公开(公告)号：WO0144793A3

公开(公告)日：2002-03-21

申请号：PCT/US0034338

申请日：2000-12-18

Applicant: OSMIC INC

Inventor： JIANG LICAI

IPC: G01N23/201 ,  G01N23/20

CPC classification number: G01N23/201

Abstract: An x-ray analysis system including a focusing optic for focusing an x-ray beam to a focal point, a first slit optically coupled to the focusing optic, a second slit optically coupled to the first slit, and an x-ray detector, where the focal point is located in front of the detector.

Abstract translation: 一种X射线分析系统，包括用于将X射线束聚焦到焦点的聚焦光学器件，与聚焦光学器件光学耦合的第一狭缝，与第一狭缝光学耦合的第二狭缝和x射线检测器，其中 焦点位于检测器前面。

公开(公告)号：WO1997022976A1

公开(公告)日：1997-06-26

申请号：PCT/US1996019565

申请日：1996-12-12

Applicant: OSMIC, INC.

Inventor： OSMIC, INC. ,  GUTMAN, George

IPC: G21K01/06

CPC classification number: B82Y10/00 ,  G21K1/062 ,  G21K2201/061 ,  G21K2201/068

Abstract: An optical system for providing a steerable monochromatized source of x-ray or neutron radiation. The system incorporates a radiation source and a Bragg structure reflective optical element. A stage causes the optical element to move relative to the radiation source. Such movement is coordinated with lateral d-layer grading such that Bragg's law of reflection is satisfied for radiation of a given wavelength bandwidth to be reflected at various instances and departure angles.

Abstract translation: 一种用于提供x射线或中子辐射的可导向单色化源的光学系统。 该系统包含辐射源和布拉格结构反射光学元件。 阶段使光学元件相对于辐射源移动。 这种运动与横向d层分级协调，使得对于给定波长带宽的辐射满足反射的布拉格定律以在各种情况和出发角度被反射。

公开(公告)号：WO2004114325A3

公开(公告)日：2004-12-29

申请号：PCT/US2004/018494

申请日：2004-06-10

Applicant: OSMIC, INC.

Inventor： VERMAN, Boris ,  HARADA, Jimpei

IPC: G21K1/00

Abstract: The present invention provides an x-ray beam conditioning system with a Kirkpatrick-Baez diffractive optic including two optical elements, of which one of the optical elements is a crystal. The elements are arranged in a side-by-side configuration. The crystal can be a perfect crystal. One or both diffractive elements can be mosaic crystals. One element can be a multilayer optic. For example, the multilayer optic can be an elliptical mirror or a parabolic mirror with graded d-spacing. The graded d-spacing can be either lateral grading or dept grading, or both.

公开(公告)号：WO2004023495A1

公开(公告)日：2004-03-18

申请号：PCT/US2003/027576

申请日：2003-09-03

Applicant: OSMIC, INC.

Inventor： PLATONOV, Yuriy

IPC: G21K1/06

CPC classification number: B82Y10/00 ,  G01N23/223 ,  G01N2223/076 ,  G21K1/062

Abstract: The present invention consists of a multilayer structure having at least one triad of layers where each of the three layers is a predetermined material. One of the materials is from a group including lanthanum, lanthanum oxide, or lanthanumbased alloys. A second material is disposed between the first material and a third material. The second material is from a group including carbon, silicon, boron, boron carbide or silicon carbide. The third material is from a group including boron or boron carbide. Alternatively, a fourth material is added to further strengthen and increase the water resistance of the multilayer structure. The fourth material is selected from a group including silicon, boron, boron carbide or silicon carbide. The fourth material is disposed between the third layer of multilayer period n and the first layer of multilayer period n-1 .

Abstract translation: 本发明包括具有至少一个三层层的多层结构，其中三层中的每一层都是预定材料。 其中一种材料来自包括镧，氧化镧或镧系合金的组合。 第二材料设置在第一材料和第三材料之间。 第二种材料来自包括碳，硅，硼，碳化硼或碳化硅的组。 第三种材料来自包括硼或碳化硼的组。 或者，添加第四材料以进一步增强和增加多层结构的耐水性。 第四种材料选自包括硅，硼，碳化硼或碳化硅的组。 第四材料设置在第三层多层周期n和第一层多层周期n-1之间。

公开(公告)号：WO2003003380A1

公开(公告)日：2003-01-09

申请号：PCT/US2002/020751

申请日：2002-06-27

Applicant: OSMIC, INC.

Inventor： MARTYNOV, Vladimir, V. ,  PLATONOV, Yuriy

IPC: G21K1/06

CPC classification number: B82Y10/00 ,  G02B5/1809 ,  G02B5/1838 ,  G21K1/06 ,  G21K1/062

Abstract: An analyzing system (10) comprised of a radiation source (12) that provides a beam (14) of radiation of various wavelengths in the range of 0.3 to 1.0 nm, a sample (16) receives and reflects the incident beam through a slit (19) to a grating (20), a grating (20) that reflects only the zero order of the beam (22), and a detector (24) that detects only the zero order. The grating (20) includes a multi-layer structure (26) that has alternating layers of materials, a plurality of grooves (30) formed between a plurality of lands (32), wherein at least one structural parameter of the plurality of grooves and plurality of lands is formed randomly in the multi-layer structure.

