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公开(公告)号：KR1020140035266A
公开(公告)日：2014-03-21
申请号：KR1020130108913
申请日：2013-09-11
Applicant: 삼성전자주식회사
IPC: A61K39/395 , A61K47/48 , A61P35/00
CPC classification number: A61K39/3955 , A61K45/06 , C07K16/2863 , C07K2317/24
Abstract: Provided is a pharmaceutical composition for a combination therapy which contains an angiogenesis inhibitor and an anti-c-Met antibody or an antigen-binding fragment thereof as an active ingredient for preventing and/or treating c-Met and angiogenic factor induced diseases. The pharmaceutical composition for the combination therapy has a superior synergistic effect, thereby more effective treatments are available.
Abstract translation: 提供了含有血管生成抑制剂和抗c-Met抗体或其抗原结合片段作为预防和/或治疗c-Met和血管生成因子诱导的疾病的活性成分的药物组合物。 用于联合治疗的药物组合物具有优异的协同效应，从而可获得更有效的治疗。
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22.发明公开슬러리 조성물, 이를 이용한 화학 기계적 연마 방법 및상기 방법을 이용한 비 휘발성 메모리 소자의 제조 방법 失效浆料组合物，使用浆料组合物的化学机械抛光方法和使用其制造非挥发性记忆体装置的方法
公开(公告)号：KR1020070066389A
公开(公告)日：2007-06-27
申请号：KR1020050127509
申请日：2005-12-22
Applicant: 삼성전자주식회사
IPC: C09K3/14
CPC classification number: C09K3/1454 , B24B37/044 , C09G1/02 , H01L21/3212
Abstract: Provided are a slurry composition to inhibit the dishing of a polysilicon pattern, thereby improving the uniformity of a substrate, and a chemical mechanical polishing(CMP) method using the composition, and a method for preparing a nonvolatile memory device by using the CMP method. The slurry composition comprises 1-20 wt% of an abrasive particle for polishing a polysilicon film; 0.005-1 wt% of a nonionic surfactant which is adsorbed on the surface of the polysilicon film to prevent the dishing of the formed polysilicon pattern when the polysilicon pattern is formed by the polishing of the polysilicon film; and a basic compound. Preferably, the abrasive particle is a colloidal silica having a particle size of 30-300 nm; and the nonionic surfactant is a polyoxyethylene isooxyl cyclohexyl nonionic surfactant represented by the chemical formula 1 (wherein R is an alkyl group; and x is an integer of 9-40) or a polyoxyethylene sorbitan fatty acid ester nonionic surfactant represented by the chemical formula 2 (wherein R is an alkyl group; and x, y, z and w are a positive integer satisfying the relation: 20
Abstract translation: 提供了抑制多晶硅图案的凹陷，从而提高基板的均匀性以及使用该组合物的化学机械抛光（CMP）方法的浆料组合物，以及通过使用CMP方法制备非易失性存储器件的方法。 浆料组合物包含1-20重量％的用于抛光多晶硅膜的磨料颗粒; 0.005-1重量％的非离子表面活性剂，其被吸附在多晶硅膜的表面上，以防止当通过多晶硅膜的抛光形成多晶硅图案时形成的多晶硅图案的凹陷; 和碱性化合物。 优选地，磨粒是粒径为30-300nm的胶体二氧化硅; 非离子表面活性剂是由化学式1表示的聚氧乙烯异氧基环己基非离子表面活性剂（其中R为烷基，x为9-40的整数）或由化学式2表示的聚氧乙烯山梨糖醇酐脂肪酸酯非离子表面活性剂 （其中R是烷基; x，y，z和w是满足以下关系的正整数：20 <= x + y + z + w <= 100）。
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公开(公告)号：KR1020050040549A
公开(公告)日：2005-05-03
申请号：KR1020030075918
申请日：2003-10-29
Applicant: 삼성전자주식회사
Inventor： 이효선
IPC: H04B1/40
Abstract: 본 발명은 USB포트를 이용하여 외부장치를 자동 인식하기 위한 이동통신 단말기를 제공한다. 이를 위한 본 발명은 USB(Universal Serial Bus)외부장치와 USB인터페이스를 통해 가능한 이동통신 단말기에 있어서, 상기 USB외부장치에 따라 활용 가능한 프로그램을 저장하고 있는 메모리와, 상기 USB인터페이스를 통해 상기 USB외부장치가 장착됨이 감지되면 상기 USB외부장치를 자동으로 인식하여 상기 메모리에 저장되어 있는 상기 대응되는 프로그램을 구동시키는 제어부를 구비함을 특징으로 한다.
