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    3.
    发明专利
    未知

    公开(公告)号：AT496027T

    公开(公告)日：2011-02-15

    申请号：AT09177920

    申请日：2006-11-08

    Applicant: BASF SE

    Inventor： MATSUMOTO AKIRA ,  TANABE JUNICHI ,  KURA HISATOSHI ,  OHWA MASAKI

    IPC: C07D209/86 ,  G03F1/88 ,  C07D209/88 ,  C07D403/10 ,  C07D409/10 ,  G03F7/004

    Abstract: Compounds of the formula II, and III wherein R 1 , R 2 , R' 2 and R"' 2 for example are C 1 -C 20 alkyl; R 3 , R 4 , and R 5 for example independently of one another are hydrogen or a defined substituent provided that at least one of R 3 , R 4 or R 5 is other than hydrogen or C 1 -C 20 alkyl; R 6 , R 7 , R 8 , R' 6 , R' 7 , R' 8 , R" 6 , R" 7 , R"' 6 and R"' 7 for example independently of one another have one of the meanings as given for R 3 , R 4 , and R 5 ; and R 9 for example is C 1 -C 20 alkyl; exhibit an unexpectedly good performance in photopolymerization reactions.

    5.
    发明专利
    未知

    公开(公告)号：AT458211T

    公开(公告)日：2010-03-15

    申请号：AT01985295

    申请日：2001-09-18

    Applicant: BASF SE

    Inventor： YAMATO HITOSHI ,  ASAKURA TOSHIKAGE ,  MATSUMOTO AKIRA ,  OHWA MASAKI

    IPC: G03F7/004 ,  C07C309/63 ,  G03F7/038 ,  G03F7/039 ,  H01L21/027

    Abstract: New oxime sulfonate compounds of the formula I, II, III, IV, V, VI and VII R 1 is for example C 1 -C 18 alkylsulfonyl, R 2 is halogen or C 1 -C 10 haloalkyl; R 3 is for example unsubstitude or substituted phenylenedisulfonyl, diphenylenedisulfonyl, or oxydiphenylenedisulfonyl; Ar 1 is for example a direct bond, C 1 -C 12 alkylene; -O-C-bond or a -O-Si-bond which cleaves upon the action of an acid; A 1 , A 2 , A 3 , A 4 , A 5 , A 6 , A 7 , A 8 , A 9 , A 10 , A 11 and A 12 are for example a direct bond, -O-, or -S-, or are C 1 -C 12 alkylene or phenylene unsubstituted or substituted; Y 1 is C 1 -C 12 alkylene which is for example substituted by OR 4 , or SR 7 ; Y 2 is e.g. a trivalent radical of C 1 -C 12 alkylene; Y 3 is e.g. a tetravalent radical of C 1 -C 12 alkylene; X is halogen; Ar' 1 is for example C 1 -C 12 alkyl which is unsubstituted or substituted; Ar'' 1 is for example phenylene; provided that at least one of the radicals Ar' 1 , Ar'' 1 , is substituted by 1 to 3 groups of example halogen; R 15 , R 16 , R 17 and R 18 e.g. hydrogen or phenyl; R 19 , R 20 , R 21 , R 22 R 23 are e.g. phenyl; are especially suitable for the preparation of photoresists.

    OXIMESTER-PHOTOINITIATOREN
    8.
    发明专利
    OXIMESTER-PHOTOINITIATOREN 未知

    公开(公告)号：DE602006012366D1

    公开(公告)日：2010-04-01

    申请号：DE602006012366

    申请日：2006-11-09

    Applicant: BASF SE

    Inventor： MATSUMOTO AKIRA ,  TANABE JUNICHI ,  KURA HISATOSHI ,  OHWA MASAKI

    IPC: C08F2/50 ,  C07C251/66 ,  G03F7/031

    Abstract: Compounds of the Formula (I) and (II) wherein M1, M2 and M3 independently of one another are no bond, a direct bond, CO, O, S, SO, SO2 or NR14; provided that at least one of M1, M2 or M3 is a direct bond, CO, O, S, SO, SO2 or NR14; M4 is a direct bond, CR''3R''4, CS, O, S, SO, or SO2; Y is S or NR18; R1 for example is hydrogen, C3-C8cycloalkyl, phenyl or naphthyl, both of which are optionally substituted; R2 for example is C1-C20alkyl; R''2 has one of the meanings given for R2; R3 and R4 are for example hydrogen, halogen, C1-C20alkyl; R'3, R'4, R''3 and R''4 independently of one another have one of the meanings given for R3 and R4; and R5 is for example hydrogen, halogen, C1-C20alkyl; provided that in the compounds of the Formula (I) at least two oxime ester groups are present; exhibit an unexpectedly good performance in photopolymerization reactions.

    9.
    发明专利
    未知

    公开(公告)号：AT458010T

    公开(公告)日：2010-03-15

    申请号：AT06807785

    申请日：2006-11-09

    Applicant: BASF SE

    Inventor： MATSUMOTO AKIRA ,  TANABE JUNICHI ,  KURA HISATOSHI ,  OHWA MASAKI

    IPC: C08F2/50 ,  C07C251/66 ,  G03F7/031

    Abstract: Compounds of the Formula (I) and (II) wherein M1, M2 and M3 independently of one another are no bond, a direct bond, CO, O, S, SO, SO2 or NR14; provided that at least one of M1, M2 or M3 is a direct bond, CO, O, S, SO, SO2 or NR14; M4 is a direct bond, CR''3R''4, CS, O, S, SO, or SO2; Y is S or NR18; R1 for example is hydrogen, C3-C8cycloalkyl, phenyl or naphthyl, both of which are optionally substituted; R2 for example is C1-C20alkyl; R''2 has one of the meanings given for R2; R3 and R4 are for example hydrogen, halogen, C1-C20alkyl; R'3, R'4, R''3 and R''4 independently of one another have one of the meanings given for R3 and R4; and R5 is for example hydrogen, halogen, C1-C20alkyl; provided that in the compounds of the Formula (I) at least two oxime ester groups are present; exhibit an unexpectedly good performance in photopolymerization reactions.

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