公开(公告)号：NL2006285A

公开(公告)日：2011-10-03

申请号：NL2006285

申请日：2011-02-23

Applicant: ASML NETHERLANDS BV

Inventor： CADEE THEODORUS ,  KUIT JAN JAAP ,  MULKENS JOHANNES ,  ZAAL KOEN

IPC: G03F7/20 ,  G03F9/00

公开(公告)号：NL2003362A

公开(公告)日：2010-04-19

申请号：NL2003362

申请日：2009-08-19

Applicant: ASML NETHERLANDS BV

Inventor： KUIT JAN JAAP ,  LIEBREGTS PAULUS

IPC: G03F7/20

Abstract: An immersion lithographic apparatus is provided in which a maximum permissible velocity of the substrate relative to a fluid confinement structure that controls the immersion fluid is determined based on a property of the substrate to be exposed and, during the exposure process, the velocity of the substrate relative to the fluid confinement structure is limited to be below this maximum permissible velocity.

公开(公告)号：NL2003039A1

公开(公告)日：2010-01-25

申请号：NL2003039

申请日：2009-06-18

Applicant: ASML NETHERLANDS BV

Inventor： KUIT JAN JAAP ,  KUIPER DOEDE

IPC: G03F7/20