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公开(公告)号：US4840653A
公开(公告)日：1989-06-20
申请号：US246954
申请日：1988-09-19
Applicant: Eliezer M. Rabinovich
Inventor： Eliezer M. Rabinovich
IPC: C03B19/12 , C03B19/14 , C03B37/014 , C03B37/016 , C03C1/00 , C03C3/06
CPC classification number: C03B19/1453 , C03B19/12 , C03B37/01446 , C03B37/016 , C03C1/006 , C03C3/06 , C03B2201/12 , C03B2201/14 , C03C2201/12 , C03C2201/14 , C03C2203/20 , Y10S65/16 , Y10S65/901
Abstract: Incorporation of fluorine into a porous silica body, such as an unsintered body produced by a sol-gel method, by VAD or OVPO, reduces or eliminates bubble or pore formation upon re-heating of the glass formed by sintering of the porous material. Effective fluorine concentrations are between 0.01 and 5% by weight. The invention can be used advantageously in producing preforms and optical fiber.
Abstract translation: 通过VAD或OVPO将氟引入多孔二氧化硅体，例如通过溶胶 - 凝胶法制造的未烧结体，减少或消除了通过多孔材料烧结形成的玻璃的再加热时的气泡或孔形成。 有效氟浓度为0.01〜5重量％。 本发明可有利地用于生产预成型件和光纤。
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公开(公告)号：WO2016130604A1
公开(公告)日：2016-08-18
申请号：PCT/US2016/017230
申请日：2016-02-10
Applicant: CORNING INCORPORATED
Inventor： ANNAMALAI, Sezhian , DURAN, Carlos Alberto , HRDINA, Kenneth Edward , ROSCH, William Rogers
CPC classification number: C03C3/076 , C03B19/12 , C03B19/1453 , C03B25/00 , C03B25/02 , C03B2201/10 , C03B2201/12 , C03B2201/42 , C03C3/06 , C03C3/089 , C03C3/112 , C03C23/007 , C03C2201/10 , C03C2201/12 , C03C2201/14 , C03C2203/52
Abstract: Annealing treatments for modified titania-silica glasses and the glasses produced by the annealing treatments. The annealing treatments include an isothermal hold that facilitates equalization of non-uniformities in fictive temperature caused by non-uniformities in modifier concentration in the glasses. The annealing treatments may also include heating the glass to a higher temperature following the isothermal hold and holding the glass at that temperature for several hours. Glasses produced by the annealing treatments exhibit high spatial uniformity of CTE, CTE slope, and fictive temperature, including in the presence of a spatially non-uniform concentration of modifier.
Abstract translation: 改性二氧化钛 - 二氧化硅玻璃和通过退火处理制备的玻璃的退火处理。 退火处理包括促进由玻璃中改性剂浓度不均匀引起的虚构温度不均匀性均衡的等温保持。 退火处理还可以包括在等温保持之后将玻璃加热到更高的温度，并将玻璃保持在该温度下几个小时。 通过退火处理生产的玻璃表现出CTE，CTE斜率和假想温度的高空间均匀性，包括在存在空间不均匀的改性剂浓度的情况下。
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公开(公告)号：WO2009007146A1
公开(公告)日：2009-01-15
申请号：PCT/EP2008/054287
申请日：2008-04-09
Applicant: EVONIK DEGUSSA GMBH , OSWALD, Monika , SCHULZE-ISFORT, Christian , SCHUMACHER, Kai , HOFMANN, Ralph , KISSNER, Corinna
Inventor： OSWALD, Monika , SCHULZE-ISFORT, Christian , SCHUMACHER, Kai , HOFMANN, Ralph , KISSNER, Corinna
CPC classification number: C03B19/1005 , C03C1/006 , C03C3/06 , C03C3/083 , C03C12/00 , C03C2201/06 , C03C2201/14 , C03C2201/28 , C03C2201/31 , C03C2201/32 , C03C2201/34 , C03C2201/40 , C03C2201/42 , C03C2201/50 , C03C2203/20 , C04B35/14 , C04B35/62655 , C04B2235/72
Abstract: Process for producing a sintered granular material containing silicon dioxide and having a BET surface area of less than 1 m 2 g and a proportion of impurities of less than 50 ppm, in which a mixture which contains silicon dioxide powder and a metal compound is intensively mixed in an atmosphere having a relative atmospheric humidity of from 1.0 to 100% at temperatures of from 0 to 50°C by means of a dispersing apparatus, the crumbly mass is divided into pieces, subsequently dried, purified 'and sintered. The moisture content of the silicon dioxide powder and/or the atmospheric humidity are/is at least sufficient to hydrolyse the metal compound completely.
