公开(公告)号：IT1148822B

公开(公告)日：1986-12-03

申请号：IT2161180

申请日：1980-04-24

Applicant: IBM

Inventor： BLUM SAMUEL EMIL ,  GUTFELD VON ROBERT JACOB ,  MELCHER ROBERT LEE ,  ROMANKIW LUBOMYR TARAS ,  KOVAC ZLATA

IPC: H05K20060101 ,  H05K

Abstract: A selective electroplating process involves placing a cathode and an anode in a non-photo decomposable electrolyte, directing a focusable beam of energy of intensity 102-106 W/cm2 onto the cathode surface to heat the regions to be plated, and establishing an electrical potential between the cathode and the anode. Also claimed is a similar process which employs a light beam of intensity \-102W/cm2 for heating the cathode surface. The process is esp. useful for personalising the repairing integrated circuits, but is also useful e.g. in video display techniques. Deposition rates of about 103 times greater on the heated regions than on the background can be achieved.

公开(公告)号：DE3362768D1

公开(公告)日：1986-05-07

申请号：DE3362768

申请日：1983-05-25

Applicant: IBM

Inventor： BLUM SAMUEL EMIL ,  BROWN KAREN HILL ,  SRINIVASAN RANGASWAMY

IPC: C23C16/16 ,  C23C16/48 ,  H01L21/285 ,  C23C16/04

公开(公告)号：BR8306654A

公开(公告)日：1984-07-31

申请号：BR8306654

申请日：1983-12-02

Applicant: IBM

Inventor： BLUM SAMUEL EMIL ,  SRINIVASAN RANGASWAMY ,  WYNNE JAMES JEFFREY

IPC: A61B17/00 ,  A61B18/20 ,  A61B18/26 ,  A61C1/00 ,  A61C17/00 ,  A61F9/008 ,  A61N5/06