公开(公告)号：PT1007517E

公开(公告)日：2004-03-31

申请号：PT98942099

申请日：1998-08-18

Applicant: ABBOTT LAB

Inventor： ALLEN MICHAEL S

IPC: C07D277/20 ,  C07D277/22 ,  C07D277/24 ,  C07D277/32

Abstract: The present invention discloses a process for the preparation of a hydroxymethylthiazole compound having formula 3: The process of the invention comprises reacting a halomethyl thiazole having the formula: with water, at an elevated temperature. Optionally, the reaction can be carried out in the presence of a base, such as sodium carbonate, which can react with any acid formed. In the process of the invention, X is a halogen atom; and R6 is selected from the group consisting of hydrogen, and halogen atoms. The invention also contemplates the preparation of acid addition salts of the hydroxymethylthiazole, compound 3.

公开(公告)号：PT916646E

公开(公告)日：2003-09-30

申请号：PT99101692

申请日：1994-09-26

Applicant: ABBOTT LAB

Inventor： ZHAO CHEN ,  SHAM HING LEUNG ,  HAIGHT ANTHONY R ,  KERDESKY FRANCIS A J ,  STUK TIMOTHY L ,  ALLEN MICHAEL S ,  MELCHER LAURA ,  LEANNA M ROBERT ,  ROBBINS TIMOTHY A ,  MORTON HOWARD E ,  SOWIN THOMAS J ,  TIEN JIEN-HEH J ,  NORBECK DANIEL W ,  LIJEWSKI-LINCH LINDA M ,  SCARPETTI DAVID ,  LANGRIDGE DENTON C ,  RENO DANIEL S

IPC: C07C213/00 ,  C07C215/28 ,  C07C225/16 ,  C07C227/18 ,  C07C229/36 ,  C07C231/12 ,  C07C233/35 ,  C07C251/40 ,  C07C255/27 ,  C07C255/42 ,  C07C269/06 ,  C07C271/20 ,  C07D209/44 ,  C07D221/14

Abstract: Processes are disclosed which are useful for the preparation of a substantially pure compound of formula (3), wherein R6 and R7 are each hydrogen or R6 and R7 are independently selected from (i), wherein Ra and Rb are independently selected from hydrogen, loweralkyl and phenyl and Rc, Rd and Re are independently selected from hydrogen, loweralkyl, trifluoromethyl, alkoxy, halo and phenyl; and (ii) wherein the naphthyl ring is unsubstituted or substituted with one, two or three substituents independently selected from loweralkyl, trifluoromethyl, alkoxy, and halo; or R6 is as defined above and R7 is R7aOC (O)- wherein R7a is loweralkyl or benzyl; or R6 and R7 taken together with the nitrogen atom to which they are bonded are (a) or (b), wherein Rf, Rg, Rh and Ri are independently selected from hydrogen, loweralkyl, alkoxy, halogen, and trifluoromethyl and R8 is hydrogen or -C(O)R'' wherein R'' is loweralkyl, alkoxy, benzyloxy or phenyl wherein the phenyl ring is unsubstituted or substituted with one, two or three substituents independently selected from loweralkyl, trifluoromethyl, alkoxy and halo; or an acid addition salt thereof.

公开(公告)号：DE69432611D1

公开(公告)日：2003-06-05

申请号：DE69432611

申请日：1994-09-26

Applicant: ABBOTT LAB

Inventor： STUK THIMOTHY L ,  KERDESKY FRANCIS A J ,  LIJEWSKI LINDA M ,  NORBECK DANIEL W ,  SCARPETTI DAVID ,  TIEN JIEN-HEH J ,  ALLEN MICHAEL S ,  LANGRIDGE DENTON C ,  MELCHER LAURA ,  RENO DANIEL S ,  SHAM HING LEUNG ,  ZHAO CHEN ,  HAIGHT ANTHONY R ,  LEANNA M ROBERT ,  MORTON HOWARD E ,  ROBBINS TIMOTHY A ,  SOWIN THOMAS J

IPC: C07C213/00 ,  C07C215/28 ,  C07C225/16 ,  C07C227/18 ,  C07C229/36 ,  C07C231/12 ,  C07C233/35 ,  C07C251/40 ,  C07C255/27 ,  C07C255/42 ,  C07C269/06 ,  C07C271/20 ,  C07D209/44 ,  C07D221/14

