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    METHOD FOR PRODUCING TITANIUM-DOPED SILICA GLASS FOR USE IN EUV LITHOGRAPHY AND BLANK PRODUCED IN ACCORDANCE THEREWITH
    202.
    发明申请
    METHOD FOR PRODUCING TITANIUM-DOPED SILICA GLASS FOR USE IN EUV LITHOGRAPHY AND BLANK PRODUCED IN ACCORDANCE THEREWITH 有权
    用于生产钛酸二氧化硅玻璃的方法，用于根据其生产的EUV光刻和空白

    公开(公告)号：US20160185645A1

    公开(公告)日：2016-06-30

    申请号：US14911506

    申请日：2014-07-22

    Applicant: HERAEUS QUARZGLAS GMBH & CO. KG

    Inventor： Stefan OCHS ,  Klaus BECKER ,  Stephan THOMAS

    IPC: C03B19/14 ,  C03C4/00 ,  G03F1/52 ,  C03C3/00

    CPC classification number: C03B19/1461 ,  C03B19/1453 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/23 ,  C03B2201/42 ,  C03C3/00 ,  C03C3/06 ,  C03C4/0085 ,  C03C2201/12 ,  C03C2201/23 ,  C03C2201/42 ,  C03C2203/46 ,  C03C2203/52 ,  C03C2204/00 ,  G03F1/52 ,  G03F1/60

    Abstract: The Ti3+ ions present in Ti-doped silica glass cause a brown staining of the glass, causing inspection of the lens to become more difficult. Known methods for reducing Ti3+ ions in favor of Ti4+ ions in Ti-doped silica glass include a sufficiently high proportion of OH-groups and carrying out an oxygen treatment prior to vitrification, which both have disadvantages. In order to provide a cost-efficient production method for Ti-doped silica glass, which at a hydroxyl group content of less than 120 ppm shows an internal transmittance (sample thickness 10 mm) of at least 70% in the wavelength range of 400 nm to 1000 nm, the TiO2—SiO2 soot body is subjected to a conditioning treatment with a nitrogen oxide prior to vitrification. The blank produced in this way from Ti-doped silica glass has the ratio Ti3+/Ti4+≦5×10−4.

    Abstract translation: Ti掺杂的二氧化硅玻璃中存在的Ti3 +离子会引起玻璃的棕色染色，导致镜片检查变得更加困难。 在Ti掺杂的二氧化硅玻璃中减少Ti3 +离子有利于Ti4 +离子的已知方法包括足够高比例的OH基，并在玻璃化之前进行氧处理，这两者都有缺点。 为了提供一种Ti掺杂石英玻璃的成本有效的制造方法，其在羟基含量小于120ppm时，在400nm的波长范围内显示出至少70％的内部透射率（样品厚度10mm） 在玻璃化之前，将TiO 2 -SiO 2烟炱体用氮氧化物进行调理处理。 由Ti掺杂的石英玻璃制成的坯料的比例为Ti3 + / Ti4 +＆nlE; 5×10-4。

    OPTICAL COMPONENT MADE OF QUARTZ GLASS FOR USE IN ArF EXCIMER LASER LITHOGRAPHY AND METHOD FOR PRODUCING THE COMPONENT
    203.
    发明申请
    OPTICAL COMPONENT MADE OF QUARTZ GLASS FOR USE IN ArF EXCIMER LASER LITHOGRAPHY AND METHOD FOR PRODUCING THE COMPONENT 有权
    在ArF EXCIMER激光光刻仪中使用的QUARTZ玻璃的光学元件及其制造方法

    公开(公告)号：US20160002092A1

    公开(公告)日：2016-01-07

    申请号：US14769382

    申请日：2014-02-19

    Applicant: HERAEUS QUARZGLAS GMBH & CO. KG

    Inventor： Bodo KUEHN

    IPC: C03C3/06 ,  G02B1/00 ,  C03B32/02 ,  C03C4/04 ,  C03B19/14

    CPC classification number: C03C3/06 ,  C03B19/1453 ,  C03B32/00 ,  C03B32/02 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/21 ,  C03B2201/23 ,  C03B2201/24 ,  C03C4/04 ,  C03C2201/11 ,  C03C2201/12 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2201/24 ,  C03C2203/54 ,  C03C2204/00 ,  G02B1/00 ,  G02B1/02 ,  Y02P40/57

