公开(公告)号：JPH10161307A

公开(公告)日：1998-06-19

申请号：JP33898296

申请日：1996-12-04

Applicant: JSR CORP

Inventor： OTA TOSHIYUKI ,  SANO KIMIYASU ,  MICHINO YOSHIYUKI ,  SATO HOZUMI

IPC: G03F7/027 ,  C08F2/48 ,  C08F265/06 ,  G03F7/038 ,  H01L21/027 ,  H01L21/60 ,  H05K3/06

Abstract: PROBLEM TO BE SOLVED: To provide a radiation sensitive resin compsn. having superior sensitivity and pattern shape, excellent in adhesion especially to a gold coated substrate and suitable for use as a material for forming a circuit board, especially for forming a gold bumper. SOLUTION: This radiation sensitive compsn. contains an alkali-soluble copolymer consisting of 10-40wt.% radical polymerizable compd. having a carboxyl group, 20-70wt.% radical polymerizable compd. having a cycloalkyl group and no carboxyl group and 5-60wt.% other radical polymerizable compds. including at least a compd. represented by the formula, a compd. having at least one ethylenic unsatd. double bond and a radiation radical polymn. initiator.

公开(公告)号：JP2004264623A

公开(公告)日：2004-09-24

申请号：JP2003055176

申请日：2003-03-03

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： TAKAMOTO EIJI ,  SANO KIMIYASU ,  NISHIKAWA MICHINORI

IPC: G03F7/038 ,  G02B1/04 ,  G03F7/004 ,  G03F7/027

Abstract: PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition which has high sensitivity and favorable storage stability and which can easily form a patterned thin film having favorable development margin and excellent adhesiveness, to provide an interlayer insulating film and a microlens formed from the above composition, and to provide a method for forming these elements. SOLUTION: The radiation-sensitive resin composition contains: (A) a high molecular weight compound having an acetal structure and/or a ketal structure, and an epoxy structure, and having ≥2,000 weight average molecular weight in terms of polystyrene measured by gel permeation chromatography; and (B) a compound which generates an acid of ≤4.0 pKa by irradiation of radiation. The interlayer insulating film and the microlens are produced from the above radiation-sensitive resin composition. COPYRIGHT: (C)2004,JPO&NCIPI

Abstract translation: 解决的问题：提供一种具有高灵敏度和良好储存稳定性的辐射敏感性树脂组合物，并且可以容易地形成具有良好显影边缘和优异粘附性的图案化薄膜，以提供层间绝缘膜和微透镜 由上述组合物形成，并提供形成这些元素的方法。 解决方案：辐射敏感性树脂组合物包含：（A）具有缩醛结构和/或缩酮结构的高分子量化合物和环氧结构，并且以聚苯乙烯计测量≥2,000重均分子量 通过凝胶渗透色谱法; 和（B）通过辐射照射产生≤4.0pKa的酸的化合物。 层间绝缘膜和微透镜由上述辐射敏感性树脂组合物制成。 版权所有（C）2004，JPO＆NCIPI

公开(公告)号：JP2003322963A

公开(公告)日：2003-11-14

申请号：JP2002128810

申请日：2002-04-30

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： SANO KIMIYASU ,  NISHIMURA YUKIO ,  YAMAMOTO MASASHI ,  ISHII HIROYUKI

IPC: G03F7/004 ,  G03F7/039 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a radiation sensitive resin composition useful as a chemically amplified resist excellent in basic physical properties as a resist as well as in exposure window.
SOLUTION: The radiation sensitive resin composition comprises (A) an alkali-insoluble or hardly alkali-soluble acid-dissociating group-containing resin which becomes alkali-soluble by dissociation of the acid-dissociating group, (B) a compound which generates an acid upon irradiation with an actinic ray or a radiation of ≤220 nm wavelength and (C) a phenolic compound represented by formula (C-1).
COPYRIGHT: (C)2004,JPO

Abstract translation: 要解决的问题：提供可用作抗蚀剂以及曝光窗的基本物理性能优异的化学放大抗蚀剂的辐射敏感性树脂组合物。 解决方案：辐射敏感性树脂组合物包含（A）通过酸解离基团的解离而变成碱溶性的碱不溶性或几乎不溶于碱的含酸解离基团的树脂，（B） 用光化辐射或≤220nm波长的辐射照射时产生酸，（C）由式（C-1）表示的酚类化合物。 版权所有（C）2004，JPO

