公开(公告)号：JP2010141315A

公开(公告)日：2010-06-24

申请号：JP2009274065

申请日：2009-12-02

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： FRANCISCUS VAN HAREN RICHARD JOHANNES ,  SCHAAR MAURITS VAN DER

IPC: H01L21/027

CPC classification number: H01L23/544 ,  G03F7/70633 ,  G03F9/7076 ,  G03F9/708 ,  G03F9/7084 ,  H01L2223/54453 ,  H01L2924/0002 ,  H01L2924/00

Abstract: PROBLEM TO BE SOLVED: To provide improved forms of marker, in particular alignment and overlay markers, and a method of forming these markers on substrates.
SOLUTION: First, a pattern of two chemically distinct feature types having a pitch P1 comparable to product features is formed. This pattern is then masked by a resist 11 in the form of a desired marker, which includes a larger pitch P2 than the pattern. Finally, one of the two feature types is selectively etched in open areas. The result is a marker with the large pitch P2 suitable to be read with long wavelength radiation but the edges of the features are defined in an exposure step having the pitch P1 equivalent to the product features.
COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供改进形式的标记，特别是对准和覆盖标记，以及在基底上形成这些标记的方法。 解决方案：首先，形成具有与产品特征相当的间距P1的两种化学不同特征类型的图案。 然后，该图案被抗蚀剂11以期望的标记的形式掩蔽，该抗蚀剂11包括比图案更大的间距P2。 最后，两个特征类型中的一个在开放区域中被有选择地蚀刻。 结果是具有适于用长波长辐射读取的大间距P2的标记，但是特征的边缘在具有等同于产品特征的间距P1的曝光步骤中限定。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2009094512A

公开(公告)日：2009-04-30

申请号：JP2008259704

申请日：2008-10-06

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： MOS EVERHARDUS CORNELIS ,  DEN BOEF ARIE JEFFREY ,  SCHAAR MAURITS VAN DER ,  KEIJ STEFAN CAROLUS J A

IPC: H01L21/027 ,  G01B11/00 ,  G03F9/00

CPC classification number: G03F9/7049 ,  G03F9/7015 ,  G03F9/7088

Abstract: PROBLEM TO BE SOLVED: To provide an improved alignment system capable of detecting the marker which has received process fluctuation, by allowing use of smaller alignment marker or radiation of different wavelength. SOLUTION: An alignment sensor comprises a spatial coherent radiation source which supplies radiation beam to an angle-resolved skiatrometer. The surface of pupil specifies an angle of incidence of the position of radial direction of radiation at a substrate while an angular position specifies the azimuth angle of radiation. A detector is preferable to be a two-dimensional detector so as to be capable of measuring the two-dimensional angular dispersion spectrum of a substrate target. Alignment is carried out by detecting beats in the dispersion spectrum during scanning the substrate with respect to the skiatrometer. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：通过允许使用较小的对准标记或不同波长的辐射，提供能够检测已经接收到过程波动的标记的改进的对准系统。 解决方案：对准传感器包括空间相干辐射源，其将辐射束提供给角度分辨的测角仪。 瞳孔表面指定基板处的辐射径向位置的入射角，而角位置指定辐射的方位角。 检测器优选为二维检测器，以便能够测量基板靶的二维角分散光谱。 通过在扫描基板期间相对于滑雪测定仪检测分散光谱中的拍子来进行对准。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2009081436A

公开(公告)日：2009-04-16

申请号：JP2008232752

申请日：2008-09-11

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： TENNER MANFRED GAWEIN ,  SCHAAR MAURITS VAN DER

IPC: H01L21/027 ,  G01B11/00 ,  G03F9/00

CPC classification number: G01N21/55 ,  G01N21/88 ,  G03F7/70508 ,  G03F7/70633 ,  G03F7/7085

Abstract: PROBLEM TO BE SOLVED: To provide an alternative method of calculating an overlay error which reduces the effect of noise and results in a more accurate overlay error calculation. SOLUTION: The reflected radiation from a target mark including a plurality of diffraction gratings or the like is detected by an array of pixels. The overlay error of the gratings for each pixel is detected, and an array of overlay errors is determined. Rather than simply averaging the overlay error value for all the pixels, filtering is performed. Pixels may be filtered according to the detected value of the overlay error or the detected intensity of the pixel. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供计算覆盖误差的替代方法，其减少噪声的影响并导致更准确的覆盖误差计算。 解决方案：通过像素阵列检测来自包括多个衍射光栅等的目标标记的反射辐射。 检测每个像素的光栅的覆盖误差，确定重叠误差的阵列。 不是简单地平均所有像素的叠加误差值，而是执行滤波。 可以根据检测到的重叠误差值或像素的检测强度对像素进行滤波。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2008311645A

公开(公告)日：2008-12-25

申请号：JP2008148757

申请日：2008-06-06

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： MARIE KIERS ANTOINE GASTON ,  DEN BOEF ARIE JEFFREY ,  SCHAAR MAURITS VAN DER

IPC: H01L21/027 ,  G01B11/00

CPC classification number: G01N21/4788 ,  G01N21/95607 ,  G01N2021/95615 ,  G03F7/70633 ,  Y10T428/24331 ,  Y10T428/24942

