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公开(公告)号：US09040942B1
公开(公告)日：2015-05-26
申请号：US12008517
申请日：2008-01-11
Applicant: Keith Standiford , Alan D. Brodie
Inventor： Keith Standiford , Alan D. Brodie
CPC classification number: H01J37/04 , H01J37/3007 , H01J37/3177 , H01J2237/201 , H01J2237/31789
Abstract: One embodiment relates to an apparatus for electron beam lithography which includes a linear array of reflection electron beam lithography columns and a rotary stage. Each column is separately controllable to write a portion of a lithographic pattern onto a substrate. The rotary stage is configured to hold multiple substrates and to be rotated under the linear array of reflection electron beam lithography columns. Another embodiment relates to a method of electron beam lithography which includes simultaneously rotating and linearly translating a stage holding a plurality of wafers, and writing a lithography pattern using a linear array of reflection electron beam lithography columns over the stage. Each said column traverses a spiral path over the stage as the stage is rotated and linearly translated. Other embodiments, aspects and feature are also disclosed.
Abstract translation: 一个实施例涉及一种用于电子束光刻的装置，其包括反射电子束光刻柱和旋转台的线性阵列。 每列可分开控制，以将一部分平版印刷图案写入基板上。 旋转台被配置为保持多个基板并且在反射电子束光刻柱的线性阵列下旋转。 另一实施例涉及电子束光刻的方法，其包括同时旋转和线性平移保持多个晶片的台，以及使用反射电子束光刻柱的线性阵列在平台上书写光刻图案。 当舞台旋转并线性平移时，每个所述列横过舞台上的螺旋路径。 还公开了其它实施例，方面和特征。
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公开(公告)号：US08932963B2
公开(公告)日：2015-01-13
申请号：US14475783
申请日：2014-09-03
Applicant: Tokyo Electron Limited
Inventor： Hitoshi Kato , Hiroyuki Kikuchi , Takeshi Kumagai
IPC: H01L21/02 , C23C16/458 , C23C16/50 , H01J37/32
CPC classification number: C23C16/4581 , C23C16/4405 , C23C16/4554 , C23C16/45551 , C23C16/4584 , C23C16/50 , H01J37/32458 , H01J37/32715 , H01J37/32733 , H01J37/32825 , H01J2237/032 , H01J2237/201 , H01J2237/20214 , H01J2237/332 , H01L21/0206
Abstract: A film deposition method using a film deposition apparatus, includes: a film deposition process step in which at least a substrate is mounted on at least one of the circular concave portions and a film is deposited on the substrate; and a particle reducing process step performed before or after the film deposition process step, in which particles in the vacuum chamber are reduced without mounting substrates on the circular concave portions, the particle reducing process step including, a step of supplying a first gas to the vacuum chamber; a step of generating plasma from the first gas by supplying high frequency waves to a plasma generating device provided for the vacuum chamber; and a step of exposing the plurality of circular concave portions, on each of which a substrate is not mounted, to the plasma while rotating the susceptor.
Abstract translation: 使用成膜装置的成膜方法包括：成膜工序，在至少一个所述圆形凹部上至少安装有基板，在所述基板上淀积薄膜; 以及在成膜处理工序之前或之后进行的粒子还原工序，其中真空室中的颗粒在不将基板安装在圆形凹部上的情况下减少，所述颗粒还原工艺步骤包括：将第一气体供应到 真空室; 通过向设置在真空室中的等离子体发生装置供给高频波而从第一气体产生等离子体的步骤; 以及在旋转所述基座的同时，将其中未安装基板的所述多个圆形凹部暴露于所述等离子体的步骤。
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公开(公告)号：US08853097B2
公开(公告)日：2014-10-07
申请号：US13743508
申请日：2013-01-17
Applicant: Tokyo Electron Limited
Inventor： Hitoshi Kato , Hiroyuki Kikuchi , Takeshi Kumagai
IPC: H01L21/02 , C23C16/44 , C23C16/455
CPC classification number: C23C16/4581 , C23C16/4405 , C23C16/4554 , C23C16/45551 , C23C16/4584 , C23C16/50 , H01J37/32458 , H01J37/32715 , H01J37/32733 , H01J37/32825 , H01J2237/032 , H01J2237/201 , H01J2237/20214 , H01J2237/332 , H01L21/0206
Abstract: A particle reducing method includes a step of supplying a first gas to a vacuum chamber in which a susceptor, formed by an insulating object and the surface of which is provided with a substrate mounting portion, is rotatably provided; a step of generating plasma from the first gas by supplying high frequency waves to a plasma generating device provided for the vacuum chamber; and a step of exposing the substrate mounting portion, on which a substrate is not mounted, to the plasma while rotating the susceptor.
