Improved ceria powder
    11.
    发明专利

    公开(公告)号:AU5464700A

    公开(公告)日:2001-01-02

    申请号:AU5464700

    申请日:2000-06-06

    Abstract: A polishing slurry, useful in optical or CMP applications, comprises a ceria with a BET surface area of at least 10 m2/gm. The slurry may be made by subjecting a commercial ceria slurry comprising agglomerates to a mechano-chemical treatment at a pH of from 9 to 11 using media that are low purity alpha alumina or zirconia. Preferred slurries maintain a positive surface charge at all pH values. CMP slurries preferably comprise in addition an anionic surfactant to aid in removal of surface residues.

    12.
    发明专利
    未知

    公开(公告)号:ES2185144T3

    公开(公告)日:2003-04-16

    申请号:ES98903491

    申请日:1998-01-14

    Abstract: Porous ceramic particles can be fragmented by generating a gas inside the pores at a sufficient pressure to cause the particles to be fragmented. The preferred way of generating the pressure is by immersing the particles in a liquid that at ambient temperatures and pressures is a gas until the liquid is absorbed into the pores and thereafter rapidly changing the conditions such that the liquid becomes a gas resulting in explosive fragmentation of the ceramic particles.

    15.
    发明专利
    未知

    公开(公告)号:BR0012290A

    公开(公告)日:2002-04-16

    申请号:BR0012290

    申请日:2000-06-06

    Abstract: A polishing slurry, useful in optical or CMP applications, comprises a ceria with a BET surface area of at least 10 m2/gm. The slurry may be made by subjecting a commercial ceria slurry comprising agglomerates to a mechano-chemical treatment at a pH of from 9 to 11 using media that are low purity alpha alumina or zirconia. Preferred slurries maintain a positive surface charge at all pH values. CMP slurries preferably comprise in addition an anionic surfactant to aid in removal of surface residues.

    IMPROVED CERIA POWDER
    19.
    发明专利

    公开(公告)号:CA2374373C

    公开(公告)日:2005-04-05

    申请号:CA2374373

    申请日:2000-06-06

    Abstract: A polishing slurry, useful in optical or CMP applications, comprises a ceria with a BET surface area of at least 10 m2/gm. The slurry may be made by subjecting a commercial ceria slurry comprising agglomerates to a mechano- chemical treatment at a pH of from 9 to 11 using media that are low purity alpha alumina or zirconia. Preferred slurries maintain a positive surface charge at all pH values. CMP slurries preferably comprise in addition an anionic surfactant to aid in removal of surface residues.

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