CHARGED PARTICLE VORTEX WAVE GENERATION
    241.
    发明申请
    CHARGED PARTICLE VORTEX WAVE GENERATION 审中-公开
    充电颗粒VORTEX波生成

    公开(公告)号:WO2013092762A1

    公开(公告)日:2013-06-27

    申请号:PCT/EP2012/076232

    申请日:2012-12-19

    Abstract: A device (100) for imparting an orbital angular momentum to a charged particle wave propagating along a beam axis (104) in a charged particle beam generating apparatus is described. The device comprises a support element (106) having a target region (108) adapted for transmitting a charged particle wave propagating along a beam axis (104) and an induction means (112) for inducing a magnetic flux along an elongated profile having a free end portion located in said target region (108) and the induction means (112) is adapted for providing a magnetic flux in said elongated profile in order to induce an angular gradient, relative to the beam axis (104), of the phase of the charged particle wave when transmitted through said target region (108). A corresponding method is also disclosed, as well as the use thereof in electron microscopy.

    Abstract translation: 描述了一种用于对带电粒子束产生装置中沿着光束轴(104)传播的带电粒子波进行轨道角动量的装置(100)。 所述装置包括支撑元件(106),所述支撑元件(106)具有适于传输沿着光束轴线(104)传播的带电粒子波的目标区域(108)和用于沿着具有自由度的细长轮廓感应磁通量的感应装置(112) 位于所述目标区域(108)中的末端部分和所述感应装置(112)适于在所述细长轮廓中提供磁通量,以便相对于所述射束轴线(104)相对于所述射束轴线(104)引起角度梯度, 带电粒子波通过所述目标区域(108)传输。 还公开了相应的方法,以及其在电子显微镜中的应用。

    전계 방출원 및 이를 적용하는 소자 및 그 제조방법
    242.
    发明申请
    전계 방출원 및 이를 적용하는 소자 및 그 제조방법 审中-公开
    场发射源,应用该器件的器件

    公开(公告)号:WO2013009083A2

    公开(公告)日:2013-01-17

    申请号:PCT/KR2012/005480

    申请日:2012-07-11

    CPC classification number: H01J19/24 H01J1/304 H01J3/021 H01J9/025

    Abstract: 전계 방출원은, 나노 크기의 전자 방출 물질을 포함하는 것으로 제1면과 그 반대 면인 제2면을 가지는 전자방출필름 그리고 상기 전자방출필름의 일단부를 고정하는 것으로 상기 전자방출필름의 제1면과 제2면에 각각 대응하는 제1블록과 제2블록을 포함하는 캐소드; 를 구비한다.

    Abstract translation:

    场致发射体是包括纳米尺度的电子发射材料的第一表面和相反的 - 表面上具有第二表面的电子发射膜,并且其中一端固定在电子发射膜 包括对应的第一块和第二块的第一表面和所述电子发射膜的第二表面上的阴极; 。< / p>

    ELECTRON BEAM SOURCE SYSTEM AND METHOD
    243.
    发明申请
    ELECTRON BEAM SOURCE SYSTEM AND METHOD 审中-公开
    电子束源系统及方法

    公开(公告)号:WO2012119009A3

    公开(公告)日:2012-11-29

    申请号:PCT/US2012027345

    申请日:2012-03-01

    Abstract: An embodiment includes an electron beam source system having a first electron beam source unit with a substrate having a substrate-top end and a substrate-bottom end; and a first lens coupled to the substrate-bottom end defining a first aperture and having a lens-top end and a lens-bottom end. Further embodiments comprise an electron-emission region at the substrate-bottom end and aligned with the first aperture, the electron-emission region being operable to emit one or more electrons due to one or more photons contacting the electron-emission region, which may include passing through the substrate and into the electron-emission region, wherein the electron- emission region comprises a first doped portion of the substrate.

