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公开(公告)号:CA1318802C
公开(公告)日:1993-06-08
申请号:CA600155
申请日:1989-05-18
Applicant: CANON KK
Inventor: MINOURA KAZUO , SHIMODA ISAMU
Abstract: A scanning optical apparatus comprises: a light source unit, optical system for converging a light beam from the light source unit at a predetermined position, moving device for moving the converged position of the light beam by the optical system; deflecting device for deflecting the light beam from the light source unit in a predetermined direction; light receiving device for receiving the light beam deflected by the deflecting device, processing device for processing a signal obtained by said light receiving device, and control device for controlling the moving device correspondingly to a signal from the processing device, the light beam emitted from said light source unit being scanned on said light receiving device a plurality of times through said optical system and said deflecting device while the converged position of the light beam is moved by the moving device, and the signal from the light receiving device during each of the plurality of times of scanning being compared or calculated by the processing device to thereby adjust and determine the converged position of the light beam by the optical system.
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公开(公告)号:GB2130762B
公开(公告)日:1986-07-02
申请号:GB8328037
申请日:1983-10-20
Applicant: CANON KK
Inventor: SATO MITSUYA , SHIMODA ISAMU
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公开(公告)号:DE3856492T2
公开(公告)日:2002-10-31
申请号:DE3856492
申请日:1988-02-04
Applicant: CANON KK
Inventor: OKUNUKI MASAHIKO , SUZUKI AKIRA , SHIMODA ISAMU , KANEKO TETSUYA , TSUKAMOTO TAKEO , TAKEDA TOSHIHIKO , YONEHARA TAKAO , ICHIKAWA TAKESHI
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公开(公告)号:DE69326197D1
公开(公告)日:1999-10-07
申请号:DE69326197
申请日:1993-06-15
Applicant: CANON KK
Inventor: SHIMODA ISAMU
Abstract: An image processing apparatus can be used by users physically-handicapped in the visual sense and users physically-handicapped both in the visual and auditory senses, as well as by normal users. In the apparatus, an image pickup device need not be pressed against the output picture surface of a visual display, resulting in an easy operation and easiness in other kinds of operations. The apparatus includes a first display output unit for displaying visual display information, a conversion device for converting the visual display information into auditory information or tactile information, and a second display output unit for displaying the converted auditory information or tactile information with a sound or vibration. The second display output unit performs a display operation in response to a switching operation of a second input device.
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公开(公告)号:DE69227876T2
公开(公告)日:1999-06-02
申请号:DE69227876
申请日:1992-09-10
Applicant: CANON KK
Inventor: YOSHIDA MASAAKI , SHIMODA ISAMU , MATSUOKA MIKIHARA , MIYAZAKI YASUKO , KANASHIKI MASAAKI
Abstract: A communication apparatus for a handicapped person, includes a plurality of first key switches for inputting character input data in a general input mode, a single second key switch for inputting character input data in a second key input mode, a character input device (50) for inputting the character input data in the general input mode inputted by operating the plurality of first key switches or in the single key input mode inputted by operating the single second key switch, a character output device (54) for outputting at least character output data which corresponds to the character input data inputted by the character input device, a mode selector for selecting the character input data input in the general input mode by the character input device (50) or the character input data input in the single key input mode by the character input device, and a controller for controlling the operation of the character input device (50), the character output device (54), and the input mode selector (51a)
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公开(公告)号:DE69030985T2
公开(公告)日:1998-02-05
申请号:DE69030985
申请日:1990-04-27
Applicant: CANON KK
Inventor: HOSHINO OSAMU , SHIMODA ISAMU , ISAKA KAZUO , SUZUKI MASAYUKI
Abstract: A scanning optical equipment provided with the means to detect scanning beam spot at more than two points of the scanned surface and the means to enable direct observation of the state of focussing of the beam spot, thus enabling extremely precise control of the state of focussing and forming an extremely high density image which could not be obtained by the conventional methods.
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公开(公告)号:DE3752064T2
公开(公告)日:1997-11-06
申请号:DE3752064
申请日:1987-09-10
Applicant: CANON KK
Inventor: SUZUKI AKIRA , TSUKAMOTO TAKEO , SHIMIZU AKIRA , SUGATA MASAO , SHIMODA ISAMU , OKUNUKI MASAHIKO
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公开(公告)号:DE69030985D1
公开(公告)日:1997-08-07
申请号:DE69030985
申请日:1990-04-27
Applicant: CANON KK
Inventor: HOSHINO OSAMU , SHIMODA ISAMU , ISAKA KAZUO , SUZUKI MASAYUKI
Abstract: A scanning optical equipment provided with the means to detect scanning beam spot at more than two points of the scanned surface and the means to enable direct observation of the state of focussing of the beam spot, thus enabling extremely precise control of the state of focussing and forming an extremely high density image which could not be obtained by the conventional methods.
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公开(公告)号:DE68921033T2
公开(公告)日:1995-06-22
申请号:DE68921033
申请日:1989-09-11
Applicant: CANON KK
Inventor: MORI MAKIKO , OZAWA KUNITAKA , UDA KOJI , SHIMODA ISAMU , UZAWA SHUNICHI , SAKAMOTO FIJI
IPC: G03F1/76 , G03F7/20 , H01L21/027
Abstract: A method of exposing a wafer to exposure energy such as ultraviolet rays or X-rays through a mask to transfer a pattern of the mask onto the wafer, for example. The temperature of the mask and/or the wafer increases during the exposure operation by absorption of the exposure energy. During the wafer being exposed, the temperature of the mask and/or the wafer is detected. If the temperature is going to exceed the exposable temperature range determined on the basis of the line width of the pattern to be transferred, the exposure operation is interrupted. Then, the heat accumulated in the mask and/or the wafer is removed. Thereafter, the exposure operation is resumed. This is repeated until the predetermined or required amount of exposure is reached, for one shot. By this, the thermal expansion of the mask and the wafer during the exposure operation is prevented to assure the precision of the pattern transfer.
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公开(公告)号:DE68921687D1
公开(公告)日:1995-04-20
申请号:DE68921687
申请日:1989-08-31
Applicant: CANON KK
Inventor: MORI TETSUZO , SAKAMOTO EIJI , HARA SHINICHI , UDA KOJI , SHIMODA ISAMU , UZAWA SHINICHI
IPC: G03F7/20
Abstract: The mask(3) and the wafer (4) are closely disposed, and predetermined exposure energy is applied to the respective shot areas of the wafer(4) through the mask (3). The exposure energy is soft-X-ray source, for example. The pattern of the mask (3) is transferred onto the respective shot areas in a step-and-repeat manner. In the apparatus (fig 1), a temperature control medium liquid is supplied into the wafer chuck (5) for supporting the wafer (4) at the exposure position. The flow rate is different during the exposure operation than during the non-exposure-operation. The flow control (10) is determined in consideration of the wafer chuck vibration attributable to the supply of the liquid medium and also to the heat generation in the wafer(4) by the exposure energy, so that the vibration of the wafer chuck (5) during the exposure operation is suppressed, and simultaneously, the temperature rise of the wafer (4) can be also suppressed. The pattern transfer from the mask (3) to the wafer (4) can be precisely performed.
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