公开(公告)号：EP2082990A2

公开(公告)日：2009-07-29

申请号：EP09150686.5

申请日：2009-01-15

Applicant: Honeywell International Inc.

Inventor： Carlson, Robert J.

IPC: B81C5/00

CPC classification number: B29C33/3842 ,  B29C41/00 ,  B29C59/14 ,  B29C59/16 ,  B29K2909/00 ,  B29K2995/0037 ,  B81B7/00 ,  B81B2201/05 ,  B81B2201/058 ,  B81B2203/0127 ,  B81C99/009 ,  B81C2201/0132 ,  B81C2201/0143 ,  B81C2201/034 ,  C23F1/02 ,  H01L21/30604 ,  Y10T428/24496

Abstract: The invention is directed to a patterned aerogel-based layer that serves as a mold for at least part of a microelectromechanical feature. The density of an aerogel is less than that of typical materials used in MEMS fabrication, such as poly-silicon, silicon oxide, single-crystal silicon, metals, metal alloys, and the like. Therefore, one may form structural features in an aerogel-based layer at rates significantly higher than the rates at which structural features can be formed in denser materials. The invention further includes a method of patterning an aerogel-based layer to produce such an aerogel-based mold. The invention further includes a method of fabricating a microelectromechanical feature using an aerogel-based mold. This method includes depositing a dense material layer directly onto the outline of at least part of a microelectromechanical feature that has been formed in the aerogel-based layer.

Abstract translation: 本发明涉及用作至少部分微机电特征的模具的图案化气凝胶基层。 气凝胶的密度小于MEMS制造中使用的典型材料的密度，例如多晶硅，氧化硅，单晶硅，金属，金属合金等。 因此，可以以比在更致密的材料中形成结构特征的速率显着更高的速率在气凝胶层中形成结构特征。 本发明还包括一种图案化气凝胶层以产生这种基于气凝胶的模具的方法。 本发明还包括使用基于气凝胶的模具制造微机电特征的方法。 该方法包括将致密材料层直接沉积在已经形成在气凝胶层中的微机电特征的至少一部分的轮廓上。

公开(公告)号：EP2082990A3

公开(公告)日：2013-10-02

申请号：EP09150686.5

申请日：2009-01-15

Applicant: Honeywell International Inc.

Inventor： Carlson, Robert J.

IPC: B81B1/00

CPC classification number: B29C33/3842 ,  B29C41/00 ,  B29C59/14 ,  B29C59/16 ,  B29K2909/00 ,  B29K2995/0037 ,  B81B7/00 ,  B81B2201/05 ,  B81B2201/058 ,  B81B2203/0127 ,  B81C99/009 ,  B81C2201/0132 ,  B81C2201/0143 ,  B81C2201/034 ,  C23F1/02 ,  H01L21/30604 ,  Y10T428/24496

Abstract: The invention is directed to a patterned aerogel-based layer that serves as a mold for at least part of a microelectromechanical feature. The density of an aerogel is less than that of typical materials used in MEMS fabrication, such as poly-silicon, silicon oxide, single-crystal silicon, metals, metal alloys, and the like. Therefore, one may form structural features in an aerogel-based layer at rates significantly higher than the rates at which structural features can be formed in denser materials. The invention further includes a method of patterning an aerogel-based layer to produce such an aerogel-based mold. The invention further includes a method of fabricating a microelectromechanical feature using an aerogel-based mold. This method includes depositing a dense material layer directly onto the outline of at least part of a microelectromechanical feature that has been formed in the aerogel-based layer.

公开(公告)号：EP2448678A1

公开(公告)日：2012-05-09

申请号：EP10732736.3

申请日：2010-07-02

Applicant: Cambridge Enterprise Ltd.