    Abstract: An optical component made of synthetic quartz glass includes a glass structure substantially free of oxygen defect sites and having a hydrogen content of 0.1×1016 to 1.0×1018 molecules/cm3, an SiH group content of less than 2×1017 molecules/cm3, a hydroxyl group content of 0.1 to 100 wt. ppm, and an Active temperature of less than 1070° C. The optical component undergoes a laser-induced change in the refractive index in response to irradiation by a radiation with a wavelength of 193 nm using 5×109 pulses with a pulse width of 125 ns and a respective energy density of 500 μJ/cm2 at a pulse repetition frequency of 2000 Hz. The change totals a first measured value M193nm when measured using the applied wavelength of 193 nm and a second measured value M633nm when measured using a measured wavelength of 633 nm. The ratio M193nm/M633nm is less than 1.7.

    Abstract translation: 由合成石英玻璃制成的光学部件包括基本上不含氧缺陷部位的玻璃结构，氢含量为0.1×1016〜1.0×1018分子/ cm3，SiH基含量小于2×1017分子/ cm3， 羟基含量为0.1〜100wt。 ppm，并且有效温度低于1070℃。光学组件响应于波长为193nm的辐射的照射，使用脉冲宽度为125的5×109脉冲对激光引起的折射率变化 ns，相应的能量密度为500μJ/ cm2，脉冲重复频率为2000Hz。 当使用193nm的施加波长测量时，该变化达到第一测量值M193nm，并且当使用633nm的测量波长测量时，该变化达到第二测量值M633nm。 M193nm / M633nm的比例小于1.7。

    Silica container and method for producing the same
    206.
    发明授权
    Silica container and method for producing the same 有权
    二氧化硅容器及其制造方法

    公开(公告)号：US08815403B2

    公开(公告)日：2014-08-26

    申请号：US13131987

    申请日：2010-06-25

    Applicant: Shigeru Yamagata ,  Tomomi Usui

    Inventor： Shigeru Yamagata ,  Tomomi Usui

    IPC: B32B9/04 ,  B32B13/04 ,  B32B5/16 ,  B32B1/08 ,  C03B19/01 ,  C03B37/00 ,  C03B27/012 ,  C03B29/00 ,  C03B11/08 ,  C30B29/06 ,  C30B35/00 ,  C03B19/09 ,  C30B15/10

    CPC classification number: C03B19/095 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/32 ,  C30B15/10 ,  C30B29/06 ,  C30B35/002 ,  Y10T428/131 ,  Y10T428/1317 ,  Y10T428/2982

    Abstract: A method for producing a silica container having a rotational symmetry is provided. The method includes forming a preliminarily molded article by feeding a powdered substrate's raw material to an inner wall of an outer frame having aspiration holes with rotating the frame, and forming a silica substrate. The preliminarily molded article is aspirated from an outer peripheral side with controlling a humidity inside the outer frame by ventilating gases present in the outer frame with charging from inside the preliminarily molded article a gas mixture comprised of an O2 gas and an inert gas and made below a prescribed dew-point temperature by dehumidification, and at the same time heated from inside the preliminarily molded article by a discharge-heat melting method with carbon electrodes, thereby making an outer peripheral part of the preliminarily molded article to a sintered body while an inner peripheral part to a fused glass body.

    Abstract translation: 提供了具有旋转对称性的二氧化硅容器的制造方法。 该方法包括通过将粉末状基材的原料供给到具有旋转框架的具有抽吸孔的外框架的内壁，并形成二氧化硅基板来形成预成型品。 从外周侧抽吸预成型品，通过从外部框架内部充填从O 2气体和惰性气体构成的气体混合物从外部框架内的气体通风来控制外框内的湿度， 通过除湿规定的露点温度，同时用碳电极通过放电加热熔融法从预成型体内部加热，由此使预成型品的外周部分成为烧结体，而内部 周边部分为熔融玻璃体。

    VERY LOW CTE SLOPE DOPED SILICA-TITANIA GLASS
    207.
    发明申请
    VERY LOW CTE SLOPE DOPED SILICA-TITANIA GLASS 有权
    非常低的CTE斜率DOPED SILICA-TITANIA玻璃

    公开(公告)号：US20140155246A1

    公开(公告)日：2014-06-05

    申请号：US13835039

    申请日：2013-03-15

    Applicant: CORNING INCORPORATED

    Inventor： Sezhian Annamalai ,  Carlos Alberto Duran ,  Kenneth Edward Hrdina

    IPC: G03F1/22

    CPC classification number: G03F1/22 ,  C03B19/12 ,  C03B19/1461 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/20 ,  C03B2201/23 ,  C03B2201/32 ,  C03B2201/40 ,  C03B2201/42 ,  C03C3/06 ,  C03C4/0085 ,  C03C2201/12 ,  C03C2201/23 ,  C03C2201/32 ,  C03C2201/40 ,  C03C2201/42 ,  C03C2203/44 ,  C03C2203/54

