公开(公告)号：US07348567B1

公开(公告)日：2008-03-25

申请号：US11545975

申请日：2006-10-10

Applicant: Pieter Kruit

Inventor： Pieter Kruit

IPC: H01J37/04

CPC classification number: H01J3/07 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/063 ,  H01J37/12 ,  H01J37/153 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2237/1205 ,  H01J2237/151 ,  H01J2237/1536 ,  H01J2237/26 ,  H01J2237/31774

Abstract: The invention relates to an apparatus for generating a plurality of charged particle beamlets, comprising a charged particle source for generating a diverging charged particle beam, a converging means for refracting said diverging charged particle beam and a lens array comprising a plurality of lenses, wherein said lens array is located between said charged particle source and said converging means.In this way, it is possible to reduce aberrations of the converging means.

Abstract translation: 本发明涉及一种用于产生多个带电粒子束的装置，包括用于产生发散带电粒子束的带电粒子源，用于折射所述发散带电粒子束的会聚装置和包括多个透镜的透镜阵列，其中所述 透镜阵列位于所述带电粒子源和所述会聚装置之间。 以这种方式，可以减小会聚装置的像差。

公开(公告)号：US20070029509A1

公开(公告)日：2007-02-08

申请号：US11545976

申请日：2006-10-10

Applicant: Pieter Kruit

Inventor： Pieter Kruit

IPC: G21K5/10

CPC classification number: H01J3/07 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/063 ,  H01J37/12 ,  H01J37/153 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2237/1205 ,  H01J2237/151 ,  H01J2237/1536 ,  H01J2237/26 ,  H01J2237/31774

Abstract: The invention relates to an apparatus for generating a plurality of charged particle beamlets, comprising a charged particle source for generating a diverging charged particle beam, a converging means for refracting said diverging charged particle beam and a lens array comprising a plurality of lenses, wherein said lens array is located between said charged particle source and said converging means. In this way, it is possible to reduce aberrations of the converging means.

Abstract translation: 本发明涉及一种用于产生多个带电粒子束的装置，包括用于产生发散带电粒子束的带电粒子源，用于折射所述发散带电粒子束的会聚装置和包括多个透镜的透镜阵列，其中所述 透镜阵列位于所述带电粒子源和所述会聚装置之间。 以这种方式，可以减小会聚装置的像差。

公开(公告)号：US20070018112A1

公开(公告)日：2007-01-25

申请号：US11527206

申请日：2006-09-25

Applicant: Pieter Kruit

Inventor： Pieter Kruit

IPC: H01J3/14 ,  G21K1/08

CPC classification number: H01J3/07 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/063 ,  H01J37/12 ,  H01J37/153 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2237/1205 ,  H01J2237/151 ,  H01J2237/1536 ,  H01J2237/26 ,  H01J2237/31774

Abstract: The invention relates to an apparatus for generating a plurality of charged particle beamlets, comprising a charged particle source for generating a diverging charged particle beam, a converging means for refracting said diverging charged particle beam and a lens array comprising a plurality of lenses, wherein said lens array is located between said charged particle source and said converging means. In this way, it is possible to reduce aberrations of the converging means.

公开(公告)号：US07569833B2

公开(公告)日：2009-08-04

申请号：US11545976

申请日：2006-10-10

Applicant: Pieter Kruit

Inventor： Pieter Kruit

IPC: H01J37/147

CPC classification number: H01J3/07 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/063 ,  H01J37/12 ,  H01J37/153 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2237/1205 ,  H01J2237/151 ,  H01J2237/1536 ,  H01J2237/26 ,  H01J2237/31774

Abstract: The invention relates to an apparatus for generating a plurality of charged particle beamlets, comprising a charged particle source for generating a diverging charged particle beam, a converging means for refracting said diverging charged particle beam and a lens array comprising a plurality of lenses, wherein said lens array is located between said charged particle source and said converging means.In this way, it is possible to reduce aberrations of the converging means.

Abstract translation: 本发明涉及一种用于产生多个带电粒子束的装置，包括用于产生发散带电粒子束的带电粒子源，用于折射所述发散带电粒子束的会聚装置和包括多个透镜的透镜阵列，其中所述 透镜阵列位于所述带电粒子源和所述会聚装置之间。 以这种方式，可以减小会聚装置的像差。

公开(公告)号：US07391037B2

公开(公告)日：2008-06-24

申请号：US11544980

申请日：2006-10-06

Applicant: Pieter Kruit

Inventor： Pieter Kruit

IPC: H01J37/317 ,  H01J37/147 ,  H01J37/26

CPC classification number: H01J3/07 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/063 ,  H01J37/12 ,  H01J37/153 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2237/1205 ,  H01J2237/151 ,  H01J2237/1536 ,  H01J2237/26 ,  H01J2237/31774

Abstract: The invention relates to an apparatus for generating a plurality of charged particle beamlets, comprising a charged particle source for generating a diverging charged particle beam, a converging means for refracting said diverging charged particle beam and a lens array comprising a plurality of lenses, wherein said lens array is located between said charged particle source and said converging means.In this way, it is possible to reduce aberrations of the converging means.