Abstract translation: 制备含有二氧化硅并且BET表面积小于1m 2 g的烧结颗粒材料和小于50ppm的杂质比例的方法，其中含有二氧化硅粉末和金属化合物的混合物在 气氛通过分散装置在0至50℃的温度下具有1.0至100％的相对大气湿度，将碎屑块分成几块，随后干燥，纯化并烧结。 二氧化硅粉末和/或大气湿度的水分含量至少足以使金属化合物完全水解。
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公开(公告)号：US20170349478A1
公开(公告)日：2017-12-07
申请号：US15686313
申请日：2017-08-25
Applicant: Corning Incorporated
IPC: C03C3/076 , C03B19/14 , C03B25/00 , C03C23/00 , C03B19/12 , C03C3/089 , C03C3/112 , C03C3/06 , C03B25/02
CPC classification number: C03C3/076 , C03B19/12 , C03B19/1453 , C03B25/00 , C03B25/02 , C03B2201/10 , C03B2201/12 , C03B2201/42 , C03C3/06 , C03C3/089 , C03C3/112 , C03C23/007 , C03C2201/10 , C03C2201/12 , C03C2201/14 , C03C2203/52
Abstract: Annealing treatments for modified titania-silica glasses and the glasses produced by the annealing treatments. The annealing treatments include an isothermal hold that facilitates equalization of non-uniformities in fictive temperature caused by non-uniformities in modifier concentration in the glasses. The annealing treatments may also include heating the glass to a higher temperature following the isothermal hold and holding the glass at that temperature for several hours. Glasses produced by the annealing treatments exhibit high spatial uniformity of CTE, CTE slope, and fictive temperature, including in the presence of a spatially non-uniform concentration of modifier.
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公开(公告)号：US20160168010A1
公开(公告)日：2016-06-16
申请号：US14958024
申请日：2015-12-03
Applicant: Corning Incorporated
Inventor： Sezhian Annamalai , Carlos Alberto Duran , Kenneth Edward Hrdina
CPC classification number: C03C3/06 , C03B19/1453 , C03B19/1461 , C03B25/02 , C03B2201/07 , C03B2201/075 , C03B2201/12 , C03B2201/14 , C03B2201/23 , C03B2201/32 , C03B2201/40 , C03B2201/42 , C03B2201/50 , C03B2201/54 , C03C3/112 , C03C4/00 , C03C2201/12 , C03C2201/14 , C03C2201/32 , C03C2201/40 , C03C2201/42 , C03C2201/50 , C03C2201/54 , C03C2203/52
Abstract: A doped silica-titania glass article is provided that includes a glass article having a glass composition comprising (i) a silica-titania base glass, (ii) a fluorine dopant, and (iii) a second dopant. The fluorine dopant has a concentration of fluorine of up to 5 wt. % and the second dopant comprises one or more oxides selected from the group consisting of Al, Nb, Ta, B, Na, K, Mg, Ca and Li oxides at a total oxide concentration from 50 ppm to 6 wt. %. Further, the glass article has an expansivity slope of less than 0.5 ppb/K2 at 20° C. The second dopant can be optional. The composition of the glass article may also contain an OH concentration of less than 100 ppm.
