公开(公告)号：WO2007053733A1

公开(公告)日：2007-05-10

申请号：PCT/US2006/042768

申请日：2006-11-01

Applicant: CORNING INCORPORATED ,  BOOKBINDER, Dana, C. ,  FIACCO, Richard, M. ,  NEUKIRCH, Ulrich

Inventor： BOOKBINDER, Dana, C. ,  FIACCO, Richard, M. ,  NEUKIRCH, Ulrich

IPC: C03C3/06 ,  C03C4/00 ,  C03B19/06 ,  C03B19/14

CPC classification number: C03C3/06 ,  C03B19/06 ,  C03B19/066 ,  C03B19/12 ,  C03B19/14 ,  C03B19/1453 ,  C03B20/00 ,  C03B32/00 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/08 ,  C03B2201/12 ,  C03B2201/22 ,  C03B2201/23 ,  C03B2201/32 ,  C03B2201/42 ,  C03C4/0085 ,  C03C2201/11 ,  C03C2201/12 ,  C03C2201/22 ,  C03C2201/23

Abstract: What is disclosed includes OD-doped synthetic silica glass capable of being used in optical elements for use in lithography below about 300 nm. OD-doped synthetic silica glass was found to have significantly lower polarization-induced birefringence value than non-OD-doped silica glass with comparable concentration of OH. Also disclosed are processes for making OD-dopes synthetic silica glasses, optical member comprising such glasses, and lithographic systems comprising such optical member. The glass is particularly suitable for immersion lithographic systems due to the exceptionally low polarization-induced birefringence values at about 193 nm.

Abstract translation: 公开的内容包括能够用于低于约300nm的光刻中的光学元件的OD掺杂合成石英玻璃。 发现OD掺杂的合成二氧化硅玻璃具有比具有相当浓度的OH的非OD掺杂的石英玻璃具有显着更低的偏振诱导双折射值。 还公开了制备OD-掺杂合成二氧化硅玻璃，包括这种玻璃的光学部件以及包括这种光学部件的光刻系统的方法。 由于在约193nm处极度低的偏振诱发双折射值，该玻璃特别适用于浸没式光刻系统。

公开(公告)号：WO2006080241A3

公开(公告)日：2006-09-21

申请号：PCT/JP2006300777

申请日：2006-01-13

Applicant: ASAHI GLASS CO LTD ,  KOIKE AKIO ,  IWAHASHI YASUTOMI ,  SHIMODAIRA NORIAKI ,  KIKUGAWA SHINYA ,  SUGIMOTO NAOKI

Inventor： KOIKE AKIO ,  IWAHASHI YASUTOMI ,  SHIMODAIRA NORIAKI ,  KIKUGAWA SHINYA ,  SUGIMOTO NAOKI

IPC: C03C3/06 ,  C03B19/14

CPC classification number: C03C3/06 ,  C03B19/1453 ,  C03B19/1484 ,  C03B2201/21 ,  C03B2201/42 ,  C03C17/40 ,  C03C2201/21 ,  C03C2201/42 ,  G03F7/70958

Abstract: Conventional TiO 2 -SiO 2 glass contains hydrogen atoms substantially and during deposition under ultrahigh vacuum condition, the hydrogen molecules will diffuse in the chamber, and H 2 molecules will be taken into a film thereby formed. Hydrogen molecules will readily diffuse and the optical characteristics of the multilayer film are likely to be thereby changed. An optical material for EUV lithography is disclosed, which comprises a silica glass having a TiO 2 concentration of from 3 to 12 mass% and a hydrogen molecule content of less than 5x10* molecules/cm 3 in the glass.

