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公开(公告)号：HUE057230T2
公开(公告)日：2022-04-28
申请号：HUE16746358
申请日：2016-01-07
Applicant: TORAY INDUSTRIES
Inventor： KITAMURA OSAMU , MAKI AKIHISA , NOMURA FUMIYASU , KIMISHIMA KOTARO
IPC: B29C48/08 , B29C48/30 , B29C48/305 , B29C48/88
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公开(公告)号：HUE039633T2
公开(公告)日：2019-01-28
申请号：HUE16746359
申请日：2016-01-07
Applicant: TORAY INDUSTRIES
Inventor： MAKI AKIHISA , KITAMURA OSAMU , NOMURA FUMIYASU , KIMISHIMA KOTARO
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公开(公告)号：DE69730185T2
公开(公告)日：2005-08-18
申请号：DE69730185
申请日：1997-03-27
Applicant: TORAY INDUSTRIES
Inventor： NOMURA FUMIYASU
Abstract: The object of the present invention is to provide a method and apparatus for efficiently and continuously manufacturing large-sized substrate with a thin film such as antireflection filters by using relatively small manufaturing apparatus. To achieve the above object, the present invention provides: A method for manufacturing substrate with a thin film, in which a film forming chamber with ,upstream and downstream of a film forming areafirst and second stockers capable of storing in multi-stages substrate on which a film to be formed is provided, and a loading chamber and an unloading chamber are provided upstream and downstream of the film forming chamber, respectively with a stocker capable of storing in multi-stages the substrate on which a film to be formed, wherein while a group of substrates on which a film to be formed are being subjected to film forming in the film forming chamber, the loading chamber is loaded with the next group of substrates on which a film to be formed and evacuated, and the substrates on each of them a film formed previously are unloaded from the unloading chamber, characterized in that the substrates are being subjected to film forming while passing through the film forming area. And also as an apparatus for executing the method for manufacturing substrate with a thin film, the present invention provides: An apparatus, comprising a film forming chamber with first and second stockers capable of storing in multi-stages substrate on which a film to be formed upstream and downstream of a film forming area, and a loading chamber and an unloading chamber provided upstream and downstream of said film forming chamber, respectively with a stocker capable of storing in multi-stages substrate on which a film to be formed, wherein said film forming chamber, said loading chamber and said unloading chamber have respectively an independent evacuation means to allow evacuation; and said film forming chamber has a film forming particle generation source, a means for passing the substrate on which a film to be formed through the film forming area, and means for taking out the substrate on which a film to be formed one after another from the first stocker into the passing means and further putting it from the passing means into the second stocker. The method for manufacturing substrate with a thin film of the present invention can continuously and efficiently produce large-sized substrate with a thin film, and is wasteless in the film forming area, having features that the productivity is several times higher compared to the conventional methods and that the production cost is very low.
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14.发明公开PLASMA CVD APPARATUS, PLASMA CVD METHOD, REACTIVE SPUTTERING APPARATUS, AND REACTIVE SPUTTERING METHOD 审中-公开离子CVD装置，等离子体CVD法，设备及无功推杆推杆响应过程
公开(公告)号：EP2692898A4
公开(公告)日：2014-09-17
申请号：EP12764688
申请日：2012-02-14
Applicant: TORAY INDUSTRIES
Inventor： EJIRI HIROE , SAKAMOTO KEITARO , NOMURA FUMIYASU , UEDA MASANORI
IPC: C23C16/455 , C23C14/00 , C23C14/34 , C23C14/56 , C23C16/54
CPC classification number: C23C14/0063 , C23C14/0068 , C23C14/562 , C23C16/401 , C23C16/402 , C23C16/455 , C23C16/45517 , C23C16/50 , C23C16/545 , H01J37/32559 , H01J37/32568 , H01J37/32752 , H01J37/3277 , H01J37/3405 , H01J37/3417 , H01J2237/3321 , H01J2237/3325
Abstract: A plasma CVD apparatus comprising a vacuum chamber, and a main roll and a plasma generation electrode in the vacuum chamber, wherein a thin film is formed on a surface of a long substrate which is conveyed along the surface of the main roll is provided. At least one side wall extending in transverse direction of the long substrate is provided on each of the upstream and downstream sides in the machine direction of the long substrate, and the side walls surrounds the film deposition space between the main roll and the plasma generation electrode. The side walls are electrically insulated from the plasma generation electrode. The side wall on either the upstream or the downstream side in the machine direction of the long substrate is provided with at least one raw of gas supply holes formed by gas supply holes aligned in the transverse direction of the long substrate.