Abstract translation: 提供掺杂二氧化硅 - 二氧化钛玻璃制品，其包括具有玻璃组合物的玻璃制品，所述玻璃组合物包含（i）二氧化硅 - 二氧化钛基底玻璃，（ii）氟掺杂剂和（iii）第二掺杂剂。 氟掺杂剂的氟浓度高达5wt。 ％，第二掺杂剂包含一种或多种选自Al，Nb，Ta，B，Na，K，Mg，Ca和Li氧化物的氧化物，其总氧化物浓度为50ppm至6wt。 ％。 此外，玻璃制品在20℃下具有小于0.5ppb / K 2的膨胀斜率。第二掺杂剂可以是任选的。 玻璃制品的组成也可以含有小于100ppm的OH浓度。
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Patent Agency Ranking
16.发明申请DOPED SILICA-TITANIA GLASS HAVING LOW EXPANSIVITY AND METHODS OF MAKING THE SAME 有权具有低膨胀性的二氧化硅 - 钛酸钠玻璃及其制造方法公开(公告)号：US20160145147A1
公开(公告)日：2016-05-26
申请号：US14950374
申请日：2015-11-24
Applicant: CORNING INCORPORATED
Inventor： Sezhian Annamalai , Carlos Alberto Duran , Kenneth Edward Hrdina , Lisa Anne Moore
CPC classification number: C03C3/112 , C03B5/225 , C03B19/02 , C03B25/00 , C03B25/02 , C03B2201/10 , C03B2201/12 , C03B2201/14 , C03B2201/42 , C03C3/06 , C03C3/089 , C03C3/115 , C03C21/007 , C03C23/007 , C03C2201/10 , C03C2201/12 , C03C2201/14 , C03C2201/23 , C03C2201/30 , C03C2201/42 , C03C2203/10 , C03C2203/54 , G03F1/22
Abstract: A method of forming a doped silica-titania glass is provided. The method includes blending batch materials comprising silica, titania, and at least one dopant. The method also includes heating the batch materials to form a glass melt. The method further includes consolidating the glass melt to form a glass article, and annealing the glass article.
Abstract translation: 提供了形成掺杂二氧化硅 - 二氧化钛玻璃的方法。 该方法包括混合包含二氧化硅，二氧化钛和至少一种掺杂剂的批料。 该方法还包括加热批料以形成玻璃熔体。 该方法还包括固化玻璃熔体以形成玻璃制品，并对玻璃制品进行退火。
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公开(公告)号：US08012653B2
公开(公告)日：2011-09-06
申请号：US12490833
申请日：2009-06-24
Applicant: Akio Koike , Ken Ebihara
Inventor： Akio Koike , Ken Ebihara
IPC: G03F1/00
CPC classification number: G03F1/24 , B82Y10/00 , B82Y40/00 , C03B19/1415 , C03B19/1453 , C03B19/1469 , C03B19/1492 , C03B2201/21 , C03B2201/42 , C03C3/06 , C03C2201/14 , C03C2201/21 , C03C2201/23 , C03C2201/42 , Y02P40/57
Abstract: A substrate that is suitable for an EUV mask or an EUV mask blank and excellent in flatness, is provided.A substrate for an EUV mask blank, which is made of a silica glass containing from 1 to 12 mass % of TiO2, wherein the surface roughness (rms) in a surface quality area of the substrate is at most 2 nm, and the maximum variation (PV) of the stress in the surface quality area of the substrate is at most 0.2 MPa.
