公开(公告)号：GB2412494B

公开(公告)日：2006-02-01

申请号：GB0512347

申请日：2003-01-13

Applicant: IMS NANOFABRICATION GMBH

Inventor： PLATZGUMMER ELMAR ,  LOESCHNER HANS ,  STENGL GERHARD ,  VONACH HERBERT ,  CHALUPKA ALFRED ,  LAMMER GERTRAUD ,  BUSCHBECK HERBERT ,  NOWAK ROBERT ,  WINDISCHBAUER TILL

IPC: H01J37/30 ,  H01J37/04 ,  H01J37/305

公开(公告)号：GB2411741B

公开(公告)日：2008-06-11

申请号：GB0404805

申请日：2004-03-03

Applicant: IMS NANOFABRICATION GMBH ,  IMS NANOFABRICATION AG

Inventor： BUSCHBECK HERBERT ,  STENGL GERHARD

IPC: G05F7/00 ,  H01J37/20 ,  H01H47/00 ,  H01L21/027

Abstract: For compensation of a magnetic field in an operating region a number of magnetic field sensors (S 1 , S 2 ) and an arrangement of compensation coils (Hh) surrounding said operating region is used. The magnetic field is measured by at least two sensors (S 1 , S 2 ) located at different positions outside the operating region, preferably at opposing positions with respect to a symmetry axis of the operating region, generating respective sensor signals (s 1 , s 2 ), the sensor signals of said sensors are superposed to a feedback signal (ms, fs), which is converted by a controlling means to a driving signal (d 1 ), and the driving signal is used to steer at least one compensation coil (Hh). To further enhance the compensation, the driving signal is also used to derive an additional input signal (cs) for the superposing step to generate the feedback signal (fs).

公开(公告)号：GB2408143B

公开(公告)日：2006-11-15

申请号：GB0423152

申请日：2004-10-18

Applicant: IMS NANOFABRICATION GMBH

Inventor： STENGL GERHARD ,  PLATZGUMMER ELMAR ,  LOSCHNER HANS

IPC: G03F7/20 ,  H01J37/317 ,  H01J3/06 ,  H01J37/08 ,  H01L21/027

Abstract: A charged-particle multi-beam exposure apparatus ( 1 ) for exposure of a target ( 41 ) uses a plurality of beams of electrically charged particles, which propagate along parallel beam paths towards the target ( 41 ). For each particle beam an illumination system ( 10 ), a pattern definition means ( 20 ) and a projection optics system ( 30 ) are provided. The illuminating system ( 10 ) and/or the projection optics system ( 30 ) comprise particle-optical lenses having lens elements (L 1 , L 2 , L 3 , L 4 , L 5 ) common to more than one particle beam. The pattern definition means ( 20 ) defines a multitude of beamlets in the respective particle beam, forming its shape into a desired pattern which is projected onto the target ( 41 ), by allowing it to pass only through a plurality of apertures defining the shape of beamlets permeating said apertures, and further comprises a blanking means to switch off the passage of selected beamlets from the respective paths of the beamlets.

公开(公告)号：GB2411741A

公开(公告)日：2005-09-07

申请号：GB0404805

申请日：2004-03-03

Applicant: IMS NANOFABRICATION GMBH

Inventor： BUSCHBECK HERBERT ,  STENGL GERHARD

IPC: H01J37/20 ,  G05F7/00 ,  H01H47/00 ,  H01L21/027

Abstract: For compensation of a magnetic field in an operating region a number of magnetic field sensors (S1, S2) and an arrangement of compensation coils (Hh) surrounding said operating region is used. The magnetic field is measured by at least two sensors (S1, S2) located at different positions outside the operating region, preferably at opposing positions with respect to a symmetry axis of the operating region, generating respective sensor signals (s1, s2), the sensor signals of said sensors are superposed to a feedback signal (ms, fs), which is converted by a controlling means to a driving signal (d1), and the driving signal is used to steer at least one compensation coil (Hh). To further enhance the compensation, the driving signal is also used to derive an additional input signal (cs) for the superposing step to generate the feedback signal (fs).

公开(公告)号：GB2408143A

公开(公告)日：2005-05-18

申请号：GB0423152

申请日：2004-10-18

Applicant: IMS NANOFABRICATION GMBH

Inventor： STENGL GERHARD ,  PLATZGUMMER ELMAR ,  LOSCHNER HANS

IPC: G03F7/20 ,  H01J37/317 ,  H01L21/027 ,  H01J3/06 ,  H01J37/08

Abstract: A charged-particle multi-beam exposure apparatus (1) for exposure of a target (41) uses a plurality of beams of electrically charged particles, which propagate along parallel beam paths towards the target (41). For each particle beam an illumination system (10), a pattern definition means (20) and a projection optics system (30) are provided. The illuminating system (10) and/or the projection optics system (30) comprise particle-optical lenses having lens elements common to more than one particle beam. The pattern definition means (20) defines a multitude of beamlets in the respective particle beam, forming its shape into a desired pattern which is projected onto the target (41), by allowing it to pass only through a plurality of apertures defining the shape of beamlets permeating said apertures, and further comprises a blanking means to switch off the passage of selected beamlets from the respective paths of the beamlets.

公开(公告)号：GB2406704A

公开(公告)日：2005-04-06

申请号：GB0421004

申请日：2004-09-22

Applicant: IMS NANOFABRICATION GMBH

Inventor： STENGL GERHARD ,  BUSCHBECK HERBERT ,  LAMMER GERTRAUD

IPC: H01J37/09 ,  H01J37/12 ,  H01J37/305 ,  H01L21/027

Abstract: In a charged-particle beam exposure device, e.g. for lithography, an electrostatic lens (ML) comprises several (at least three) electrodes with rotational symmetry (EFR, EM, EFN) surrounding a particle beam path; the electrodes are arranged coaxially on a common optical axis representing the center of said particle beam path and are fed different electrostatic potentials through electric supplies. At least a subset of the electrodes (EM) form an electrode column realized as a series of electrodes of equal shape arranged in consecutive order along the optical axis, wherein outer portions of said electrodes (EM) of the electrode column have outer portions (OR) of corresponding opposing surfaces (f1, f2) facing toward the next and previous electrodes, respectively. Preferably, the length of the electrode column is at least 4.1 times (3 times) the inner radius of said surfaces (f1, f2). The electrodes may be made of soft magnetic material to shield the particle beam. An external magnetic shield (MS) may also be provided.