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15.发明公开FILMED SUBSTRATE, AND METHOD AND APPARATUS FOR PRODUCING THE SAME 失效BESCHICHTETES SUBSTRAT，VERFAHREN UND VORRICHTUNG ZU DESSEN HERSTELLUNG
公开(公告)号：EP0712942A4
公开(公告)日：1998-09-02
申请号：EP95920217
申请日：1995-05-31
Applicant: TORAY INDUSTRIES
Inventor： NOMURA FUMIYASU , SAITO TAKESHI
CPC classification number: C23C14/547
Abstract: An object of the present invention is to provide a method and an apparatus for producing a large sized filmed substrate such as a reflection preventive filter using a relatively small production facility. In a method for producing a filmed substrate according to the present invention, the thickness of a monitor film formed on a film forming monitor is measured by using the film forming monitor disposed outside of a film forming area or a movable film forming monitor and a film forming process is controlled based on a film thickness so measured to thereby form a film even on a film forming objective substrate having a size equal to the entirety of the film forming area. In addition, the method of the present invention can improve the degree of freedom in which the film forming objective substrate is disposed within the film forming area, whereby the productivity during the production process can also be improved.
Abstract translation: 本发明的目的是提供一种使用相对较小的生产设备来制造诸如反射预防过滤器的大尺寸胶片基材的方法和装置。 在根据本发明的成膜基板的制造方法中，通过使用设置在成膜区域外的成膜监视器或可动膜形成监视器和膜，测量形成在成膜监视器上的监视膜的厚度 基于所测量的膜厚来控制成型工艺，从而即使在尺寸等于成膜区域的整体的成膜物体基板上也形成膜。 此外，本发明的方法可以提高成膜物质基材在成膜区域内的自由度，从而可以提高生产过程中的生产率。
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Patent Agency Ranking16.发明专利
公开(公告)号：JP2002347099A
公开(公告)日：2002-12-04
申请号：JP2001158570
申请日：2001-05-28
Applicant: TORAY INDUSTRIES
Inventor： CHIGIRA NOBUTSUGU , OKASHIRO HIDETOSHI , NOMURA FUMIYASU
IPC: B29C48/305 , B29C48/92 , B29C47/14 , B29C47/92
Abstract: PROBLEM TO BE SOLVED: To provide a mouthpiece for manufacturing a sheet for obtaining a smooth sheet by stably executing steps of discharging a molten material from the mouthpiece and drawing by a cooling roll at a high speed of 60 m/min or more, to manufacture the sheet by using particularly an electrostatic applying method, and to provide an apparatus and a method for manufacturing the sheet. SOLUTION: The mouthpiece for discharging the molten material from a slit to the sheet comprises a molten material heating means for heating the molten material at least at a center of a sheet widthwise direction of the mouthpiece, and an end molten material temperature regulating means for regulating a temperature of the molten material near the end of the sheet in the widthwise direction of the sheet independently from the center. The apparatus and the method for manufacturing the sheet are provided.
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公开(公告)号：JP2000289979A
公开(公告)日：2000-10-17
申请号：JP9765299
申请日：1999-04-05
Applicant: TORAY INDUSTRIES
Inventor： OSAWA YOSHIHIKO , MIYAGAWA TATSUYA , NOMURA FUMIYASU
Abstract: PROBLEM TO BE SOLVED: To securely detect an abnormality irrespective of the number of suspension bands to be cut and loosened and a section to be cut and loosened, to detect an abnormality when a conveyance means overruns, to provide a detection means in a narrow installation space, and to improve maintenance property when cutting and loosening of the suspension bands and overrun of the conveyance means are detected automatically. SOLUTION: In a vertical conveyance device having a substrate holding unit 12 holding a substrate in a chamber and a conveyance means lifting and lowering the substrate holding unit to an arbitrary position in a suspension condition by a suspension band 19, a detector for detecting cutting and loosening of the suspension band is arranged in the vicinity of a suspension band winding part, and a detection means for detecting cutting and loosening of the suspension band capable of detecting cutting and loosening of the suspension band due to the deformation of the suspension band in the suspension band winding part and its contact with the detector when the suspension band is cut and loosened is provided.