公开(公告)号：JP2003280201A

公开(公告)日：2003-10-02

申请号：JP2002083930

申请日：2002-03-25

Applicant: Jsr Corp ,  Jsr Micro Inc ,  Jsr株式会社 ,  ジェイエスアール マイクロ インコーポレイテッド

Inventor： SANO KIMIYASU ,  NISHIMURA YUKIO ,  ISHII HIROYUKI ,  KUROKAWA MITSUO ,  MARK SLEZAK

IPC: G03F7/039 ,  C08F220/18 ,  C08F220/28 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a radiation sensitive resin composition useful as a chemically amplified resist excellent in basic physical properties as a resist as well as in terms of an exposure window. SOLUTION: The radiation sensitive resin composition comprises (A) two or more acid-dissociating group-containing resins which have at least one of formulae (1)-(4) as a repeating unit, become alkali-soluble by dissociation of the acid-dissociating group, contain the same acid-dissociating group and have mutually different acid-dissociating group contents and (B) a compound which generates an acid upon irradiation with an actinic ray or a radiation. COPYRIGHT: (C)2004,JPO

Abstract translation: 要解决的问题：提供可用作抗蚀剂的基本物理性能优异的化学放大抗蚀剂以及曝光窗口的辐射敏感性树脂组合物。 解决方案：辐射敏感性树脂组合物包含（A）两种或多种具有至少一个式（1） - （4）作为重复单元的含酸解离基团的树脂，其通过解离形成碱溶性 酸解离基团含有相同的酸解离基团并且具有相互不同的酸解离基团含量，和（B）在用光化射线或辐射照射时产生酸的化合物。 版权所有（C）2004，JPO

公开(公告)号：JP2003215804A

公开(公告)日：2003-07-30

申请号：JP2002009190

申请日：2002-01-17

Applicant: JSR CORP

Inventor： NISHIMURA YUKIO ,  ISHII HIROYUKI ,  SANO KIMIYASU ,  KOBAYASHI HIDEKAZU

IPC: G03F7/039 ,  C08F220/16 ,  C08F220/28 ,  G03F7/004 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a radiation sensitive resin composition having high transparency for radiation and excellent basic physical properties as a resist such as sensitivity, resolution, dry etching durability and pattern profile. SOLUTION: The radiation sensitive resin composition contains the following resin and a radiation sensitive acid generator. The resin contains a repeating unit derived from alkyladamantyl (meth)acrylate or a repeating unit derived from mevalonic lactone (meth)acrylate and the resin is insoluble with alkali or hardly soluble with alkali and changed into alkali-soluble by the action of an acid. COPYRIGHT: (C)2003,JPO

公开(公告)号：JP2002244285A

公开(公告)日：2002-08-30

申请号：JP2001043843

申请日：2001-02-20

Applicant: JSR CORP

Inventor： SANO KIMIYASU ,  MIYAJIMA FUMINAO ,  SHIMOKAWA TSUTOMU

IPC: G03F7/022 ,  C07C303/28 ,  C07C309/71 ,  C08K5/13 ,  C08K5/42 ,  C08L61/06 ,  G03F7/004 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a radiation sensitive resin composition ensuring good resolution and a good pattern section shape and suitable for use as a positive type resist having a good margin for exposure. SOLUTION: The radiation sensitive resin composition contains (A) an alkali- soluble novolak resin, (B) a naphthoquinonediazido compound of a phenol compound of formula (1) (where X1 and X2 are each H or alkyl and (p) and (q) are each 1 or 2) and (C) a low molecular weight compound containing 2 or 3 benzene rings and having at least one hydroxyl group on each of the benzene rings. The margin (Eop/Ec) of the composition for exposure is >=1.20.

公开(公告)号：JPH10161310A

公开(公告)日：1998-06-19

申请号：JP33898196

申请日：1996-12-04

Applicant: JSR CORP

Inventor： OTA TOSHIYUKI ,  SANO KIMIYASU ,  MICHINO YOSHIYUKI ,  SATO HOZUMI

IPC: G03F7/027 ,  C08F2/48 ,  C08F265/06 ,  G03F7/033 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To obtain a radiation sensitive resin compsn. excellent in plating resistance and flexibility and fit to form a circuit board by incorporating an alkali-soluble copolymer consisting of specified radical polymerizable compds., a compd. having at least one ethylenic unsatd. double bond and a radiation radical polymn. initiator. SOLUTION: This radiation sensitive resin compsn. contains an alkali-soluble copolymer consisting of 10-50wt.% radical polymerizable compd. having a carboxy group, 20-60wt.% radical polymerizable compd. having a cycloalkyl group but not having a carboxy group and 5-60wt.% other radical polymerizable compds. including at least a compd. represented by the formula, a compd. having at least one ethylenic unsatd. double bond and a radiation radical polymn. initiator. In the formula, R is H or methyl, R is H or 1-4C alkyl and (n) is an integer of 2-25.

