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公开(公告)号：KR1019890011030A
公开(公告)日：1989-08-12
申请号：KR1019870014927
申请日：1987-12-24
Applicant: 한국전자통신연구원
IPC: H01L21/223
Abstract: 내용 없음
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公开(公告)号：KR100133489B1
公开(公告)日：1998-04-23
申请号：KR1019930029355
申请日：1993-12-23
Applicant: 한국전자통신연구원
IPC: H01L21/68
Abstract: 본 발명은 반도체 공정을 통합하기 위한 반도체 제조장치에 관한 것으로 특히 치구를 사용하여 웨이퍼 반송장치와 공정모듈간의 위치를 정렬할 수 있는 반도체 제조용 클러스트 장비의 위치정렬장치에 관한 것이다.
종래의 클러스트는 웨이퍼 반송장치를 통해 공정챔버 내에 웨이퍼 정렬을 위한 입출력이 육안관찰에 의한 피동적인 방법으로 정량적으로 이루어지지 않으므로 공정챔버의 중심에 정확히 놓이지 않는 단점이 있었다.
본 발명은 상술한 문제점들을 극복하기 위한 것으로 웨이퍼 반송로봇이 내장된 공통된 하나의 반송챔버나 다수의 격리밸브 및 부대 진공장치로 구성되는 클러스터 플랫폼과 이의 각 부착면에 다수의 공정모듈 및 카세트모듈 등의 부착모듈들이 장착되는 형태로 구성되어지는 복합 반도체 제조장비에 있어서, 상기 웨이퍼의 반송을 위한 반송로봇과 상기 공정모듈들간의 위치를 정렬하기 위해 각 공정모듈 내에 위치정렬치구를 장착하여, R, θ좌표를 추출하여 정렬하는 반도체 제조용 클러스트 장비의 위치정렬장치이다.-
公开(公告)号：KR100126588B1
公开(公告)日：1998-04-02
申请号：KR1019930029998
申请日：1993-12-27
Applicant: 한국전자통신연구원
IPC: H01L21/68
Abstract: An aligning apparatus and method of wafer carrier is provided to exactly align the process chamber and the wafer carrier. The aligning method comprises the steps of: locating a light receiving unit(112) on the center of each facet of a platform(110); and locating a light emitting unit(107) used as visible light source to lower part of an arm for supporting an end effector of wafer carrier(100). Thereby, it is possible to exactly align the process chamber, cooling module and align module to the wafer carrier using photo-sensing device such as the light receiving and emitting units(112,107).
Abstract translation: 提供晶片载体的对准装置和方法以精确对准处理室和晶片载体。 对准方法包括以下步骤：将光接收单元（112）定位在平台（110）的每个小平面的中心; 以及将用作可见光源的发光单元（107）定位到用于支撑晶片载体（100）的末端执行器的臂的下部。 因此，可以使用诸如光接收和发射单元（112,107）的光感测装置将处理室，冷却模块和对准模块精确地对准晶片载体。
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公开(公告)号：KR100126587B1
公开(公告)日：1998-04-02
申请号：KR1019930029997
申请日：1993-12-27
Applicant: 한국전자통신연구원
IPC: H01L21/68
Abstract: An apparatus and method for sensing an wafer position of cassette elevator is provided to exactly sense the position of wafer. The wafer position sensing apparatus comprises: a light emitting unit(19) used as an visible light source and located to back-side of an wafer cassette elevator chamber(1); and a light receiving unit(15) used as sensing module of wafer and located to a chamber door of the wafer cassette. Thereby, it is possible to exactly sense the wafer position in the cassette formed on UCL(universal cassette locator).
Abstract translation: 提供用于检测盒式电梯的晶片位置的装置和方法以精确地感测晶片的位置。 晶片位置检测装置包括：发光单元（19），用作可见光源并位于晶片盒式电梯室（1）的后侧; 以及光接收单元（15），用作晶片的感测模块并且位于晶片盒的室门上。 因此，可以精确地感测在UCL（通用盒定位器）上形成的盒中的晶片位置。
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Patent Agency Ranking
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公开(公告)号：KR1019920004959B1
公开(公告)日：1992-06-22
申请号：KR1019880017973
申请日：1988-12-30
IPC: H01L21/00
Abstract: The apparatus includes a plurality of pressure sensors (PS1- PS5) for detecting the pressures of the respective reactors to convert them into voltage signals. A power supplying and reading circuit supplies power to the pressure sensors (PS1-PS5), and vacuum valves (V1-V5) are connected to the respective reaction chambers. A throttle valve adjusts the pressure of the reaction chambers, and a vacuum pump produces vacuum within discharge tubes, while an interface board transmits and receives analogue signals representing the pressures of the chambers, to transmit the signals between the power supplying and reading circuit and a throttle valve controller.
Abstract translation: 该装置包括多个压力传感器（PS1-PS5），用于检测各个电抗器的压力以将它们转换为电压信号。 供电和读取电路为压力传感器（PS1-PS5）供电，真空阀（V1-V5）连接到各个反应室。 节流阀调节反应室的压力，真空泵在放电管内产生真空，而接口板传输和接收表示室的压力的模拟信号，以在供电和读取电路之间传输信号和 节流阀控制器。
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公开(公告)号：KR1019910008433B1
公开(公告)日：1991-10-15
申请号：KR1019890008242
申请日：1989-06-15
Applicant: 한국전자통신연구원 , 전화기산업기술연구조합 , 주식회사KDC상사
IPC: G06K15/00
Abstract: The method for reading the permanent code written on the magnetic layer of the card comprises steps: a) amplifying the signal read by the magnetic head and filtering the high frequency noise; b) differentiating the filtered signal; c) detecting the zero point from the differentiated signal and providing pulse; and d) reproducing the information signal with the pulse.
Abstract translation: 读取写在卡的磁性层上的永久代码的方法包括步骤：a）放大由磁头读取的信号并滤除高频噪声; b）区分滤波信号; c）从微分信号检测零点并提供脉冲; 以及d）用脉冲再现信息信号。
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公开(公告)号：KR1019910000274B1
公开(公告)日：1991-01-23
申请号：KR1019870014927
申请日：1987-12-24
Applicant: 한국전자통신연구원
IPC: H01L21/223
Abstract: The system is for depositing the polysilicon thin film safety and making the system maintenance easy. The silan(SiH4) and nitrogen gases are provided through two main pipes (1,2) so that the system is applicable to any type of the gas injectors adapted to the horizontal tube type reactor depositing the uniform polysicon. An air valve (4) for sequence control is positioned in front of a mass flow regulator (3) so that the mass flow is controlled fast in precision. A nitrogen, a bypass, and an exhaust lines are connected to the lines (1,2) to improve the safety and maintenance of the mass flow regulator. Also, a normal open air valve (14) and a manual valve (25) are installed to clean the reactor automatically in case of the power off.
Abstract translation: 该系统用于沉积多晶硅薄膜的安全性，使系统维护变得容易。 硅烷（SiH4）和氮气通过两个主管（1,2）提供，使得该系统适用于适用于沉积均匀多晶硅的水平管式反应器的任何类型的气体注入器。 用于顺序控制的空气阀（4）位于质量流量调节器（3）的前面，使得质量流量被精确地控制。 氮气，旁路和排气管线连接到管线（1,2），以改善质量流量调节器的安全和维护。 而且，在断电的情况下，安装有普通的露天阀（14）和手动阀（25）以自动清洁电抗器。
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