FOR REDOX CURING OF RADICALLY CURABLE FORMULATIONS 审中-公开
    用于氧化固化的光固化胺基

    公开(公告)号：WO2009095282A4

    公开(公告)日：2010-01-14

    申请号：PCT/EP2009050066

    申请日：2009-01-06

    Applicant: BASF SE ,  STUDER KATIA ,  DIETLIKER KURT ,  JUNG TUNJA

    Inventor： STUDER KATIA ,  DIETLIKER KURT ,  JUNG TUNJA

    IPC: C08F2/50 ,  C07D487/04 ,  G03F7/031

    CPC classification number: C08F2/50 ,  G03F7/031

    Abstract: The invention pertains to photolatent amidine bases for redox curing of radically curable formulations, that is a composition comprising (a1) a photolatent amidine base; or (a2) a photolatent amine base; or (a3) a mixture of (a1) and (a2); and (b) a radically polymerizable compound; and (c) a free radical initiator capable to be reduced by amines and/or amidines, in particular a peroxide.

    Abstract translation: 本发明涉及用于自由基可固化制剂的氧化还原固化的光潜脒碱，即包含（a1）光致脒基的组合物; 或（a2）光致胺基; 或（a3）（a1）和（a2）的混合物; 和（b）自由基聚合性化合物; 和（c）能够被胺和/或脒，特别是过氧化物还原的自由基引发剂。

    PHOTOACTIVABLE NITROGEN BASES
    9.
    发明专利
    PHOTOACTIVABLE NITROGEN BASES 未知

    公开(公告)号：CA2681201C

    公开(公告)日：2016-06-14

    申请号：CA2681201

    申请日：2008-03-25

    Applicant: BASF SE

    Inventor： DIETLIKER KURT ,  MISTELI KATHARINA ,  STUDER KATIA ,  JUNG TUNJA ,  ENGELBRECHT LOTHAR ALEXANDER

    IPC: B01J37/34 ,  B01J19/12 ,  C07B61/00 ,  C07C249/02 ,  C07C251/02 ,  C07D487/04 ,  C08F2/50 ,  C08F4/00 ,  C08G85/00 ,  C08J3/24

    Abstract: Compounds of the formula (I), (II) or (III), wherein Ar is for example phenylene, biphenylene or naphthylene, all of which are unsubstituted or substituted by C1-C4-alkyl, C2-C4-alkenyl, CN, OR11, SR11, CH2OR11, COOR12, CONR12R13 or halogen; R1, R2, R7 and R8 independently of one another are hydrogen or C1-C6-alkyl; R3 and R5 together and R4 and R6 together form a C2-C6-alkylene bridge which is unsubstituted or substituted by one ore more C1-C4-alkyl; R11 is hydrogen or C1-C6-alkyl; R12 and R13 independently of one another for example are hydrogen, phenyl, C1-C18-alkyl, C1-C18-alkyl which is interrupted by one or more 0; n is 1-1 0;X is O, S or NR10; A and A1 are suitable linking groups; are suitable as photolatent bases. (see formula I) (see formula II) (see formula III)

    10.
    发明专利
    未知

    公开(公告)号：AT524765T

    公开(公告)日：2011-09-15

    申请号：AT08718153

    申请日：2008-03-25

    Applicant: BASF SE

    Inventor： DIETLIKER KURT ,  MISTELI KATHARINA ,  STUDER KATIA ,  JUNG TUNJA ,  ENGELBRECHT LOTHAR ALEXANDER

    IPC: G03F7/004 ,  C07C1/00 ,  C07D487/00 ,  C08F2/50 ,  G03F7/038

    Abstract: Compounds of the Formula (I), (II) and (III) wherein Ar is for example phenylene, biphenylene or naphthylene, all of which are unsubstituted or substituted by C1-C4-alkyl, C2-C4-alkenyl, CN, OR11, SR11, CH2OR11, COOR12, CONR12R13 or halogen; R1, R2, R7 and R8 independently of one another other are hydrogen or C1-C6-alkyl; R3 and R5 together and R4 and R6 together form a C2-C6-alkylene bridge which is unsubstituted or substituted by one or more C1-C4-alkyl; R11 is hydrogen or C1-C6-alkyl; R12 and R13 independently of one another for example are hydrogen, phenyl, C1-C18-alkyl, C1-C18-alkyl which is interrupted by one or more O; n is 1-10; X is O, S or NR10; A and A1 are suitable linking groups; are suitable as photolatent bases.

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