Inventor： BAUER, Wolfgang Andreas ,  HUCK, Wilhelm T. S. ,  FISCHLECHNER, Martin

IPC: B01L3/00 ,  B01F13/00 ,  G01N27/447

CPC classification number: B01L3/502707 ,  B01F17/00 ,  B01J2219/00511 ,  B01J2219/0059 ,  B01J2219/00637 ,  B01J2219/00783 ,  B01J2219/00788 ,  B01J2219/00831 ,  B01J2219/00833 ,  B01J2219/00837 ,  B01J2219/0097 ,  B01L2200/0636 ,  B01L2300/0867 ,  B01L2300/16 ,  B01L2300/161 ,  B05C7/04 ,  B05D7/22 ,  B05D7/222 ,  B81B2201/0214 ,  B81B2201/05 ,  B81B2201/052 ,  B81B2201/058 ,  B81C1/00119 ,  B81C1/00206 ,  Y10T137/8593

Abstract: We describe a method of layer-by-layer deposition of a plurality of layers of material onto the wall or walls of a channel of a microfluidic device, the method comprising: loading a tube with a series of segments of solution, a said segment of solution bearing a material to be deposited; coupling said tube to said microfluidic device; and injecting said segments of solution into said microfluidic device such that said segments of solution pass, in turn, through said channel depositing successive layers of material to perform said layer-by-layer deposition onto said wall or walls of said channel. Embodiments of the methods are particularly useful for automated surface modification of plastic, for example PDMS (Poly(dimethylsiloxane)), microchannels. We also describe methods and apparatus for forming double-emulsions.

Abstract translation: 我们描述了在微流体装置的通道的壁或壁上逐层沉积多层材料的方法，所述方法包括：加载具有一系列溶液段的管，所述段 带有待沉积材料的溶液; 将所述管耦合至所述微流体装置; 以及将所述溶液片段注入所述微流体装置，使得所述溶液片段依次通过所述通道沉积连续的材料层以在所述通道的所述一个或多个壁上执行所述逐层沉积。 该方法的实施方式对于塑料的自动化表面改性特别有用，例如PDMS（聚（二甲基硅氧烷））微通道。 我们还描述了形成双重乳液的方法和设备。

公开(公告)号：US20240280513A1

公开(公告)日：2024-08-22

申请号：US18224325

申请日：2023-07-20

Applicant: SAMSUNG ELECTRONICS CO., LTD. ,  SEOUL NATIONAL UNIVERSITY R&DB FOUNDATION

Inventor： Jae Hong LEE ,  Jungwon PARK ,  Min-Ho KANG ,  Minyoung LEE ,  Hyeong Seok JANG ,  Won Jong JUNG ,  Jin Ha KIM ,  Kak NAMKOONG ,  Hyung Jun YOUN

IPC: G01N23/06 ,  B81B1/00 ,  B81C1/00 ,  G01N33/483

CPC classification number: G01N23/06 ,  B81B1/002 ,  B81C1/00071 ,  G01N33/483 ,  B81B2201/05 ,  B81B2203/033 ,  B81B2203/0338 ,  B81C2201/0132 ,  B81C2201/0181 ,  B81C2201/0198

Abstract: The present disclosure provides methods and apparatuses for biomaterial detection sensors. In some embodiments, a biomaterial detection sensor includes a membrane including a plurality of wells. Each of the plurality of wells is configured to encapsulate a biomaterial contained in a sample solution. A surface of the membrane is selectively modified into at least one of a hydrophilic surface and a hydrophobic surface. In some embodiments, a method of manufacturing a biomaterial detection sensor includes depositing a first membrane and a second membrane on respective surfaces of a wafer, forming a window by etching the first membrane and the first surface of the wafer, forming a plurality of wells on the second membrane, modifying a surface of the second membrane into at least one of a hydrophilic surface and a hydrophobic surface; and transferring a two-dimensional graphene oxide material onto a bottom of each of the plurality of wells.

公开(公告)号：US20240158222A1

公开(公告)日：2024-05-16

申请号：US18055151

申请日：2022-11-14

Applicant: Robert Bosch GmbH

Inventor： Christoph Schelling ,  Timothy Schultz

IPC: B81B3/00

CPC classification number: B81B3/0021 ,  B81B2201/05 ,  B81B2203/0118 ,  B81B2203/0127 ,  B81B2203/0315 ,  B81B2207/053

Abstract: A fluidic microelectromechanical system (MEMS) device includes fluid interaction elements (FIEs) that are configured to be monitored by a sensing device to generate an electrical signal in response to a fluid flow through the device. The FIEs include a serial arrangement of cantilevered lever arms to achieve increased sensitivity in a fluid flow sensor as compared to some conventional MEMS devices.

公开(公告)号：US11956921B1

公开(公告)日：2024-04-09

申请号：US17459239

申请日：2021-08-27

Applicant: Frore Systems Inc.

