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    METHOD OF LOADING A FLEXIBLE SUBSTRATE AND LITHOGRAPHY APPARATUS
    1.
    发明申请
    METHOD OF LOADING A FLEXIBLE SUBSTRATE AND LITHOGRAPHY APPARATUS 审中-公开
    装载柔性基板和光刻装置的方法

    公开(公告)号：WO2013107684A3

    公开(公告)日：2013-12-12

    申请号：PCT/EP2013050402

    申请日：2013-01-10

    Applicant: ASML NETHERLANDS BV

    Inventor： LOOPSTRA ERIK ,  DONDERS SJOERD ,  ZAAL KOEN ,  CADEE THEODORUS PETRUS MARIA

    IPC: G03F7/20

    CPC classification number: G03F7/70791 ,  G03F7/707 ,  H01L21/67778

    Abstract: A method of loading a flexible substrate (38), a device manufacturing method, an apparatus for loading a flexible substrate, and a lithography apparatus. According to an embodiment, there is provided a method of loading a flexible substrate onto a support (42) for use in an exposure apparatus, including transferring the substrate progressively from a substrate carrier (40) to the support in a way that a boundary line (45) separating a region of the substrate that is loaded onto the support and a region of the substrate that is not yet loaded onto the support remains substantially straight during the loading process.

    Abstract translation: 装载柔性基板（38）的方法，装置制造方法，装载柔性基板的装置和光刻装置。 根据一个实施例，提供了一种将柔性基板装载到用于曝光设备的支撑件（42）上的方法，包括将基板从基板载体（40）逐渐地以基板载体（40）的方式转移到支撑件 （45），分离装载到载体上的基板的区域和尚未加载到载体上的基板的区域在加载过程中保持基本上直线。

    LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    2.
    发明申请
    LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 审中-公开
    LITHOGRAPHIC装置和装置制造方法

    公开(公告)号：WO2013113634A2

    公开(公告)日：2013-08-08

    申请号：PCT/EP2013051480

    申请日：2013-01-25

    Applicant: ASML NETHERLANDS BV

    Inventor： KOEVOETS ADRIANUS ,  DONDERS SJOERD ,  VAN SCHOOT JAN ,  ZAAL KOEN ,  CADEE THEODORUS PETRUS MARIA

    IPC: G03F7/20

    CPC classification number: G03F7/70891 ,  G03F7/70266 ,  G03F7/70775 ,  G03F7/70833 ,  G03F7/7085 ,  G03F7/70858

    Abstract: A lithographic apparatus component, such as a metrology system or an optical element (e.g., a mirror) is provided with a temperature control system for controlling deformation of the component. The control system includes channels provided close to a surface of the component through which a two phase cooling medium is supplied. The metrology system measures a position of at least a moveable item with respect to a reference position and includes a metrology frame connected to the reference position. An encoder is connected to the moveable item and constructed and arranged to measure a relative position of the encoder with respect to a reference grid. The reference grid may be provided directly on a surface of the metrology frame. A lithographic projection apparatus may have the metrology system for measuring a position of the substrate table with respect to the projection system.

    Abstract translation: 光刻设备部件如测量系统或光学元件（例如，反射镜）设置有用于控制部件变形的温度控制系统。 控制系统包括靠近组件的表面设置的通道，通过该通道提供两相冷却介质。 计量系统测量相对于参考位置的至少可移动项目的位置，并且包括连接到参考位置的计量框架。 编码器连接到可移动项目，并被构造和布置成测量编码器相对于参考网格的相对位置。 参考网格可以直接设置在计量框架的表面上。 平版印刷设备可以具有用于测量衬底台相对于投影系统的位置的计量系统。

    PROJECTION SYSTEM, MIRROR AND RADIATION SOURCE FOR A LITHOGRAPHIC APPARATUS
    3.
    发明申请
    PROJECTION SYSTEM, MIRROR AND RADIATION SOURCE FOR A LITHOGRAPHIC APPARATUS 审中-公开
    投影系统，镜像和放射源用于光刻设备

