Abstract:
[Object] To simplify a production process regarding a production method for a plasma display panel by lowering a deposition temperature so that a (111)-oriented MgO layer can be easily obtained as a protective layer. [Solving Means] In a production method for a plasma display panel constituted of a front substrate including a scanning electrode, a sustaining electrode, a dielectric layer, and a protective layer, and a back substrate including an address electrode, a barrier rib, and a phosphor, a temperature of a glass substrate before being subjected to vapor deposition in an electron beam vapor deposition apparatus is set at room temperature (120°C or less), and an MgO deposition rate of the electron beam vapor deposition apparatus is set to be 8000 Å*m/min or more. By the deposition at room temperature, an MgO layer equivalent to that obtained by conventional deposition at high temperature can be obtained.