公开(公告)号：WO2004043870A1

公开(公告)日：2004-05-27

申请号：PCT/KR2003/002209

申请日：2003-10-21

Applicant: LG CABLE LTD. ,  JANG, Ki-Wan ,  LEE, Chan-Joo ,  PARK, Ji-Sang ,  SON, Soon-Il ,  KWON, Young-Il

Inventor： JANG, Ki-Wan ,  LEE, Chan-Joo ,  PARK, Ji-Sang ,  SON, Soon-Il ,  KWON, Young-Il

IPC: C03B37/018

CPC classification number: C03B37/01228 ,  C03B37/01446 ,  C03B37/01853 ,  C03B2201/04 ,  C03B2201/075 ,  C03B2201/28 ,  C03B2201/31 ,  C03C25/6208 ,  C03C25/64

Abstract: A method for manufacturing an optical fiber preform including a dehydration process by photochemical reaction is provided. The method performs forming a clad and a core according to a predetermined refractive index profile by repeated deposition and sintering of soot particles by means of oxidation of soot generation gas, and a dehydration step for removing moisture and hydroxyl groups from a soot deposition region by means of photochemical reaction is executed between the deposition and sintering. The dehydration step activates dehydration gas into ionic or atomic state by irradiating light, in a wavelength range capable of inducing activation of the dehydration gas, from light source to the dehydration gas including chlorine and supplied to the soot deposition region, and then adsorbs the activated dehydration gas onto surface of the soot in order to induce dehydration reaction with moisture or hydroxyl groups.

Abstract translation: 提供了一种通过光化学反应制造包括脱水过程的光纤预制件的方法。 该方法通过烟灰发生气体的氧化反复沉积和烧结烟灰颗粒，根据预定的折射率分布形成包层和芯，以及通过手段从烟灰沉积区域除去水分和羟基的脱水步骤 在沉积和烧结之间进行光化学反应。 脱水步骤通过在能够引起脱水气体的激活的波长范围内从光源向包括氯的脱水气体照射光并将其供应到烟灰沉积区域，将脱水气体激活成离子或原子状态，然后吸附活化的 将烟气脱气到烟灰表面，以引起与水分或羟基的脱水反应。

公开(公告)号：WO2002090258A2

公开(公告)日：2002-11-14

申请号：PCT/US2002/010945

申请日：2002-04-04

Applicant: CORNING INCORPORATED

Inventor： TENNENT, David, L. ,  WHALEN, Joseph, M.

IPC: C01B33/18

CPC classification number: C03B37/01413 ,  C03B19/106 ,  C03B19/1415 ,  C03B2201/06 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/20 ,  C03B2207/30 ,  C03B2207/38

Abstract: A method for making silica includes delivering a silica precursor comprising a perfluorinated group to a conversion site and passing the silica precursor through a conversion flame to produce silica soot.

Abstract translation: 制备二氧化硅的方法包括将包含全氟化基团的二氧化硅前体输送到转化位点并使二氧化硅前体通过转化火焰以产生二氧化硅烟灰。

公开(公告)号：WO2002088035A1

公开(公告)日：2002-11-07

申请号：PCT/US2002/009189

申请日：2002-03-25

Applicant: CORNING INCORPORATED ,  HRDINA, Kenneth E ,  RUSSO, Nikki J ,  WASILEWSKI, Michael H

Inventor： HRDINA, Kenneth E ,  RUSSO, Nikki J ,  WASILEWSKI, Michael H

IPC: C03B8/04

CPC classification number: C03B19/1453 ,  C03B19/1407 ,  C03B19/1484 ,  C03B2201/04 ,  C03B2201/075 ,  C03B2201/42 ,  C03B2207/32

Abstract: A method for forming EUV Lithography large dimension homogeneous glass body is disclosed which includes delivering a silica precursor (28) to a burner (16) and passing the silica precursor (16) through the flame (36) of the burner (16) to form silica particles (38), depositing the silica particles (38) on a planar surface (14) to form a flat porous EUV Lithography large dimension preform (40) and consolidating the flat porous EUV Lithography large dimension preform (40) into a flat dense EUV Lithography large dimension homogeneous glass body.

