公开(公告)号：NL2005479A

公开(公告)日：2011-05-18

申请号：NL2005479

申请日：2010-10-07

Applicant: ASML NETHERLANDS BV

Inventor： GRAAF ROELOF ,  DZIOMKINA NINA ,  KERKHOF MARCUS ,  LEENDERS MARTINUS ,  LIEBREGTS PAULUS ,  ROOIJ GERARDUS ,  HOUBEN MARTIJN ,  BADAM VIJAY ,  SONDAG-HUETHORST JEANNET ,  KRUIJF NIEK

IPC: G03F7/20

Abstract: A sealing member is provided to prevent immersion liquid ingress to a gap between components. The sealing member has a plastic or polymer sealing portion that is adhered to the components forming the gap being sealed. The sealing member is constructed so as to reduce the force-coupling, in particular the time-related force-coupling, between the components being sealed.

公开(公告)号：NL2005478A

公开(公告)日：2011-05-18

申请号：NL2005478

申请日：2010-10-07

Applicant: ASML NETHERLANDS BV

Inventor： DZIOMKINA NINA ,  KRUIJF NIEK ,  GRAAF ROELOF ,  KERKHOF MARCUS ,  LEENDERS MARTINUS ,  LIEBREGTS PAULUS ,  ROOIJ GERARDUS ,  HOUBEN MARTIJN ,  BADAM VIJAY ,  SONDAG-HUETHORST JEANNET

IPC: G03F7/20

Abstract: A member is provided to prevent immersion liquid ingress to a gap between components or to adhere to at least one component to provide a surface to a feature of an immersion system. The member has a plastic sealing portion that is adhered to the component(s). The plastic sealing portion is opaque to DUV radiation. It may be resistant to degradation through exposure to DUV radiation. It may have a liquid phobic coating or property.

公开(公告)号：NL2004808A

公开(公告)日：2011-01-12

申请号：NL2004808

申请日：2010-06-03

Applicant: ASML NETHERLANDS BV

Inventor： PATEL HRISHIKESH ,  STEFFENS KOEN ,  LEMPENS HAN ,  LIEROP MATHIEUS ,  METSENAERE CHRISTOPHE ,  SPRUYTENBURG PATRICK ,  VERSTRAETE JORIS ,  BLOKS RUUD ,  MIRANDA MARCIO ,  JACOBS JOHANNES ,  LIEBREGTS PAULUS ,  HAM RONALD ,  SIMONS WILHELMUS ,  DIRECKS DANIEL ,  JANSSEN FRANCISCUS ,  BERKVENS PAUL ,  BRANDS GERT-JAN

IPC: G03F7/20

Abstract: A fluid handling structure configured to supply and confine immersion liquid to a space defined between a projection system and a facing surface facing the fluid handling structure is disclosed. The fluid handling structure includes a supply passage formed therein for the passage of fluid from outside the fluid handling structure to the space, and a thermal isolator positioned adjacent the supply passage at least partly to isolate fluid in the supply passage from a thermal load induced in the fluid handling structure.

公开(公告)号：NL2003362A

公开(公告)日：2010-04-19

申请号：NL2003362

申请日：2009-08-19

Applicant: ASML NETHERLANDS BV

Inventor： KUIT JAN JAAP ,  LIEBREGTS PAULUS

IPC: G03F7/20

Abstract: An immersion lithographic apparatus is provided in which a maximum permissible velocity of the substrate relative to a fluid confinement structure that controls the immersion fluid is determined based on a property of the substrate to be exposed and, during the exposure process, the velocity of the substrate relative to the fluid confinement structure is limited to be below this maximum permissible velocity.

公开(公告)号：NL2003914A

公开(公告)日：2010-06-09

申请号：NL2003914

申请日：2009-12-07

Applicant: ASML NETHERLANDS BV

Inventor： KNAAPEN THIJS ,  PELLENS RUDY ,  HOEVEN JAN ,  ANSTOTZ DAVID ,  BRANDS GERT-JAN ,  BADAM VIJAY ,  ZANDEN MARCUS ,  GROOT CASPER ,  BRULS RICHARD ,  DOMMELEN YOURI ,  JACOBS JOHANNES ,  KAMPHUIS MARTIJN ,  LIEBREGTS PAULUS ,  MAAS RUDOLF ,  STAVENGA MARCO ,  VERSPAGET COEN

IPC: G03F7/20

Abstract: A lithographic apparatus having a table including a target and/or a sensor and a liquid displacing device to displace liquid from the target and/or sensor using a localized gas flow is disclosed. The liquid displacement device may be positioned at various positions, e.g. mounted to a liquid handling device at an exposure station, adjacent or in a transfer path between the exposure station and a measurement station, at a load/unload station or adjacent a sensor.