Abstract: PROBLEM TO BE SOLVED: To provide a manufacturing method of a target capable of providing a scatterometry target, and of reducing the size of a diffraction grating of the target without impairing a further high-order diffraction order when the pitch of the diffraction grating is smaller than the wavelength of a measurement radiation beam. SOLUTION: An overlay target on a substrate is disclosed, the overlay target including a periodic array of structures wherein every structure is different from the rest of the structures. The periodic array is desirably made of two interlaced diffraction gratings, one of the gratings having a different pitch from the other grating in order to form an asymmetry in the array. This asymmetry can then be measured by measuring the diffraction spectra of radiation reflected from the overlay target. Variation in the asymmetry indicates the presence of an overlay error in layers on the substrate, where overlay targets are printed on subsequent layers. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：为了提供能够提供散射仪的目标物的制造方法，并且当衍射的间距为零时，减小靶的衍射光栅的尺寸而不损害另外的高阶衍射级 光栅小于测量辐射束的波长。 解决方案：公开了衬底上的覆盖目标，覆盖目标包括周期性结构阵列，其中每个结构与其余结构不同。 周期性阵列希望由两个隔行衍射光栅组成，其中一个光栅与另一个光栅具有不同的间距，以便在阵列中形成不对称。 然后可以通过测量从覆盖目标反射的辐射的衍射光谱来测量该不对称性。 不对称性的变化表示衬底上存在覆盖层错误，其中覆盖目标印刷在后续层上。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2008147654A

公开(公告)日：2008-06-26

申请号：JP2007310091

申请日：2007-11-30

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： MOS EVERHARDUS CORNELIS ,  SCHAAR MAURITS VAN DER ,  SIMONS HUBERTUS JOHANNES GERTR

IPC: H01L21/027

CPC classification number: G03F7/70725 ,  G03F7/70258 ,  G03F7/70358 ,  G03F7/70458 ,  G03F7/70525 ,  G03F7/70633 ,  G03F7/70783

Abstract: PROBLEM TO BE SOLVED: To provide an instrument and process that can reduce or correct the contribution of the strains or defects of a mask pattern to the strain of an exposure pattern.
SOLUTION: In the instrument for determining the process parameter of a process for generating an overlay pattern on a substrate, by applying a process model to a proposed process parameter and data, including a deduced overlay error between overlay patterns, the proposed overlay error corresponds to a process control, depending on the proposed value of the process parameter. Thus, the value determined for the process parameter corresponds to the minimum overlay error. The instrument determines the first value of the process parameter that generates the first portion of the overlay pattern in the first section of a target field, and a second value that is different from the first value of the process parameter for generating one of the second portion of the overlay pattern.
COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：提供可以减少或校正掩模图案的应变或缺陷对曝光图案的应变的贡献的仪器和工艺。 解决方案：在用于确定用于在衬底上生成覆盖图案的工艺的工艺参数的工具中，通过将工艺模型应用于所提出的工艺参数和数据，包括叠加图案之间的推导覆盖误差，所提出的覆盖 错误对应于过程控制，具体取决于过程参数的建议值。 因此，为过程参数确定的值对应于最小重叠误差。 仪器确定在目标场的第一部分中产生覆盖图案的第一部分的过程参数的第一值，以及不同于用于生成第二部分之一的过程参数的第一值的第二值 的覆盖图案。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：JP2008085326A

公开(公告)日：2008-04-10

申请号：JP2007232149

申请日：2007-09-07

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： WERKMAN ROY ,  MOS EVERHARDUS CORNELIS ,  SCHAAR MAURITS VAN DER

IPC: H01L21/027

CPC classification number: G03F7/70633

Abstract: PROBLEM TO BE SOLVED: To provide an apparatus capable of improving image quality in a plurality of focal depths.
SOLUTION: When using a scatterometer, different sections of a target region have different focal depths, respectively, and therefore, when measuring an entire region, a result of the measurement is partially out of a focus. In order to compensate this, a lens array is arranged in a back focal plane of a high numerical aperture lens.
COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 解决的问题：提供能够提高多个焦点深度的图像质量的装置。 解决方案：当使用散射仪时，目标区域的不同部分分别具有不同的焦深，因此当测量整个区域时，测量结果部分地不在焦点上。 为了补偿这一点，在高数值孔径透镜的后焦平面上布置透镜阵列。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：NL2002962A1

公开(公告)日：2009-12-14

申请号：NL2002962

申请日：2009-06-04

Applicant: ASML NETHERLANDS BV

Inventor： FUCHS ANDREAS ,  SCHAAR MAURITS VAN DER

IPC: G03F9/00 ,  H01L21/66 ,  H01L23/544

公开(公告)号：NL2003118A1

公开(公告)日：2010-01-18

申请号：NL2003118

申请日：2009-07-03

Applicant: ASML NETHERLANDS BV

Inventor： MOS EVERHARDUS ,  MEGENS HENRICUS ,  SCHAAR MAURITS VAN DER ,  SIMONS HUBERTUS ,  MIDDLEBROOKS SCOTT

IPC: G03F9/00 ,  G03F7/20 ,  H01L21/68

公开(公告)号：NL1036857A1

公开(公告)日：2009-10-22

申请号：NL1036857

申请日：2009-04-15

Applicant: ASML NETHERLANDS BV

Inventor： KERKHOF MARCUS ADRIANUS VAN DE ,  SCHAAR MAURITS VAN DER ,  FUCHS ANDREAS ,  COOGANS MARTYN JOHN

IPC: G03F7/20 ,  G01N21/47

公开(公告)号：NL1035874A1

公开(公告)日：2009-03-19

申请号：NL1035874

申请日：2008-08-27

Applicant: ASML NETHERLANDS BV

Inventor： TENNER MANFRED GAWEIN ,  SCHAAR MAURITS VAN DER

IPC: G03F9/00 ,  G01B11/00 ,  G03F7/20 ,  H01L21/027