公开(公告)号：JP2003222991A

公开(公告)日：2003-08-08

申请号：JP2002020274

申请日：2002-01-29

Applicant: CANON KK

Inventor： TERAJIMA SHIGERU ,  HASEGAWA TAKAYASU

IPC: G03F1/64 ,  G03F1/66 ,  G03F7/20 ,  H01L21/027 ,  G03F1/14

Abstract: PROBLEM TO BE SOLVED: To provide a reticle structure to prevent the infiltration of impurities including oxygen and moisture into a pellicle space of a reticle and to provide manufacturing means, storing means, inspecting means and exposing means for the same. SOLUTION: In a manufacturing stage of the reticle, inert gas is sealed under the pressure higher than ambient pressure into the pellicle space and the reticle is stored in a pressure vessel so as to maintain this state. In inspecting the reticle, the reticle is inspected by adjusting the air pressure of an inspection space based on the pressure of the pellicle. In the exposure device, the reticle is exposed by adjusting the air pressure in the exposure space during exposure based on the pressure of the pellicle. COPYRIGHT: (C)2003,JPO

公开(公告)号：JP2003162044A

公开(公告)日：2003-06-06

申请号：JP2001361695

申请日：2001-11-27

Applicant: CANON KK

Inventor： TERAJIMA SHIGERU ,  HASEGAWA TAKAYASU

IPC: G03F1/64 ,  H01L21/027 ,  G03F1/14

Abstract: PROBLEM TO BE SOLVED: To provide a reticle, an exposure method and its device which allows the exposure from just after fitting the reticle and prevents the lowering of throughput. SOLUTION: This reticle is used for a projection optical system which exposes a transfer pattern to an object to be treated and is provided with a base plate on which the transfer pattern is formed, a pellicle film which protects the transfer pattern from particles in the circumference and a pellicle frame which supports the pellicle film. Therein, a plurality of air holes for ventilating gas in the pellicle space which is formed by the base plate, the pellicle film and the pellicle frame are disposed on the pellicle frame opposing each other. COPYRIGHT: (C)2003,JPO

公开(公告)号：JP2000082666A

公开(公告)日：2000-03-21

申请号：JP18651899

申请日：1999-06-30

Applicant: CANON KK

Inventor： CHIBA KEIKO ,  TERAJIMA SHIGERU

IPC: H01L21/027 ,  G03F1/22 ,  G03F7/20 ,  G21K5/02 ,  G03F1/16

Abstract: PROBLEM TO BE SOLVED: To provide a method which can correspond to prevention of dust adhesion to a mask and an aligner, prevents the mask surface from being contaminated, prolongs the life of a mask, and facilitates maintenance, in an X ray mask structure, an X ray aligner in which the X ray mask structure is assembled, an X ray exposing method using the X ray aligner, a semiconductor device and a manufacturing method of the semiconductor device. SOLUTION: In an X ray mask structure constituted of X ray absorber 3, a retaining film 2 retaining the absorber and a holding frame 1 holding the retaining film, suction ports 6 are formed in the X ray mask structure except a part used for exposure, and suction is performed from an X ray surface side as the side of a member to be transferred to the opposite side. Since the suction ports are formed on the surface, except a part used for exposure, of the X ray mask and an X ray aligner and suction is performed, all kinds of dusts such as organic material and metal are exhausted from the suction ports, and the X ray aligner can prevent dust from sticking to the mask and the aligner.

公开(公告)号：JPH11312640A

公开(公告)日：1999-11-09

申请号：JP1510299

申请日：1999-01-25

Applicant: CANON KK

Inventor： HARA SHINICHI ,  TANAKA YUTAKA ,  TERAJIMA SHIGERU ,  MATSUI SHIN ,  HASEGAWA TAKAYUKI

IPC: H01L21/027 ,  G03F7/20 ,  G05D16/00 ,  G05D16/20

Abstract: PROBLEM TO BE SOLVED: To provide a processor, which generates intended air current in the atmospheric gas in a pressure reduced chamber, reduces local temperature variation and is able to maintain a stabilized atmospheric state. SOLUTION: A vacuum line 11, which controls the atmospheric pressure by evacuating the atmospheric gas in a pressure reduced chamber 1, containing a light exposing section by a vacuum pump 20, a circulating supply line 12, which returns the gas evacuated by the vacuum pump 20, and a branching supply line 12A which branches the gas from the circulating supply line 20 and returns the gas, are provided. By blowing out the gas to be returned into the chamber through blowing holes 15 and 17, the down-flow air current along the surrounding part of the processing part and the local blowing are generated. Heat and the like generated by the heating source in the chamber 1 are adequately discharged. The fluctuations in the gas generated by the local temperature difference is avoided and the stabilized atmospheric state is maintained.

