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    METHOD OF MANUFACTURING OPTICAL FIBER PREFORM USING MODIFIED CHEMICAL VAPOR DEPOSITION INCLUDING DEHYDRATION AND DECHLORINATION PROCESS AND OPTICAL FIBER MANUFACTURED BY THE METHOD
    192.
    发明申请
    METHOD OF MANUFACTURING OPTICAL FIBER PREFORM USING MODIFIED CHEMICAL VAPOR DEPOSITION INCLUDING DEHYDRATION AND DECHLORINATION PROCESS AND OPTICAL FIBER MANUFACTURED BY THE METHOD 审中-公开
    使用改性化学蒸气沉积物制造光纤预制件的方法，包括脱水和脱漆工艺以及由该方法制造的光纤

    公开(公告)号：WO2004018374A1

    公开(公告)日：2004-03-04

    申请号：PCT/KR2003/001678

    申请日：2003-08-20

    Applicant: LG CABLE LTD. ,  JANG, Ki-Wan ,  PARK, Lae-Hyuk ,  LEE, Chan-Joo

    Inventor： JANG, Ki-Wan ,  PARK, Lae-Hyuk ,  LEE, Chan-Joo

    IPC: C03B37/018

    CPC classification number: C03B37/01853 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/28 ,  C03B2201/31 ,  G02B6/02

    Abstract: Disclosed is a method of manufacturing an optical fiber perform using MCVD including dehydration and dechlorination, which executes the following process repeatedly with changing the composition of soot generation gas according to the refractive index profile, the process including the steps of: forming a soot layer having pores on an inner wall of a deposition tube at a temperature lower than the soot sintering temperature with putting soot generation gas and oxygen gas into the rotating deposition tube; removing hydroxyl groups with keeping the pores by putting dehydration gas into the deposition tube; removing chlorine impurities existing in the soot layer with keeping the pores by putting dehydration gas into the deposition tube; and sintering the soot layer by heating the deposition tube at a temperature over the soot sintering temperature.

    Abstract translation: 本发明公开了一种使用包括脱水和脱氯在内的MCVD进行的光纤的制造方法，其通过根据折射率分布改变烟灰发生气体的组成而重复地执行以下处理，该方法包括以下步骤：形成具有 在低于烟灰烧结温度的温度下在沉积管的内壁上的孔，将烟灰产生气体和氧气放入旋转沉积管中; 通过将脱水气体放入沉积管中，保持孔隙去除羟基; 通过将脱水气体放入沉积管中来除去存在于烟灰层中的氯杂质，同时保持孔; 并且通过在超过烟灰烧结温度的温度下加热沉积管来烧结烟灰层。

    石英ガラス部材及び投影露光装置
    193.
    发明申请
    石英ガラス部材及び投影露光装置 审中-公开
    QUARTZ玻璃成员和投影对准器

    公开(公告)号：WO2002085808A1

    公开(公告)日：2002-10-31

    申请号：PCT/JP2002/003951

    申请日：2002-04-19

    Applicant: 株式会社ニコン ,  小峰 典男 ,  吉田 明子 ,  神保 宏樹 ,  藤原 誠志

    Inventor： 小峰 典男 ,  吉田 明子 ,  神保 宏樹 ,  藤原 誠志

    IPC: C03C3/06

    CPC classification number: C03C4/0071 ,  C03B19/1423 ,  C03B19/1453 ,  C03B19/1492 ,  C03B2201/07 ,  C03B2201/21 ,  C03B2201/23 ,  C03B2207/00 ,  C03C3/06 ,  C03C2201/11 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2203/40 ,  C03C2203/44 ,  C03C2203/46 ,  C03C2203/52 ,  C03C2203/54 ,  G02B1/02 ,  G02B13/143 ,  G03F7/70241 ,  G03F7/70958

    Abstract: A quartz glass member, wherein when the composition thereof is represented by SiOx, x takes a value of 1.85 to 1.95, the concentration of hydrogen molecules contained therein is 1 X 10 molecules/cm to 5 X 10 molecules/cm , and the value of (A-B) is 0.002 cm or less, where A represents the absorption coefficient observed immediately before the termination of irradiation when the irradiation of ArF excimer laser light is carried out in 1 X 10 pulses at one pulse energy density of 2 mJ/cm and B represents a second absorption coefficient observed 600 seconds after the stop of the above ArF excimer laser light irradiation. The use of the quartz glass member in optical systems for illumination and projection in a projection aligner allows the reduction of variation in the illuminance in an exposure region on a reticle plane or a wafer, which leads to a uniform exposure.