Abstract translation: 提供了适用于EUV掩模或EUV掩模坯料并且具有优异的平面度的基板。 由含有1〜12质量％的TiO 2的二氧化硅玻璃构成的EUV掩模坯的基板，其中，所述基板的表面质量区域的表面粗糙度（rms）为2nm以下，最大变化量 基板的表面质量区域的应力的最大值（PV）为0.2MPa以下。
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公开(公告)号：US20190248696A1
公开(公告)日：2019-08-15
申请号：US16390139
申请日：2019-04-22
Applicant: Corning Incorporated
IPC: C03C3/076 , C03C3/06 , C03C3/112 , C03B19/12 , C03C3/089 , C03C23/00 , C03B19/14 , C03B25/00 , C03B25/02
CPC classification number: C03C3/076 , C03B19/12 , C03B19/1453 , C03B25/00 , C03B25/02 , C03B2201/10 , C03B2201/12 , C03B2201/42 , C03C3/06 , C03C3/089 , C03C3/112 , C03C23/007 , C03C2201/10 , C03C2201/12 , C03C2201/14 , C03C2203/52
Abstract: Annealing treatments for modified titania-silica glasses and the glasses produced by the annealing treatments. The annealing treatments include an isothermal hold that facilitates equalization of non-uniformities in fictive temperature caused by non-uniformities in modifier concentration in the glasses. The annealing treatments may also include heating the glass to a higher temperature following the isothermal hold and holding the glass at that temperature for several hours. Glasses produced by the annealing treatments exhibit high spatial uniformity of CTE, CTE slope, and fictive temperature, including in the presence of a spatially non-uniform concentration of modifier.
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公开(公告)号：US09611169B2
公开(公告)日：2017-04-04
申请号：US14958024
申请日：2015-12-03
Applicant: Corning Incorporated
Inventor： Sezhian Annamalai , Carlos Alberto Duran , Kenneth Edward Hrdina
CPC classification number: C03C3/06 , C03B19/1453 , C03B19/1461 , C03B25/02 , C03B2201/07 , C03B2201/075 , C03B2201/12 , C03B2201/14 , C03B2201/23 , C03B2201/32 , C03B2201/40 , C03B2201/42 , C03B2201/50 , C03B2201/54 , C03C3/112 , C03C4/00 , C03C2201/12 , C03C2201/14 , C03C2201/32 , C03C2201/40 , C03C2201/42 , C03C2201/50 , C03C2201/54 , C03C2203/52
Abstract: A doped silica-titania glass article is provided that includes a glass article having a glass composition comprising (i) a silica-titania base glass, (ii) a fluorine dopant, and (iii) a second dopant. The fluorine dopant has a concentration of fluorine of up to 5 wt. % and the second dopant comprises one or more oxides selected from the group consisting of Al, Nb, Ta, B, Na, K, Mg, Ca and Li oxides at a total oxide concentration from 50 ppm to 6 wt. %. Further, the glass article has an expansivity slope of less than 0.5 ppb/K2 at 20° C. The second dopant can be optional. The composition of the glass article may also contain an OH concentration of less than 100 ppm.
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公开(公告)号：US20160236965A1
公开(公告)日：2016-08-18
申请号：US15003115
申请日：2016-01-21
Applicant: Corning Incorporated
CPC classification number: C03C3/076 , C03B19/12 , C03B19/1453 , C03B25/00 , C03B25/02 , C03B2201/10 , C03B2201/12 , C03B2201/42 , C03C3/06 , C03C3/089 , C03C3/112 , C03C23/007 , C03C2201/10 , C03C2201/12 , C03C2201/14 , C03C2203/52
Abstract: Annealing treatments for modified titania-silica glasses and the glasses produced by the annealing treatments. The annealing treatments include an isothermal hold that facilitates equalization of non-uniformities in fictive temperature caused by non-uniformities in modifier concentration in the glasses. The annealing treatments may also include heating the glass to a higher temperature following the isothermal hold and holding the glass at that temperature for several hours. Glasses produced by the annealing treatments exhibit high spatial uniformity of CTE, CTE slope, and fictive temperature, including in the presence of a spatially non-uniform concentration of modifier.
Abstract translation: 改性二氧化钛 - 二氧化硅玻璃和通过退火处理制备的玻璃的退火处理。 退火处理包括促进由玻璃中改性剂浓度不均匀引起的虚构温度不均匀性均衡的等温保持。 退火处理还可以包括在等温保持之后将玻璃加热到更高的温度，并将玻璃保持在该温度下几个小时。 通过退火处理产生的玻璃表现出CTE，CTE斜率和假想温度的高空间均匀性，包括在存在空间不均匀的改性剂浓度的情况下。
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