公开(公告)号：JP2002278060A

公开(公告)日：2002-09-27

申请号：JP2001076486

申请日：2001-03-16

Applicant: JSR CORP

Inventor： SANO KIMIYASU ,  MIYAJIMA FUMINAO ,  SHIMOKAWA TSUTOMU

IPC: G03F7/022 ,  C08K5/13 ,  C08K5/42 ,  C08L61/10 ,  G03F7/004 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a radiation sensitive resin composition ensuring good resolution and a good section shape of a pattern and suitable for use as a positive type resist having a good margin for exposure. SOLUTION: The radiation sensitive resin composition contains (A) an alkali- soluble novolak resin and (B) a naphthoquinonediazidosulfonic ester compound of a phenol compound of formula (1) [where R1 and R2 are each a monovalent organic group having alkyl or aryl; R3 is H or alkyl; and (a) and (b) are each an integer of 0-2] having a structure corresponding to tertiary carbon in a position adjacent to a hydroxyl group. Preferably (C) a low molecular weight compound containing two or three benzene rings and having at least one hydroxyl group on each of the benzene rings is further contained.

公开(公告)号：JP2004317907A

公开(公告)日：2004-11-11

申请号：JP2003113660

申请日：2003-04-18

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： MIYAJIMA FUMINAO ,  MIYAJI MASAAKI ,  NAGAI TOMOKI ,  INABA JUNICHIRO ,  EHATA SATOSHI

IPC: G03F7/004 ,  C08F12/04 ,  G03F7/039

Abstract: PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition having excellent sensitivity and resolution and little dependence on pattern density (iso-dense bias) and capable of stably forming various fine patterns with high accuracy. SOLUTION: The composition contains: (A) a radiation-sensitive acid generating agent represented by 2-t-butoxycarbonylmethoxyphenyldiphenyl sulfonium 2-(bicyclo[2.2.1]heptan-2-yl)-1,1,2,2-tetrafluoroethane sulfonate, 2-t-butoxycarbonylmethoxyphenyldiphenyl sulfonium nonafluoro-n-butane sulfonate, or the like; and (B) a resin having a hydroxylstyrene-based repeating unit and a repeating unit derived from hydroxyl styrene by protecting the phenolic hydroxyl group with an acid dissociating acetal group such as a 1-ethoxyethoxy group, and/or a repeating unit derived from hydroxystyrene by protecting the phenolic hydroxyl group with another acid dissociating group such as a t-butyl group. COPYRIGHT: (C)2005,JPO&NCIPI

公开(公告)号：JP2002268212A

公开(公告)日：2002-09-18

申请号：JP2001067307

申请日：2001-03-09

Applicant: JSR CORP

Inventor： SANO KIMIYASU ,  MIYAJIMA FUMINAO ,  SHIMOKAWA TSUTOMU

IPC: G03F7/022 ,  C08G8/12 ,  C08K5/42 ,  C08L61/06 ,  G03F7/023 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a radiation sensitive resin composition excellent in resolution, developability, heat resistance, pattern shape, margin for exposure and focus latitude, having good balance of these characteristics and suitable for use as a positive type resist. SOLUTION: The radiation sensitive resin composition contains (A) an alkali- soluble novolak resin obtained by condensing specified first phenols (2,4- dimethylphenol, 2-methyl-4-ethylphenol, etc.), specified second phenols (m-cresol, p-cresol, 2,5-dimethylphenol, etc.), and an aldehyde and (B) a quinonediazidosulfonic ester compound of a phenol compound having a structure corresponding to quaternary carbon in a position adjacent to a hydroxyl group.