    Abstract translation: 一个实施例包括具有第一电子束源单元的电子束源系统,该第一电子束源单元具有衬底,该衬底具有衬底顶端和衬底底端; 以及耦合到所述衬底底端的第一透镜,所述第一透镜限定第一孔并且具有透镜顶端和透镜底端。 另外的实施例包括在衬底底端处并与第一孔对准的电子发射区域,电子发射区域可操作以由于与电子发射区域接触的一个或多个光子而发射一个或多个电子,其可以包括 通过衬底并进入电子发射区域,其中电子发射区域包括衬底的第一掺杂部分。

    METHOD AND APPARATUS FOR ENHANCING QUANTUM EFFICIENCY (QE) OF PHOTOCATHODE WITH SURFACE ACOUSTIC WAVES (SAW) AND APPLYING SURFACE ACOUSTIC WAVES (SAW) TO ELECTRON PHOTOINJECTOR
    244.
    发明申请
    METHOD AND APPARATUS FOR ENHANCING QUANTUM EFFICIENCY (QE) OF PHOTOCATHODE WITH SURFACE ACOUSTIC WAVES (SAW) AND APPLYING SURFACE ACOUSTIC WAVES (SAW) TO ELECTRON PHOTOINJECTOR 审中-公开
    用于提高表面声波(SAW)和应用表面声波(SAW)对电子照相机的光谱效率(QE)的方法和装置

    公开(公告)号:WO2012135544A1

    公开(公告)日:2012-10-04

    申请号:PCT/US2012/031295

    申请日:2012-03-29

    CPC classification number: H01J3/021 H01J1/34 H01J9/12 H01J29/481

    Abstract: In a particular embodiment, a method is disclosed that includes exciting one or more surface acoustic waves (SAW) on a surface of a piezoelectric substrate of a photocathode of a photoinjector using one or more interdigital tranducers (IDT). The method also includes optically generating electrons (e) and holes (h) in the photocathode using an incident laser beam. The method also includes changing at least one of a recombination probability and a recombination rate of at least some electrons (e) and holes (h) in the photocathode producing a high-current electron gun having an increased beam brightness, which is a ratio of electron beam current to electron beam emittance, due to at least one of a decreased electron beam emittance of electrons photoemitted from the photocathode of the photoinjector and an increased electron beam current. The method results in enhancing a quantum efficiency (QE) of photoemission by the photocathode of the photoinjector, leading to production of intense, low emittance electron bunches at a high repetition rate using laser excitation. Also disclosed are devices based on the disclosed method.

    Abstract translation: 在一个具体实施例中,公开了一种方法,其包括使用一个或多个叉指式传感器(IDT)激发光引发剂的光电阴极的压电基板的表面上的一个或多个表面声波(SAW)。 该方法还包括使用入射激光束在光电阴极中光学生成电子(e)和孔(h)。 该方法还包括改变光电阴极中的至少一些电子(e)和空穴(h)的复合概率和复合率中的至少一种,产生具有增加的光束亮度的高电流电子枪,其是比率 电子束电流对电子束发射率的影响,由于光电子发射器的光电阴极发射的电子的电子束发射率降低和电子束电流增加中的至少一种。 该方法提高了光引发剂的光电阴极的光电子发射的量子效率(QE),从而以激光激发的高重复率产生强烈的低发射率电子束。 还公开了基于所公开的方法的装置。

    ELECTRON BEAM SOURCE SYSTEM AND METHOD
    245.
    发明申请
    ELECTRON BEAM SOURCE SYSTEM AND METHOD 审中-公开
    电子束源系统和方法

    公开(公告)号:WO2012119009A2

    公开(公告)日:2012-09-07

    申请号:PCT/US2012/027345

    申请日:2012-03-01

    Abstract: An embodiment includes an electron beam source system having a first electron beam source unit with a substrate having a substrate-top end and a substrate-bottom end; and a first lens coupled to the substrate-bottom end defining a first aperture and having a lens-top end and a lens-bottom end. Further embodiments comprise an electron-emission region at the substrate-bottom end and aligned with the first aperture, the electron-emission region being operable to emit one or more electrons due to one or more photons contacting the electron-emission region, which may include passing through the substrate and into the electron-emission region, wherein the electron- emission region comprises a first doped portion of the substrate.