Abstract translation: 公开了一种用于形成EUV平版印刷大尺寸均匀玻璃体的方法，其包括将二氧化硅前体（28）输送到燃烧器（16）并使二氧化硅前体（16）通过燃烧器（16）的火焰（36）形成 二氧化硅颗粒（38），将二氧化硅颗粒（38）沉积在平坦表面（14）上以形成平坦多孔EUV平版印刷大尺寸预制件（40），并将平面多孔EUV平版印刷大尺寸预成型件（40）固结成扁平密度 EUV平版印刷大尺寸均匀玻璃体。

公开(公告)号：WO2002068350A1

公开(公告)日：2002-09-06

申请号：PCT/US2002/005237

申请日：2002-02-11

Applicant: CORNING INCORPORATED

Inventor： MOORE, Lisa A ,  SMITH, Charlene M

IPC: C03B32/00

CPC classification number: G03F7/70216 ,  C03B19/1407 ,  C03B19/1415 ,  C03B19/1423 ,  C03B19/1453 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/20 ,  C03B2201/21 ,  C03B2207/30 ,  C03B2207/32 ,  C03B2207/36 ,  C03B2207/38 ,  C03C3/06 ,  C03C4/0085 ,  C03C2201/12 ,  C03C2201/20 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2201/30 ,  C03C2201/32 ,  C03C2203/54 ,  G03F1/60 ,  G03F7/70958

Abstract: High purity silicon oxyfluoride glass suitable for use as a photomask substrates for photolithography applications in the VUV wavelength region below 190 nm is disclosed. The doped glass (20) is made by providing an O 2 doping atmosphere (26) to a silicon oxyfluoride glass (22) in a doping vessel (28). The inventive silicon oxyfluoride glass is transmissive at wavelengths around 157 nm, making it particularly useful as a photomask substrate at the 157 nm wavelength region. The inventive photomask substrate is a "dry," silicon oxyfluoride glass which contains doped O 2 molecules and which exhibits very high transmittance and laser transmission durability in the vacuum ultraviolet (VUV) wavelength region. In addition to containing fluorine and having little or no OH content, the inventive silicon oxyfluoride glass contains intersticial O 2 molecules which provide improved endurance to laser exposure. Preferably the O 2 doped silicon oxyfluoride glass is characterized by having less than 1x10 17 molecules/cm3 of molecular hydrogen and low chlorine levels.

Abstract translation: 公开了适用于在低于190nm的VUV波长区域中用于光刻应用的光掩模基板的高纯度氟氧化硅玻璃。 掺杂玻璃（20）通过在掺杂容器（28）中向氟氧化硅玻璃（22）提供O 2>掺杂气氛（26）制成。 本发明的氟氧化硅玻璃在157nm波长下是透射的，使其特别适用于157nm波长区域的光掩模衬底。 本发明的光掩模衬底是含有掺杂的O 2>分子的“干式”氟氧化硅玻璃，并且在真空紫外（VUV）波长区域中表现出非常高的透射率和激光透射耐久性。 除了含氟并且具有很少或不含OH含量之外，本发明的氟氧化硅玻璃含有间隔的O> 2 <分子，这提供了对激光曝光的改善的耐久性。 优选地，O 2>掺杂的氟氧化硅玻璃的特征在于具有小于1×10 17分子/ cm 3的分子氢和低氯水平。

公开(公告)号：WO02051761A2

公开(公告)日：2002-07-04

申请号：PCT/US2001/049051

申请日：2001-12-17

IPC: C03B37/014 ,  C03C13/04 ,  C03C25/60 ,  G02B6/02 ,  C03B37/00

CPC classification number: C03C25/607 ,  C03B37/01446 ,  C03B37/0146 ,  C03B37/01486 ,  C03B2201/075 ,  C03B2201/22 ,  C03B2201/31 ,  C03C3/06 ,  C03C13/045 ,  C03C13/047 ,  C03C2201/21 ,  C03C2201/22 ,  C03C2203/54 ,  G02B6/02

Abstract: Optical waveguide fiber having low water peak as well as optical waveguide fiber preforms and methods of making optical waveguide fiber preforms from which low water peak and/or low hydrogen aged attenuation optical waveguide fibers are formed, including optical waveguide fiber and preforms made via OVD. The fibers may be hydrogen resistant, i.e. exhibit low hydrogen aged attenuation. A low water peak, hydrogen resistant optical waveguide fiber is disclosed which exhibits an optical attenuation at a wavelength of about 1383 nm which is less than or equal to an optical attenuation exhibited at a wavelength of about 1310 nm.