Abstract: Processes are disclosed which are useful for the preparation of a substantially pure compound of formula (3), wherein R6 and R7 are each hydrogen or R6 and R7 are independently selected from (i), wherein Ra and Rb are independently selected from hydrogen, loweralkyl and phenyl and Rc, Rd and Re are independently selected from hydrogen, loweralkyl, trifluoromethyl, alkoxy, halo and phenyl; and (ii) wherein the naphthyl ring is unsubstituted or substituted with one, two or three substituents independently selected from loweralkyl, trifluoromethyl, alkoxy, and halo; or R6 is as defined above and R7 is R7aOC (O)- wherein R7a is loweralkyl or benzyl; or R6 and R7 taken together with the nitrogen atom to which they are bonded are (a) or (b), wherein Rf, Rg, Rh and Ri are independently selected from hydrogen, loweralkyl, alkoxy, halogen, and trifluoromethyl and R8 is hydrogen or -C(O)R'' wherein R'' is loweralkyl, alkoxy, benzyloxy or phenyl wherein the phenyl ring is unsubstituted or substituted with one, two or three substituents independently selected from loweralkyl, trifluoromethyl, alkoxy and halo; or an acid addition salt thereof.

公开(公告)号：GR3031939T3

公开(公告)日：2000-03-31

申请号：GR990403031

申请日：1999-11-25

Applicant: ABBOTT LAB

Inventor： STUK TIMOTHY L ,  KERDESKY FRANCIS A J ,  LIJEWSKI LINDA M ,  NORBECK DANIEL W ,  SCARPETTI DAVID ,  TIEN JIEN-HEH J ,  ALLEN MICHAEL S ,  LANGRIDGE DENTON C ,  MELCHER LAURA ,  RENO DANIEL S ,  SHAM HING LEUNG ,  ZHAO CHEN ,  HAIGHT ANTHONY R ,  LEANNA M ROBERT ,  MORTON HOWARD E ,  ROBBINS TIMOTHY A ,  SOWIN THOMAS J

IPC: C07C213/00 ,  C07C215/28 ,  C07C225/16 ,  C07C227/18 ,  C07C229/36 ,  C07C231/12 ,  C07C233/35 ,  C07C251/40 ,  C07C255/27 ,  C07C255/42 ,  C07C269/06 ,  C07C271/20 ,  C07D209/44 ,  C07D221/14

Abstract: Processes are disclosed which are useful for the preparation of a substantially pure compound of formula (3), wherein R6 and R7 are each hydrogen or R6 and R7 are independently selected from (i), wherein Ra and Rb are independently selected from hydrogen, loweralkyl and phenyl and Rc, Rd and Re are independently selected from hydrogen, loweralkyl, trifluoromethyl, alkoxy, halo and phenyl; and (ii) wherein the naphthyl ring is unsubstituted or substituted with one, two or three substituents independently selected from loweralkyl, trifluoromethyl, alkoxy, and halo; or R6 is as defined above and R7 is R7aOC (O)- wherein R7a is loweralkyl or benzyl; or R6 and R7 taken together with the nitrogen atom to which they are bonded are (a) or (b), wherein Rf, Rg, Rh and Ri are independently selected from hydrogen, loweralkyl, alkoxy, halogen, and trifluoromethyl and R8 is hydrogen or -C(O)R'' wherein R'' is loweralkyl, alkoxy, benzyloxy or phenyl wherein the phenyl ring is unsubstituted or substituted with one, two or three substituents independently selected from loweralkyl, trifluoromethyl, alkoxy and halo; or an acid addition salt thereof.