Abstract translation: 一种粒子还原方法包括：将第一气体供给到真空室，其中由绝缘物体形成的基座和其表面设置有基板安装部分的基座可旋转地设置; 通过向设置在真空室中的等离子体发生装置供给高频波而从第一气体产生等离子体的步骤; 以及在旋转基座的同时将未安装基板的基板安装部暴露于等离子体的步骤。
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公开(公告)号：US20140191125A1
公开(公告)日：2014-07-10
申请号：US14147884
申请日：2014-01-06
Applicant: FEI Company
Inventor： Matthew Barrett , Michael D. Smith , Michal Geryk , Paul Scagnetti , Richard Tovey
CPC classification number: H01J37/20 , G01N2223/307 , G01N2223/418 , G01N2223/616 , H01J37/16 , H01J2237/2007 , H01J2237/201 , H01J2237/28 , H01J2237/2826
Abstract: A sample holder assembly includes a sample tray, a base plate, a stage mount, and a calibration standard mounted onto the stage mount. Three mating structures on the bottom of the base plate mate with corresponding structures on a stage mount that is attached to the sample stage of the SEM. An optional contacting conductor provides electrical contact between the stage mount and the base plate so that charge generated on the sample by the electron beam can leave the sample through the sample conductive layer to the sample tray, to the base plate, to the stage mount, and through the grounded stage.
Abstract translation: 样品架组件包括样品托盘，基板，载物台和安装在载物台上的校准标准品。 底板底部的三个配合结构与安装在扫描电镜样品台上的台架上的相应结构配合。 可选的接触导体提供台架和基板之间的电接触，使得通过电子束在样品上产生的电荷可以使样品通过样品导电层到样品托盘，到基板，到载物台， 并通过接地阶段。
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公开(公告)号：US20140048972A1
公开(公告)日：2014-02-20
申请号：US14110576
申请日：2012-04-23
Applicant: Paul Gottlieb
Inventor： Paul Gottlieb
IPC: G01N1/28
CPC classification number: G01N1/28 , G01N1/06 , G01N1/286 , G01N1/36 , H01J2237/2007 , H01J2237/201
Abstract: Mineral samples for use in analytical instruments are created by a system that greatly reduces the sample preparation time and facilitates automation. For example, in some implementations, rather than grinding to expose the interior of mineral particles in sample plug containing mineral particles in an epoxy compound, the sample plug is sliced with a saw, which more rapidly provides in many applications a sufficiently smooth surface on the exposed particle surfaces for observation. Rather than slowly mixing a slow curing epoxy to avoid introducing bubbles into the sample plug, some implementations use a fast settle fixative and a mechanical mixture that avoid bubbles.