Inventor： Suryaprakash Ganti ,  Vikram Mukundan ,  Ananth Saran Yalamarthy ,  Seshagiri Rao Madhavapeddy ,  Prabhu Sathyamurthy

IPC: H05K7/20 ,  B81B7/00 ,  H01L41/09 ,  H10N30/20

CPC classification number: H05K7/20272 ,  B81B7/0061 ,  H10N30/2042 ,  B81B2201/05

Abstract: A cooling system including a support structure and a cooling element is described. The cooling element has a central region and a perimeter. The cooling element is supported by the support structure at the central region. At least a portion of the perimeter is unpinned. The cooling element is configured to undergo vibrational motion when actuated to drive a fluid toward a heat-generating structure. Further, the cooling element has a first side distal from the heat-generating structure and a second side proximate to the heat-generating structure. The support structure supports the cooling element from one of the first side and the second side.

公开(公告)号：US20150323408A1

公开(公告)日：2015-11-12

申请号：US14443904

申请日：2013-11-12

Applicant: NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY

Inventor： Hajime YOSHIDA ,  Kenta ARAI ,  Tokihiko KOBATA

IPC: G01L27/00 ,  G01M3/26 ,  B81B7/00

CPC classification number: G01L27/002 ,  B81B7/0009 ,  B81B2201/05 ,  G01M3/007 ,  G01M3/207 ,  G01M3/26

Abstract: There is provided a reference leak generating device capable of precisely generating an ultra-fine reference leak. The reference leak generating device adapted to be connected to an upstream side of a measurement chamber includes a chamber connected to the measurement chamber through an orifice or a porous plug having a molecular flow conductance C and a pressure to establish molecular flow conditions which are known in advance, and is characterized in that a pressure p1 of testing gas to be introduced into the chamber is precisely determined by using a static expansion method once or more times, and a leak rate of a reference leak at the pressure p1 is obtained in accordance with a product of C and p1.

Abstract translation: 提供了能够精确地产生超细参考泄漏的参考泄漏产生装置。 适于连接到测量室的上游侧的参考泄漏产生装置包括通过具有分子流导度C和压力的孔口或多孔塞连接到测量室的室，以建立分子流动条件 并且其特征在于，通过使用静态膨胀法一次或多次精确地确定要引入到室中的测试气体的压力p1，并且根据压力p1获得压力p1处的基准泄漏的泄漏率 C和p1的产物。

公开(公告)号：US20120168010A1

公开(公告)日：2012-07-05

申请号：US13381791

申请日：2010-07-02

Applicant: Wolfgang Andreas Bauer ,  Wilhelm T.S. Huck ,  Martin Fischlechner

Inventor： Wolfgang Andreas Bauer ,  Wilhelm T.S. Huck ,  Martin Fischlechner

IPC: F03B11/02 ,  B05D3/10 ,  B05C9/02 ,  B05D7/22

CPC classification number: B01L3/502707 ,  B01F17/00 ,  B01J2219/00511 ,  B01J2219/0059 ,  B01J2219/00637 ,  B01J2219/00783 ,  B01J2219/00788 ,  B01J2219/00831 ,  B01J2219/00833 ,  B01J2219/00837 ,  B01J2219/0097 ,  B01L2200/0636 ,  B01L2300/0867 ,  B01L2300/16 ,  B01L2300/161 ,  B05C7/04 ,  B05D7/22 ,  B05D7/222 ,  B81B2201/0214 ,  B81B2201/05 ,  B81B2201/052 ,  B81B2201/058 ,  B81C1/00119 ,  B81C1/00206 ,  Y10T137/8593

Abstract: We describe a method of layer-by-layer deposition of a plurality of layers of material onto the wall or walls of a channel of a microfluidic device, the method comprising: loading a tube with a series of segments of solution, a said segment of solution bearing a material to be deposited; coupling said tube to said microfluidic device; and injecting said segments of solution into said microfluidic device such that said segments of solution pass, in turn, through said channel depositing successive layers of material to perform said layer-by-layer deposition onto said wall or walls of said channel. Embodiments of the methods are particularly useful for automated surface modification of plastic, for example PDMS (Poly(dimethylsiloxane)), microchannels. We also describe methods and apparatus for forming double-emulsions.