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Patent Agency Ranking
公开(公告)号：KR1020170002055A
公开(公告)日：2017-01-06
申请号：KR1020150091946
申请日：2015-06-29
Applicant: 삼성전자주식회사
IPC: H01L21/768 , H01L21/033
CPC classification number: H01L21/823475 , H01L21/76811 , H01L21/76813 , H01L21/76816 , H01L21/823431 , H01L23/5226 , H01L23/528 , H01L23/53223 , H01L23/53238 , H01L23/53266
Abstract: 배선구조물형성방법에서, 제2 방향으로연장되는제1 부분, 및제2 방향과교차하는제1 방향으로연장되어제1 부분과연통하는제2 부분을갖는제1 개구를포함하는제1 마스크를제작한다. 제1 개구의제1 부분에적어도부분적으로오버랩되는제2 개구, 및제1 개구의제2 부분에각각적어도부분적으로오버랩되는복수의제3 개구들을포함하도록설계된제2 마스크의제2 개구를확장하여제1 개구의제1 및제2 부분들의경계영역에적어도부분적으로오버랩되는제4 개구를포함하도록제2 마스크를제작한다. 기판상에형성된층간절연막상에제작된제1 및제2 마스크들을사용하여층간절연막을식각함으로써, 제4 개구및 제3 개구들에각각대응하는제1 비아홀(via hole) 및제2 비아홀들을층간절연막하부에형성하고, 제1 개구에대응하며제1 및제2 비아홀들에연통하는트렌치를층간절연막상부에형성한다. 제1 및제2 비아홀들, 및트렌치를각각채우는제1 및제2 비아들(vias), 및배선을형성하다.
Abstract translation: 在形成布线结构的方法中，形成具有第一开口的第一掩模，第一开口包括沿第二方向延伸的第一部分和沿第一方向延伸的第二部分。 设计了包括与第一开口的第一部分重叠的第二开口和与第一开口的第二部分重叠的第三开口的第二掩模。 通过扩大第二开口将第二掩模制造成包括第四开口。 第四开口与第一开口的第一和第二部分之间的边界重叠。 使用第一和第二掩模蚀刻绝缘中间层，以形成对应于第四和第三开口的第一和第二通孔以及对应于第一开口的沟槽。 形成第一和第二通孔和布线以填充第一和第二通孔和沟槽。
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公开(公告)号：KR1020160136062A
公开(公告)日：2016-11-29
申请号：KR1020150069754
申请日：2015-05-19
Applicant: 삼성전자주식회사
IPC: H01L21/768
CPC classification number: H01L23/5226 , H01L21/76802 , H01L21/76807 , H01L21/76832 , H01L21/76834 , H01L21/76873 , H01L21/76882 , H01L21/823475 , H01L23/485 , H01L23/53295 , H01L27/088
Abstract: 배선구조물은기판, 기판상에형성된하부절연막, 하부절연막내에형성된하부배선, 하부배선을커버하며금속유전성물질을포함하는제1 식각저지막, 제1 식각저지막및 하부절연막상에형성된제2 식각저지막, 상기제2 식각저지막상에형성된층간절연막, 및상기층간절연막, 상기제2 식각저지막및 상기제1 식각저지막을관통하여상기하부배선과전기적으로연결되는도전패턴을포함한다.