Abstract translation: 用于分析仪器的矿物样品由大大降低样品准备时间并便于自动化的系统创建。 例如，在一些实施方案中，不是研磨以暴露含有环氧化合物中的矿物颗粒的样品塞中的矿物颗粒的内部，用锯切片样品塞，其在许多应用中更快地提供足够光滑的表面 暴露的颗粒表面进行观察。 不是缓慢地混合缓慢固化的环氧树脂，以避免将气泡引入到样品塞中，一些实施方案使用快速沉降固定剂和避免气泡的机械混合物。
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Patent Agency Ranking
公开(公告)号：US08624199B2
公开(公告)日：2014-01-07
申请号：US13284729
申请日：2011-10-28
Applicant: Matthew Barrett , Michael D. Smith , Michal Geryk , Paul Scagnetti , Richard Tovey
Inventor： Matthew Barrett , Michael D. Smith , Michal Geryk , Paul Scagnetti , Richard Tovey
CPC classification number: H01J37/20 , G01N2223/307 , G01N2223/418 , G01N2223/616 , H01J37/16 , H01J2237/2007 , H01J2237/201 , H01J2237/28 , H01J2237/2826
Abstract: A sample holder assembly includes a sample tray, a base plate, a stage mount, and a calibration standard mounted onto the stage mount. Three mating structures on the bottom of the base plate mate with corresponding structures on a stage mount that is attached to the sample stage of the SEM. An optional contacting conductor provides electrical contact between the stage mount and the base plate so that charge generated on the sample by the electron beam can leave the sample through the sample conductive layer to the sample tray, to the base plate, to the stage mount, and through the grounded stage.
Abstract translation: 样品架组件包括样品托盘，基板，载物台和安装在载物台上的校准标准品。 底板底部的三个配合结构与安装在扫描电镜样品台上的台架上的相应结构配合。 可选的接触导体提供台架和基板之间的电接触，使得通过电子束在样品上产生的电荷可以使样品通过样品导电层到样品托盘，到基板，到载物台， 并通过接地阶段。
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公开(公告)号：US20130340936A1
公开(公告)日：2013-12-26
申请号：US14010780
申请日：2013-08-27
Applicant: EXpressLO LLC
Inventor： Lucille A. Giannuzzi
IPC: H01J37/30
CPC classification number: H01J37/3002 , G01N1/00 , G01N1/32 , H01J37/20 , H01J2237/201 , H01J2237/31745
Abstract: A method for mounting a specimen on a specimen carrier for milling in an ex-situ lift-out (EXLO) milling process is described where “cross-section” specimens, plan view specimens, or bulk specimens may be lifted-out for analysis. The method comprising positioning the specimen on a recessed surface within a specimen carrier top surface so that a region to be milled is centered about a carrier opening formed through the specimen carrier. Peripheral edges of the specimen are then wedged against inwardly sloping side walls framing the recessed surface. Finally, the specimen is mounted to the specimen carrier so that a path of a milling beam intersects the region to be milled and carrier opening.
Abstract translation: 描述了一种将样品安装在样本载体上用于在非原位提取（EXLO）铣削过程中进行铣削的方法，其中可以将“横截面”样本，平面图样本或体积样本提起以进行分析。 该方法包括将样品定位在样品载体顶表面内的凹陷表面上，使得待研磨的区域围绕通过样品载体形成的载体开口居中。 然后将试样的外围边缘楔入抵靠凹陷表面的向内倾斜的侧壁。 最后，将样品安装到试样载体上，使得铣削梁的路径与要研磨的区域和载体开口相交。
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公开(公告)号：US08569719B2
公开(公告)日：2013-10-29
申请号：US13326783
申请日：2011-12-15
Applicant: Satoshi Tomimatsu , Kaoru Umemura , Yuichi Madokoro , Yoshimi Kawanami , Yasunori Doi
Inventor： Satoshi Tomimatsu , Kaoru Umemura , Yuichi Madokoro , Yoshimi Kawanami , Yasunori Doi
IPC: G21G5/00
CPC classification number: G01N1/32 , G01N1/28 , G01N2001/028 , G01N2001/045 , G01N2001/282 , H01J37/20 , H01J37/302 , H01J37/3056 , H01J2237/2007 , H01J2237/201 , H01J2237/202 , H01J2237/31732 , H01J2237/31745 , H01J2237/31749
Abstract: A focused ion beam apparatus, including: a sample holder provided with a fixing surface for fixing, via a deposition film, a micro-specimen extracted from a specimen using a method for fabrication by a focused ion beam, in which a width of the fixing surface is smaller than 50 microns; a specimen transferring unit having a probe to which the specimen can be joined through the deposition film, and transferring the micro-specimen extracted from the specimen by the focused ion-beam fabrication method, to the sample holder; and a sample chamber in which the sample, the sample holder and the probe are laid out, wherein, in the sample chamber, the micro-specimen extracted from the specimen by the focused ion-beam fabrication method is fixed to the fixing surface of the sample holder through the deposition film, and the micro-specimen fixed to the fixing surface is fabricated by irradiating the focused ion beam.