Abstract translation: 一种分析系统（10），包括辐射源（12），所述辐射源（12）提供在0.3至1.0nm范围内的各种波长的辐射束（14），样本（16）通过狭缝（...）接收并反射入射光束 19）到光栅（20），仅反射光束（22）的零级的光栅（20）和仅检测零级的检测器（24）。 光栅（20）包括具有交替的材料层的多层结构（26），形成在多个焊盘（32）之间的多个凹槽（30），其中多个凹槽中的至少一个结构参数和 在多层结构中随机形成多个焊盘。

公开(公告)号：WO9951972A2

公开(公告)日：1999-10-14

申请号：PCT/US9905876

申请日：1999-03-17

Applicant: OSMIC INC

Inventor： VERMAN BORIS ,  JIANG LICAI

IPC: G01N23/20 ,  G01N23/207

CPC classification number: G01N23/207 ,  G01N23/20016 ,  G01N23/20025

Abstract: An x-ray diffractometer system comprising an x-ray optic which directs x-rays, a sample placed into said directed x-rays, wherein said sample diffracts said directed x-rays, creating a diffraction pattern, a translation stage coupled to said sample for moving said sample within said directed x-rays, whereby the resolution, angular range, and intensity of said diffraction pattern may be adjusted, and an x-ray detector for registering said diffraction pattern.

Abstract translation: x射线衍射仪系统，其包括x射线光学器件，X射线光学器件将X射线，放置在所述定向x射线中的样品放置，其中所述样品衍射所述定向x射线，产生衍射图案，耦合到所述样品的平移台 用于在所述定向x射线内移动所述样品，由此可以调节所述衍射图案的分辨率，角度范围和强度，以及用于记录所述衍射图案的X射线检测器。

公开(公告)号：WO1996004665A1

公开(公告)日：1996-02-15

申请号：PCT/US1995009769

申请日：1995-08-01

Applicant: OSMIC, INC.

Inventor： OSMIC, INC. ,  GUTMAN, George

IPC: G21K01/06

CPC classification number: B82Y10/00 ,  G21K1/062 ,  G21K2201/061 ,  G21K2201/064 ,  G21K2201/067 ,  G21K2201/068

Abstract: This invention relates to novel methods of producing flat and curved optical elements with laterally and depth graded multilayer thin films, in particular multilayers of extremely high precision, for use with soft and hard x-rays and neutrons and the optical elements achieved by these methods. In order to improve the performance of an optical element, errors in d spacing and curvature are isolated and subsequently compensated.

Abstract translation: 本发明涉及生产具有横向和深度梯度多层薄膜的平面和弯曲光学元件的新方法，特别是具有极高精度的多层，用于软和硬x射线和中子以及通过这些方法实现的光学元件。 为了提高光学元件的性能，分离出d间隔和曲率的误差并随后进行补偿。

公开(公告)号：DE60221394T2

公开(公告)日：2008-04-17

申请号：DE60221394

申请日：2002-06-27

Applicant: OSMIC INC

Inventor： MARTYNOV VLADIMIR V ,  PLATONOV YURIY

IPC: G21K1/06 ,  G02B5/18

Abstract: The invention relates to a grating (20) comprising: a multi-layer structure (26) comprising: alternating layers of materials; a plurality of grooves (30) formed between a plurality of lands (32), wherein at least one structural parameter of said plurality of grooves and plurality of lands is formed randomly in said multi-layer structure.

公开(公告)号：DE602004003347T2

公开(公告)日：2007-06-21

申请号：DE602004003347

申请日：2004-02-26

Applicant: OSMIC INC

Inventor： VERMAN BORIS ,  JIANG LICAI

IPC: G21K1/06 ,  G21K1/04

Abstract: An x-ray optical device includes an optic and an adjustable aperture that selectively occludes a portion of an x-ray beam. The adjustable aperture may be positioned between the optic and a sample and may be integrated with the optic or located in close proximity to the optic. The adjustable aperture enables a user to easily and effectively adjust the convergence of the x-rays. In doing so, the flux and resolution of the x-ray optical device can be optimized by using an optic having the maximum convergence allowed for all potential measurements, and then selecting a convergence for a particular measurement by adjusting the aperture.

公开(公告)号：DE60305044T2

公开(公告)日：2006-11-30

申请号：DE60305044

申请日：2003-09-03

Applicant: OSMIC INC

Inventor： PLATONOV YURIY

IPC: G21K1/06 ,  G01N23/223

Abstract: The present invention consists of a multilayer structure having at least one triad of layers where each of the three layers is a predetermined material. One of the materials is from a group including lanthanum, lanthanum oxide, or lanthanum-based alloys. A second material is disposed between the first material and a third material. The second material is from a group including carbon, silicon, boron, boron carbide or silicon carbide. The third material is from a group including boron or boron carbide. Alternatively, a fourth material is added to further strengthen and increase the water resistance of the multilayer structure. The fourth material is selected from a group including silicon, boron, boron carbide or silicon carbide. The fourth material is disposed between the third layer of multilayer period n and the first layer of multilayer period n-1.