    Abstract translation: 石英玻璃构件，当其组成由SiO x表示时，x取1.85〜1.95的值，其中所含的氢分子的浓度为1×10 16分子/ cm 3〜5×10 18 >分子/ cm 3，（AB）的值为0.002cm -1以下，其中A表示在ArF准分子激光的照射下进行照射结束之前观察到的吸收系数 1×10 4脉冲，脉冲能量密度为2mJ / cm 2，B表示在停止上述ArF准分子激光照射后600秒观察到的第二吸收系数。 在投影对准器中用于照明和投影的光学系统中使用石英玻璃构件允许减少在掩模版平面或晶片上的曝光区域中的照度的变化，这导致均匀的曝光。

    SYNTHETIC QUARTZ GLASS OPTICAL MATERIAL AND OPTICAL MEMBER FOR F2 EXCIMER LASERS
    194.
    发明申请
    SYNTHETIC QUARTZ GLASS OPTICAL MATERIAL AND OPTICAL MEMBER FOR F2 EXCIMER LASERS 审中-公开
    F2 EXCIMER激光器的合成石英玻璃光学材料和光学部件

    公开(公告)号：WO01092175A1

    公开(公告)日：2001-12-06

    申请号：PCT/EP2001/006061

    申请日：2001-05-28

    IPC: G02B1/00 ,  C03B19/14 ,  C03B20/00 ,  C03C3/06 ,  C03C4/00 ,  H01L21/027

    CPC classification number: C03B19/1453 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/21 ,  C03B2207/32 ,  C03C3/06 ,  C03C4/0085 ,  C03C2201/12 ,  C03C2201/21 ,  C03C2203/54 ,  Y02P40/57

    Abstract: An object of the present invention is to provide a synthetic quartz glass optical material having a high optical transmittance for a radiation 157 nm in wavelength emitted from F2 excimer laser and a high resistance against irradiation of a F2 excimer laser radiation, yet having a uniformity suitable for such a fine pattenring using a F2 excimer laser, and to provide an optical member using the same. The problems above are solved by a synthetic quartz glass optical material for F2 excimer lasers having an OH group concentration of 0.5 ppm or lower, a fluorine concentration of 0.1 to 2 mol%, a hydrogen molecule concentration of 5 X 10 or lower, a difference between the maximum and minimum fluorine concentrations within 20 mol ppm, and a difference between the maximum and minimum refraction indices of 2 X 10 or lower.

    Abstract translation: 本发明的目的是提供一种合成石英玻璃光学材料，其对于从F2准分子激光器发射的波长为157nm的辐射具有高的透光率，并且对F2受激准分子激光辐射的照射具有高的抗性，但具有适合的均匀性 对于使用F2准分子激光器的这种精细的图案，并提供使用其的光学构件。 上述问题通过具有OH基浓度为0.5ppm以下，氟浓度为0.1〜2mol％，氢分子浓度为5×10 <16λ的F2准分子激光的合成石英玻璃光学材料来解决。 分子/ cm 3以下，最大和最小氟浓度之间的差异在20摩尔ppm以内，最大和最小折射率之间的差异为2×10 -5以下。

    PROJECTION LITHOGRAPHY PHOTOMASK BLANKS, PREFORMS AND METHOD OF MAKING
    195.
    发明申请
    PROJECTION LITHOGRAPHY PHOTOMASK BLANKS, PREFORMS AND METHOD OF MAKING 审中-公开
    投影光刻胶片，预制件和制作方法

    公开(公告)号：WO00055689A1

    公开(公告)日：2000-09-21

    申请号：PCT/US2000/003588

    申请日：2000-02-11

    IPC: C03B19/14 ,  C03B20/00 ,  C03C3/06 ,  C03C4/00 ,  G03F1/00 ,  G03F7/20 ,  G03F1/14

    CPC classification number: C03C4/0085 ,  C03B19/1415 ,  C03B19/1423 ,  C03B19/1453 ,  C03B19/1469 ,  C03B19/1492 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/21 ,  C03B2207/02 ,  C03B2207/06 ,  C03B2207/20 ,  C03B2207/32 ,  C03B2207/52 ,  C03B2207/54 ,  C03B2207/66 ,  C03C3/06 ,  C03C2201/12 ,  C03C2201/21 ,  G03F1/60

    Abstract: The invention includes methods of making lithography photomask blanks. The invention also includes lithography photomask blanks and preforms for producing lithography photomask. The method of making a lithography photomask blank includes providing a soot deposition surface, producing SiO2 soot particles and projecting the SiO2 soot particles toward the soot deposition surface. The method includes successively depositing layers of the SiO2 soot particle on the deposition surface to form a coherent SiO2 porous glass preform body comprised of successive layers of the SiO2 soot particles and dehydrating the coherent SiO2 glass preform body to remove OH from the preform body. The SiO2 is exposed to and reacted with a fluorine containing compound and consolidated into a nonporous silicon oxyfluoride glass body with parallel layers of striae. The method further includes forming the consolidated silicon oxyfluoride glass body into a photomask blank having a planar surface with the orientation of the striae layer parallel to the photomask blank planar surface.