公开(公告)号：US07365338B2

公开(公告)日：2008-04-29

申请号：US11527206

申请日：2006-09-25

Applicant: Pieter Kruit

Inventor： Pieter Kruit

IPC: H01J37/04

CPC classification number: H01J3/07 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/063 ,  H01J37/12 ,  H01J37/153 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2237/1205 ,  H01J2237/151 ,  H01J2237/1536 ,  H01J2237/26 ,  H01J2237/31774

Abstract: The invention relates to an apparatus for generating a plurality of charged particle beamlets, comprising a charged particle source for generating a diverging charged particle beam, a converging means for refracting said diverging charged particle beam and a lens array comprising a plurality of lenses, wherein said lens array is located between said charged particle source and said converging means.In this way, it is possible to reduce aberrations of the converging means.

公开(公告)号：US20070029499A1

公开(公告)日：2007-02-08

申请号：US11544980

申请日：2006-10-06

Applicant: Pieter Kruit

Inventor： Pieter Kruit

IPC: H01J3/14

CPC classification number: H01J3/07 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/063 ,  H01J37/12 ,  H01J37/153 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2237/1205 ,  H01J2237/151 ,  H01J2237/1536 ,  H01J2237/26 ,  H01J2237/31774

Abstract: The invention relates to an apparatus for generating a plurality of charged particle beamlets, comprising a charged particle source for generating a diverging charged particle beam, a converging means for refracting said diverging charged particle beam and a lens array comprising a plurality of lenses, wherein said lens array is located between said charged particle source and said converging means. In this way, it is possible to reduce aberrations of the converging means.

公开(公告)号：JP4484868B2

公开(公告)日：2010-06-16

申请号：JP2006507851

申请日：2004-03-10

Applicant: マッパー・リソグラフィー・アイピー・ビー.ブイ.

Inventor： クルイト、ピーター

IPC: H01J37/09 ,  G03F7/20 ,  G09G20060101 ,  H01J3/02 ,  H01J3/07 ,  H01J3/14 ,  H01J3/26 ,  H01J37/06 ,  H01J37/063 ,  H01J37/12 ,  H01J37/147 ,  H01J37/305 ,  H01J37/317 ,  H01L21/027

CPC classification number: H01J3/07 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/063 ,  H01J37/12 ,  H01J37/153 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2237/1205 ,  H01J2237/151 ,  H01J2237/1536 ,  H01J2237/26 ,  H01J2237/31774

公开(公告)号：JP2006520078A

公开(公告)日：2006-08-31

申请号：JP2006507851

申请日：2004-03-10

Applicant: マッパー・リソグラフィー・アイピー・ビー.ブイ.

Inventor： クルイト、ピーター

IPC: H01J37/12 ,  G03F7/20 ,  G09G20060101 ,  H01J3/02 ,  H01J3/07 ,  H01J3/14 ,  H01J3/26 ,  H01J37/06 ,  H01J37/063 ,  H01J37/09 ,  H01J37/147 ,  H01J37/305 ,  H01J37/317 ,  H01L21/027

CPC classification number: H01J3/07 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/063 ,  H01J37/12 ,  H01J37/153 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2237/1205 ,  H01J2237/151 ,  H01J2237/1536 ,  H01J2237/26 ,  H01J2237/31774

Abstract: 本発明は、発散する荷電粒子ビームを発生させるための荷電粒子源と、この発散する荷電粒子ビームを屈折させるための集束手段と、複数のレンズを有するレンズアレイとを具備し、このレンズアレイは、前記荷電粒子源と、前記集束手段との間に位置されている複数の荷電粒子小ビームを発生させるための装置に関する。 このようにして、前記集束手段の収差を減少させることが可能である。

公开(公告)号：WO2004081910A3

公开(公告)日：2005-03-31

申请号：PCT/NL2004000174

申请日：2004-03-10

Applicant: MAPPER LITHOGRAPHY IP BV ,  KRUIT PIETER

Inventor： KRUIT PIETER

IPC: G09G20060101 ,  H01J3/02 ,  H01J3/07 ,  H01J3/14 ,  H01J3/26 ,  H01J37/063 ,  H01J37/317

CPC classification number: H01J3/07 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/063 ,  H01J37/12 ,  H01J37/153 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2237/1205 ,  H01J2237/151 ,  H01J2237/1536 ,  H01J2237/26 ,  H01J2237/31774

Abstract: The invention relates to an apparatus for generating a plurality of charged particle beamlets, comprising a charged particle source for generating a diverging charged particle beam, a converging means for refracting said diverging charged particle beam and a lens array comprising a plurality of lenses, wherein said lens array is located between said charged particle source and said converging means. In this way, it is possible to reduce aberrations of the converging means.

Abstract translation: 本发明涉及一种用于产生多个带电粒子束的装置，包括用于产生发散带电粒子束的带电粒子源，用于折射所述发散带电粒子束的会聚装置和包括多个透镜的透镜阵列，其中所述 透镜阵列位于所述带电粒子源和所述会聚装置之间。 以这种方式，可以减小会聚装置的像差。