Abstract translation: 我们描述了将多层材料层逐层沉积到微流体装置的通道的壁或壁上的方法，该方法包括：将具有一系列溶液段的管装载， 含有待沉积材料的溶液; 将所述管连接到所述微流体装置; 以及将所述溶液段注射到所述微流体装置中，使得所述溶液段又通过所述通道沉积连续的材料层，以在所述通道的所述壁或壁上执行所述逐层沉积。 该方法的实施方案对于塑料的自动表面改性特别有用，例如PDMS（聚（二甲基硅氧烷）），微通道。 我们还描述了形成双重乳液的方法和设备。

公开(公告)号：JP2014205237A

公开(公告)日：2014-10-30

申请号：JP2014126143

申请日：2014-06-19

Applicant: ハネウェル・インターナショナル・インコーポレーテッド ,  Honeywell Internatl Inc

Inventor： CARLSON ROBERT J

IPC: B81C1/00 ,  B81C99/00

CPC classification number: B29C33/3842 ,  B29C41/00 ,  B29C59/14 ,  B29C59/16 ,  B29K2909/00 ,  B29K2995/0037 ,  B81B7/00 ,  B81B2201/05 ,  B81B2201/058 ,  B81B2203/0127 ,  B81C99/009 ,  B81C2201/0132 ,  B81C2201/0143 ,  B81C2201/034 ,  C23F1/02 ,  H01L21/30604 ,  H05K999/00 ,  Y10T428/24496

Abstract: 【課題】微小電気機械システム(MEMS)においてパターン形成された材料層を形成するために必要とされる時間を削減する。【解決手段】基板30上のエアロゲルベース層31にパターン形成する。エアロゲルベース層は、微小電気機械特徴の少なくとも一部の型として機能する。エアロゲルベース層に形成された微小電気機械特徴の少なくとも一部の外形上に、重い材料層34を直接堆積し、重い材料の層を残すように基板からエアロゲルベース層を取り除くことで微小電気機械構造を形成する。エアロゲルの密度は、ポリシリコン、酸化シリコン、単結晶シリコン、金属、合金等のMEMS製造に用いられる典型的な材料よりも小さい。それゆえ、重い材料で構造的特徴を形成する場合の速度よりも、エアロゲルベース層で構造的特徴を有意に高い速度で形成することができる。【選択図】図3

Abstract translation: 要解决的问题：减少在微机电系统（MEMS）中形成图案化材料层所需的时间。解决方案：将气凝胶基层31沉积到基底30上。气凝胶基层至少用作模具 部分微机电特征。 致密材料层34直接沉积在已经形成在气凝胶基层中的微机电特征的至少一部分的轮廓上，并且气相凝胶基材料从基底去除以留下致密材料层， 从而制造微机电结构。 气凝胶的密度小于MEMS制造中使用的典型材料的密度，例如多晶硅，氧化硅，单晶硅，金属，金属合金等。 因此，气凝胶层中的结构特征可以以比在更致密的材料中形成结构特征的速率显着更高的速率形成。

公开(公告)号：US11905163B2

公开(公告)日：2024-02-20

申请号：US16753362

申请日：2019-04-03

Applicant: BOE TECHNOLOGY GROUP CO., LTD.

Inventor： Xiaochen Ma ,  Guangcai Yuan ,  Ce Ning ,  Xin Gu ,  Xiao Zhang ,  Chao Li

IPC: B81B1/00 ,  B81C1/00 ,  B01L3/00

CPC classification number: B81B1/002 ,  B01L3/502715 ,  B81C1/00071 ,  B01L2300/0645 ,  B81B2201/05 ,  B81B2203/0338 ,  B81C2201/0111 ,  B81C2201/036

Abstract: A micro-nano channel structure, a method for manufacturing the micro-nano channel structure, a sensor, a method for manufacturing the sensor, and a microfluidic device are provided by the embodiments of the present disclosure. The micro-nano channel structure includes: a base substrate; a base layer, on the base substrate and including a plurality of protrusions; and a channel wall layer, on a side of the plurality of the protrusions away from the base substrate, and the channel wall layer has a micro-nano channel; a recessed portion is provided between adjacent protrusions of the plurality of the protrusions, and an orthographic projection of the micro-nano channel on the base substrate is located within an orthographic projection of the recessed portion on the base substrate.