    Abstract translation: 一个实施例包括电子束源系统,其具有第一电子束源单元和具有衬底顶端和衬底底端的衬底; 以及耦合到所述基板底端的第一透镜,所述第一透镜限定第一孔并且具有透镜顶端和透镜底端。 其他实施例包括在衬底底端处的电子发射区域并且与第一孔径对准,电子发射区域可操作以由于接触电子发射区域的一个或多个光子而发射一个或多个电子,这可以包括 穿过衬底并进入电子发射区域,其中电子发射区域包括衬底的第一掺杂部分。

    SELF-HEALING LOW TEMPERATURE DISPENSER PHOTOCATHODE
    246.
    发明申请
    SELF-HEALING LOW TEMPERATURE DISPENSER PHOTOCATHODE 审中-公开
    自愈低温分光光度计

    公开(公告)号:WO2011084139A1

    公开(公告)日:2011-07-14

    申请号:PCT/US2010/003209

    申请日:2010-12-15

    CPC classification number: H01J1/34 H01J3/021 H01J2201/3426

    Abstract: Self-healing photocathode device comprising a photoemissive multi-alkali semiconductor comprising a multi-alkali antimonide having the formula AxBy C2Sb, where A, B and C are Group I alkali metals and x+y+z = 3; a nanostructured porous membrane, one surface of which is in direct contact with the multi-alkali semiconductor and the opposing surface of which is disposed toward the inside of a sealed reservoir, such that the porous membrane and the sealed reservoir form a volume which is maintained at low pressure; a temperature control means in contact with the porous membrane, wherein the temperature control means regulates the temperature of the porous membrane at 2000C or less; a source comprising elemental cesium which is releasable into the enclosed volume; and, a current conducting means attached to the source.

    Abstract translation: 包含具有式AxBy C2Sb的多碱锑化物的光发射多碱半导体的自愈合光电阴极装置,其中A,B和C是I族碱金属,x + y + z = 3; 纳米结构多孔膜,其一个表面与多碱半导体直接接触并且其相对表面设置在密封储存器的内部,使得多孔膜和密封储存器形成维持的体积 在低压下 与所述多孔膜接触的温度控制装置,其中所述温度控制装置将所述多孔膜的温度调节至200℃以下; 包含可释放到封闭容积中的元素铯的源; 以及附接到源的电流传导装置。

    TRIODES USING NANOFABRIC ARTICLES AND METHODS OF MAKING THE SAME
    247.
    发明申请
    TRIODES USING NANOFABRIC ARTICLES AND METHODS OF MAKING THE SAME 审中-公开
    使用纳米制品的三价钽及其制备方法

    公开(公告)号:WO2009005908A3

    公开(公告)日:2009-02-26

    申请号:PCT/US2008064385

    申请日:2008-05-21

    Abstract: Vacuum microelectronic devices with carbon nanotube films, layers, ribbons and fabrics are provided. The present invention discloses microelectronic vacuum devices including triode structures that include three-terminals (an emitter, a grid and an anode), and also higher-order devices such as tetrodes and pentodes, all of which use carbon nanotubes to form various components of the devices. In certain embodiments, patterned portions of nanotube fabric may be used as grid/gate components, conductive traces, etc. Nanotube fabrics may be suspended or conformally disposed. In certain embodiments, methods for stiffening a nanotube fabric layer are used. Various methods for applying, selectively removing (e.g. etching), suspending, and stiffening vertically- and horizontally- disposed nanotube fabrics are disclosed, as are CMOS -compatible fabrication methods. In certain embodiments, nanotube fabric triodes provide high-speed, small-scale, low -power devices that can be employed in radiation-intensive applications.