Abstract translation: 常规的TiO 2 -SiO 2 SiO 2玻璃基本上包含氢原子，并且在超高真空条件下沉积期间，氢分子将在室中扩散，H 2 / SUB>分子将被吸收到由此形成的膜中。 氢分子将容易扩散，并且可能由此改变多层膜的光学特性。 公开了一种用于EUV光刻的光学材料，其包括具有3至12质量％的TiO 2浓度和小于5×10 *分子/ cm 3的氢分子含量的二氧化硅玻璃 在玻璃。

公开(公告)号：WO2006080241A2

公开(公告)日：2006-08-03

申请号：PCT/JP2006/300777

申请日：2006-01-13

Applicant: ASAHI GLASS COMPANY, LIMITED ,  KOIKE, Akio ,  IWAHASHI, Yasutomi ,  SHIMODAIRA, Noriaki ,  KIKUGAWA, Shinya ,  SUGIMOTO, Naoki

Inventor： KOIKE, Akio ,  IWAHASHI, Yasutomi ,  SHIMODAIRA, Noriaki ,  KIKUGAWA, Shinya ,  SUGIMOTO, Naoki

IPC: C03C3/06 ,  C03B19/14

CPC classification number: C03C3/06 ,  C03B19/1453 ,  C03B19/1484 ,  C03B2201/21 ,  C03B2201/42 ,  C03C17/40 ,  C03C2201/21 ,  C03C2201/42 ,  G03F7/70958

Abstract: Conventional TiO 2 -SiO 2 glass contains hydrogen atoms substantially, and during deposition under ultrahigh vacuum condition, the hydrogen molecules will diffuse in the chamber, and H 2 molecules will be taken into a film thereby formed. Hydrogen molecules will readily diffuse, and the optical characteristics of the multilayer film are likely to be thereby changed. In an optical material for EUV lithography, a multilayer film is coated by ion beam sputtering on a silica glass having a TiO 2 concentration of from 3 to 12 mass% and a hydrogen molecule content of less than 5x10 17 molecules/cm 3 in the glass.

Abstract translation: 常规的TiO 2 -SiO 2 SiO 2玻璃基本上含有氢原子，并且在超高真空条件下沉积期间，氢分子将在室中扩散，并且H 2 < / SUB>分子将被吸收到由此形成的膜中。 氢分子将容易扩散，并且可能由此改变多层膜的光学特性。 在用于EUV光刻的光学材料中，通过离子束溅射在具有3至12质量％的TiO 2浓度和小于5×10 5质量％的氢分子含量的二氧化硅玻璃上涂覆多层膜， SUP> 17分子/ cm 3在玻璃中。

公开(公告)号：WO2004089836A1

公开(公告)日：2004-10-21

申请号：PCT/JP2004/004845

申请日：2004-04-02

Applicant: ASAHI GLASS COMPANY LIMITED ,  IWAHASHI, Yasutomi ,  KOIKE, Akio

Inventor： IWAHASHI, Yasutomi ,  KOIKE, Akio

IPC: C03B19/14

CPC classification number: C03B19/1415 ,  C03B19/1461 ,  C03B2201/12 ,  C03B2201/42 ,  C03C3/06 ,  C03C2201/12 ,  C03C2201/23 ,  C03C2201/42 ,  C03C2203/40 ,  C03C2203/54

Abstract: A silica glass containing TiO 2 , which has a fictive temperature of at most 1, 200 C, a F concentration of at least 100 ppm and a coefficient of thermal expansion of 0 ± 200 ppb/°c from 0 to 100°c. A process for producing a silica glass containing TiO 2 , which comprises a step of forming a porous glass body on a target quartz glass particles obtained by flame hydrolysis of glass-forming materials, a step of obtaining a fluorine-containing porous glass body, a step of obtaining a fluorine-containing vitrified glass body, a step of obtaining a fluorine-containing formed glass body and a step of carrying out annealing treatment.

