Abstract:
Introduced in the present invention are a TiAgN coating layer, a TiAgN coating method, and a TiAgN coating apparatus. The TiAgN coating layer is coated by a plasma coating method using nitrogen gas, a Ti source, and an Ag source, and contents of Ag increase when approaching the surface of the TiAgN coating layer. The TiAgN coating layer comprises four layers, and each layer has unique Ag contents. Moreover, the four layers comprise, from the inside to the surface, a first layer through a fourth layer. Contents of Ag in the respective four layers are: 1-4 at% in the first layer; 5-9 at% in the second layer; 10-16 at% in the third layer; and 17-20 at% in the fourth layer.
Abstract:
The present invention is aimed at providing a TiAgN coating layer, a TiAgN coating method, and a TiAgN coating apparatus. The TiAgN coating layer has excellent load carrying properties and wear resistance, and, at the same time, is capable of maximizing low-friction characteristics, by overgrowing Ag, a soft metal, on a TiAgN coating having a high hardness, to grant softness to the surface of the TiAgN coating and to make Ag move onto the surface in a situation of a metal to metal contact when the temperature rises. According to the present invention regarding the TiAgN coating layer, the TiAgN coating method, and the TiAgN coating apparatus, a friction coefficient at room temperature (25°C) is 0.41 or higher, and a friction coefficient at a high temperature (200°C) is 0.32 or higher.
Abstract:
Disclosed are a multilayered coating layer on which a first coating layer composed of TiN and a second coating layer composed of TiAgN are laminated to be repeatedly alternated and a coating method for the same. A first coating layer (30) and a second coating layer (40) are individually formed at the thickness of 20-300 nm. Ag in whole atoms composing the first coating layer (30) and the second coating layer (40) is 7-20at%.
Abstract:
Disclosed is an aluminum alloy having a compound TiB_2 composed therein by comprising: Al as a main component; 12-18 wt% of Si; 0.1-3 wt% of Ti; and 0.1-1 wt% of B (1 is not included).
Abstract:
PURPOSE: A method for surface-treating an engine driving part and the engine driving part surface-treated by the same are provided to deposit Ag as a functional element on a TiN material having an excellent heat resistant property, thereby maximizing the heat resistant property and a low frictional property. CONSTITUTION: A method for surface-treating an engine driving part includes: a step of maintaining the inner side of a coating chamber to be vacuous; a step of heating the coating chamber until temperature distribution at the surface and the inner side of a target to be coated is uniform; a step of removing foreign matters from the surface of the target; a step of depositing a buffer layer in order to improve bonding strength between the coating layer boundary surfaces of the target; a step of applying a biased voltage to the target on which the buffer layer is deposited in order to coat the target with a TiAgN coating material; and a step of cooling the target on which the coating material is coated. [Reference numerals] (AA) Step of making a vacuum in a coating chamber; (BB) Step of heating the coating chamber; (CC) Step of cleaning a coating target; (DD) Step of depositing a buffer layer on the coating target; (EE) Step of coating TiAgN on the coating target; (FF) Step of cooling the coated coating target
Abstract:
PURPOSE: A pollution level measuring method for a PVD coater is provided to improve cleaning efficiency by cleaning if the pollution level measurement of a coating material inside a coater chamber is same or greater than a predetermined level. CONSTITUTION: A pollution level measuring method for a PVD coater comprises following steps: attaching a silicon wafer for adhesion to the inside of a PVD coater before a coating operation(S100); separating the silicon wafer after the coating operation and partially cutting the separated silicon wafer(S200); and checking whether the pollution level of an coating material is same or greater than a predetermined level by measuring the coating thickness of the silicon wafer cut surface(S330). [Reference numerals] (AA) Start; (S100) Attaching a wafer; (S200) Cutting the wafer; (S310) Measuring the coating thickness of a cut surface; (S320) Checking a pollution level; (S330) Polluted over a predetermined level?; (S400) Performing cleaning;
Abstract:
스퍼터링기구와 아크이온플레이팅기구가 구비된 물리기상증착기를 이용한 코팅층 형성방법으로서, 모재에 스퍼터링기구의 Mo 타겟과 Ar 가스를 이용하여 Mo코팅층을 형성하는 제1코팅단계; 아크이온플레이팅기구의 Ar 가스 및 N 2 가스를 이용하여 질화물 박막 형성 분위기를 형성하는 질화단계; 모재에 스퍼터링기구의 Mo 타겟과 Ar 가스 및 아크이온플레이팅기구의 Ar 가스, N 2 가스 및 Cr 소스를 동시에 이용하여 Cr-Mo-N의 나노복합코팅층을 형성하는 제2코팅단계; 및 모재를 회전축을 중심으로 공전시킴으로써 Cr-Mo-N의 나노복합코팅층과 Mo코팅층이 반복되는 멀티레이어로 코팅하는 멀티코팅단계;를 포함하는 나노멀티레이어 코팅층 그 형성방법 및 형성장치가 소개된다.