    公开(公告)号：WO2014114405A3

    公开(公告)日：2014-09-25

    申请号：PCT/EP2013076310

    申请日：2013-12-12

    Applicant: ASML NETHERLANDS BV

    Inventor： VAN DE KERKHOF MARCUS ,  VAN OOSTEN ANTON ,  BUTLER HANS ,  LOOPSTRA ERIK ,  VAN DER WIJST MARC ,  ZAAL KOEN

    IPC: G03F7/20

    CPC classification number: G03F7/702 ,  G02B7/182 ,  G02B7/1827 ,  G02B26/0825 ,  G03F7/70158 ,  G03F7/70191 ,  G03F7/70266 ,  G03F7/70575 ,  G03F7/709

    Abstract: Disclosed is a system configured to project a beam of radiation onto a target portion of a substrate within a lithographic apparatus. The system comprises a mirror (510) having an actuator (500) for positioning the mirror and/or configuring the shape of the mirror, the actuator also providing active damping to the mirror, and a controller (515a, 515b) for generating actuator control signals for control of said actuator(s). A first coordinate system is used for control of said actuator(s) when positioning said mirror and/or configuring the shape of said mirror and a second coordinate system is used for control of said actuator(s) when providing active damping to said mirror.

    Abstract translation: 公开了一种被配置为将光束投射到光刻设备内的基板的目标部分上的系统。 该系统包括具有用于定位反射镜的致动器（500）和/或配置反射镜的形状的反射镜（510），致动器还向反射镜提供主动阻尼，以及用于产生致动器控制的控制器（515a，515b） 用于控制所述致动器的信号。 当定位所述反射镜和/或构造所述反射镜的形状时，第一坐标系用于控制所述致动器，并且当向所述反射镜提供主动阻尼时，使用第二坐标系来控制所述致动器。

    APPARATUS AND METHOD FOR CONTACTLESS HANDLING OF AN OBJECT.
    5.
    发明专利
    APPARATUS AND METHOD FOR CONTACTLESS HANDLING OF AN OBJECT. 未知

    公开(公告)号：NL2006514A

    公开(公告)日：2011-11-14

    申请号：NL2006514

    申请日：2011-04-01

    Applicant: ASML NETHERLANDS BV

    Inventor： CADEE THEODORUS ,  ZAAL KOEN ,  HOL TIMO ,  KOOT MICHAEL WILHELMUS THEODORUS

    IPC: G03F7/20 ,  H01L21/68

    Abstract: An apparatus configured to handle an object in a contactless manner, the apparatus includes a carrying body having a carrying surface which is configured to be directed towards the object, the carrying surface being provided with a plurality of traction members and a plurality of overpressure members, each overpressure member being provided with at least one exhaust opening, each traction member being provided with an indentation and at least two suction openings that are arranged in the indentation, the at least two suction openings of each traction member being configured to generate a pressure gradient between them so as to create a traction fluid flow in the indentation in a direction substantially parallel to the carrying surface; and a pressure controller configured to control the pressure gradient between the at least two suction openings of each traction member.

    PROJECTION SYSTEM, MIRROR AND RADIATION SOURCE FOR A LITHOGRAPHIC APPARATUS.
    7.
    发明专利
    PROJECTION SYSTEM, MIRROR AND RADIATION SOURCE FOR A LITHOGRAPHIC APPARATUS. 未知

    公开(公告)号：NL2011945A

    公开(公告)日：2014-07-29

    申请号：NL2011945

    申请日：2013-12-12

    Applicant: ASML NETHERLANDS BV

    Inventor： KERKHOF MARCUS ,  OOSTEN ANTON ,  BUTLER HANS ,  LOOPSTRA ERIK ,  WIJST MARC ,  ZAAL KOEN

    IPC: G03F7/20 ,  H05G2/00

    Abstract: Disclosed is a system configured to project a beam of radiation onto a target portion of a substrate within a lithographic apparatus. The system includes a radiation source. The radiation source includes a grating structure operable to suppress the zeroth order of reflected radiation for at least a first component wavelength. The grating structure has a periodic profile including regularly spaced structures providing three surface levels, such that radiation diffracted by the grating structure includes radiation of three phases which destructively interfere for at least the zeroth order of the reflected radiation for the first component wavelength. The grating structure is on a radiation collector within the source.

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