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    Spectrometer using concave holographic diffraction grating
    271.
    发明公开
    Spectrometer using concave holographic diffraction grating 失效
    Spektralphotometer mit Verwendung eines konkaven holographischen Beugungsgitters。

    公开(公告)号：EP0322654A2

    公开(公告)日：1989-07-05

    申请号：EP88120935.7

    申请日：1988-12-14

    Applicant: Hewlett-Packard Company

    Inventor： Sullivan, James J.

    IPC: G01J3/18 ,  G01J3/36

    CPC classification number: G01J3/32 ,  G01J3/02 ,  G01J3/0237 ,  G01J3/04 ,  G01J3/1838 ,  G01J3/2803

    Abstract: A spectrometer includes a source of light (12), a slit member (18) along the path of the light emitted from the source, a holographic, concave grating (24) in the path of the light passing through the slit member, and a photodetector (28) in the path of the diffracted light reflected from the grating. The photodetector (28) is positioned sub­stantially along the portion of the primary horizontal focal curve of the grating where it is intersected three times by a vertical focal curve of the grating. The three intersections are on the same side of the normal vector to the grating and two of the intersecting points being the positions of the laser used to form the grating.

    Abstract translation: 光谱仪包括光源（12），沿着从源发射的光的路径的狭缝构件（18），穿过狭缝构件的光的路径中的全息凹面光栅（24），以及 在从光栅反射的衍射光的路径中的光电检测器（28）。 光电检测器（28）基本上沿着光栅的主水平焦点曲线的部分定位，其中光栅与光栅的垂直焦点曲线相交三次。 三个交点位于与光栅的法向量相同的一侧，两个相交点是用于形成光栅的激光的位置。

    Color measurement apparatus
    275.
    发明授权
    Color measurement apparatus 有权

    公开(公告)号：US11927484B2

    公开(公告)日：2024-03-12

    申请号：US17522104

    申请日：2021-11-09

    Applicant: Seiko Epson Corporation

    Inventor： Haruki Miyasaka ,  Sho Aruga

    IPC: G01J3/50 ,  G01J3/02 ,  G01J3/04 ,  G02B5/28

    CPC classification number: G01J3/50 ,  G01J3/0237 ,  G01J3/04 ,  G02B5/284

    Abstract: A color measurement apparatus includes an incident light processing portion that processes light incident through the opening portion, a light emission portion that emits light toward the measurement target, a first circuit substrate in which the incident light processing portion is disposed, a second circuit substrate in which the light emission portion is disposed, and a frame assembly that is formed of a metal material, and in which the first circuit substrate and the second circuit substrate are disposed, in which the frame assembly includes a main frame that forms a base of the apparatus, a first subframe that holds the first circuit substrate, and a second subframe that holds the second circuit substrate, and the first subframe and the second subframe are in direct or indirect contact with the main frame.

    Dual-optical-path spectrophotometer and color measurement method thereof
    277.
    发明授权
    Dual-optical-path spectrophotometer and color measurement method thereof 有权

    公开(公告)号：US11815396B2

    公开(公告)日：2023-11-14

    申请号：US17700476

    申请日：2022-03-21

    Applicant: CAIPU TECHNOLOGY (ZHEJIANG) CO., LTD.

    Inventor： Kun Yuan ,  Shuanghu Gong ,  Jian Wang

    IPC: G01J3/02

    CPC classification number: G01J3/0251 ,  G01J3/0208 ,  G01J3/0232 ,  G01J3/0237 ,  G01J3/0294

    Abstract: Disclosed are a dual-optical-path spectrophotometer and a color measurement method thereof. The spectrophotometer includes an integrating sphere, a light source, and a sensor. A second shutter, a semi-reflecting and semi-transmitting device and lenses are arranged between the detection hole and the sensor, and a light guide device and a first shutter are arranged between a light guide hole formed in the integrating sphere and the semi-reflecting and semi-transmitting device. The color measurement method includes the following steps. A first shutter is closed, a second shutter is opened, light, reflected by the measuring opening, enters a sensor and the sensor measures a spectral reflected signal of the object surface. The first shutter is opened, the second shutter is closed, reflected light enters the sensor, and the sensor measures a spectral reflected signal of a light source. A final sampled signal is calculated.

    Support structure and method for focus adjustment
    278.
    发明授权
    Support structure and method for focus adjustment 有权

    公开(公告)号：US11781909B2

    公开(公告)日：2023-10-10

    申请号：US17684603

    申请日：2022-03-02

    Applicant: THERMO ELECTRON SCIENTIFIC INSTRUMENTS LLC

    Inventor： Matthew Meyer ,  Francis Deck

    IPC: G01J3/02 ,  G01J3/18

    CPC classification number: G01J3/0202 ,  G01J3/021 ,  G01J3/0208 ,  G01J3/0237 ,  G01J3/18

    Abstract: An embodiment of a support structure for adjusting the position of a plurality of optical elements is described that comprises a base plate comprising a centering pin, a first translation slot, and a second translation slot; and a translatable plate configured to operatively couple with a plurality of the optical elements and move relative to the base plate, wherein the translatable plate comprises a centering slot configured to engage with the centering pin, a first cam configured to engage with the first translation slot and control movement of the translatable plate along a first axis, and a second cam configured to engage with the second translation slot and control movement of the translatable plate along a second axis.

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