METHOD FOR MEDICAL TREATMENT OF ANXIETY USING (S)-(-)-ALPHA-ETHYL-2-OXO-1- PYRROLIDINE ACETAMIDE

    公开(公告)号:JPH07149639A

    公开(公告)日:1995-06-13

    申请号:JP22833194

    申请日:1994-09-22

    Applicant: UCB SA

    Abstract: PURPOSE: To provide a method for treating an anxiety by using an anxiolytic agent capable of differentiating the anxiety shown by a healthy living body from a morbid anxiety, and having a large margin between an anxiolytic dosage and a neurotoxic dosage. CONSTITUTION: This method for treating an anxiety is to administer (S)-(-)-α- ethyl-2-oxo-1-pyrrolidine acetamide in an amount necessary for the treatment of a patient requiring the treatment through an oral or a parenteral route. As the anxiety requiring the treatment, the anxiety caused by a stress after an acute trauma and the anxiety induced by the withdrawal of chronically administered benzodiazepine, are cited. The daily dose is 5-70 mg/kg, and an average dose of 250 mg twice daily is effective for alleviating the anxiety in human. This dosage does not develop an adverse effect on a memory even if slightly, and also not develop an awkward motor nerve disturbance.

    PHOTOSENSITIVE COMPOSITION
    26.
    发明专利

    公开(公告)号:JPH021857A

    公开(公告)日:1990-01-08

    申请号:JP31833088

    申请日:1988-12-16

    Applicant: UCB SA

    Abstract: PURPOSE: To enhance the contrast and selectivity of a pattern by incorporating a specified arom. polycyclic sulfonic acid (salt) or arom. polycylic carboxylic acid (salt). CONSTITUTION: This compsn. contains a phenolic resin, a diazoquinone compd. and free arom. polycyclic sulfonic acid or carboxylic acid (A) and/or its ammonium salt (B) and/or its halide. When the salt B is contained, a component represented by the formula is used as the cation of the salt B and an acid other than amino acids is used as the acid component. In the formula, each of R1 -R4 is H, a 1-4C alkyl, etc. Naphthalenesulfonic acid, naphthalenecarboxylic acid, diazoquinonesulfonic acid or diazoquinonecarboxylic acid is preferably used as the acid A. After a layer of this compsn. is exposed to UV, a protective layer is preferably formed by selectively adding an Si compd.

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