公开(公告)号：JPH10221498A

公开(公告)日：1998-08-21

申请号：JP3697997

申请日：1997-02-05

Applicant: CANON KK

Inventor： TERAJIMA SHIGERU

IPC: G21K5/00 ,  G03F7/20 ,  H01J35/08 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To effectively cool an X-ray take-out window. SOLUTION: An X-ray take-out window 10 consisting of a beryllium foil 11 and a window frame 12 are fixed together with a cooling ring 13 and a spacer 14 in between a beam duct 2 and flanges 2a and 3a of an exposure room 3. The cooling ring 13 is cooled by refrigerant flowing in an inner pipe 13b and cools the beryllium foil 11 by touching the inner edge 13a to its surface. Thus, the exchange of the X-ray take-out window 10 is easy and such a troubles as degradation of the bonding agent of the window frame 12 and generation of gas can be avoided.

公开(公告)号：JPH07283128A

公开(公告)日：1995-10-27

申请号：JP9587494

申请日：1994-04-08

Applicant: CANON KK

Inventor： TERAJIMA SHIGERU ,  ETO MAKOTO ,  MIYAJI GOJI ,  MIZUSAWA NOBUTOSHI

IPC: G21K5/00 ,  G03F7/20 ,  G03F9/00 ,  H01L21/027

Abstract: PURPOSE:To prevent a reduction in contrast of an alignment mark to be transferred to a scribe line of a wafer. CONSTITUTION:An aperture 10 has an aperture opening 10a through which a beam of X rays having an optical axis O1 pass, and the edge of the aperture opening 10a includes inner end edges 1a to 4a of each of aperture blades 1 to 4 of the aperture 10. Stepped parts 1b to 4b are provided in the inner end edges 1a to 4a of each of the aperture blades 1 to 4, whereby projections and recesses are formed in the edge of the aperture opening 10a. The aperture 10 shields a part of a scribe line encircling a specific circuit pattern transfer region of the wafer (not shown) from the X rays by the projections and recesses, and a reduction in contrast of an alignment mark to be transferred to this part is prevented due to excessive exposure.

公开(公告)号：JPH028057A

公开(公告)日：1990-01-11

申请号：JP15795988

申请日：1988-06-28

Applicant: CANON KK

Inventor： TERAJIMA SHIGERU ,  SAKANO YOSHIKAZU ,  KAWASE TOSHIMITSU ,  ENARI MASAHIKO

IPC: B41J2/05 ,  B41J2/14 ,  B41J2/16

Abstract: PURPOSE:To enable an electrode wiring with a sufficiently high density and a low resistance and facilitate arrangement of heat generating resistors by providing a heat generating resistor layer on surfaces of partition walls, disposing discrete electrodes on one side of a plurality of liquid passages formed by upper and lower base members, disposing a common electrode on the other side, and connecting the discrete and common electrodes to the resistor layer. CONSTITUTION:A base 201 is provided with partition walls 203 trapezoid in cross section and liquid passages 204 trapezoid in cross section between the partition walls 203. Discrete electrodes 205 are provided on bottom surfaces of the liquid passages 204, whereas a common electrode 206 is provided on the lower side of a substrate 202. On the side of the substrate 201, the discrete electrodes 205 are provided in the liquid passages 204, then a heat generating resistor layer 207 is provided to the lie over the surfaces of the plurality of partition walls 203 and the liquid passages 204, the upper substrate 202 is joined to the lower base 201, and orifices 208 are provided at end parts of the liquid passages 204. With each of the electrodes provided with a sufficient width, an electrical loss can be restrained, and with at least a surface for forming the resistor layer thereon of each of the partition walls 203 inclined, information of the resistor layer 207 by deposition or the like can be facilitated.