公开(公告)号：JP2004210803A

公开(公告)日：2004-07-29

申请号：JP2002354142

申请日：2002-12-05

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： NAGAI TOMOKI ,  SHIMIZU DAISUKE ,  SHIMOKAWA TSUTOMU ,  MIYAJIMA FUMINAO ,  MIYAJI MASAAKI

IPC: G03F7/039 ,  C08F212/14 ,  C08F220/18 ,  H01L21/027

CPC classification number: C08F212/14 ,  C08F220/18 ,  G03F7/0397 ,  Y10S430/106 ,  Y10S430/111

Abstract: PROBLEM TO BE SOLVED: To obtain a radiation-sensitive resin composition which is useful as a chemical amplification type resist sensitive to far ultra-violet rays, has improved dry etching resistance, high resolution and high radiation transmissivity, to provide a copolymer useful as its component and a polymer mixture. SOLUTION: The radiation-sensitive resin composition comprises (A) a polymer component such as a copolymer having a (meth)acrylate repeating unit protected with a cycloalkyl-based acid dissociating group, a hydroxystyrene-based repeating unit and a hydroxystyrene-based repeating unit protected with a specific acid-dissociable group and (B) a radiation-sensitive acid generator. COPYRIGHT: (C)2004,JPO&NCIPI

公开(公告)号：JP2004133055A

公开(公告)日：2004-04-30

申请号：JP2002295260

申请日：2002-10-08

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： YOKOYAMA KENICHI ,  MIYAJIMA FUMINAO ,  NAGAI TOMOKI ,  YONEDA EIJI

IPC: G03F7/004 ,  G03C1/76 ,  G03F7/038 ,  G03F7/039 ,  H01L21/027

CPC classification number: G03F7/0382 ,  G03F7/0392 ,  Y10S430/106 ,  Y10S430/111 ,  Y10S430/115 ,  Y10S430/12 ,  Y10S430/122

Abstract: PROBLEM TO BE SOLVED: To provide a radiation sensitive composition having excellent resolution and preservable stability as a chemical amplification type resist sensitive to active radiations, for example, UV rays, such as g rays and i rays, KrF excimer laser, ArF excimer laser or F 2 excimer laser, far UV rays as represented by EUV (Extreme Ultraviolet) or electron beams, etc. SOLUTION: The positive radiation sensitive resin composition contains (A) 1 place replacement imidazoles, (B) a radiation-sensitive acid generator, and (C) the following (a) or (b); (a) a resin which is an alkali-insoluble or hardly alkali-soluble resin protected by a hardly acid soluble group and is made alkali-soluble when the hardly acid soluble group is dissociated, and (b) an alkali-soluble resin and alkali solubility controlling agent. Also, the negative radiation sensitive resin composition contains (A), (B), (D) the alkali-soluble resin, and (E) a compound which can crosslink the alkali-soluble resin in the presence of the acid. COPYRIGHT: (C)2004,JPO

Abstract translation: 要解决的问题：提供具有优异的分辨率和可保持稳定性的辐射敏感组合物作为对活性辐射敏感的化学放大型抗蚀剂，例如，诸如g射线和i射线的紫外线，KrF准分子激光器，ArF 准分子激光或F 2 准分子激光，由EUV（极紫外）或电子束等表示的远紫外线。解决方案：正射线敏感性树脂组合物含有（A） 咪唑，（B）辐射敏感性酸产生剂，和（C）以下（a）或（b）; （a）当几乎不溶于酸的基团被保护的碱不溶性或几乎不溶于碱的树脂的树脂，当几乎不溶于酸的基团解离时，它是碱溶性的，和（b）碱溶性树脂和碱 溶解度控制剂。 此外，负辐射敏感性树脂组合物含有（A），（B），（D）碱溶性树脂和（E）可在酸存在下使碱溶性树脂交联的化合物。 版权所有（C）2004，JPO

公开(公告)号：JP2001146694A

公开(公告)日：2001-05-29

申请号：JP32805399

申请日：1999-11-18

Applicant: JSR CORP

Inventor： KURITA OSAMU ,  MIYAJIMA FUMINAO ,  ISHIKAWA OSAMU

IPC: C08F236/12 ,  D21H19/42 ,  D21H19/58 ,  D21H21/54

Abstract: PROBLEM TO BE SOLVED: To obtain a copolymer latex for paper coating, capable of providing the coated paper having extremely improved adhesive strength, and excellent in coated paper properties such as the gloss of print, and in operability of coating, such as redispersibility, mechanical stability and stickiness-preventing properties, and further to provide a method for producing the copolymer latex and to obtain a composition for paper coating. SOLUTION: This copolymer latex for paper coating contains >=31% components detected at the time earlier than the elution time corresponding to 1,000,000 molecular weight expressed in terms of a polystyrene in the molecular weight distribution measured by a gel permeation chromatography(GPC). The weight average molecular weight of the components detected at the time later than the elution time corresponding to 1,000,000 molecular weight expressed in terms of the polystyrene is 30,000-400,000, and the content of components therein insoluble in toluene is >=31 wt.%.