Abstract translation: 含有TiO 2的二氧化硅玻璃，其虚拟温度为至多1200℃，F浓度为至少100ppm，热膨胀系数为0±200ppb /℃，为0至100℃。 一种制备含有TiO 2的二氧化硅玻璃的方法，其包括在通过玻璃形成材料的火焰水解获得的目标石英玻璃颗粒上形成多孔玻璃体的步骤，获得含氟多​​孔玻璃体的步骤， 获得含氟玻璃化玻璃体的步骤，获得含氟成形玻璃体的步骤和进行退火处理的步骤。

公开(公告)号：WO9952832A9

公开(公告)日：2000-02-17

申请号：PCT/US9907872

申请日：1999-04-09

Applicant: FIBERCORE INC

Inventor： GOUSKOV MIKHAIL IVANOVICH ,  DANILOV EVGUENI BORISOVICH ,  ASLAMI MOHAMMAD AFZAL ,  WU DAU ,  MATTISON JOHN EDWARD

IPC: C03B23/047 ,  C03B37/012 ,  C03B37/014 ,  C03B37/018 ,  C03B37/027

CPC classification number: C03B37/01861 ,  C03B37/01413 ,  C03B37/01426 ,  C03B37/01466 ,  C03B37/01823 ,  C03B2201/02 ,  C03B2201/12 ,  C03B2201/28 ,  C03B2201/31 ,  C03B2201/32 ,  C03B2201/42 ,  C03B2203/22

Abstract: Glass soot (130) is deposited on a glass rod by a burner (140). The body is stretched (126). More depositing and stretching is effected. The final body is then drawn into a fiber.

Abstract translation: 玻璃烟炱（130）通过燃烧器（140）沉积在玻璃棒上。 身体伸展（126）。 进行更多的沉积和拉伸。 然后将最后的身体拉成纤维。

公开(公告)号：US20230312387A1

公开(公告)日：2023-10-05

申请号：US18127351

申请日：2023-03-28

Applicant: CORNING INCORPORATED

Inventor： William Robert Angell, IV ,  John Edward Maxon ,  Jeffrey Lee Sunderland

IPC: C03B19/14

CPC classification number: C03B19/1423 ,  C03B2201/42 ,  C03B2207/32 ,  C03B2207/36

Abstract: A process for producing a glass body, the process including flowing oxygen gas from a burner in a furnace at a flow rate of greater than 12.0 standard liters per minute and flowing a precursor gas mixture from the burner. The process further including oxidizing the precursor gas mixture with the oxygen gas to form glass particles and depositing the glass particles on a collection cup to form the glass body.

公开(公告)号：US09932261B2

公开(公告)日：2018-04-03

申请号：US15297534

申请日：2016-10-19

Applicant: Corning Incorporated

Inventor： Sezhian Annamalai ,  Steven Bruce Dawes ,  Carlos Alberto Duran ,  Kenneth Edward Hrdina ,  William Rogers Rosch ,  Bryan Ray Wheaton

IPC: C03C3/06 ,  C03C3/089 ,  C03B25/02 ,  C03C4/00 ,  C03B19/14

CPC classification number: C03C3/089 ,  C03B19/14 ,  C03B25/02 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/10 ,  C03B2201/42 ,  C03C3/06 ,  C03C4/00 ,  C03C23/007 ,  C03C2201/10 ,  C03C2201/12 ,  C03C2201/23 ,  C03C2201/42 ,  C03C2203/54

Abstract: A doped silica-titania (“DST”) glass article that includes a glass article having a glass composition comprising a silica-titania base glass containing titania at 7 to 14 wt. % and a balance of silica, and a dopant selected from the group consisting of (a) F at 0.7 to 1.5 wt. %, (b) B2O3 at 1.5 to 5 wt. %, (c) OH at 1000 to 3000 ppm, and (d) B2O3 at 0.5 to 2.5 wt. % and OH at 100 to 1400 ppm. The glass article has an expansivity slope of less than about 1.3 ppb/K2 at 20° C. For DST glass articles doped with F or B2O3, the OH level can be held to less than 10 ppm, or less than 100 ppm, respectively. In many aspects, the DST glass articles are substantially free of titania in crystalline form.