公开(公告)号：JPH01135653A

公开(公告)日：1989-05-29

申请号：JP29395387

申请日：1987-11-24

Applicant: CANON KK

Inventor： SAKANO YOSHIKAZU ,  TERAJIMA SHIGERU ,  KAWASE TOSHIMITSU ,  ENARI MASAHIKO

IPC: B41J2/05 ,  B41J2/14

Abstract: PURPOSE:To make high density and fully multiple, by a method wherein one side electrode is extended to an end part of one side main face of a substrate, and a resistor established to the other main face of the substrate and the extended electrode are electrically connected by a common electrode. CONSTITUTION:Electrodes on one side among electrodes connected to an electrothermal conversion material are respectively extended to an end part of a substrate to form a common electrode 203. Besides, a resistor 201 as a radiator 205 arranged on the other side face of the substrate is extensively electrically connected to the electrode 203 at an edge face of the substrate with a joint electrode 206. Since the radiator 205 has a short-circuit-function and a function that accumulated heat is radiated from the substrate 204, it is settled only to keep electrode density on the substrate equal to arrangement density of the electrothermal conversion material. Therefore, two times density of heating resistant array can be obtained by traditional packaging density, and said resistance can be reduced to an extent capable of being neglected by connecting the common electrode to a substrate radiation means. Wiring resistance can be decreased to one half traditional one or less, and driving becomes easy.

公开(公告)号：JPS63236655A

公开(公告)日：1988-10-03

申请号：JP7027287

申请日：1987-03-26

Applicant: CANON KK

Inventor： TERAJIMA SHIGERU ,  ENARI MASAHIKO ,  SAKANO YOSHIKAZU ,  KAWASE TOSHIMITSU ,  KASUGAYAMA YUKIO

IPC: B41J2/05 ,  B41J2/14

Abstract: PURPOSE:To obtain a full multi-recording head in a simple manner, by a method wherein two or more wiring blocks are disposed on a substrate so that common electrodes connecting commonly to two or more heating resistors and discrete electrode groups are alternately disposed. CONSTITUTION:A wiring block 301 is composed of a plurality of heating resistors 202, discrete electrodes 203 individually connecting thereto, a common electrode 201 commonly connecting to the heating resistors 202. The heating resistors 202 are not necessarily required to be arranged in a line, but preferably aligned on a straight line for obtaining a full multi-recording head. The wiring blocks 301 are provided on a substrate 303 so that the common electrodes and the discrete electrode groups are alternately disposed. In the block arrangement mentioned above, since the electrodes forming the respective wiring blocks are divided into the two directions of the substrate, the connection of the electrodes and a drive part can be carried out at both ends of the substrate, i.e. respectively by use of half of the heating resistor numbers; thus, high-density packaging is not particularly needed.

公开(公告)号：JPS63105433A

公开(公告)日：1988-05-10

申请号：JP24948386

申请日：1986-10-22

Applicant: CANON KK

Inventor： TERAJIMA SHIGERU ,  WATANABE NOBUO ,  KUNO MITSUTOSHI

IPC: H01J17/49

Abstract: PURPOSE:To prevent a damage of an electrode resulting from a plasma discharge, by using a plasma electrode covered with an insulating membrane to protect the electrode material for a cathode system, and utilizing the AD discharge. CONSTITUTION:An upper layer substrate is composed of an upper plate 1, an anode 2, and a phosphor 3, a control substrate is composed of a control cathode 4 and an insulator 5, and a plasma substrate is composed of a protective membrane 7, a plasma electrode 8, and a lower plate 9. When an AD voltage is applied to such a composition and a discharge is started linearly, the gas in the space is ionized into ions and electrons by the discharge, and the electrons are selected and absorbed by the electric signal applied to the control electrode 4. The electrons passing through the control substrate are accelerated, and hit the phosphor 3 of the upper substrate to make the phosphor 3 luminous. By using a plasma electrode which is covered with an insulating membrane to protect the material for the cathode system in such a way, and by utilizing an AD discharge, a damage of the electrode resulting from the discharge can be prevented.