Abstract translation: 具有低水峰的光波导纤维以及光波导纤维预制件以及制造出低水峰值和/或低氢老化衰减光波导纤维的光波导纤维预制棒的方法，包括通过OVD制造的光波导纤维和预制棒。 纤维可以是耐氢性的，即表现出低氢老化衰减。 公开了一种低水峰，耐氢光波导纤维，其在约1383nm的波长处表现出光衰减，其小于或等于在约1310nm的波长处显示的光衰减。

公开(公告)号：WO02021217A1

公开(公告)日：2002-03-14

申请号：PCT/US2001/023257

申请日：2001-07-24

IPC: C03B19/14 ,  C03C3/06 ,  C03C4/00 ,  G03F1/00 ,  G03F7/20 ,  H01L21/027 ,  G03F9/00 ,  C03B37/027 ,  C03C3/112 ,  C03C15/00

CPC classification number: G03F7/70216 ,  C03B19/1407 ,  C03B19/1415 ,  C03B19/1423 ,  C03B19/1453 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/20 ,  C03B2201/21 ,  C03B2207/06 ,  C03B2207/08 ,  C03B2207/14 ,  C03B2207/30 ,  C03B2207/32 ,  C03B2207/38 ,  C03C3/06 ,  C03C4/0085 ,  C03C2201/12 ,  C03C2201/20 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2201/30 ,  C03C2201/32 ,  C03C2203/54 ,  G03F1/60 ,  G03F7/70958 ,  Y02P40/57

Abstract: High purity direct deposit vitrified silicon oxyfluoride glass suitable for use as a photomask substrates for photolithography applications in the VUV wavelength region below 190 nm is disclosed. The inventive direct deposit vitrified silicon oxyfluoride glass is transmissive at wavelengths around 157 nm, making it particularly useful as a photomask substrate at the 157 nm wavelength region. The inventive photomask substrate is a dry direct deposit vitrified silicon oxyfluoride glass which exhibits very high transmittance in the vacuum ultraviolet (VUV) wavelength region while maintaining the excellent thermal and physical properties generally associated with high purity fused silica. In addition to containing fluorine and having little or no OH content, the inventive direct deposit vitrified silicon oxyfluoride glass suitable for use as a photomask substrate at 157 nm is also characterized by having less than 1x10 molecules/cm of molecular hydrogen and low chlorine levels.

Abstract translation: 公开了适用于在190nm以下的VUV波长区域中用于光刻应用的光掩模基板的高纯度直接沉积玻璃化硅氧氟化物玻璃。 本发明的直接沉积玻璃化硅氧氟化物玻璃在157nm波长附近是透射的，使其特别适用于157nm波长区域的光掩模衬底。 本发明的光掩模基材是在真空紫外（VUV）波长区域中显示非常高的透射率的干直接沉积玻璃化硅氧氟化物玻璃，同时保持通常与高纯度熔融石英相关的优异的热和物理性能。 除了含氟并且具有很少或不具有OH含量之外，本发明的适用于157nm的光掩模衬底的玻璃化玻璃化氟氧化硅玻璃的特征还在于具有小于1×10 17分子/ cm 3的分子 氢和低氯水平。

公开(公告)号：WO01090010A1

公开(公告)日：2001-11-29

申请号：PCT/EP2001/005771

申请日：2001-05-21

IPC: G02B6/00 ,  C03B20/00 ,  C03B37/012 ,  C03B37/014

CPC classification number: C03B37/01211 ,  C03B37/014 ,  C03B2201/04 ,  C03B2201/075 ,  C03B2201/12

Abstract: According to a known method for producing an optical fibre by drawing from a blank with a cladded core structure or from a coaxial arrangement of components forming a cladded core structure, a core cylinder is produced in a soot deposition method, said core cylinder having a core glass layer with a higher index of refraction >" k " k " M1 " M1 " M1 " k

Abstract translation: 在通过从一个芯鞘结构的绘图构成预型体或芯鞘结构中形成的多个部件的同轴布置的制造光纤的已知方法，芯筒是在烟炱沉积方法生产的，具有具有较高的芯玻璃层的芯筒 折射率>“ K <”和外径>“ķ<从具有较低的折射率>第一包层玻璃层伸出” M1“和外径>” M1包围<， 以及将第二包层玻璃层施加到芯筒，第二包层玻璃层（4）以在单独的工艺步骤中生产的包壳管，其具有按重量计不超过1ppm的平均OH含量的形式，提供其特征在于，所述第二包层玻璃层的应用（4 3时），是）由所述包层管熔缩到芯筒（2;由一个芯圆柱体（2 3），和在 i中的“> M1 << D>”是> K“1和2.2之间，并且在一个区域的表面附近到10微米的深度的比率具有至多1重量％的平均OH含量。 质量ppm。

