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    METHOD FOR MAKING PATTERNS ON THE SURFACE OF A SUBSTRATE USING BLOCK COPOLYMERS
    191.
    发明申请
    METHOD FOR MAKING PATTERNS ON THE SURFACE OF A SUBSTRATE USING BLOCK COPOLYMERS 有权
    使用嵌段共聚物在基材表面上形成图案的方法

    公开(公告)号：US20140193580A1

    公开(公告)日：2014-07-10

    申请号：US14122576

    申请日：2012-05-18

    Applicant: Raluca Tiron ,  Stéphanie Gaugiran ,  Xavier Chevalier ,  Serge Tedesco

    Inventor： Raluca Tiron ,  Stéphanie Gaugiran ,  Xavier Chevalier ,  Serge Tedesco

    IPC: B05D5/00

    CPC classification number: B05D5/00 ,  B81C1/00031 ,  B81C2201/0149 ,  B81C2201/0159 ,  H01L21/0273 ,  H01L21/0337

    Abstract: A method for making patterns on the surface of a substrate by graphoepitaxy, includes depositing a layer of resin on the surface of the substrate; making patterns in the resin on the surface of a substrate; curing the patterns in the resin by producing a layer of amorphous carbon on the surface of the patterns in the resin; depositing a layer of statistical copolymer after curing the patterns in the resin; grafting the layer of statistical copolymer onto the patterns in the resin by annealing; and depositing a layer of a block copolymer into the spaces defined by the patterns in the resin after curing the patterns and the grafting of the layer of statistical copolymer.

    Abstract translation: 一种用于通过石刻电泳法在衬底表面上制作图案的方法，包括在衬底的表面上沉积一层树脂; 在基板表面上的树脂中形成图案; 通过在树脂中的图案的表面上产生无定形碳层来固化树脂中的图案; 在固化树脂中的图案之后沉积一层统计共聚物; 通过退火将统计共聚物层接枝到树脂上的图案上; 以及在固化图案和统计共聚物层的接枝之后，将一层嵌段共聚物沉积在由树脂中的图案限定的空间中。

    Electron Beam Processing With Condensed Ice
    192.
    发明申请
    Electron Beam Processing With Condensed Ice 有权
    冷凝电子束加工

    公开(公告)号：US20130288182A1

    公开(公告)日：2013-10-31

    申请号：US13881504

    申请日：2011-10-26

    Applicant: Daniel Branton ,  Anpan Han ,  Jene A. Golovchenko

    Inventor： Daniel Branton ,  Anpan Han ,  Jene A. Golovchenko

    IPC: G03F7/20

    CPC classification number: G03F7/2059 ,  B81C1/00531 ,  B81C2201/0143 ,  B81C2201/0159 ,  B82Y10/00 ,  B82Y40/00 ,  G01N23/2251 ,  H01J37/3174 ,  H01J2237/004 ,  H01J2237/022 ,  H01J2237/2002 ,  H01J2237/2803 ,  H01J2237/2809 ,  H01J2237/31796 ,  H01L21/0331 ,  H01L22/12 ,  H01L51/0014 ,  H01L51/0048

    Abstract: In a method for imaging a solid state substrate, a vapor is condensed to an amorphous solid water condensate layer on a surface of a solid state substrate. Then an image of at least a portion of the substrate surface is produced by scanning an electron beam along the substrate surface through the water condensate layer. The water condensate layer integrity is maintained during electron beam scanning to prevent electron-beam contamination from reaching the substrate during electron beam scanning. Then one or more regions of the layer can be locally removed by directing an electron beam at the regions. A material layer can be deposited on top of the water condensate layer and any substrate surface exposed at the one or more regions, and the water condensate layer and regions of the material layer on top of the layer can be removed, leaving a patterned material layer on the substrate.

    Abstract translation: 在固态基板成像方法中，将蒸气冷凝成固态基板表面的无定形固体水凝结物层。 然后通过沿着衬底表面扫描电子束通过水凝结层产生衬底表面的至少一部分的图像。 在电子束扫描期间维持水凝结层的完整性，以防止电子束扫描期间电子束污染到达衬底。 然后可以通过在该区域处引导电子束来局部地去除该层的一个或多个区域。 材料层可以沉积在水冷凝物层的顶部和在一个或多个区域暴露的任何基底表面，并且水凝结物层和该层顶部上的材料层的区域可以被去除，留下图案化的材料层 在基板上。

    FLUDIC CHANNEL SYSTEM AND METHOD FOR FABRICATING FINE STRUCTURE
    193.
    发明申请
    FLUDIC CHANNEL SYSTEM AND METHOD FOR FABRICATING FINE STRUCTURE 审中-公开
    用于制作精细结构的流体通道系统和方法