公开(公告)号：JP2002244285A

公开(公告)日：2002-08-30

申请号：JP2001043843

申请日：2001-02-20

Applicant: JSR CORP

Inventor： SANO KIMIYASU ,  MIYAJIMA FUMINAO ,  SHIMOKAWA TSUTOMU

IPC: G03F7/022 ,  C07C303/28 ,  C07C309/71 ,  C08K5/13 ,  C08K5/42 ,  C08L61/06 ,  G03F7/004 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a radiation sensitive resin composition ensuring good resolution and a good pattern section shape and suitable for use as a positive type resist having a good margin for exposure. SOLUTION: The radiation sensitive resin composition contains (A) an alkali- soluble novolak resin, (B) a naphthoquinonediazido compound of a phenol compound of formula (1) (where X1 and X2 are each H or alkyl and (p) and (q) are each 1 or 2) and (C) a low molecular weight compound containing 2 or 3 benzene rings and having at least one hydroxyl group on each of the benzene rings. The margin (Eop/Ec) of the composition for exposure is >=1.20.

公开(公告)号：JP2002105146A

公开(公告)日：2002-04-10

申请号：JP2000297247

申请日：2000-09-28

Applicant: JSR CORP

Inventor： SAKURAI FUJIO ,  ZAMA YOSHIAKI ,  MIYAJIMA FUMINAO

IPC: B01J13/02 ,  C08F2/22 ,  C08F2/44 ,  C08F285/00 ,  C09D151/00 ,  D21H19/38 ,  D21H19/58

Abstract: PROBLEM TO BE SOLVED: To provide a method for efficiently producing hollow polymer particles having good balance between hiding tendency, gloss, coating film strength, water resistance, alkali resistance, weatherability, etc., with uniform particle size, and having high porosity. SOLUTION: This method for producing hollow polymer particles comprises the following process: an unsaturated carboxylic acid and a radical- polymerizable monomer are copolymerized with each other in the presence of polymer particles (A) obtained by copolymerization between an unsaturated carboxylic acid and a radical-polymerizable monomer to obtain polymer particles (B), a radical-polymerizable monomer is then polymerized in the presence of the polymer particles (B) to obtain polymer particles (C), an unsaturated carboxylic acid and a radical-polymerizable monomer are copolymerized with each other in the presence of polymer particles (C) to obtain core/shell-type polymer particles (D), which are then swollen under neutralization.

公开(公告)号：JP2001172894A

公开(公告)日：2001-06-26

申请号：JP35428199

申请日：1999-12-14

Applicant: JSR CORP

Inventor： KURITA OSAMU ,  MIYAJIMA FUMINAO ,  ISHIKAWA OSAMU

IPC: C08F236/12 ,  D21H19/42 ,  D21H19/58 ,  D21H21/54

Abstract: PROBLEM TO BE SOLVED: To provide a method for producing a copolymer latex which is used for coating paper, largely improves the adhesive strength of the coated paper, improves coated paper physical properties such as print gloss, and has excellent coating operation properties such as excellent redispersibility, mechanical stability and anti-tackiness, to provide the copolymer latex for coating paper, and to provide a composition for coating paper. SOLUTION: This method for producing the copolymer latex, comprising a process for emulsion-polymerizing monomers in the presence of a polymerization initiator containing a free radical catalyst and a reducing agent and adding at least a part of the reducing agent to the reaction process of the monomers by at least one of a batch type method and a continuous method, wherein the weight-average mol.wt. of components detected more late than an elution time corresponding to a mol.wt. of 1,000,000 converted into polystyrene in a mol.wt. distribution obtained by the measurement of GPC is 30,000 to 400,000.