公开(公告)号：JP2005049691A

公开(公告)日：2005-02-24

申请号：JP2003282830

申请日：2003-07-30

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： NISHIMURA HIDEKI ,  MINOWA TAKAKI ,  TAKAMOTO EIJI ,  SANO KIMIYASU ,  NISHIKAWA MICHINORI

IPC: G03F7/033 ,  G02B1/04 ,  G02B3/00 ,  G03F7/022 ,  G03F7/40 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a radiation-sensitive composition which has high radiation sensitivity and development margin to form a favorable pattern even when the process time exceeds the optimum developing time in a developing process, and with which a patterned thin film having excellent adhesiveness can be easily formed, and to provide an interlayer insulating film of electronic parts and microlens. SOLUTION: The radiation-sensitive resin composition contains: [A] a copolymer of (a1) an unsaturated carboxylic acid and/or an unsaturated carboxylic acid anhydride, (a2) an unsaturated compound having an alicyclic epoxy skeleton expressed by formula, and (a3) an unsaturated compound excluding the compounds of (a1) and (a2); and [B] a 1,2-naphthoquinone diazide sulfonic acid ester. The interlayer insulating film and the microlens are produced from the above composition. COPYRIGHT: (C)2005,JPO&NCIPI

Abstract translation: 要解决的问题：即使当处理时间超过显影过程中的最佳显影时间时，提供具有高辐射敏感性和显影余量的辐射敏感性组合物以形成有利的图案，并且通过该组合物，图案化薄膜 可以容易地形成具有优异的粘合性，并且提供电子部件和微透镜的层间绝缘膜。 解决方案：辐射敏感性树脂组合物包含：[A]（a1）不饱和羧酸和/或不饱和羧酸酐的共聚物，（a2）具有由式表示的脂环族环氧骨架的不饱和化合物， 和（a3）不包括（a1）和（a2）化合物的不饱和化合物; 和[B] 1,2-萘醌二叠氮磺酸酯。 层间绝缘膜和微透镜由上述组成制成。 版权所有（C）2005，JPO＆NCIPI

公开(公告)号：JP2004170566A

公开(公告)日：2004-06-17

申请号：JP2002334547

申请日：2002-11-19

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： SANO KIMIYASU ,  MINOWA TAKAKI ,  NISHIMURA HIDEKI ,  NISHIKAWA MICHINORI

IPC: G03F7/033 ,  C08G59/62 ,  G02B3/00 ,  G03F7/022 ,  G03F7/027 ,  G03F7/40 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition which has high sensitivity to radiation and such development margin that a favorable pattern profile can be obtained even when the developing time exceeds the optimum developing time in the developing process, and with which a patterned thin film having excellent adhesiveness can be easily formed, to provide a method for forming an interlayer insulating film and a microlens by using the above radiation-sensitive resin composition, and to provide an interlayer insulating film and a microlens formed by the above method. SOLUTION: The radiation-sensitive resin composition contains: [A] a copolymer of (a1) an unsaturated carboxylic acid and/or unsaturated carboxylic acid anhydride, (a2) an epoxy group-containing unsaturated compound and (a3) an olefin unsaturated compound excluding the compounds of (a1) and (a2); and [B] a condensed product of a specified phenol compound and a 1,2-naphthoquinone diazide sulfonic acid halide. The interlayer insulating film and the microlens are formed from the above radiation-sensitive resin composition. COPYRIGHT: (C)2004,JPO

公开(公告)号：JP2003342319A

公开(公告)日：2003-12-03

申请号：JP2002153421

申请日：2002-05-28

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： SUWA YOSHI ,  NAKASE YOSHIHISA ,  IWAZAWA HARUO ,  SANO KIMIYASU

IPC: G03F7/039 ,  C08F6/08 ,  C08F32/04 ,  C08G67/02 ,  G03F7/26 ,  G03F7/38 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a purification process by which a metal contained in alicyclic hydrocarbon polymers as an impurity is removed and to provide a radiation-sensitive resin composition of a high performance photoresist which is composed of the purified polymer.
SOLUTION: 1. The method of removing a metal contained in the alicyclic hydrocarbon polymer comprises the following processes: a process of coagulating the alicyclic hydrocarbon polymer by mixing an acid-added organic solvent solution of the polymer with its poor solvent, and a process of dissolving the coagulated polymer into a water-insoluble organic solvent, followed by bringing the solution into contact with an acidic hot water solution, extracting the metal contained therein. 2. The radiation-sensitive composition contains the alicyclic hydrocarbon polymer purified by the above-mentioned processes to remove the contained metal, and a radiation-sensitive acid generator.
COPYRIGHT: (C)2004,JPO

Abstract translation: 要解决的问题：提供除去作为杂质的脂环烃聚合物中所含的金属的纯化方法，并提供由纯化的聚合物构成的高性能光致抗蚀剂的辐射敏感性树脂组合物。 解决方案：1.除去脂环烃聚合物中所含的金属的方法包括以下方法：通过将聚合物的加酸有机溶剂溶液与其不良溶剂混合而使脂环族烃聚合物凝结的方法，以及 将凝固的聚合物溶解在水不溶性有机溶剂中，然后使溶液与酸性热水溶液接触，萃取其中所含的金属的方法。 辐射敏感性组合物含有通过上述方法纯化的脂环烃聚合物以除去所含的金属和辐射敏感的酸产生剂。 版权所有（C）2004，JPO