    Abstract: The present disclosure is directed to a doped silica-titania glass, DST glass, consisting essentially of 0.1 wt. % to 5 wt. % halogen, 50 ppm-wt. to 6 wt. % one or more oxides of Al, Ta and Nb, 3 wt. % to 10 wt. % TiO2 and the remainder SiO2. In an embodiment the halogen content can be in the range of 0.2 wt. % to 3 wt. % along with 50 ppm-wt. to 6 wt. % one or more oxides of Al, Ta and Nb, 3 wt. % to 10 wt. % TiO2 and the remainder SiO2. In an embodiment the DST glass has an OH concentration of less than 100 ppm. In another embodiment the OH concentration is less than 50 ppm. The DST glass has a fictive temperature Tf of less than 875° C. In an embodiment Tf is less than 825° C. In another embodiment Tf is less than 775° C.

    Abstract translation: 本公开涉及掺杂的二氧化硅 - 二氧化钛玻璃，DST玻璃，其基本上由0.1重量％ ％至5wt。 ％卤素，50ppm-wt。 至6重量％ ％的一种或多种Al，Ta和Nb的氧化物，3wt。 ％〜10重量％ ％的TiO 2和其余的SiO 2。 在一个实施方案中，卤素含量可以在0.2wt。 ％〜3重量％ ％和50ppm-wt。 至6重量％ ％的一种或多种Al，Ta和Nb的氧化物，3wt。 ％〜10重量％ ％的TiO 2和其余的SiO 2。 在一个实施方案中，DST玻璃的OH浓度小于100ppm。 在另一个实施方案中，OH浓度小于50ppm。 DST玻璃具有小于875℃的假想温度Tf。在一个实施方案中，Tf小于825℃。在另一个实施方案中，Tf小于775℃

    Method for producing a hollow cylinder of synthetic quartz glass, and thickwalled hollow cylinder obtained according to the method
    210.
    发明授权
    Method for producing a hollow cylinder of synthetic quartz glass, and thickwalled hollow cylinder obtained according to the method 有权
    制造合成石英玻璃中空圆柱体的方法和根据该方法获得的厚壁中空圆柱体

    公开(公告)号：US08316671B2

    公开(公告)日：2012-11-27

    申请号：US12448294

    申请日：2007-12-13

    Applicant: Michael Huenermann

    Inventor： Michael Huenermann

    IPC: C03B37/018 ,  C03B37/00 ,  C03B25/00 ,  C03C3/06

    CPC classification number: C03B19/1469 ,  C03B19/1423 ,  C03B19/1492 ,  C03B37/01205 ,  C03B37/01208 ,  C03B37/01211 ,  C03B37/0122 ,  C03B37/0142 ,  C03B37/01466 ,  C03B37/01493 ,  C03B2201/04 ,  C03B2201/075 ,  C03B2203/42 ,  C03B2207/46

    Abstract: A known method for producing a hollow cylinder of synthetic quartz glass comprises the steps of: (a) providing an inner tube of synthetic quartz glass having an inner bore defined by an inner wall, (b) cladding the inner tube (3′) with an SiO2 soot layer (4′), and (c) sintering the SiO2 soot layer with formation of the hollow cylinder. Starting therefrom, to indicate a method in which on the one hand the sintering process is completed before the hollow cylinder is further processed together with the core rod, and in which on the other hand a complicated machining of the inner bore of the hollow cylinder of quartz glass is not required, the invention suggests that during sintering the surface temperature of the inner wall of the inner tube should be kept below the softening temperature.

    Abstract translation: 用于生产合成石英玻璃的中空圆筒的已知方法包括以下步骤：（a）提供合成石英玻璃的内管，其具有由内壁限定的内孔，（b）用内壁（3'）包覆内管 SiO 2烟灰层（4'），和（c）在形成中空圆筒的情况下烧结SiO 2烟灰层。 从此开始，指示一方面在中空圆筒与芯棒一起进一步加工之前烧结过程完成的方法，另一方面，中空圆柱体的内孔的复杂加工 石英玻璃不需要，本发明提出在烧结过程中，内管内壁的表面温度应保持在软化温度以下。

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