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18.发明专利
公开(公告)号：JPH11330191A
公开(公告)日：1999-11-30
申请号：JP12487498
申请日：1998-05-07
Applicant: TORAY INDUSTRIES
Inventor： OSAWA YOSHIHIKO , ARISUMI HISAWAKE , NOMURA FUMIYASU
Abstract: PROBLEM TO BE SOLVED: To reduce the attachment of the generated dust material such as abrasion powder to a substrate, even under the high vacuum state and to make the device simple and to make the setting space small further, by guiding the relay cable of a substrate heating heater by a suspending unit for a cable guide roll. SOLUTION: In the inside of the U-shaped part of a relay cable 29, a cable- guide unit 33, which moves and guides the relay cable 29 in the lifting and lowering directions of a substrate when a substrate/heater holding unit is lifted and lowered, is provided. The cable guide unit 33 comprises a cable-guide roller 34, a lifting pulley 38, a connecting shaft 39 and an attaching metal tool 40. Then, the cable-guide unit 33 is engaged with a guide bearing 37 of a linear guide unit 35 for guiding in the lifting and lowering directions. The lifting pulley 38 is in a state so that the pulley is suspended from a lifting unit 17. In this way, when electric power is supplied to a heater for heating the substrate, the cable is not cut out and the stable operation is possible for a long period.
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公开(公告)号：JPH1123837A
公开(公告)日：1999-01-29
申请号：JP17944597
申请日：1997-07-04
Applicant: TORAY INDUSTRIES
Inventor： NOMURA FUMIYASU , OKUNO MAYUMI
IPC: G02B5/22 , B29D11/00 , B32B7/02 , C09K3/00 , G02B1/11 , G02B1/115 , G02B1/116 , G02B1/14 , G02B1/16
Abstract: PROBLEM TO BE SOLVED: To eliminate the malfunction of a remote controller and easy to view a display body without being affected by external light even when an optical filter is attached to the front of a display screen by using the optical filter whose absorption rate and visual sensitive reflectance of a near infrared region are specified. SOLUTION: The optical filter absorbing 80% or above of the near infrared region, reflection preventing a visible light region and having the visible sensitive reflectance of 3% or below is used. As the substrate of this optical filter, a glass planar plate, a plastic planar plate or a plastic sheet, film, etc., are used preferably. The substrate made of plastic resin is used preferably in the side of particularly hardly be split, light, easy to process, easy to handle, etc. Further, the near infrared region means a wavelength region >=700 nm and =700 nm and
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公开(公告)号：JP2003129229A
公开(公告)日：2003-05-08
申请号：JP2001325056
申请日：2001-10-23
Applicant: TORAY INDUSTRIES
Inventor： NOMURA FUMIYASU , OKAMOTO KATSUYA , HIROSE HIROKAZU
Abstract: PROBLEM TO BE SOLVED: To provide a film-winding-type vapor deposition method for obtaining a metal oxide film by melting and vaporizing a vapor-depositable metal and introducing oxygen in the mid course, more particularly, for forming a thick metal oxide film on a film by fully oxidizing the metal, to provide a method for increasing the strength of a film as thin as 2-6 μm, especially, for increasing the strength of a film for a magnetic recording medium, and to provide a magnetic recording medium support desirable for producing magnetic recording media, especially DVC-LP tapes, having few DOs and excellent running performances. SOLUTION: The method is a film forming method comprising disposing a cooling can over a vapor source prepared by melting a metal, conveying an undeposited film delivered from an unwinding means along the can to expose it to the formed vapor and to thereby form a metal oxide, and winding the deposited film by means of a winding means, wherein the metal vapor is passed from an opening situated at a height equal to (0.6-0.9)×h (wherein (h) is the shortest distance between the surface of the molten metal in the vapor source and the undeposited film), enclosing the perpendicular part of the surface of the molten metal, and being larger by at least 1.5 times than the area of the molten metal, and oxygen is introduced from the space between the opening and the can.
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