Abstract:
본 발명은 a) 금속 전구체, 산, 아민 및 환원제를 포함하는 제1 용액을 가열 및 교반하여 표면 산화막 형성이 제어된 금속 나노입자를 합성하는 단계, b) 상기 a) 단계에서 생성된 금속 나노입자를 비수계 용매에 분산시켜 전도성 잉크 조성물을 제조하는 단계, c) 상기 전도성 잉크 조성물을 절연성 기판에 도포하는 단계 및 d) 잉크 조성물이 도포된 절연성 기판을 열처리하여 금속 전도성 박막을 형성하는 단계를 포함하는 금속 전도성 박막의 제조방법에 관한 것이다. 본 발명에 따른 금속 전도성 박막 제조방법은 기존의 귀금속 나노입자 기반의 전도성 잉크 조성물에 비해 저가, 대면적 전도성 박막 제조공정을 가능케 할뿐만 아니라, 표면 산화막의 제어를 통해 우수한 전도도를 가지는 금속 전도성 박막의 제조방법을 제공한다.
Abstract:
본 발명은 태양전지 광활성층의 제조방법에 관한 것으로, 상세하게, 본 발명의 제조방법은 a) 11족 금속의 제1칼코젠화합물 및 상기 제1칼코젠화합물보다 낮은 융점을 갖는 11족 금속의 제2칼코젠화합물이 단일한 입자 내에 혼재된 복합 입자 및 12족 내지 14족에서 하나 또는 둘 이상 선택된 원소의 제3칼코젠화합물을 함유하는 잉크를 기판에 도포하여 도포막을 형성하는 단계; 및 b) 상기 도포막을 열처리하여 구리 및 12족 내지 14족에서 하나 또는 둘 이상 선택된 원소의 다원 칼코젠화합물 막을 제조하는 단계를 포함한다.
Abstract:
PURPOSE: Ink is provided to produce a semiconductor compound based photoactive layer in a single phase by a low temperature heat-processing at a temperature lower than 550°C, which is a process allowable temperature. CONSTITUTION: Ink contains the following: a composite particle which contains a first chalcogen compound of 11th group, and a second chalcogen compound of the 11th group with the lower melting point than the first chalcogen compound; and a precursor of more than one element selected from 12-14th group. The melting point of the second chalcogen compound is 220-550°C. A production method of a solar cell photoactive layer comprises a step of forming a coating film by coating the ink on a substrate, and a step of heat-processing the coating film.
Abstract:
PURPOSE: A manufacturing method of a photoactive layer is comprises to be able to manufacture multi-source chalcogen compound (a photoactive layer) with high quality through simple, safe and convenient processes, or to be able to manufacture a photoactive layer made of coarse grains, having an excellent compositional stability and uniformity, and an elaborate fine structure. CONSTITUTION: Ink includes composite particles in which a first chalcogen compound of a metal of group 11, and a second chalcogen compound of a metal of group 11, which has a lower melting point than the first chalcogen compound, are mixed in a single particle; and a third chalcogen compound of one or more than two selected from group 12-14. A manufacturing method of a photoactive layer for a solar cell comprises (i) a step of forming a coated film by coating the ink on a substrate; and (ii) a step of manufacturing a multi-source chalcogen compound film of a metal of group 11, and one or more than two elements selected from group 12-14, by heat-treating the coated film.
Abstract:
본 발명은 금속양이온 전구체, 용매, 안정화제 및 첨가제를 포함하는 금속산화물 반도체 잉크 조성물 및 상기 조성물을 이용한 박막 트랜지스터 제조방법에 관한 것이다. 본 발명의 고성능 금속산화물 반도체 잉크 조성물은 화학적 첨가제의 조성에 따라 인쇄공정성이 확보되는 동시에 박막 트랜지스터 소자의 특성이 향상되는 것을 특징으로 한다. 또한, 인쇄공정을 통한 소자제작 접근방법은 기상이 아닌 액상에서 이루어지기 때문에, 환경 친화적이며 저가의 대량생산에 적합한 방법이라는 장점을 가지고 있다.
Abstract:
The present invention relates to a method to fabricate nanopatterns using electrohydrodynimic-jet printing manufactured by heat-treating an insulating substrate having a printed metal nanoink composite for EHD printing and includes: a step (a) of heating and agitating a first solution including metal precursor, acid, ammine, and reducing agent and synthesizing metal nanoparticles having controlled surface oxide layer; a step (b) of dispersing the metal particles generated by step (a) into a non-aqueous solvent and fabricating the metal nanoink composite for EHD printing; and a step of allowing an electrohydrodynimic-jet printing device form the nanoink composite with a fine pattern.
Abstract:
PURPOSE: A method for synthesizing metal nanoparticles with a controlled surface oxide film and a method for manufacturing a conductive metal thin film are provided to improve electrical conductivity by efficiently removing capping molecules. CONSTITUTION: Metal nanoparticles are synthesized by heating and stirring first solutions. The metal nanoparticles are dispersed in non-aqueous solvents. A conductive ink composition is made by a dispersion process. The conductive ink composition is coated on an insulating substrate. A conductive metal thin film is formed by thermally processing the insulating substrate.
Abstract:
PURPOSE: A manufacturing method of nano-crystal silicon is provided to synthesize high purity nanocrystalline silicon having luminosity and redispersibility through simple processes. CONSTITUTION: A manufacturing method of the nano-crystal silicon comprises the following steps: adding a reducing agent and a capping agent to an organic solvent; manufacturing capped silicon dispersed solution by adding tetraethoxysilane(TEOS) or tetramethoxysilane(TMOS); adding a phase-separation solvent to the silicon dispersed solution; and separating the silicon solution from the reaction mixture of the previous step. The capping reagent is selected from C5-C20 alcohol, amine, thiol or fatty acid. 2-6 moles of the reducing agent is added for 1mole of tetraethoxysilane(TEOS) or tetramethoxysilane(TMOS). 0.01-100 moles of the capping reagent is added for 1 mole of tetraethoxysilane(TEOS) or tetramethoxysilane(TMOS).