公开(公告)号：AT183993T

公开(公告)日：1999-09-15

申请号：AT94929340

申请日：1994-09-26

Applicant: ABBOTT LAB

Inventor： STUK TIMOTHY L ,  KERDESKY FRANCIS A J ,  LIJEWSKI LINDA M ,  NORBECK DANIEL W ,  SCARPETTI DAVID ,  TIEN JIEN-HEH J ,  ALLEN MICHAEL S ,  LANGRIDGE DENTON C ,  MELCHER LAURA ,  RENO DANIEL S ,  SHAM HING LEUNG ,  ZHAO CHEN ,  HAIGHT ANTHONY R ,  LEANNA M ROBERT ,  MORTON HOWARD E ,  ROBBINS TIMOTHY A ,  SOWIN THOMAS J

IPC: C07C213/00 ,  C07C215/28 ,  C07C225/16 ,  C07C227/18 ,  C07C229/36 ,  C07C231/12 ,  C07C233/35 ,  C07C251/40 ,  C07C255/27 ,  C07C255/42 ,  C07C269/06 ,  C07C271/20 ,  C07D209/44 ,  C07D221/14

Abstract: Processes are disclosed which are useful for the preparation of a substantially pure compound of formula (3), wherein R6 and R7 are each hydrogen or R6 and R7 are independently selected from (i), wherein Ra and Rb are independently selected from hydrogen, loweralkyl and phenyl and Rc, Rd and Re are independently selected from hydrogen, loweralkyl, trifluoromethyl, alkoxy, halo and phenyl; and (ii) wherein the naphthyl ring is unsubstituted or substituted with one, two or three substituents independently selected from loweralkyl, trifluoromethyl, alkoxy, and halo; or R6 is as defined above and R7 is R7aOC (O)- wherein R7a is loweralkyl or benzyl; or R6 and R7 taken together with the nitrogen atom to which they are bonded are (a) or (b), wherein Rf, Rg, Rh and Ri are independently selected from hydrogen, loweralkyl, alkoxy, halogen, and trifluoromethyl and R8 is hydrogen or -C(O)R'' wherein R'' is loweralkyl, alkoxy, benzyloxy or phenyl wherein the phenyl ring is unsubstituted or substituted with one, two or three substituents independently selected from loweralkyl, trifluoromethyl, alkoxy and halo; or an acid addition salt thereof.

公开(公告)号：HK1011677A1

公开(公告)日：1999-07-16

申请号：HK98112593

申请日：1998-11-30

Applicant: ABBOTT LAB

Inventor： STUK TIMOTHY L ,  KERDESKY FRANCIS A J ,  LIJEWSKI LINDA M ,  NORBECK DANIEL W ,  SCARPETTI DAVID ,  TIEN JIEN-HEH J ,  ALLEN MICHAEL S ,  LANGRIDGE DENTON C ,  MELCHER LAURA ,  RENO DANIEL S ,  SHAM HING LEUNG ,  ZHAO CHEN ,  HAIGHT ANTHONY R ,  LEANNA ROBERT M ,  MORTON HOWARD E ,  ROBBINS TIMOTHY A ,  SOWIN THOMAS J

IPC: C07C213/00 ,  C07C215/28 ,  C07C225/16 ,  C07C227/18 ,  C07C229/36 ,  C07C231/12 ,  C07C233/35 ,  C07C251/40 ,  C07C255/27 ,  C07C255/42 ,  C07C269/06 ,  C07C271/20 ,  C07D209/44 ,  C07D221/14 ,  C07C

Abstract: Processes are disclosed which are useful for the preparation of a substantially pure compound of formula (3), wherein R6 and R7 are each hydrogen or R6 and R7 are independently selected from (i), wherein Ra and Rb are independently selected from hydrogen, loweralkyl and phenyl and Rc, Rd and Re are independently selected from hydrogen, loweralkyl, trifluoromethyl, alkoxy, halo and phenyl; and (ii) wherein the naphthyl ring is unsubstituted or substituted with one, two or three substituents independently selected from loweralkyl, trifluoromethyl, alkoxy, and halo; or R6 is as defined above and R7 is R7aOC (O)- wherein R7a is loweralkyl or benzyl; or R6 and R7 taken together with the nitrogen atom to which they are bonded are (a) or (b), wherein Rf, Rg, Rh and Ri are independently selected from hydrogen, loweralkyl, alkoxy, halogen, and trifluoromethyl and R8 is hydrogen or -C(O)R'' wherein R'' is loweralkyl, alkoxy, benzyloxy or phenyl wherein the phenyl ring is unsubstituted or substituted with one, two or three substituents independently selected from loweralkyl, trifluoromethyl, alkoxy and halo; or an acid addition salt thereof.