    Abstract translation: 本发明包括制造光刻光掩模坯料的方法。 本发明还包括光刻光掩模坯料和用于生产光刻光掩模的预成型件。 制造光刻光掩模坯料的方法包括提供烟灰沉积表面，产生SiO 2烟灰颗粒并将SiO 2烟灰颗粒投射到烟灰沉积表面。 该方法包括在沉积表面上依次沉积SiO 2烟灰颗粒层，以形成由SiO 2烟灰颗粒的连续层组成的粘结SiO 2多孔玻璃预制体，并使相干的SiO 2玻璃预制体脱水以从预成型体中去除OH。 将SiO 2暴露于含氟化合物并与其反应，并固化成具有平行的条纹层的无孔氟硅氧化物玻璃体。 该方法还包括将固化的氟氧化硅玻璃体形成为具有平坦表面的光掩模坯料，其中条纹层的取向平行于光掩模坯料平面。

    SYNTHETIC SILICA GLASS USED WITH UV-RAYS AND METHOD PRODUCING THE SAME
    197.
    发明申请
    SYNTHETIC SILICA GLASS USED WITH UV-RAYS AND METHOD PRODUCING THE SAME 审中-公开
    使用紫外线的合成二氧化硅玻璃及其制造方法

    公开(公告)号：WO98052879A1

    公开(公告)日：1998-11-26

    申请号：PCT/EP1998/002965

    申请日：1998-05-20

    IPC: C03B19/14 ,  C03B23/047 ,  C03B32/00 ,  C03C3/06 ,  C03C23/00 ,  G02B1/00

    CPC classification number: C03C3/06 ,  C03B19/1453 ,  C03B23/047 ,  C03B32/00 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/20 ,  C03B2201/21 ,  C03B2201/23 ,  C03B2207/32 ,  C03C2201/11 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2203/52

    Abstract: An object of the present invention is to provide a synthetic silica glass optical material which exhibits excellent transmittance as well as durability for high output power vacuum ultraviolet rays, being emitted from, for example, ArF excimer lasers and Xe2 excimer lamps, and to provide a method for producing the same. A synthetic silica glass optical material for high output power vacuum ultraviolet rays made from ultra high purity synthetic silica glass for use in the wavelength region of from 165 to 195 nm, containing OH groups at a concentration of from 5 to 300 wtppm with a fluctuation width in OH group concentration ( DELTA OH/cm) of 10 wtppm or less, containing hydrogen molecules at a concentration of from 1 x 10 to 1 x 10 molecule/cm with a fluctuation width in hydrogen molecule concentration ( DELTA H2/cm) of 1 x 10 molecule/cm or lower, and containing chlorine at a concentration of 50 wtppm or lower. Also claimed is a method for producing the same.

    Abstract translation: 本发明的目的是提供一种合成二氧化硅玻璃光学材料，其从例如ArF准分子激光器和Xe2准分子灯发射的高输出功率的真空紫外线具有优异的透射率和耐久性，并提供 其制造方法 一种用于高浓度合成石英玻璃的高输出功率真空紫外线的合成二氧化硅玻璃光学材料，用于波长范围为165至195nm的OH基，其浓度为5至300重量ppm，具有波动宽度 在OH分子浓度（DELTA OH / cm）为10重量ppm以下，含有浓度为1×10 17〜1×10 19分子/ cm 3的氢分子，氢分子的波动宽度 浓度（DELTA H2 / cm）为1×10 17分子/ cm 3以下，含有浓度为50重量ppm以下的氯。 还要求保护其的方法。

    실리카 용기 및 그 제조방법
    200.
    发明授权
    실리카 용기 및 그 제조방법 有权
    二氧化硅容器及其制造方法

    公开(公告)号：KR101313647B1

    公开(公告)日：2013-10-02

    申请号：KR1020117018621

    申请日：2010-06-25

    Applicant: 신에쯔 세끼에이 가부시키가이샤

    Inventor： 야마가타,시게루 ,  우스이,토모미

    IPC: C03B20/00 ,  C30B15/10 ,  C30B29/04

    CPC classification number: C03B19/095 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/32 ,  C30B15/10 ,  C30B29/06 ,  C30B35/002 ,  Y10T428/131 ,  Y10T428/1317 ,  Y10T428/2982

    Abstract: 본 발명은, 회전 대칭성을 갖는 실리카 기체를 구비해 이루어진 실리카 용기를 제조하는 방법으로서, 감압용 홀을 갖는 외측 몰드를 회전시키면서 외측 몰드의 내벽에 기체용 원료분말(실리카 입자)을 도입하고, 소정의 형상으로 가성형하는 공정, 제습에 의해 소정의 이슬점 온도 이하로 한, O
    2 가스와 불활성가스를 포함하는 혼합가스를, 가성형체의 내측에서 공급하고, 외측 몰드 내의 가스를 환기해, 외측 몰드 내에서의 습도를 조정하면서, 가성형체를 외주측에서 감압하면서, 탄소 전극에 의한 방전 가열 용융법에 따라 가성형체의 내측에서 가열함으로써, 가성형체의 외주 부분을 소결체로 함과 동시에, 내측 부분을 용융 유리체로 하고, 실리카 기체를 형성하는 공정을 포함하는 실리카 용기의 제조방법이다. 이에 의해, 고치수 정밀도를 갖고, 탄소 및 OH기의 함유량이 매우 적은 실리카 용기를, 실리카를 주성분으로 하는 분체를 주원료로 하여 저비용으로 제조할 수 있는 실리카 용기의 제조방법, 및 이 같은 실리카 용기가 제공된다.

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