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公开(公告)号:AU2003234134A1
公开(公告)日:2003-11-03
申请号:AU2003234134
申请日:2003-04-18
Applicant: KLA TENCOR CORP
Inventor: MILLER LARRY , VAEZ-IRAVANI MEHDI
IPC: G01N21/88 , G01N21/956
Abstract: A compact and versatile multi-spot inspection imaging system employs an objective for focusing an array of radiation beams to a surface and a second reflective or refractive objective having a large numerical aperture for collecting scattered radiation from the array of illuminated spots. The scattered radiation from each illuminated spot is focused to a corresponding receiver or detector so that information about a scattering may be conveyed to a corresponding detector in a remote detector array for processing. Radiation reflected from the spots is imaged into a first array of receivers or detectors so that each receiver in the first array receives radiation from a corresponding spot in the array of spots; and scattered radiation from the spots is imaged onto a second array of receivers or detectors in a dark field imaging scheme so that each receiver or detector in the second array receives radiation from a corresponding spot.
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公开(公告)号:AT445152T
公开(公告)日:2009-10-15
申请号:AT04754334
申请日:2004-06-04
Applicant: KLA TENCOR CORP
Inventor: BEVIS CHRISTOPHER , KIRK MIKE , VAEZ-IRAVANI MEHDI
Abstract: Systems for inspection of patterned and unpatterned wafers are provided. One system includes an illumination system configured to illuminate the specimen. The system also includes a collector configured to collect light scattered from the specimen. In addition, the system includes a segmented detector configured to separately detect different portions of the light such that azimuthal and polar angular information about the different portions of light is preserved. The detector may also be configured to produce signals representative of the different portions of the light. The system may also include a processor configured to detect defects on the specimen from the signals. In another embodiment, the system may include a stage that is configured to rotate and translate the specimen. In one such embodiment, the system may also include an illumination system configured to scan the specimen in a wide scan path during rotation and translation of the specimen.
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公开(公告)号:DE69819159D1
公开(公告)日:2003-11-27
申请号:DE69819159
申请日:1998-07-28
Applicant: KLA TENCOR CORP
Inventor: ZHAO GUOHENG , STOKOWSKI STANLEY , VAEZ-IRAVANI MEHDI
Abstract: A cylindrical mirror or lens is used to focus an input collimated beam of light onto a line on the surface to be inspected, where the line is substantially in the plane of incidence of the focused beam. An image of the beam is projected onto an array of charge-coupled devices parallel to the line for detecting anomalies and/or features of the surface, where the array is outside the plane of incidence of the focused beam.
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公开(公告)号:SG190678A1
公开(公告)日:2013-07-31
申请号:SG2013023924
申请日:2011-12-07
Applicant: KLA TENCOR CORP
Inventor: ZHAO GUOHENG , LEONG JENN-KUEN , VAEZ-IRAVANI MEHDI
Abstract: Systems and methods for inspecting a wafer are provided.
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公开(公告)号:DE602004023505D1
公开(公告)日:2009-11-19
申请号:DE602004023505
申请日:2004-06-04
Applicant: KLA TENCOR CORP
Inventor: BEVIS CHRISTOPHER F , KIRK MIKE , VAEZ-IRAVANI MEHDI
Abstract: Systems for inspection of patterned and unpatterned wafers are provided. One system includes an illumination system configured to illuminate the specimen. The system also includes a collector configured to collect light scattered from the specimen. In addition, the system includes a segmented detector configured to separately detect different portions of the light such that azimuthal and polar angular information about the different portions of light is preserved. The detector may also be configured to produce signals representative of the different portions of the light. The system may also include a processor configured to detect defects on the specimen from the signals. In another embodiment, the system may include a stage that is configured to rotate and translate the specimen. In one such embodiment, the system may also include an illumination system configured to scan the specimen in a wide scan path during rotation and translation of the specimen.
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公开(公告)号:DE69819929D1
公开(公告)日:2003-12-24
申请号:DE69819929
申请日:1998-09-18
Applicant: KLA TENCOR CORP
Inventor: VAEZ-IRAVANI MEHDI , STOKOWSKI STANLEY , ZHAO GUOHENG
IPC: G01N21/956 , G01J3/44 , G01N21/00 , G01N21/21 , G01N21/47 , G01N21/88 , G01N21/94 , G01N21/95 , H01L21/66 , G01N21/86 , G01B11/24 , G01B7/34
Abstract: A curved mirrored surface (78) is used to collect radiation scattered by a sample surface (76a) and originating from a normal illumination beam (70) and an oblique illumination beam (90). The collected radiation is focused to a detector (80). Scattered radiation originating from the normal and oblique illumination beams may be distinguished by employing radiation at two different wavelengths, by intentionally introducing an offset between the spots illuminated by the two beams or by switching the normal and oblique illumination beams (70, 90) on and off alternately. Beam position error caused by change in sample height may be corrected by detecting specular reflection of an oblique illumination beam and changing the direction of illumination in response thereto. Butterfly-shaped spatial filters may be used in conjunction with curved mirror radiation collectors 78 to restrict detection to certain azimuthal angles.