Abstract translation: 一种聚焦离子束装置，包括：样本保持器，其设置有固定表面，用于通过沉积膜固定从样本提取的微量样本，其中使用聚焦离子束制造方法，其中定影宽度 表面小于50微米; 具有可以通过沉积膜将样品接合的探针的样本转移单元，通过聚焦离子束制造方法将从样品提取的微量样品转移到样品保持器; 以及样本室，样本保持器和探针布置在其中，其中，在样本室中，通过聚焦离子束制造方法从样本提取的微量样本被固定到 通过沉积膜的样品保持器和固定到固定表面的微型样品通过照射聚焦离子束来制造。
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公开(公告)号：US08507876B2
公开(公告)日：2013-08-13
申请号：US13043220
申请日：2011-03-08
Applicant: Steven L. Goodman , Jack LaSee , Mark T. Nelson
Inventor： Steven L. Goodman , Jack LaSee , Mark T. Nelson
CPC classification number: H01J37/20 , H01J2237/2007 , H01J2237/201
Abstract: A device for holding a specimen holder, the device including a body with a slot formed therein. The slot includes an interior for receiving the specimen holder which may be a flat disk with edges and a pair of opposing sides. The disk may be made of a resilient deformable material. The slot may be sized to receive the specimen holder through an open top end and may taper from top bottom, such that the bottom end of the slot is smaller than the specimen holder. The slot further configured to contact the specimen holder along edges of the specimen holder and to allow some sideways deformation of the specimen holder without either side of the specimen holder distant from the edges coming into contact with the interior of the slot.
Abstract translation: 一种用于保持试样保持器的装置，该装置包括其中形成有槽的主体。 狭槽包括用于容纳样品架的内部，其可以是具有边缘的平板和一对相对的侧面。 盘可以由弹性可变形材料制成。 狭槽的尺寸可以通过敞开的顶端容纳样品架，并且可以从顶部底部逐渐变细，使得狭槽的底端小于样品架。 所述槽进一步构造成沿着所述试样保持器的边缘接触所述试样保持器，并且允许所述试样保持器的一些侧向变形，而所述试样保持器的任何一侧远离所述边缘与所述槽的内部接触。
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公开(公告)号：US08487270B2
公开(公告)日：2013-07-16
申请号：US13589461
申请日：2012-08-20
Applicant: Ulrike Zeile , Andreas Schertel
Inventor： Ulrike Zeile , Andreas Schertel
IPC: H01J37/26
CPC classification number: H01J37/20 , H01J37/26 , H01J37/3056 , H01J2237/201 , H01J2237/20207 , H01J2237/206 , H01J2237/31745 , H01J2237/31749
Abstract: A particle beam device includes a movable carrier element with at least one receiving element for receiving a specimen and in which the receiving element is situated on the carrier element. In various embodiments, the receiving element may be situated removably on the carrier element and/or multiple receiving elements may be situated on the carrier element in such a way that a movement of the carrier element causes a movement of the multiple receiving elements in the same spatial direction or around the same axis. The carrier element may be movable in three spatial directions situated perpendicular to one another and rotatable around a first axis which is parallel to an optical axis of the particle beam device and around a second axis which is situated perpendicular to the optical axis. A method for using the particle beam device in connection with specimen study and preparation is also disclosed.
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