    公开(公告)号：US20130207315A1

    公开(公告)日：2013-08-15

    申请号：US13800428

    申请日：2013-03-13

    Applicant: SNU R&DB FOUNDATION

    Inventor： Sunghoon KWON ,  Ji Yun KIM ,  Wook PARK ,  Hyun Sung PARK ,  Seung Ah LEE ,  Su Eun CHUNG

    IPC: B29C39/22

    CPC classification number: B29C39/22 ,  B81C99/0095 ,  B81C2201/0159 ,  G03F7/2035

    Abstract: A fluidic channel system is provided. The fluidic channel system includes a light projection apparatus, a fluidic channel, and a rail. The light projection apparatus provides light. A photocurable fluid, which is selectively cured by the light, flows inside the fluidic channel. A fine structure which is to be formed by curing the photocurable fluid moves along the rail.

    Abstract translation: 提供流体通道系统。 流体通道系统包括光投射装置，流体通道和轨道。 光投射装置提供光。 由光选择性固化的光固化流体在流体通道内流动。 通过固化可光固化流体而形成的精细结构沿轨道移动。

    METHOD TO FABRICATE A MOULD FOR LITHOGRAPHY BY NANO-IMPRINTING
    199.
    发明申请
    METHOD TO FABRICATE A MOULD FOR LITHOGRAPHY BY NANO-IMPRINTING 有权
    用于通过纳米压印来雕刻模具的方法

    公开(公告)号：US20100227018A1

    公开(公告)日：2010-09-09

    申请号：US12715801

    申请日：2010-03-02

    Applicant: Stèfan LANDIS

    Inventor： Stèfan LANDIS

    IPC: C23F1/00 ,  B29C59/02

    CPC classification number: G03F7/2059 ,  B81C99/009 ,  B81C2201/0159 ,  B81C2201/034 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  G03F7/0017

    Abstract: The invention concerns a device forming an imprint mould in three dimensions and comprising at least: a substrate, comprising at least one alternation of layers having at least one part perpendicular to the plane of the substrate, in a first type of material and a second type of material which can be etched selectively relative to each other, a surface topology comprising at least: a) first patterns whose top lies at a first level relative to a surface of the substrate located either side of said topology, these first patterns being in a first type of material, b) and second patterns having at least a second level relative to said surface of the substrate, different from and lower than the first level, and these second patterns being in a second type of material.

    Abstract translation: 本发明涉及一种在三维上形成压印模具的装置，其至少包括：基底，其包括至少一个具有垂直于基底的平面的部分的至少一部分的交替层，第一类型的材料和第二类型 可以相对于彼此选择性蚀刻的材料，表面拓扑结构至少包括：a）第一图案，其顶部相对于位于所​​述拓扑结构的任一侧的所述衬底的表面处于第一水平，所述第一图案位于 第一类型的材料，b）和具有相对于衬底的所述表面至少第二级别的第二图案，不同于和低于第一层级，并且这些第二图案是第二类型的材料。

    Integrated Encapsulation for MEMS Devices
    200.
    发明申请
    Integrated Encapsulation for MEMS Devices 审中-公开
    MEMS器件的集成封装

    公开(公告)号：US20100221463A1

    公开(公告)日：2010-09-02

    申请号：US12607415

    申请日：2009-10-28

    Applicant: Imed Zine-El-Abidine ,  Michael Okoniewski

    Inventor： Imed Zine-El-Abidine ,  Michael Okoniewski

    IPC: G03F7/20 ,  B32B1/00

    CPC classification number: B81C1/00333 ,  B81C2201/0159 ,  B81C2203/0136 ,  B81C2203/0154 ,  Y10T428/13

    Abstract: In one general aspect, methods and articles of manufacture for creating micro-structures are disclosed. In one embodiment, the micro-structures are configured to provide a desired level of hermiticity to other micro-sized devices, such as MEMS and microfluidic devices. In one embodiment, the microstructures are formed from a single species of photoresist, where the photoresist is lithographically patterned to encapsulate the micro-sized device. In general, the ability to form an encapsulating micro-structure from a single photoresist relies in part on applying variable light doses to a later of photoresist to affect a desired level of cross-linking within the photoresist.

    Abstract translation: 在一般的方面，公开了用于产生微结构的方法和制品。 在一个实施例中，微结构被配置为向其他微尺寸装置（例如MEMS和微流体装置）提供期望水平的隐性。 在一个实施例中，微结构由单一光致抗蚀剂形成，其中光刻胶被光刻图案化以封装微尺寸的器件。 通常，从单一光致抗蚀剂形成封装微结构的能力部分地依赖于将可变光剂量应用于稍后的光致抗蚀剂以影响光致抗蚀剂内期望的交联水平。

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