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公开(公告)号:AU8765798A
公开(公告)日:1999-02-22
申请号:AU8765798
申请日:1998-07-28
Applicant: KLA TENCOR CORP
Inventor: ZHAO GUOHENG , STOKOWSKI STANLEY , VAEZ-IRAVANI MEHDI
Abstract: A cylindrical mirror or lens is used to focus an input collimated beam of light onto a line on the surface to be inspected, where the line is substantially in the plane of incidence of the focused beam. An image of the beam is projected onto an array of charge-coupled devices parallel to the line for detecting anomalies and/or features of the surface, where the array is outside the plane of incidence of the focused beam.
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公开(公告)号:EP2457251A4
公开(公告)日:2017-11-08
申请号:EP10802700
申请日:2010-07-16
Applicant: KLA-TENCOR CORP
Inventor: ZHAO GUOHENG , VAEZ-IRAVANI MEHDI , YOUNG SCOTT , BHASKAR KRIS
CPC classification number: G01N21/9501 , G01N21/8806 , G01N2021/8822
Abstract: A dark field inspection system that minimizes the speckle noise due to sample surface roughness can include a plurality of beam shaping paths for generating a composite, focused illumination line on a wafer. Each beam shaping path can illuminate the wafer at an oblique angle. The plurality of beam shaping paths can form a ring illumination. This ring illumination can reduce the speckle effect, thereby improving SNR. An objective lens can capture scattered light from the wafer and an imaging sensor can receive an output of the objective lens. Because the wafer illumination occurs at oblique angles, the objective lens can have a high NA, thereby improving optical resolution of the imaging sensor, and the resulting signal level.
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公开(公告)号:WO2012082501A2
公开(公告)日:2012-06-21
申请号:PCT/US2011063849
申请日:2011-12-07
Applicant: KLA TENCOR CORP , ZHAO GUOHENG , LEONG JENN-KUEN , VAEZ-IRAVANI MEHDI
Inventor: ZHAO GUOHENG , LEONG JENN-KUEN , VAEZ-IRAVANI MEHDI
IPC: H01L21/66
CPC classification number: G01N21/9501 , G01N21/21 , G01N21/47 , G01N21/8806 , G01N2201/06113 , H01L22/12 , H01L2924/0002 , H01L2924/00
Abstract: Systems and methods for inspecting a wafer are provided.
Abstract translation: 提供了用于检查晶片的系统和方法。
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公开(公告)号:WO2010077865A2
公开(公告)日:2010-07-08
申请号:PCT/US2009068060
申请日:2009-12-15
Applicant: KLA TENCOR CORP , ZHAO GUOHENG , ZAPALAC GEORGE H , NGAI SAMUEL S H , VAEZ-IRAVANI MEHDI , LEVY ADY , DHARMADHIKARI VINEET
Inventor: ZHAO GUOHENG , ZAPALAC GEORGE H , NGAI SAMUEL S H , VAEZ-IRAVANI MEHDI , LEVY ADY , DHARMADHIKARI VINEET
IPC: H01L21/66 , H01L31/042
CPC classification number: G06T7/001 , G01N25/72 , G02F1/1309 , G06T2207/10048 , G06T2207/30148
Abstract: To increase inspection throughput, the field of view of an infrared camera can be moved over the sample at a constant velocity. Throughout this moving, a modulation can be provided to the sample and infrared images can be captured using the infrared camera. Moving the field of view, providing the modulation, and capturing the infrared images can be synchronized. The infrared images can be filtered to generate the time delay lock-in thermography, thereby providing defect identification. This filtering can account for the number of pixels of the infrared camera in a scanning direction. For the case of optical modulation, a dark field region can be provided for the field of view throughout the moving, thereby providing an improved signal-to-noise ratio during filtering. Localized defects can be repaired by a laser integrated into the detection system or marked by ink for later repair in the production line.
Abstract translation: 为了提高检查吞吐量,红外摄像机的视野可以以恒定的速度移动到样品上。 在整个移动过程中,可以向样品提供调制,并可以使用红外摄像机捕获红外图像。 可以同步移动视野,提供调制和捕获红外图像。 可以对红外图像进行滤波以产生延时锁定热成像,从而提供缺陷识别。 该过滤可以解释红外摄像机在扫描方向上的像素数。 对于光调制的情况,可以在整个移动期间为视场提供暗场区域,从而在滤波期间提供改善的信噪比。 局部缺陷可以通过集成到检测系统中的激光器或由墨水标记来修复,以便在生产线中进行后续修复。
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