公开(公告)号：CA893116A

公开(公告)日：1972-02-15

申请号：CA893116D

Applicant: IBM

Inventor： WURSTER HERBERT K ,  COX ROBERT J ,  CLECAK NICHOLAS J ,  SOLAR SAMUEL L

公开(公告)号：CA1221864A

公开(公告)日：1987-05-19

申请号：CA499173

申请日：1986-01-08

Applicant: IBM

Inventor： CLECAK NICHOLAS J ,  GRANT BARBARA D ,  MILLER ROBERT D ,  TOMPKINS TERRY C ,  WILLSON C GRANT

IPC: C08L101/00 ,  C08K5/00 ,  C08K5/53 ,  C08L33/00 ,  C08L33/02 ,  C08L61/10 ,  G03C1/72 ,  G03C5/16 ,  G03F7/016 ,  G03F7/038 ,  G03F7/039 ,  G03F7/20 ,  H01L21/027 ,  G03C1/54

Abstract: HIGH-CONTRAST, HIGH RESOLUTION DEEP ULTRAVIOLET LITHOGRAPHIC RESISTS A lithographic resin for use with deep ultraviolet radiation comprises a weakly acidic resin and an alpha phosphoryl substituted diazo carbonyl compound as a sensitizer.

公开(公告)号：CA1122467A

公开(公告)日：1982-04-27

申请号：CA361713

申请日：1980-10-07

Applicant: IBM

Inventor： CLECAK NICHOLAS J ,  GRANT BARBARA D ,  WILLSON C GRANT

IPC: G03C1/72 ,  C08K5/1575 ,  C08L61/00 ,  C08L61/04 ,  C08L61/06 ,  G03C1/00 ,  G03F7/004 ,  G03F7/016 ,  G03F7/022 ,  G03F7/038 ,  G03F7/26 ,  H01L21/26 ,  G03C1/52 ,  B41M

Abstract: Lithographic resist compositions are provided which permit an improved lift-off process in which the deposition mask with apertures has the desirable negative slope or overhang. The resist composition comprises a phenolic-aldehyde resin, a photosensitizer and Meldrum's diazo, or Meldrum's acid or suitable analogs thereof as a profile modifying agent. The profile modifying agents useful in the present invention have the formula: wherein R1 is C1 to C20 alkyl or aryl, R2 is H, C1 to C20 alkyl or aryl, or together R1 and R2 are cycloalkyl, A is N or H.

公开(公告)号：CA945563A

公开(公告)日：1974-04-16

申请号：CA156419

申请日：1972-11-14

Applicant: IBM

Inventor： CLECAK NICHOLAS J ,  COX ROBERT J

IPC: C08L7/00 ,  C07F9/74 ,  C07F9/76 ,  C08F8/42 ,  C08K5/00 ,  C08L21/00 ,  G03F7/008 ,  H05K3/10

公开(公告)号：CA887061A

公开(公告)日：1971-11-30

申请号：CA887061D

Applicant: IBM

Inventor： SOLAR SAMUEL L ,  WURSTER HERBERT K ,  CLECAK NICHOLAS J ,  COX ROBERT J

公开(公告)号：CA1247726A

公开(公告)日：1988-12-28

申请号：CA464051

申请日：1984-09-26

Applicant: IBM

Inventor： CLECAK NICHOLAS J ,  COX ROBERT J ,  FENG JOSEPH S ,  LEFF JERRY

IPC: G02F1/13 ,  G02F1/133 ,  G02F1/1335 ,  G02F1/1337 ,  G09F9/35

Abstract: ALIGNMENT LAYER ORIENTATION IN RASTER SCAN THERMALLY ADDRESSED SMECTIC LIQUID CRYSTAL DISPLAYS The orientation of the alignment layer in a rasterscanned thermally addressed smectic liquid crystal display device can be chosen relative to the writing orientation to accentuate a selected characteristic. A perpendicular alignment with respect to the scan direction produces uniformly written images in both scan directions to allow high quality bidirectional writing. In a preferred embodiment the liquid crystal cell includes a liquid crystal material comprising 4octyloxy-4'-cyanobiphenyl 37.5%, 4-decyl-4'-cyanobiphenyl 36.8% weight percent and 4-undecyl-4'-cyanobiphenyl 25.7 weight percent.

公开(公告)号：CA1132825A

公开(公告)日：1982-10-05

申请号：CA349767

申请日：1980-04-14

Applicant: IBM

Inventor： BALANSON RICHARD D ,  CLECAK NICHOLAS J ,  GRANT BARBARA D ,  OUANO AUGUSTUS C

IPC: G03C1/72 ,  G03F7/016 ,  G03F7/038 ,  G03F7/039 ,  G03F7/02

Abstract: Phenolic-aldehyde resins sensitized with Meldrum's diazo or an analog thereof are useful as lithographic resists sensitive to deep ultra-violet light.

公开(公告)号：CA1081350A

公开(公告)日：1980-07-08

申请号：CA322303

申请日：1979-02-26

Applicant: IBM

Inventor： CLECAK NICHOLAS J ,  GRANT BARBARA D ,  JAFFE ANNETTE B ,  KELLER GARY S

IPC: C09K9/02 ,  G02F1/15 ,  G02F1/17 ,  G09F9/30 ,  G02F1/13 ,  C09K3/00

Abstract: ELECTROCHROMIC DISPLAY DEVICES COMPRISING SUBSTITUTED FLUORENE COMPOUNDS Electrochromic display devices having very desirable stability and reversibility are obtained using as the oxidant certain fluorene compounds substituted with at least two alkoxy groups per molecule. The display device comprises a reactive medium between two electrically conductive electrodes at least one of which is transparent. The reactive medium comprises an anhydrous solvent and an oxidant/reductant pair.