    Abstract translation: 提供具有碳纳米管膜,层,带和织物的真空微电子器件。 本发明公开了包括三端子结构(包括三端子(发射极,栅极和阳极))以及高阶器件如四极管和五极管的微电子真空装置,所有这些装置都使用碳纳米管来形成 设备。 在某些实施例中,纳米管织物的图案化部分可以用作栅格/栅极组件,导电迹线等。纳米管织物可以悬挂或保形地布置。 在某些实施例中,使用用于加强纳米管织物层的方法。 披露了用于施加,选择性地去除(例如蚀刻),悬挂和硬化垂直和水平设置的纳米管结构的各种方法,以及与CMOS兼容的制造方法。 在某些实施例中,纳米管织物三极管提供可用于辐射密集型应用的高速,小规模,低功率器件。

    STRUCTURE DE CATHODE POUR ECRAN PLAT AVEC GRILLE DE REFOCALISATION
    249.
    发明申请
    STRUCTURE DE CATHODE POUR ECRAN PLAT AVEC GRILLE DE REFOCALISATION 审中-公开
    具有反光网格的平面屏幕的阴极结构

    公开(公告)号:WO2008074825A1

    公开(公告)日:2008-06-26

    申请号:PCT/EP2007/064195

    申请日:2007-12-19

    CPC classification number: H01J29/467 H01J3/021 H01J29/481 H01J31/127

    Abstract: L'invention concerne une structure de cathode de type triode comprenant, en superposition sur un support (41), une électrode de cathode (42), une couche d'isolant électrique (44) et une électrode de grille (45), la couche d'isolant électrique (44) et l'électrode de grille (45) présentant des ouvertures d'émission (46) révélant au moins un élément émetteur d'électrons (48) relié électriquement à l'électrode de cathode (42), la structure comprenant en outre une électrode de refocalisation disposée pour refocaliser les électrons extraits par l'électrode de grille (45). L'électrode de refocalisation (50) est disposée sur ladite couche d'isolant électrique (44) et est reliée à des moyens de connexion électrique permettant de lui appliquer une tension de refocalisation par l'intermédiaire de nanotubes électriquement conducteurs (58). Elle concerne également un dispositif à émission de champ à commande matricielle.

    Abstract translation: 本发明涉及一种三极管类型的阴极结构,其包括叠置在支撑体(41),阴极电极(42),电绝缘层(44)和栅电极(45)上,电绝缘层 )和具有露出与阴极电极(42)电连接的至少一个电子发射元件(48)的发射开口(46)的栅电极(45),该结构还包括重新聚焦电极,以重新聚焦所提取的电子 通过栅电极(45)。 重聚焦电极(50)被放置在所述电绝缘层(44)上,并且连接到用于通过导电纳米管(58)向其施加再聚焦电压的电连接装置。 本发明还涉及矩阵控制场致发射器件。

    METHOD FOR PREVENTING ELECTRON EMISSION FROM DEFECTS IN A FIELD EMISSION DEVICE
    250.
    发明申请
    METHOD FOR PREVENTING ELECTRON EMISSION FROM DEFECTS IN A FIELD EMISSION DEVICE 审中-公开
    用于防止来自场发射装置中的缺陷的电子发射的方法

    公开(公告)号:WO2007065054A3

    公开(公告)日:2007-12-06

    申请号:PCT/US2006060669

    申请日:2006-11-08

    CPC classification number: H01J9/025 H01J3/021 H01J9/148 H01J29/481

    Abstract: A method is provided for preventing electron emission from a sidewall (34) of a gate electrode (20) and the edge (28) of the gate electrode stack of a field emission device (10), the gate electrode (20) having a surface (24) distally disposed from an anode (40) and a side (26) proximate to emission electrodes (38). The method comprises growing dielectric material (22) over the surface (24) and side (26) of the gate electrode (20), and performing an anisotropic etch (32) normal to the surface (24) to remove the dielectric material (22) from the surface (24) and leaving at least a portion of the dielectric material (22) on the side (26) of the gate electrode (20) and edge (28) of the gate electrode stack.

    Abstract translation: 提供了一种防止来自栅极电极(20)的侧壁(34)和场致发射器件(10)的栅极电极堆叠的边缘(28)的电子发射的方法,栅电极(20)具有表面 (40)和靠近发射电极(38)的侧面(26)远离地设置的(24)。 该方法包括在栅电极(20)的表面(24)和侧面(26)上方生长电介质材料(22),并且执行垂直于表面(24)的各向异性蚀刻(32)以移除电介质材料 ),并且在栅电极(20)的侧面(26)和栅极电极叠层的边缘(28)上留下介电材料(22)的至少一部分。

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