公开(公告)号：WO00076923A1

公开(公告)日：2000-12-21

申请号：PCT/JP2000/003778

申请日：2000-06-09

IPC: C03B8/04 ,  C03B19/14 ,  C03C3/06 ,  C03B20/00

CPC classification number: C03B19/1415 ,  C03B19/1453 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/21 ,  C03B2207/30 ,  C03B2207/32 ,  C03B2207/36 ,  C03C3/06 ,  C03C2201/12 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2203/40 ,  C03C2203/54 ,  Y02P40/57

Abstract: A synthetic quartz glass being used for a light having a wavelength of 150 to 200 nm, which has a concentration of OH group of 100 ppm or less, a concentration of hydrogen molecules of 1 x 10 molecules/cm or less and defects of reducing type of 1 x 10 /cm or less, and exhibits a relationship of DELTA K163 and DELTA K190 before and after irradiation of ultraviolet rays which satisfies 0

Abstract translation: 将合成石英玻璃用于波长为150〜200nm的光，OH基浓度为100ppm以下，氢分子浓度为1×10 17分子/ cm 3或 减少1×10 15 / cm 3以下的还原型的缺陷，并且在照射紫外线之前和之后呈现DELTA K163和DELTA K190的关系，满足0

公开(公告)号：WO00039040A1

公开(公告)日：2000-07-06

申请号：PCT/JP1999/007282

申请日：1999-12-24

IPC: C03B8/04 ,  C03B19/14 ,  C03C3/06 ,  C03C23/00 ,  C03B20/00

CPC classification number: C03B19/1453 ,  C03B2201/03 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/21 ,  C03B2201/23 ,  C03C3/06 ,  C03C23/002 ,  C03C2201/11 ,  C03C2201/12 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2203/44 ,  C03C2203/54 ,  Y02P40/57

Abstract: A synthetic quartz glass to be used for vacuum ultraviolet lights having a wavelength of 175 nm or less which is characterized in that it has an OH group content of 100 ppm or less and is substantially free of reducing type defects.

Abstract translation: 用于波长为175nm以下的真空紫外光的合成石英玻璃，其特征在于其OH基含量为100ppm以下，基本上不含还原型缺陷。

公开(公告)号：WO1993000307A1

公开(公告)日：1993-01-07

申请号：PCT/JP1992000821

申请日：1992-06-29

Applicant: SHIN-ETSU QUARTZ PRODUCTS COMPANY LIMITED ,  NISHIMURA, Hiroyuki; ,  FUJINOKI, Akira; ,  MATSUYA, Toshikatsu; ,  INAKI, Kyoichi; ,  KATO, Toshiyuki; ,  SHIMADA, Atsushi;

Inventor： SHIN-ETSU QUARTZ PRODUCTS COMPANY LIMITED

IPC: C03C03/06

CPC classification number: C03B37/014 ,  C03B19/1415 ,  C03B19/1453 ,  C03B2201/02 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/20 ,  C03B2201/21 ,  C03B2201/23 ,  C03B2203/22 ,  C03B2207/32 ,  C03C3/06 ,  C03C2201/11 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2203/40 ,  G03F7/70958 ,  Y02P40/57 ,  Y10S65/08 ,  Y10S501/90

Abstract: A synthetic quartz glass optical member for an ultraviolet laser, suitably applicable as a stepper lens of a lithographer using an excimer laser beam and other optical members, wherein the quartz glass has a hydroxyl content of 10 to 100 ppm, a chlorine content of 200 ppm or less, a hydrogen content of 1 x 1016 molecules/cm3 or less, a homogeneity of refractive index of 5 x 10-6 or less in terms of Δn, and a birefringence of 5 nm/cm or less. The optical member can be produced by subjecting a volatile silicon compound to flame hydrolysis with oxyhydrogen flame, depositing the formed particulate silica on a heat-resistant support to prepare a porous silica matrix, heating the matrix in a vacuum as high as 1 x 10-2 Torr or above to a temperature of 1,400 °C or above to effect dehydration and degassing, homogenizing the resultant transparent quartz glass into highly homogeneous quartz glass free from striae in at least one direction, molding the highly homogeneous quartz glass, and annealing the molded glass.