公开(公告)号：US09890071B2

公开(公告)日：2018-02-13

申请号：US15291379

申请日：2016-10-12

Applicant: Corning Incorporated

Inventor： Carlos Alberto Duran

IPC: C03C3/06 ,  C03B25/00 ,  C03B25/02 ,  C03B25/08 ,  C03C3/076

CPC classification number: C03B25/00 ,  C03B25/02 ,  C03B25/08 ,  C03B2201/42 ,  C03C3/06 ,  C03C3/076 ,  C03C2201/00 ,  C03C2201/42 ,  Y02P40/57

Abstract: Silica-titania glasses with small temperature variations in coefficient of thermal expansion over a wide range of zero-crossover temperatures and methods for making the glasses. The method includes a cooling protocol with controlled anneals over two different temperature regimes. A higher temperature controlled anneal may occur over a temperature interval from 750° C.-950° C. or a sub-interval thereof. A lower temperature controlled anneal may occur over a temperature interval from 650° C.-875° C. or a sub-interval thereof. The controlled anneals permit independent control over CTE slope and Tzc of silica-titania glasses. The independent control provides CTE slope and Tzc values for silica-titania glasses of fixed composition over ranges heretofore possible only through variations in composition.

公开(公告)号：US20180016176A1

公开(公告)日：2018-01-18

申请号：US15716084

申请日：2017-09-26

Applicant: NIKON CORPORATION

Inventor： Toshio YOSHINARI ,  Tadahiko SAITO

IPC: C03B19/14 ,  C03C3/04 ,  C03B23/00 ,  C03C3/06 ,  C03B32/00 ,  C03B23/049 ,  C03B11/00

CPC classification number: C03B19/1415 ,  C03B11/00 ,  C03B19/1453 ,  C03B19/1469 ,  C03B19/1476 ,  C03B19/1492 ,  C03B23/0013 ,  C03B23/0496 ,  C03B32/005 ,  C03B2201/12 ,  C03B2201/42 ,  C03C3/04 ,  C03C3/06 ,  C03C2201/12 ,  C03C2201/42 ,  C03C2203/44 ,  C03C2203/52

Abstract: A device for manufacturing SiO2—TiO2 based glass by growing a glass ingot upon a target by a direct method. The device includes the target, comprising a thermal storage portion that accumulates heat by being preheated, and a heat insulating portion that suppresses conduction of heat from the thermal storage portion in a direction opposite to the glass ingot.

公开(公告)号：US20170197878A1

公开(公告)日：2017-07-13

申请号：US15471344

申请日：2017-03-28

Applicant: Corning Incorporated

Inventor： Dana Craig Bookbinder ,  Robert Brett Desorcie ,  Hazel Benton Matthews, III ,  Pushkar Tandon

IPC: C03C25/66 ,  G02B6/036 ,  C03C25/10

CPC classification number: C03C25/66 ,  C03B37/01205 ,  C03B37/01446 ,  C03B37/0146 ,  C03B37/027 ,  C03B2201/10 ,  C03B2201/12 ,  C03B2201/20 ,  C03B2201/22 ,  C03B2201/31 ,  C03B2201/32 ,  C03B2201/34 ,  C03B2201/42 ,  C03B2203/23 ,  C03B2203/24 ,  C03C3/06 ,  C03C13/045 ,  C03C25/1061 ,  C03C25/1068 ,  C03C2201/11 ,  C03C2201/22 ,  C03C2201/31 ,  C03C2203/54 ,  G02B6/02 ,  G02B6/021 ,  G02B6/03627 ,  G02B6/0365 ,  Y02P40/57

Abstract: The present disclosure is directed to a method of making an optical fiber with improved bend performance, the optical fiber having a core and at least one cladding layer, and a chlorine content in the in the last layer of the at least one cladding layer that is greater than 500 ppm by weight. The fiber is prepared using a mixture of a carrier gas, a gaseous chlorine source material and a gaseous reducing agent during the sintering of the last or outermost layer of the at least one cladding layer. The inclusion of the reducing gas into a mixture of the carrier gas and gaseous chlorine material reduces oxygen-rich defects that results in at least a 20% reduction in TTP during hydrogen aging testing.