Abstract translation: 布线结构包括衬底，衬底上的下绝缘层，下绝缘层中的下布线，覆盖下布线并包括金属电介质材料的第一蚀刻停止层，第一蚀刻停止层 蚀刻停止层和下绝缘层，在第二蚀刻停止层上的绝缘中间层，以及延伸穿过绝缘中间层，第二蚀刻停止层和第一蚀刻停止层并电连接到下部绝缘层的导电图案 接线。
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公开(公告)号：KR1020150004444A
公开(公告)日：2015-01-12
申请号：KR1020130077228
申请日：2013-07-02
Applicant: 삼성전자주식회사
IPC: C07K16/18 , C12N15/12 , A61K39/395 , G01N33/53
CPC classification number: C07K16/22 , C07K2317/34 , C07K2317/76 , C07K2317/92 , G01N33/74 , G01N2333/515 , G01N2800/7014
Abstract: In the present invention, provided are an Ang-2 antibody specifically bound to an Angiopoietin-2 (Ang-2) which is an angiogenic growth factor, a hybridoma cell line for producing a monoclonal antibody of the Ang-2 antibody, and a pharmaceutical composition including the Ang-2 antibody as an active ingredient. In the present invention, the provided antibody prevents the an angiogenesis from growing and cancer from transferring.
Abstract translation: 在本发明中，提供了与作为血管生成生长因子的血管生成素-2（Ang-2）特异性结合的Ang-2抗体，用于制备Ang-2抗体的单克隆抗体的杂交瘤细胞系和药物 组合物，其包含Ang-2抗体作为活性成分。 在本发明中，所提供的抗体阻止血管生成生长和癌转移。
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公开(公告)号：KR1020140125165A
公开(公告)日：2014-10-28
申请号：KR1020130042981
申请日：2013-04-18
Applicant: 삼성전자주식회사
IPC: C12Q1/68 , G01N33/53 , G01N33/574 , G01N33/563
CPC classification number: C12Q1/6876 , G01N33/5308 , G01N33/563 , G01N33/5748
Abstract: The present invention relates to a biomarker, secreted phosphoprotein 1 for evaluating efficacy, reactivity, a prognosis, or a does of anti-angiopoietin-2 antibodies in treating cancer or inflammatory diseases and screening potent anti-angiopoietin-2 antibodies, and to the uses of the biomarker.
Abstract translation: 本发明涉及用于评价治疗癌症或炎症性疾病和有效的抗血管生成素-2抗体的功效，反应性，预后或抗血管生成素-2抗体的分泌性磷蛋白1和用途 的生物标志物。
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公开(公告)号：KR1020130032106A
公开(公告)日：2013-04-01
申请号：KR1020110095814
申请日：2011-09-22
Applicant: 삼성전자주식회사 , 주식회사 동진쎄미켐
CPC classification number: G03F7/168 , C11D11/0047
Abstract: PURPOSE: A thinner composition for RRC and EBR processes is provided to conduct EBR process without tailing on edge part of a photoresist and to improve process stability and increase yield. CONSTITUTION: A thinner composition for RRC and EBR processes comprises 40-90 parts by weight of an alkyl lactate, 5-30 parts by weight of cyclohexanone, and 1-30 parts by weight of alkyl acetate. The alkyl substituent of the alkyl acetate is C1-5 nonether-based alkyl group. The composition additionally comprises a silicon-based surfactant. The alkyl substituent of the alkyl acetate is a methyl group, ethyl group, or propyl group. The thinner composition for EBR process comprises 40-90 parts by weight of an alkyl lactate, 5-30 parts by weight of the cyclohexanone, and 1-30 parts by weight of the alkyl acetate. The alkyl substituent of the alkyl acetate is C1-5 nonether-based alkyl group.
Abstract translation: 目的：提供用于RRC和EBR工艺的更薄的组合物以进行EBR工艺，而不会在光致抗蚀剂的边缘部分拖尾并提高工艺稳定性并提高产量。 构成：用于RRC和EBR方法的较薄组合物包含40-90重量份的乳酸烷基酯，5-30重量份的环己酮和1-30重量份的乙酸烷基酯。 乙酸烷基酯的烷基取代基是C1-5非醚基烷基。 该组合物另外包含硅基表面活性剂。 乙酸烷基酯的烷基取代基是甲基，乙基或丙基。 用于EBR方法的较薄组合物包含40-90重量份的乳酸烷基酯，5-30重量份的环己酮和1-30重量份的乙酸烷基酯。 乙酸烷基酯的烷基取代基是C1-5非醚基烷基。
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